TWI359470B - Method and apparatus for monitoring and controllin - Google Patents

Method and apparatus for monitoring and controllin Download PDF

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Publication number
TWI359470B
TWI359470B TW093122003A TW93122003A TWI359470B TW I359470 B TWI359470 B TW I359470B TW 093122003 A TW093122003 A TW 093122003A TW 93122003 A TW93122003 A TW 93122003A TW I359470 B TWI359470 B TW I359470B
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TW
Taiwan
Prior art keywords
wafer
immersion
volume
medium
immersion medium
Prior art date
Application number
TW093122003A
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English (en)
Chinese (zh)
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TW200511470A (en
Inventor
Harry J Levinson
Original Assignee
Globalfoundries Us Inc
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Publication date
Application filed by Globalfoundries Us Inc filed Critical Globalfoundries Us Inc
Publication of TW200511470A publication Critical patent/TW200511470A/zh
Application granted granted Critical
Publication of TWI359470B publication Critical patent/TWI359470B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
TW093122003A 2003-08-11 2004-07-23 Method and apparatus for monitoring and controllin TWI359470B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/638,927 US7061578B2 (en) 2003-08-11 2003-08-11 Method and apparatus for monitoring and controlling imaging in immersion lithography systems

Publications (2)

Publication Number Publication Date
TW200511470A TW200511470A (en) 2005-03-16
TWI359470B true TWI359470B (en) 2012-03-01

Family

ID=34135772

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093122003A TWI359470B (en) 2003-08-11 2004-07-23 Method and apparatus for monitoring and controllin

Country Status (8)

Country Link
US (1) US7061578B2 (enExample)
EP (1) EP1654593B1 (enExample)
JP (1) JP2007502539A (enExample)
KR (1) KR101152366B1 (enExample)
CN (1) CN1826559A (enExample)
DE (1) DE602004027261D1 (enExample)
TW (1) TWI359470B (enExample)
WO (1) WO2005017625A2 (enExample)

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KR101152366B1 (ko) 2012-06-05
JP2007502539A (ja) 2007-02-08
US20050037269A1 (en) 2005-02-17
KR20060058713A (ko) 2006-05-30
TW200511470A (en) 2005-03-16
DE602004027261D1 (de) 2010-07-01
CN1826559A (zh) 2006-08-30
EP1654593A2 (en) 2006-05-10
EP1654593B1 (en) 2010-05-19
WO2005017625A2 (en) 2005-02-24
US7061578B2 (en) 2006-06-13

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