CN110998441A - 感光性树脂组合物、感光性转印材料、电路布线的制造方法及触摸面板的制造方法 - Google Patents
感光性树脂组合物、感光性转印材料、电路布线的制造方法及触摸面板的制造方法 Download PDFInfo
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- CN110998441A CN110998441A CN201880049839.0A CN201880049839A CN110998441A CN 110998441 A CN110998441 A CN 110998441A CN 201880049839 A CN201880049839 A CN 201880049839A CN 110998441 A CN110998441 A CN 110998441A
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- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F120/00—Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F120/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
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- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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- Manufacturing Of Printed Circuit Boards (AREA)
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| JP2017147150 | 2017-07-28 | ||
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| CN102023480A (zh) * | 2009-09-18 | 2011-04-20 | Jsr株式会社 | 放射线敏感性树脂组合物、作为显示元件用保护膜、绝缘膜或分隔物的固化物及其形成方法 |
| JP2017078852A (ja) * | 2015-10-21 | 2017-04-27 | 富士フイルム株式会社 | ドライフィルムレジスト、回路配線の製造方法、回路配線、入力装置および表示装置 |
| CN106959585A (zh) * | 2015-12-21 | 2017-07-18 | 富士胶片株式会社 | 正型感光性转印材料和电路布线的制造方法 |
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| JP3731356B2 (ja) * | 1997-08-13 | 2006-01-05 | 三菱化学株式会社 | ポジ型感光性組成物、感光性平版印刷版及びポジ画像の形成方法 |
| JP4376347B2 (ja) * | 1999-03-31 | 2009-12-02 | 富士フイルム株式会社 | 酸発生組成物 |
| JP4582948B2 (ja) * | 2000-12-15 | 2010-11-17 | 株式会社林原生物化学研究所 | 画像表示材料 |
| JP4483371B2 (ja) * | 2003-04-07 | 2010-06-16 | 東レ株式会社 | 感光性樹脂組成物 |
| JP2004361557A (ja) * | 2003-06-03 | 2004-12-24 | Fuji Photo Film Co Ltd | 記録材料 |
| JP2006220863A (ja) * | 2005-02-09 | 2006-08-24 | Fuji Photo Film Co Ltd | パターン形成材料、並びにパターン形成装置及びパターン形成方法 |
| JP4657783B2 (ja) * | 2005-04-08 | 2011-03-23 | 富士フイルム株式会社 | 画像形成材料及び平版印刷版原版 |
| JP2008122501A (ja) * | 2006-11-09 | 2008-05-29 | Sumitomo Chemical Co Ltd | ポジ型感放射線性樹脂組成物 |
| JP5343664B2 (ja) * | 2009-03-30 | 2013-11-13 | Ｊｓｒ株式会社 | 感放射線性樹脂組成物、有機ｅｌ表示素子用隔壁及び絶縁膜、並びにその形成方法 |
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- 2018-06-11 TW TW107119995A patent/TW201910916A/zh unknown
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102023480A (zh) * | 2009-09-18 | 2011-04-20 | Jsr株式会社 | 放射线敏感性树脂组合物、作为显示元件用保护膜、绝缘膜或分隔物的固化物及其形成方法 |
| JP2017078852A (ja) * | 2015-10-21 | 2017-04-27 | 富士フイルム株式会社 | ドライフィルムレジスト、回路配線の製造方法、回路配線、入力装置および表示装置 |
| CN106959585A (zh) * | 2015-12-21 | 2017-07-18 | 富士胶片株式会社 | 正型感光性转印材料和电路布线的制造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201910916A (zh) | 2019-03-16 |
| JP6808045B2 (ja) | 2021-01-06 |
| WO2019021622A1 (ja) | 2019-01-31 |
| JPWO2019021622A1 (ja) | 2020-05-28 |
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