TW369679B - Method and apparatus for cleaning treatment - Google Patents

Method and apparatus for cleaning treatment

Info

Publication number
TW369679B
TW369679B TW086113798A TW86113798A TW369679B TW 369679 B TW369679 B TW 369679B TW 086113798 A TW086113798 A TW 086113798A TW 86113798 A TW86113798 A TW 86113798A TW 369679 B TW369679 B TW 369679B
Authority
TW
Taiwan
Prior art keywords
vessel
cleaning
liquid
cleaning treatment
cleaning means
Prior art date
Application number
TW086113798A
Other languages
English (en)
Inventor
Ikuo Sato
Mitsuhiro Sakai
Takeshi Tsukamoto
Yoichi Honda
Yasumitsu Yamaguchi
Kimio Motoda
Tetsuya Sada
Kiyohisa Tateyama
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP27129296A external-priority patent/JP3289208B2/ja
Priority claimed from JP31860696A external-priority patent/JP3250095B2/ja
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of TW369679B publication Critical patent/TW369679B/zh

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V33/00—Structural combinations of lighting devices with other articles, not otherwise provided for
    • F21V33/0088—Ventilating systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
    • A61L9/00—Disinfection, sterilisation or deodorisation of air
    • A61L9/16—Disinfection, sterilisation or deodorisation of air using physical phenomena
    • A61L9/18—Radiation
    • A61L9/20—Ultraviolet radiation
    • A61L9/205—Ultraviolet radiation using a photocatalyst or photosensitiser
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Veterinary Medicine (AREA)
  • Epidemiology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Animal Behavior & Ethology (AREA)
  • Chemical & Material Sciences (AREA)
  • Public Health (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning In General (AREA)
  • Cleaning By Liquid Or Steam (AREA)
TW086113798A 1996-09-24 1997-09-23 Method and apparatus for cleaning treatment TW369679B (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP27129296A JP3289208B2 (ja) 1996-09-24 1996-09-24 洗浄処理方法及び洗浄処理装置
JP31860696A JP3250095B2 (ja) 1996-11-15 1996-11-15 洗浄装置及び洗浄方法
JP943297 1997-01-22

Publications (1)

Publication Number Publication Date
TW369679B true TW369679B (en) 1999-09-11

Family

ID=27278478

Family Applications (1)

Application Number Title Priority Date Filing Date
TW086113798A TW369679B (en) 1996-09-24 1997-09-23 Method and apparatus for cleaning treatment

Country Status (4)

Country Link
US (3) US6159288A (zh)
KR (1) KR100549879B1 (zh)
SG (3) SG103277A1 (zh)
TW (1) TW369679B (zh)

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KR100945768B1 (ko) * 2006-10-05 2010-03-08 도쿄엘렉트론가부시키가이샤 기판 처리 장치, 기판 처리 방법 및 배액컵의 세정 방법
JP4926678B2 (ja) * 2006-12-04 2012-05-09 東京エレクトロン株式会社 液浸露光用洗浄装置および洗浄方法、ならびにコンピュータプログラムおよび記憶媒体
WO2008081504A1 (ja) * 2006-12-27 2008-07-10 C.Uyemura & Co., Ltd. 表面処理装置
JP2008251806A (ja) * 2007-03-30 2008-10-16 Sumco Corp ウェーハの枚葉式エッチング方法及びそのエッチング装置
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US8028709B2 (en) * 2009-01-12 2011-10-04 Texas Instruments Incorporated Photoresist dispenser with nozzle arrangement for cone-shaped spray
JP5183659B2 (ja) * 2010-03-23 2013-04-17 東京エレクトロン株式会社 基板処理装置、基板処理方法、プログラム及びコンピュータ記憶媒体
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US9421617B2 (en) 2011-06-22 2016-08-23 Tel Nexx, Inc. Substrate holder
US9117856B2 (en) 2011-07-06 2015-08-25 Tel Nexx, Inc. Substrate loader and unloader having an air bearing support
US9573297B2 (en) * 2011-11-21 2017-02-21 Reza Reza Youssefi Method and system for enhancing polymerization and nanoparticle production
US20130133701A1 (en) * 2011-11-28 2013-05-30 Intermolecular, Inc. Method and apparatus for dispensing an inert gas
JP6020271B2 (ja) * 2013-03-18 2016-11-02 東京エレクトロン株式会社 液処理装置
JP6239893B2 (ja) * 2013-08-07 2017-11-29 株式会社荏原製作所 ウェット処理装置及びこれを備えた基板処理装置
US10307798B2 (en) 2015-08-28 2019-06-04 Taiwan Semiconducter Manufacturing Company Limited Cleaning device for cleaning electroplating substrate holder
CN105499091A (zh) * 2016-01-04 2016-04-20 京东方科技集团股份有限公司 一种配向液的涂布方法及涂布装置
US10105732B2 (en) * 2016-01-05 2018-10-23 Taiwan Semiconductor Manufacturing Co., Ltd. Coater and surface treatment method
US10245529B2 (en) * 2017-02-27 2019-04-02 GM Global Technology Operations LLC System and apparatus to improve venting and spill mitigation for tank
CN107199188B (zh) 2017-06-12 2020-03-27 京东方科技集团股份有限公司 涂布机、涂布系统及涂布机清洁方法
EP3594748B1 (en) * 2018-07-09 2021-04-14 C&D Semiconductor Services. Inc Optimal exposure of a bottom surface of a substrate material and/or edges thereof for cleaning in a spin coating device
CN113731726B (zh) * 2020-05-30 2024-04-02 郑州航天电子技术有限公司 一种圆形连接器壳体表面自动涂覆标志漆设备
KR20220092345A (ko) * 2020-12-24 2022-07-01 세메스 주식회사 기판 처리 장치 및 기판 처리 방법

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Also Published As

Publication number Publication date
US20020162574A1 (en) 2002-11-07
SG103277A1 (en) 2004-04-29
SG98022A1 (en) 2003-08-20
US6159288A (en) 2000-12-12
US6770149B2 (en) 2004-08-03
KR100549879B1 (ko) 2006-02-06
US6398879B1 (en) 2002-06-04
SG76527A1 (en) 2000-11-21

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MM4A Annulment or lapse of patent due to non-payment of fees