TW201910916A - 感光性樹脂組成物、感光性轉印材料、電路配線的製造方法及觸控面板的製造方法 - Google Patents

感光性樹脂組成物、感光性轉印材料、電路配線的製造方法及觸控面板的製造方法 Download PDF

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Publication number
TW201910916A
TW201910916A TW107119995A TW107119995A TW201910916A TW 201910916 A TW201910916 A TW 201910916A TW 107119995 A TW107119995 A TW 107119995A TW 107119995 A TW107119995 A TW 107119995A TW 201910916 A TW201910916 A TW 201910916A
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TW
Taiwan
Prior art keywords
photosensitive resin
group
resin composition
acid
pattern
Prior art date
Application number
TW107119995A
Other languages
English (en)
Chinese (zh)
Inventor
山田悟
後藤英範
Original Assignee
日商富士軟片股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商富士軟片股份有限公司 filed Critical 日商富士軟片股份有限公司
Publication of TW201910916A publication Critical patent/TW201910916A/zh

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F120/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F120/10—Esters
    • C08F120/26—Esters containing oxygen in addition to the carboxy oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Human Computer Interaction (AREA)
  • Health & Medical Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
TW107119995A 2017-07-28 2018-06-11 感光性樹脂組成物、感光性轉印材料、電路配線的製造方法及觸控面板的製造方法 TW201910916A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017-147150 2017-07-28
JP2017147150 2017-07-28

Publications (1)

Publication Number Publication Date
TW201910916A true TW201910916A (zh) 2019-03-16

Family

ID=65040500

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107119995A TW201910916A (zh) 2017-07-28 2018-06-11 感光性樹脂組成物、感光性轉印材料、電路配線的製造方法及觸控面板的製造方法

Country Status (4)

Country Link
JP (1) JP6808045B2 (ja)
CN (1) CN110998441A (ja)
TW (1) TW201910916A (ja)
WO (1) WO2019021622A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021024650A1 (ja) * 2019-08-02 2021-02-11 富士フイルム株式会社 感光性転写部材、樹脂パターンの製造方法、回路配線の製造方法、タッチパネルの製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3731356B2 (ja) * 1997-08-13 2006-01-05 三菱化学株式会社 ポジ型感光性組成物、感光性平版印刷版及びポジ画像の形成方法
JP4376347B2 (ja) * 1999-03-31 2009-12-02 富士フイルム株式会社 酸発生組成物
JP4582948B2 (ja) * 2000-12-15 2010-11-17 株式会社林原生物化学研究所 画像表示材料
JP4483371B2 (ja) * 2003-04-07 2010-06-16 東レ株式会社 感光性樹脂組成物
JP2004361557A (ja) * 2003-06-03 2004-12-24 Fuji Photo Film Co Ltd 記録材料
JP2006220863A (ja) * 2005-02-09 2006-08-24 Fuji Photo Film Co Ltd パターン形成材料、並びにパターン形成装置及びパターン形成方法
JP4657783B2 (ja) * 2005-04-08 2011-03-23 富士フイルム株式会社 画像形成材料及び平版印刷版原版
JP2008122501A (ja) * 2006-11-09 2008-05-29 Sumitomo Chemical Co Ltd ポジ型感放射線性樹脂組成物
JP5343664B2 (ja) * 2009-03-30 2013-11-13 Ｊｓｒ株式会社 感放射線性樹脂組成物、有機ｅｌ表示素子用隔壁及び絶縁膜、並びにその形成方法
KR20110031089A (ko) * 2009-09-18 2011-03-24 제이에스알 가부시끼가이샤 표시 소자용 보호막, 절연막 또는 스페이서로서의 경화물 형성용 감방사선성 수지 조성물, 경화물 및 그 형성 방법
JP2017078852A (ja) * 2015-10-21 2017-04-27 富士フイルム株式会社 ドライフィルムレジスト、回路配線の製造方法、回路配線、入力装置および表示装置
JP6573545B2 (ja) * 2015-12-21 2019-09-11 富士フイルム株式会社 ポジ型感光性転写材料及び回路配線の製造方法

Also Published As

Publication number Publication date
CN110998441A (zh) 2020-04-10
JP6808045B2 (ja) 2021-01-06
WO2019021622A1 (ja) 2019-01-31
JPWO2019021622A1 (ja) 2020-05-28

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