PL3234696T3 - Sposób wytwarzania form fleksograficznych poprzez wielokrotne naświetlanie za pomocą diod UV-LED - Google Patents

Sposób wytwarzania form fleksograficznych poprzez wielokrotne naświetlanie za pomocą diod UV-LED

Info

Publication number
PL3234696T3
PL3234696T3 PL15816138T PL15816138T PL3234696T3 PL 3234696 T3 PL3234696 T3 PL 3234696T3 PL 15816138 T PL15816138 T PL 15816138T PL 15816138 T PL15816138 T PL 15816138T PL 3234696 T3 PL3234696 T3 PL 3234696T3
Authority
PL
Poland
Prior art keywords
leds
flexographic printing
multiple exposure
printing forms
producing flexographic
Prior art date
Application number
PL15816138T
Other languages
English (en)
Inventor
Peter FRONCZKIEWICZ
Thorben Wendland
Matthias Beyer
Original Assignee
Flint Group Germany Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=52282414&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=PL3234696(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Flint Group Germany Gmbh filed Critical Flint Group Germany Gmbh
Publication of PL3234696T3 publication Critical patent/PL3234696T3/pl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/325—Non-aqueous compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Printing Plates And Materials Therefor (AREA)
PL15816138T 2014-12-17 2015-12-16 Sposób wytwarzania form fleksograficznych poprzez wielokrotne naświetlanie za pomocą diod UV-LED PL3234696T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP14198604.2A EP3035123A1 (de) 2014-12-17 2014-12-17 Verfahren zur Herstellung von Flexodruckformen durch mehrfache Belichtung mit UV-LEDs
EP15816138.0A EP3234696B1 (de) 2014-12-17 2015-12-16 Verfahren zur herstellung von flexodruckformen durch mehrfache belichtung mit uv-leds
PCT/EP2015/079930 WO2016096945A1 (de) 2014-12-17 2015-12-16 Verfahren zur herstellung von flexodruckformen durch mehrfache belichtung mit uv-leds

Publications (1)

Publication Number Publication Date
PL3234696T3 true PL3234696T3 (pl) 2020-09-07

Family

ID=52282414

Family Applications (1)

Application Number Title Priority Date Filing Date
PL15816138T PL3234696T3 (pl) 2014-12-17 2015-12-16 Sposób wytwarzania form fleksograficznych poprzez wielokrotne naświetlanie za pomocą diod UV-LED

Country Status (9)

Country Link
US (1) US10175580B2 (pl)
EP (2) EP3035123A1 (pl)
JP (1) JP6726190B2 (pl)
CN (1) CN107278278B (pl)
BR (1) BR112017012559B1 (pl)
ES (1) ES2786320T3 (pl)
MX (1) MX2017007720A (pl)
PL (1) PL3234696T3 (pl)
WO (1) WO2016096945A1 (pl)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10732507B2 (en) 2015-10-26 2020-08-04 Esko-Graphics Imaging Gmbh Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof
JP6602984B2 (ja) 2015-10-26 2019-11-06 エスコ−グラフィックス イメージング ゲゼルシャフト ミット ベシュレンクテル ハフツング フレキソ印刷板の制御式露光のためのシステム及び方法
US11007767B2 (en) 2016-11-28 2021-05-18 Flint Group Germany Gmbh Light exposure device and method for exposing plate-shaped materials to light
EP4130882A1 (en) * 2017-03-20 2023-02-08 Esko-Graphics Imaging GmbH Process and apparatus for adjusting the floor of a flexographic printing plate in a controlled exposure system or process
US11822246B2 (en) 2017-10-10 2023-11-21 Flint Group Germany Gmbh Relief precursor having low cupping and fluting
US11724533B2 (en) 2018-04-06 2023-08-15 Esko-Graphics Imaging Gmbh System and process for persistent marking of flexo plates and plates marked therewith
DE212019000246U1 (de) 2018-04-06 2020-11-11 Esko-Graphics Imaging Gmbh System zum Herstellen einer Flexoplatte, Flexoplatte computerlesbares Medium, Flexoplatte-Bearbeitungsmaschine und Lesegerät für eine Verwendung in einem Verfahren zur Herstellung einer Flexoplatte
EP3794411B1 (en) 2019-05-30 2022-05-18 Esko-Graphics Imaging GmbH Process and apparatus for automatic measurement of density of photopolymer printing plates
EP3811155B8 (en) * 2019-08-29 2022-08-31 Esko-Graphics Imaging GmbH Uv led radiation sources for use in photopolymer exposure
EP4042245B1 (en) * 2019-10-07 2023-09-27 Esko-Graphics Imaging GmbH System and process for persistent marking of flexo plates and plates marked therewith
US20210318620A1 (en) 2020-04-10 2021-10-14 Esko-Graphics Imaging Gmbh Systems and methods for optimization of parameters for exposing flexographic photopolymer plates
NL2027142B1 (en) 2020-12-17 2022-07-11 Flint Group Germany Gmbh Method for exposure of relief precursors with multiple profiles
CN113635657B (zh) * 2021-08-19 2022-11-04 上海出版印刷高等专科学校 一种采用led光源的柔性版制版组合曝光方法
CN118556213A (zh) * 2021-11-22 2024-08-27 埃斯科绘图成像有限责任公司 用于使柔版印刷版去粘的uvc led光精整机

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DE3807929A1 (de) 1988-03-10 1989-09-28 Basf Ag Verfahren zur herstellung von reliefformen
ATE136661T1 (de) 1988-08-23 1996-04-15 Du Pont Verfahren zur herstellung von flexographischen druckreliefs
US5175072A (en) 1990-07-26 1992-12-29 Minnesota Mining And Manufacturing Company Flexographic printing plate process
US5262275A (en) 1992-08-07 1993-11-16 E. I. Du Pont De Nemours And Company Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate
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US8669041B2 (en) 2011-07-15 2014-03-11 Brian Cook Method for improving print performance of flexographic printing elements
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US8790864B2 (en) 2012-08-27 2014-07-29 Kyle P. Baldwin Method of improving print performance in flexographic printing plates
CN103331988B (zh) * 2013-06-19 2015-02-18 汪海洋 一种柔性印刷版的制版方法和主曝光设备
EP3052988B1 (de) * 2013-09-30 2017-08-30 Flint Group Germany GmbH Vorrichtung und verfahren zur in-line herstellung von flexodruckplatten
JP5910799B2 (ja) * 2014-02-10 2016-04-27 Dic株式会社 床材用活性エネルギー線硬化性組成物の硬化方法、及びその硬化方法を用いた硬化装置

Also Published As

Publication number Publication date
CN107278278A (zh) 2017-10-20
BR112017012559B1 (pt) 2022-06-07
US20180004093A1 (en) 2018-01-04
JP6726190B2 (ja) 2020-07-22
EP3234696A1 (de) 2017-10-25
EP3234696B1 (de) 2020-02-05
US10175580B2 (en) 2019-01-08
EP3035123A1 (de) 2016-06-22
MX2017007720A (es) 2017-09-05
JP2018503120A (ja) 2018-02-01
BR112017012559A2 (pt) 2018-01-02
ES2786320T3 (es) 2020-10-09
CN107278278B (zh) 2020-09-11
WO2016096945A1 (de) 2016-06-23

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