EP3481562A4 - Patterning of nanostructures using imprint lithography - Google Patents
Patterning of nanostructures using imprint lithography Download PDFInfo
- Publication number
- EP3481562A4 EP3481562A4 EP17824706.0A EP17824706A EP3481562A4 EP 3481562 A4 EP3481562 A4 EP 3481562A4 EP 17824706 A EP17824706 A EP 17824706A EP 3481562 A4 EP3481562 A4 EP 3481562A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- nanostructures
- patterning
- imprint lithography
- imprint
- lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001459 lithography Methods 0.000 title 1
- 239000002086 nanomaterial Substances 0.000 title 1
- 238000000059 patterning Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/02—Thermal after-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B3/00—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form
- B32B3/10—Layered products comprising a layer with external or internal discontinuities or unevennesses, or a layer of non-planar shape; Layered products comprising a layer having particular features of form characterised by a discontinuous layer, i.e. formed of separate pieces of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/16—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by features of a layer formed of particles, e.g. chips, powder or granules
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/22—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed
- B32B5/30—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by the presence of two or more layers which are next to each other and are fibrous, filamentary, formed of particles or foamed one layer being formed of particles, e.g. chips, granules, powder
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
- C09D11/033—Printing inks characterised by features other than the chemical nature of the binder characterised by the solvent
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
- C09D11/037—Printing inks characterised by features other than the chemical nature of the binder characterised by the pigment
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/52—Electrically conductive inks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/06—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1283—Control of temperature, e.g. gradual temperature increase, modulation of temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
- H01L21/02288—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating printing, e.g. ink-jet printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C71/00—After-treatment of articles without altering their shape; Apparatus therefor
- B29C71/02—Thermal after-treatment
- B29C2071/022—Annealing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Wood Science & Technology (AREA)
- Thermal Sciences (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Dispersion Chemistry (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662359967P | 2016-07-08 | 2016-07-08 | |
PCT/US2017/039294 WO2018009363A1 (en) | 2016-07-08 | 2017-06-26 | Patterning of nanostructures using imprint lithography |
Publications (2)
Publication Number | Publication Date |
---|---|
EP3481562A1 EP3481562A1 (en) | 2019-05-15 |
EP3481562A4 true EP3481562A4 (en) | 2019-06-26 |
Family
ID=60913124
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP17824706.0A Pending EP3481562A4 (en) | 2016-07-08 | 2017-06-26 | Patterning of nanostructures using imprint lithography |
Country Status (4)
Country | Link |
---|---|
US (1) | US20190243237A1 (en) |
EP (1) | EP3481562A4 (en) |
CN (1) | CN109414726A (en) |
WO (1) | WO2018009363A1 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017174755A1 (en) * | 2016-04-06 | 2017-10-12 | Koninklijke Philips N.V. | Imprint lithography stamp method of making and using the same |
EP3596544B1 (en) * | 2017-03-16 | 2021-09-22 | Université d'Aix-Marseille | Nanoimprint lithography process and patterned substrate obtainable therefrom |
JP2020515011A (en) * | 2017-03-17 | 2020-05-21 | ユニバーシティ オブ マサチューセッツ | Direct printing of 3D microbatteries and electrodes |
US11262495B1 (en) | 2017-10-04 | 2022-03-01 | Facebook Technologies, Llc | Waveguides with high refractive index gratings manufactured by post-patterning infusion |
US11035988B1 (en) * | 2018-05-22 | 2021-06-15 | Facebook Technologies, Llc | Tunable shrinkage process for manufacturing gratings |
US20200278605A1 (en) * | 2019-03-01 | 2020-09-03 | Applied Materials, Inc. | Method and apparatus for stamp generation and curing |
US20210325777A1 (en) | 2020-04-20 | 2021-10-21 | Applied Materials, Inc. | Methods for increasing the refractive index of high-index nanoimprint lithography films |
US11543584B2 (en) * | 2020-07-14 | 2023-01-03 | Meta Platforms Technologies, Llc | Inorganic matrix nanoimprint lithographs and methods of making thereof with reduced carbon |
CN112793324B (en) * | 2020-12-16 | 2022-04-29 | 维达力实业(赤壁)有限公司 | UV transfer printing mold and manufacturing method thereof |
JP7377382B2 (en) * | 2021-08-06 | 2023-11-09 | 日東電工株式会社 | laminate |
CN114273190A (en) * | 2021-10-27 | 2022-04-05 | 江苏大学 | Method for constructing amorphous photonic crystal on substrate |
US20230375759A1 (en) * | 2022-05-18 | 2023-11-23 | GE Precision Healthcare LLC | Aligned and stacked high-aspect ratio metallized structures |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110064925A1 (en) * | 2008-05-20 | 2011-03-17 | Asml Netherlands B.V. | Aqueous curable imprintable medium and patterned layer forming method |
US20140072720A1 (en) * | 2012-05-22 | 2014-03-13 | University Of Massachusetts | Patterned nanoparticle structures |
US20150140837A1 (en) * | 2012-05-14 | 2015-05-21 | Saint-Gobain Glass France | Method for texturing a substrate having a large surface area |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6039897A (en) * | 1996-08-28 | 2000-03-21 | University Of Washington | Multiple patterned structures on a single substrate fabricated by elastomeric micro-molding techniques |
US7491422B2 (en) * | 2002-10-21 | 2009-02-17 | Nanoink, Inc. | Direct-write nanolithography method of transporting ink with an elastomeric polymer coated nanoscopic tip to form a structure having internal hollows on a substrate |
US6900126B2 (en) * | 2002-11-20 | 2005-05-31 | International Business Machines Corporation | Method of forming metallized pattern |
KR100825176B1 (en) * | 2007-01-26 | 2008-04-24 | 삼성전자주식회사 | Substrate for patterning and method for forming a pattern of nanocrystals using the same |
WO2009069557A1 (en) * | 2007-11-29 | 2009-06-04 | Nissan Chemical Industries, Ltd. | Three-dimensional pattern forming material |
US20100109201A1 (en) * | 2008-10-31 | 2010-05-06 | Molecular Imprints, Inc. | Nano-Imprint Lithography Template with Ordered Pore Structure |
CN101477304B (en) * | 2008-11-04 | 2011-08-17 | 南京大学 | Stamping method for copying high-resolution nano-structure on complicated shape surface |
KR101017403B1 (en) * | 2008-11-06 | 2011-02-28 | 한국기계연구원 | Patterning method of nanoink using nano-imprint lithography |
CN101581879A (en) * | 2009-05-27 | 2009-11-18 | 西安交通大学 | Method for preparing soft template for nanoimprint |
CN103328176B (en) * | 2011-01-14 | 2015-07-29 | 吉坤日矿日石能源株式会社 | The manufacture method of fine pattern transfer printing mould and use the manufacture method of the diffraction grating of this mould and there is the manufacture method of organic EL element of this diffraction grating |
CN102135728B (en) * | 2011-02-23 | 2012-07-25 | 大连理工大学 | Method for manufacturing three-dimensional nano grid structure based on one-dimensional soft template nanoimprinting |
US8895158B2 (en) * | 2011-08-10 | 2014-11-25 | The Johns Hopkins University | Nanoparticle taggants for explosive precursors |
EP2904058B1 (en) * | 2012-12-21 | 2016-05-25 | Koninklijke Philips N.V. | Composition, imprinting ink and imprinting method |
US9298089B1 (en) * | 2014-07-24 | 2016-03-29 | Abeam Technologies, Inc. | Composition for resist patterning and method of manufacturing optical structures using imprint lithography |
WO2017174755A1 (en) * | 2016-04-06 | 2017-10-12 | Koninklijke Philips N.V. | Imprint lithography stamp method of making and using the same |
-
2017
- 2017-06-26 CN CN201780042278.7A patent/CN109414726A/en active Pending
- 2017-06-26 US US16/315,442 patent/US20190243237A1/en active Pending
- 2017-06-26 WO PCT/US2017/039294 patent/WO2018009363A1/en unknown
- 2017-06-26 EP EP17824706.0A patent/EP3481562A4/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110064925A1 (en) * | 2008-05-20 | 2011-03-17 | Asml Netherlands B.V. | Aqueous curable imprintable medium and patterned layer forming method |
US20150140837A1 (en) * | 2012-05-14 | 2015-05-21 | Saint-Gobain Glass France | Method for texturing a substrate having a large surface area |
US20140072720A1 (en) * | 2012-05-22 | 2014-03-13 | University Of Massachusetts | Patterned nanoparticle structures |
Non-Patent Citations (1)
Title |
---|
See also references of WO2018009363A1 * |
Also Published As
Publication number | Publication date |
---|---|
CN109414726A (en) | 2019-03-01 |
EP3481562A1 (en) | 2019-05-15 |
WO2018009363A1 (en) | 2018-01-11 |
US20190243237A1 (en) | 2019-08-08 |
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