TW201614367A - Pellicle, pellicle production method and exposure method using pellicle - Google Patents

Pellicle, pellicle production method and exposure method using pellicle

Info

Publication number
TW201614367A
TW201614367A TW104130869A TW104130869A TW201614367A TW 201614367 A TW201614367 A TW 201614367A TW 104130869 A TW104130869 A TW 104130869A TW 104130869 A TW104130869 A TW 104130869A TW 201614367 A TW201614367 A TW 201614367A
Authority
TW
Taiwan
Prior art keywords
pellicle
frame body
pellicle film
production method
filter
Prior art date
Application number
TW104130869A
Other languages
English (en)
Other versions
TWI693466B (zh
Inventor
Kazuo Kohmura
Daiki Taneichi
Takashi Kozeki
Yosuke Ono
Hisako Ishikawa
Tsuneaki BIYAJIMA
Atsushi Okubo
Yasuyuki Sato
Toshiaki Hirota
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Publication of TW201614367A publication Critical patent/TW201614367A/zh
Application granted granted Critical
Publication of TWI693466B publication Critical patent/TWI693466B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
TW104130869A 2014-09-19 2015-09-18 防塵薄膜、防塵薄膜的製造方法及使用防塵薄膜的曝光方法 TWI693466B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014-192007 2014-09-19
JP2014192007 2014-09-19

Publications (2)

Publication Number Publication Date
TW201614367A true TW201614367A (en) 2016-04-16
TWI693466B TWI693466B (zh) 2020-05-11

Family

ID=55533337

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104130869A TWI693466B (zh) 2014-09-19 2015-09-18 防塵薄膜、防塵薄膜的製造方法及使用防塵薄膜的曝光方法

Country Status (8)

Country Link
US (1) US10585348B2 (zh)
EP (1) EP3196700B1 (zh)
JP (1) JP6367342B2 (zh)
KR (1) KR101910302B1 (zh)
CN (1) CN106796391B (zh)
SG (1) SG11201701802SA (zh)
TW (1) TWI693466B (zh)
WO (1) WO2016043301A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI797292B (zh) * 2018-03-27 2023-04-01 日商三井化學股份有限公司 支持框、防塵薄膜及曝光原版、及使用上述的曝光裝置、以及半導體裝置的製造方法

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SG11201701805QA (en) * 2014-09-19 2017-04-27 Mitsui Chemicals Inc Pellicle, production method thereof, exposure method
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Publication number Priority date Publication date Assignee Title
TWI797292B (zh) * 2018-03-27 2023-04-01 日商三井化學股份有限公司 支持框、防塵薄膜及曝光原版、及使用上述的曝光裝置、以及半導體裝置的製造方法

Also Published As

Publication number Publication date
JP6367342B2 (ja) 2018-08-01
CN106796391B (zh) 2020-02-11
WO2016043301A1 (ja) 2016-03-24
EP3196700B1 (en) 2019-01-30
SG11201701802SA (en) 2017-04-27
KR20170038910A (ko) 2017-04-07
US20170184957A1 (en) 2017-06-29
CN106796391A (zh) 2017-05-31
EP3196700A1 (en) 2017-07-26
KR101910302B1 (ko) 2018-10-19
EP3196700A4 (en) 2018-06-20
TWI693466B (zh) 2020-05-11
JPWO2016043301A1 (ja) 2017-06-29
US10585348B2 (en) 2020-03-10

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