TWI449665B - 自鋸縫回收及純化矽顆粒之方法 - Google Patents
自鋸縫回收及純化矽顆粒之方法 Download PDFInfo
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- TWI449665B TWI449665B TW098146020A TW98146020A TWI449665B TW I449665 B TWI449665 B TW I449665B TW 098146020 A TW098146020 A TW 098146020A TW 98146020 A TW98146020 A TW 98146020A TW I449665 B TWI449665 B TW I449665B
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- particles
- ruthenium
- cerium
- solid particulate
- mixture
- Prior art date
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- 238000000034 method Methods 0.000 title claims description 99
- 239000011856 silicon-based particle Substances 0.000 title claims description 6
- 239000002245 particle Substances 0.000 claims description 374
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 133
- 229910052707 ruthenium Inorganic materials 0.000 claims description 133
- 239000007787 solid Substances 0.000 claims description 129
- 239000000203 mixture Substances 0.000 claims description 121
- 229910052684 Cerium Inorganic materials 0.000 claims description 72
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 claims description 72
- 238000000926 separation method Methods 0.000 claims description 72
- 239000012530 fluid Substances 0.000 claims description 63
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 60
- 230000005291 magnetic effect Effects 0.000 claims description 59
- 229910052751 metal Inorganic materials 0.000 claims description 59
- 239000002184 metal Substances 0.000 claims description 59
- 239000007788 liquid Substances 0.000 claims description 50
- 230000001050 lubricating effect Effects 0.000 claims description 50
- 239000002002 slurry Substances 0.000 claims description 50
- 239000002923 metal particle Substances 0.000 claims description 46
- 239000000243 solution Substances 0.000 claims description 42
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 39
- 239000003929 acidic solution Substances 0.000 claims description 36
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- 239000002738 chelating agent Substances 0.000 claims description 32
- 239000000356 contaminant Substances 0.000 claims description 30
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 claims description 26
- 229910003468 tantalcarbide Inorganic materials 0.000 claims description 26
- 239000008346 aqueous phase Substances 0.000 claims description 24
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- 239000007864 aqueous solution Substances 0.000 claims description 21
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 16
- 229910052799 carbon Inorganic materials 0.000 claims description 16
- 238000005520 cutting process Methods 0.000 claims description 16
- 238000001914 filtration Methods 0.000 claims description 15
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- 238000001035 drying Methods 0.000 claims description 10
- 150000002739 metals Chemical class 0.000 claims description 9
- 229910052758 niobium Inorganic materials 0.000 claims description 9
- 239000010955 niobium Substances 0.000 claims description 9
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 9
- 239000012074 organic phase Substances 0.000 claims description 9
- 238000005188 flotation Methods 0.000 claims description 8
- 238000011084 recovery Methods 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- WXANAQMHYPHTGY-UHFFFAOYSA-N cerium;ethyne Chemical compound [Ce].[C-]#[C] WXANAQMHYPHTGY-UHFFFAOYSA-N 0.000 claims description 7
- 238000011109 contamination Methods 0.000 claims description 7
- 239000011630 iodine Substances 0.000 claims description 7
- 229910052740 iodine Inorganic materials 0.000 claims description 7
- 238000004062 sedimentation Methods 0.000 claims description 7
- 239000000443 aerosol Substances 0.000 claims description 6
- 229910052797 bismuth Inorganic materials 0.000 claims description 6
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 6
- 239000002480 mineral oil Substances 0.000 claims description 6
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- FZENGILVLUJGJX-NSCUHMNNSA-N (E)-acetaldehyde oxime Chemical compound C\C=N\O FZENGILVLUJGJX-NSCUHMNNSA-N 0.000 claims description 5
- UNASZPQZIFZUSI-UHFFFAOYSA-N methylidyneniobium Chemical compound [Nb]#C UNASZPQZIFZUSI-UHFFFAOYSA-N 0.000 claims description 4
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 4
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 238000002844 melting Methods 0.000 claims description 2
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- 238000000227 grinding Methods 0.000 claims 5
- 230000001419 dependent effect Effects 0.000 claims 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims 1
- QPJSUIGXIBEQAC-UHFFFAOYSA-N n-(2,4-dichloro-5-propan-2-yloxyphenyl)acetamide Chemical compound CC(C)OC1=CC(NC(C)=O)=C(Cl)C=C1Cl QPJSUIGXIBEQAC-UHFFFAOYSA-N 0.000 description 24
- 239000000463 material Substances 0.000 description 23
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 22
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 19
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 17
- 229910052802 copper Inorganic materials 0.000 description 17
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- 230000008569 process Effects 0.000 description 16
- 235000012431 wafers Nutrition 0.000 description 12
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- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 11
- 239000002253 acid Substances 0.000 description 10
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- 229910052760 oxygen Inorganic materials 0.000 description 8
- 239000011698 potassium fluoride Substances 0.000 description 8
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 8
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- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 6
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- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- 239000006061 abrasive grain Substances 0.000 description 4
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- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 229910000420 cerium oxide Inorganic materials 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
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- 229910052734 helium Inorganic materials 0.000 description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 4
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- 239000012528 membrane Substances 0.000 description 4
- 238000001000 micrograph Methods 0.000 description 4
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 4
- 238000000746 purification Methods 0.000 description 4
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- 238000002474 experimental method Methods 0.000 description 2
- 238000009291 froth flotation Methods 0.000 description 2
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 2
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- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
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- 210000003802 sputum Anatomy 0.000 description 2
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- 229910052712 strontium Inorganic materials 0.000 description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 2
- HJUGFYREWKUQJT-UHFFFAOYSA-N tetrabromomethane Chemical compound BrC(Br)(Br)Br HJUGFYREWKUQJT-UHFFFAOYSA-N 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
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- 239000010937 tungsten Substances 0.000 description 2
- 238000003828 vacuum filtration Methods 0.000 description 2
- 229910052902 vermiculite Inorganic materials 0.000 description 2
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- 238000004065 wastewater treatment Methods 0.000 description 2
- 238000005303 weighing Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- IMNZTTFHPDRADC-UHFFFAOYSA-N 2-(hydroxyiminomethyl)-4-sulfanylphenol Chemical compound SC1=CC=C(C(C=NO)=C1)O IMNZTTFHPDRADC-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
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- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
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- 150000001447 alkali salts Chemical class 0.000 description 1
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- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 125000005626 carbonium group Chemical group 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
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- 150000004696 coordination complex Chemical class 0.000 description 1
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- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- NQKXFODBPINZFK-UHFFFAOYSA-N dioxotantalum Chemical compound O=[Ta]=O NQKXFODBPINZFK-UHFFFAOYSA-N 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
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- 125000001153 fluoro group Chemical group F* 0.000 description 1
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- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
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- 239000007791 liquid phase Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 231100000053 low toxicity Toxicity 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
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- 239000011733 molybdenum Substances 0.000 description 1
- 238000000399 optical microscopy Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
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- 239000013055 pulp slurry Substances 0.000 description 1
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- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M175/00—Working-up used lubricants to recover useful products ; Cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03D—FLOTATION; DIFFERENTIAL SEDIMENTATION
- B03D1/00—Flotation
- B03D1/02—Froth-flotation processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
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- B03C1/02—Magnetic separation acting directly on the substance being separated
- B03C1/28—Magnetic plugs and dipsticks
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- B24B55/12—Devices for exhausting mist of oil or coolant; Devices for collecting or recovering materials resulting from grinding or polishing, e.g. of precious metals, precious stones, diamonds or the like
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- C10M175/005—Working-up used lubricants to recover useful products ; Cleaning using extraction processes; apparatus therefor
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- C—CHEMISTRY; METALLURGY
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- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
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- C10M175/02—Working-up used lubricants to recover useful products ; Cleaning mineral-oil based
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- B03C2201/20—Magnetic separation of bulk or dry particles in mixtures
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- B03D1/08—Subsequent treatment of concentrated product
- B03D1/085—Subsequent treatment of concentrated product of the feed, e.g. conditioning, de-sliming
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- C—CHEMISTRY; METALLURGY
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- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
- C10M2203/00—Organic non-macromolecular hydrocarbon compounds and hydrocarbon fractions as ingredients in lubricant compositions
- C10M2203/10—Petroleum or coal fractions, e.g. tars, solvents, bitumen
- C10M2203/1006—Petroleum or coal fractions, e.g. tars, solvents, bitumen used as base material
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- C—CHEMISTRY; METALLURGY
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- C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
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- C10M2209/1045—Polyethers, i.e. containing di- or higher polyoxyalkylene groups of alkylene oxides containing two carbon atoms only used as base material
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/10—Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
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- Oil, Petroleum & Natural Gas (AREA)
- Inorganic Chemistry (AREA)
- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Silicon Compounds (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Lubricants (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Separation Of Solids By Using Liquids Or Pneumatic Power (AREA)
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| WO2010078274A2 (en) * | 2008-12-31 | 2010-07-08 | Memc Electronic Materials, Inc. | Methods to recover and purify silicon particles from saw kerf |
| US20120186572A1 (en) * | 2009-07-28 | 2012-07-26 | Helmuth Treichel | Silicon wafer sawing fluid and process for use thereof |
| WO2011026473A1 (de) * | 2009-09-02 | 2011-03-10 | Guntram Krettek | Verfahren und vorrichtung zur wiederaufbereitung von verbrauchten bearbeitungsslurries |
| TW201144222A (en) * | 2010-06-04 | 2011-12-16 | Hong Jing Environment Company | A method for the silicon recycling |
| DE102010026923A1 (de) * | 2010-07-12 | 2012-01-12 | Centrotherm Sitec Gmbh | Verfahren zur Rückgewinnung von Silizium aus einer Sägesuspension |
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| WO2012109459A1 (en) * | 2011-02-09 | 2012-08-16 | Hariharan Alleppey V | Recovery of silicon value from kerf silicon waste |
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| US20150135829A1 (en) * | 2012-06-14 | 2015-05-21 | Presidents And Fellows Of Harvard College | Levitation of Materials in Paramagnetic Ionic Liquids |
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| US9114403B1 (en) * | 2013-06-03 | 2015-08-25 | Douglas Scott de Lange | Gravity recovery system and method for recovery of heavy metals from sands and gravels |
| DE102013218450B3 (de) * | 2013-09-14 | 2014-06-05 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Recycling von pulverförmigen Siliciumcarbid-Abfallprodukten |
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| JP6090154B2 (ja) * | 2013-12-26 | 2017-03-08 | 信越半導体株式会社 | スライス方法 |
| JP6172030B2 (ja) * | 2014-04-03 | 2017-08-02 | 信越半導体株式会社 | ワークの切断方法及び加工液 |
| DE102014007354B4 (de) | 2014-05-19 | 2019-05-29 | Viridis.iQ GmbH | Verfahren zum Aufbereiten von Rückständen aus der mechanischen Bearbeitung von Siliziumprodukten |
| CN104148166B (zh) * | 2014-08-06 | 2016-06-22 | 昆明理工大学 | 一种复杂碲矿石的选矿方法 |
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| JP5850192B1 (ja) * | 2015-03-19 | 2016-02-03 | コニカミノルタ株式会社 | 研磨材の回収方法 |
| CN105013595B (zh) * | 2015-08-07 | 2017-05-24 | 华北理工大学 | 一种低品位蓝晶石生产高纯蓝晶石的选矿方法 |
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| CN105214830A (zh) * | 2015-11-09 | 2016-01-06 | 攀钢集团矿业有限公司 | 磁性矿物分级方法 |
| CN105798053B (zh) * | 2016-04-27 | 2018-01-23 | 浙江工业大学 | 一种污染砂石处理装置 |
| CN106010764A (zh) * | 2016-05-19 | 2016-10-12 | 苏州晶樱光电科技有限公司 | 一种硅片切割砂浆回收方法 |
| JP7168288B2 (ja) * | 2017-04-19 | 2022-11-09 | サンパワー コーポレイション | シリコン切粉を電子級ポリシリコンまたは冶金級シリコンにリサイクルする方法 |
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| CN108855584A (zh) * | 2018-06-28 | 2018-11-23 | 马钢集团设计研究院有限责任公司 | 一种难选低品位磁铁矿石生产高质量铁精矿的选矿工艺 |
| CN109759248B (zh) * | 2019-02-28 | 2021-06-01 | 玉溪大红山矿业有限公司 | 一种井下低品位铁矿磁重联合提质降尾的选矿工艺 |
| CN111822154B (zh) * | 2020-07-30 | 2023-10-13 | 济南大学 | 一种从硅渣中浮选硅的方法 |
| KR102647640B1 (ko) * | 2020-10-30 | 2024-03-14 | 하나머티리얼즈(주) | 실리콘 슬러지로부터 고순도 실리콘 분말 회수 및 정제 방법 |
| KR102672043B1 (ko) * | 2021-01-21 | 2024-06-05 | 하나머티리얼즈(주) | 탄화규소 재생 방법 및 이를 이용한 단결정 탄화규소의 제조 방법 |
| CN115193101B (zh) * | 2021-04-09 | 2024-02-13 | 中国矿业大学 | 一种线切冷却液回收方法 |
| CN114588998B (zh) * | 2022-01-28 | 2024-01-30 | 山东华特磁电科技股份有限公司 | 含钽铌、锡石、长石、锂辉石的伟晶岩综合利用方法 |
| JP2024043122A (ja) * | 2022-09-16 | 2024-03-29 | キオクシア株式会社 | 端材回収装置 |
| CN116177552B (zh) * | 2023-02-22 | 2023-11-17 | 江苏秉盛环保工程有限公司 | 硅片切割液硅粉回收系统及其工艺 |
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- 2009-12-28 EP EP13174613.3A patent/EP2679662A3/en not_active Withdrawn
- 2009-12-28 EP EP13174612.5A patent/EP2662432A1/en not_active Withdrawn
- 2009-12-28 MY MYPI2011003084A patent/MY159778A/en unknown
- 2009-12-28 JP JP2011544566A patent/JP5539390B2/ja not_active Expired - Fee Related
- 2009-12-28 EP EP09796277A patent/EP2382291A2/en not_active Withdrawn
- 2009-12-28 SG SG2011047933A patent/SG172435A1/en unknown
- 2009-12-28 KR KR1020117017816A patent/KR101538827B1/ko not_active Expired - Fee Related
- 2009-12-28 CN CN2009801575910A patent/CN102388121B/zh not_active Expired - Fee Related
- 2009-12-28 EP EP14158888.9A patent/EP2743335A1/en not_active Withdrawn
- 2009-12-28 SG SG2013022934A patent/SG188935A1/en unknown
- 2009-12-30 TW TW098146020A patent/TWI449665B/zh not_active IP Right Cessation
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Also Published As
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|---|---|
| CN102388121A (zh) | 2012-03-21 |
| EP2743335A1 (en) | 2014-06-18 |
| EP2679662A2 (en) | 2014-01-01 |
| US8505733B2 (en) | 2013-08-13 |
| MY159778A (en) | 2017-01-31 |
| SG188935A1 (en) | 2013-04-30 |
| WO2010078274A3 (en) | 2010-12-16 |
| EP2679662A3 (en) | 2014-04-23 |
| US8231006B2 (en) | 2012-07-31 |
| JP2012514349A (ja) | 2012-06-21 |
| KR20110111296A (ko) | 2011-10-10 |
| WO2010078274A2 (en) | 2010-07-08 |
| SG172435A1 (en) | 2011-07-28 |
| JP5539390B2 (ja) | 2014-07-02 |
| US20120024761A1 (en) | 2012-02-02 |
| EP2662432A1 (en) | 2013-11-13 |
| US8528740B2 (en) | 2013-09-10 |
| CN102388121B (zh) | 2013-08-21 |
| US20100163462A1 (en) | 2010-07-01 |
| EP2382291A2 (en) | 2011-11-02 |
| TW201034950A (en) | 2010-10-01 |
| US20120027660A1 (en) | 2012-02-02 |
| KR101538827B1 (ko) | 2015-07-22 |
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