TW584893B - Method and apparatus for removing organic films - Google Patents
Method and apparatus for removing organic films Download PDFInfo
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- TW584893B TW584893B TW091124051A TW91124051A TW584893B TW 584893 B TW584893 B TW 584893B TW 091124051 A TW091124051 A TW 091124051A TW 91124051 A TW91124051 A TW 91124051A TW 584893 B TW584893 B TW 584893B
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3063—Electrolytic etching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D9/00—Chemical paint or ink removers
- C09D9/005—Chemical paint or ink removers containing organic solvents
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/266—Esters or carbonates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
- G03F7/422—Stripping or agents therefor using liquids only
- G03F7/423—Stripping or agents therefor using liquids only containing mineral acids or salts thereof, containing mineral oxidizing substances, e.g. peroxy compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B2203/00—Details of cleaning machines or methods involving the use or presence of liquid or steam
- B08B2203/005—Details of cleaning machines or methods involving the use or presence of liquid or steam the liquid being ozonated
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Emergency Medicine (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Liquid Crystal (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Drying Of Semiconductors (AREA)
- Weting (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001325516 | 2001-10-23 | ||
| JP2002061096 | 2002-03-06 | ||
| JP2002229394A JP3914842B2 (ja) | 2001-10-23 | 2002-08-07 | 有機被膜の除去方法および除去装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW584893B true TW584893B (en) | 2004-04-21 |
Family
ID=27347717
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW091124051A TW584893B (en) | 2001-10-23 | 2002-10-18 | Method and apparatus for removing organic films |
Country Status (5)
| Country | Link |
|---|---|
| US (2) | US6696228B2 (OSRAM) |
| JP (1) | JP3914842B2 (OSRAM) |
| KR (2) | KR100882988B1 (OSRAM) |
| CN (1) | CN1286154C (OSRAM) |
| TW (1) | TW584893B (OSRAM) |
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| US7586581B2 (en) | 2004-07-02 | 2009-09-08 | Sharp Kabushiki Kaisha | Developing method of photoresist and developing device |
| TWI406111B (zh) * | 2007-05-23 | 2013-08-21 | Meidensha Electric Mfg Co Ltd | Method for removing resist and device thereof |
| TWI584085B (zh) * | 2014-11-18 | 2017-05-21 | Lg 化學股份有限公司 | 光阻移除裝置及使用其的光阻移除方法 |
| TWI615895B (zh) * | 2013-01-22 | 2018-02-21 | 東京電子Ｆｓｉ股份有限公司 | 自基板移除碳物質之製程 |
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2002
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- 2002-10-18 TW TW091124051A patent/TW584893B/zh not_active IP Right Cessation
- 2002-10-21 US US10/274,153 patent/US6696228B2/en not_active Expired - Fee Related
- 2002-10-22 CN CNB021471231A patent/CN1286154C/zh not_active Expired - Lifetime
- 2002-10-23 KR KR1020020064786A patent/KR100882988B1/ko not_active Expired - Fee Related
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- 2003-10-14 US US10/683,288 patent/US6851873B2/en not_active Expired - Lifetime
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- 2005-11-21 KR KR1020050111295A patent/KR100806476B1/ko not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7586581B2 (en) | 2004-07-02 | 2009-09-08 | Sharp Kabushiki Kaisha | Developing method of photoresist and developing device |
| TWI406111B (zh) * | 2007-05-23 | 2013-08-21 | Meidensha Electric Mfg Co Ltd | Method for removing resist and device thereof |
| TWI615895B (zh) * | 2013-01-22 | 2018-02-21 | 東京電子Ｆｓｉ股份有限公司 | 自基板移除碳物質之製程 |
| TWI584085B (zh) * | 2014-11-18 | 2017-05-21 | Lg 化學股份有限公司 | 光阻移除裝置及使用其的光阻移除方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003330206A (ja) | 2003-11-19 |
| JP3914842B2 (ja) | 2007-05-16 |
| KR100882988B1 (ko) | 2009-02-12 |
| US20040076912A1 (en) | 2004-04-22 |
| CN1414610A (zh) | 2003-04-30 |
| US20030108823A1 (en) | 2003-06-12 |
| CN1286154C (zh) | 2006-11-22 |
| US6696228B2 (en) | 2004-02-24 |
| US6851873B2 (en) | 2005-02-08 |
| KR20050115844A (ko) | 2005-12-08 |
| KR20030033988A (ko) | 2003-05-01 |
| KR100806476B1 (ko) | 2008-02-21 |
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