MX2017007720A - Metodo para producir placas de impresion flexografica a traves de multiple exposicion con leds uv. - Google Patents
Metodo para producir placas de impresion flexografica a traves de multiple exposicion con leds uv.Info
- Publication number
- MX2017007720A MX2017007720A MX2017007720A MX2017007720A MX2017007720A MX 2017007720 A MX2017007720 A MX 2017007720A MX 2017007720 A MX2017007720 A MX 2017007720A MX 2017007720 A MX2017007720 A MX 2017007720A MX 2017007720 A MX2017007720 A MX 2017007720A
- Authority
- MX
- Mexico
- Prior art keywords
- layer
- flexographic printing
- forming layer
- photopolymerizable
- leds
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Abstract
Un método para producir placas de impresión flexográfica, en las cuales un elemento de impresión flexográfica fotopolimerizable se utiliza como el material de partida, el cual comprende al menos los siguientes, colocados encimados entre sí; un soporte dimensionalmente estable, y al menos una capa fotopolimerizable formadora de relieves, que comprende al menos un aglutinante elastomérico, un compuesto etilénicamente insaturado y un fotoiniciador; y una capa capaz de formar imágenes digitalmente, y el método comprende al menos las siguientes etapas: (a) generar una máscara creando imágenes de la capa capaz de formar imágenes digitalmente, (b) exponer la capa fotopolimerizable formadora de relieves a través de la máscara utilizando luz actínica y fotopolimerización de las regiones de imagen de la capa; y (c) revelar la capa fotopolimerizada lavando las regiones no fotopolimerizadas de la capa formadora de relieves utilizando un solvente orgánico o utilizando revelado térmico, caracterizado en que la etapa (b) comprende dos o más ciclos de exposición (b-1) a (b-n) utilizando luz actínica a una intensidad de 100 a 10000 mV/cm2 de una pluralidad de LEDs UV, en donde la energía introducida en la capa fotopolimerizable formadora de relieves por ciclo de exposición es de 0.1 a 5 J/cm2.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14198604.2A EP3035123A1 (de) | 2014-12-17 | 2014-12-17 | Verfahren zur Herstellung von Flexodruckformen durch mehrfache Belichtung mit UV-LEDs |
PCT/EP2015/079930 WO2016096945A1 (de) | 2014-12-17 | 2015-12-16 | Verfahren zur herstellung von flexodruckformen durch mehrfache belichtung mit uv-leds |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2017007720A true MX2017007720A (es) | 2017-09-05 |
Family
ID=52282414
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2017007720A MX2017007720A (es) | 2014-12-17 | 2015-12-16 | Metodo para producir placas de impresion flexografica a traves de multiple exposicion con leds uv. |
Country Status (9)
Country | Link |
---|---|
US (1) | US10175580B2 (es) |
EP (2) | EP3035123A1 (es) |
JP (1) | JP6726190B2 (es) |
CN (1) | CN107278278B (es) |
BR (1) | BR112017012559B1 (es) |
ES (1) | ES2786320T3 (es) |
MX (1) | MX2017007720A (es) |
PL (1) | PL3234696T3 (es) |
WO (1) | WO2016096945A1 (es) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10732507B2 (en) | 2015-10-26 | 2020-08-04 | Esko-Graphics Imaging Gmbh | Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof |
DK3368949T3 (da) | 2015-10-26 | 2022-04-11 | Esko Graphics Imaging Gmbh | System og fremgangsmåde til kontrolleret eksponering af flexografiske trykplader |
JP7155120B2 (ja) | 2016-11-28 | 2022-10-18 | フリント グループ ジャーマニー ゲーエムベーハー | 板状の材料を露光するための露光装置および方法 |
DK3583470T3 (da) * | 2017-03-20 | 2022-10-03 | Esko Graphics Imaging Gmbh | Fremgangsmåde og indretning til at justere gulvet af en flexografisk trykplade i et system eller en proces med kontrolleret belysning |
US11822246B2 (en) | 2017-10-10 | 2023-11-21 | Flint Group Germany Gmbh | Relief precursor having low cupping and fluting |
US11724533B2 (en) | 2018-04-06 | 2023-08-15 | Esko-Graphics Imaging Gmbh | System and process for persistent marking of flexo plates and plates marked therewith |
US11571920B2 (en) | 2018-04-06 | 2023-02-07 | Esko-Graphics Imaging Gmbh | Method for persistent marking of flexo plates with workflow information and plates marked therewith |
WO2020239665A1 (en) | 2019-05-30 | 2020-12-03 | Esko-Graphics Imaging Gmbh | Process and apparatus for automatic measurement of density of photopolymer printing plates |
EP4042245B1 (en) | 2019-10-07 | 2023-09-27 | Esko-Graphics Imaging GmbH | System and process for persistent marking of flexo plates and plates marked therewith |
US20210318620A1 (en) | 2020-04-10 | 2021-10-14 | Esko-Graphics Imaging Gmbh | Systems and methods for optimization of parameters for exposing flexographic photopolymer plates |
NL2027142B1 (en) | 2020-12-17 | 2022-07-11 | Flint Group Germany Gmbh | Method for exposure of relief precursors with multiple profiles |
CN113635657B (zh) * | 2021-08-19 | 2022-11-04 | 上海出版印刷高等专科学校 | 一种采用led光源的柔性版制版组合曝光方法 |
WO2023089374A2 (en) * | 2021-11-22 | 2023-05-25 | Esko-Graphics Imaging Gmbh | Uvc led light finisher for detacking flexographic printing plates |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
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US3264103A (en) | 1962-06-27 | 1966-08-02 | Du Pont | Photopolymerizable relief printing plates developed by dry thermal transfer |
DE3807929A1 (de) | 1988-03-10 | 1989-09-28 | Basf Ag | Verfahren zur herstellung von reliefformen |
WO1990002359A1 (en) | 1988-08-23 | 1990-03-08 | E.I. Du Pont De Nemours And Company | Process for the production of flexographic printing reliefs |
US5175072A (en) | 1990-07-26 | 1992-12-29 | Minnesota Mining And Manufacturing Company | Flexographic printing plate process |
US5262275A (en) | 1992-08-07 | 1993-11-16 | E. I. Du Pont De Nemours And Company | Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate |
US6171758B1 (en) | 1994-11-08 | 2001-01-09 | Dupont Operations Worldwide, Inc. | Dimensionally stable flexographic printing plates |
DE19909152C2 (de) | 1999-03-02 | 2001-06-07 | Du Pont Deutschland | Photopolymerisierbares Aufzeichnungselement und Verfahren zur Herstellung von flexographischen Druckformen |
EP1070989A1 (en) | 1999-07-13 | 2001-01-24 | Agfa-Gevaert N.V. | Flexographic printing plate precursor comprising a (photo)thermographic recording layer |
EP1072953A1 (en) | 1999-07-13 | 2001-01-31 | Agfa-Gevaert N.V. | Flexographic printing plate precursor comprising an ink-jet receiving layer |
EP1069475B1 (en) | 1999-07-13 | 2002-09-18 | BASF Drucksysteme GmbH | Flexographic printing element comprising an IR-ablatable layer with high sensitivity |
DE60125755T2 (de) | 2000-05-17 | 2007-11-15 | E.I. Dupont De Nemours And Co., Wilmington | Verfahren zur herstellung einer flexodruckplatte |
US7682775B2 (en) | 2004-03-05 | 2010-03-23 | E. I. Du Pont De Nemours And Company | Process for preparing a flexographic printing plate |
US7125650B2 (en) | 2004-07-20 | 2006-10-24 | Roberts David H | Method for bump exposing relief image printing plates |
EP2145229B1 (en) | 2007-05-08 | 2016-04-20 | Esko-Graphics Imaging GmbH | Exposing printing plates using light emitting diodes |
US8389203B2 (en) | 2007-05-08 | 2013-03-05 | Esko-Graphics Imaging Gmbh | Exposing printing plates using light emitting diodes |
US8236479B2 (en) | 2008-01-23 | 2012-08-07 | E I Du Pont De Nemours And Company | Method for printing a pattern on a substrate |
US8578854B2 (en) | 2008-05-23 | 2013-11-12 | Esko-Graphics Imaging Gmbh | Curing of photo-curable printing plates using a light tunnel of mirrored walls and having a polygonal cross-section like a kaleidoscope |
US8227769B2 (en) | 2008-05-27 | 2012-07-24 | Esko-Graphics Imaging Gmbh | Curing of photo-curable printing plates with flat tops or round tops |
US8153347B2 (en) * | 2008-12-04 | 2012-04-10 | Eastman Kodak Company | Flexographic element and method of imaging |
EP2418235B1 (en) | 2008-12-18 | 2019-03-13 | Henkel IP & Holding GmbH | Photocurable resin composition for ultraviolet led irradiation |
US8820234B2 (en) | 2009-10-30 | 2014-09-02 | Esko-Graphics Imaging Gmbh | Curing of photo-curable printing plates with flat tops or round tops by variable speed exposure |
DE102010031527A1 (de) * | 2010-07-19 | 2012-01-19 | Flint Group Germany Gmbh | Verfahren zur Herstellung von Flexodruckformen umfassend die Bestrahlung mit UV-LEDs |
US8492074B2 (en) | 2011-01-05 | 2013-07-23 | Laurie A. Bryant | Method of improving print performance in flexographic printing plates |
US8772740B2 (en) | 2011-04-08 | 2014-07-08 | Esko-Graphics Imaging Gmbh | UV curing creating flattop and roundtop structures on a single printing plate |
US8669041B2 (en) | 2011-07-15 | 2014-03-11 | Brian Cook | Method for improving print performance of flexographic printing elements |
US8808968B2 (en) | 2012-08-22 | 2014-08-19 | Jonghan Choi | Method of improving surface cure in digital flexographic printing plates |
US8790864B2 (en) | 2012-08-27 | 2014-07-29 | Kyle P. Baldwin | Method of improving print performance in flexographic printing plates |
CN103331988B (zh) * | 2013-06-19 | 2015-02-18 | 汪海洋 | 一种柔性印刷版的制版方法和主曝光设备 |
BR112016006935B1 (pt) * | 2013-09-30 | 2022-02-08 | Flint Group Germany Gmbh | Dispositivo e método para produzir placas de impressão flexográfica |
JP5910799B2 (ja) * | 2014-02-10 | 2016-04-27 | Dic株式会社 | 床材用活性エネルギー線硬化性組成物の硬化方法、及びその硬化方法を用いた硬化装置 |
-
2014
- 2014-12-17 EP EP14198604.2A patent/EP3035123A1/de not_active Withdrawn
-
2015
- 2015-12-16 ES ES15816138T patent/ES2786320T3/es active Active
- 2015-12-16 WO PCT/EP2015/079930 patent/WO2016096945A1/de active Application Filing
- 2015-12-16 CN CN201580076229.6A patent/CN107278278B/zh active Active
- 2015-12-16 BR BR112017012559-5A patent/BR112017012559B1/pt active IP Right Grant
- 2015-12-16 MX MX2017007720A patent/MX2017007720A/es active IP Right Grant
- 2015-12-16 US US15/536,565 patent/US10175580B2/en active Active
- 2015-12-16 PL PL15816138T patent/PL3234696T3/pl unknown
- 2015-12-16 JP JP2017533031A patent/JP6726190B2/ja active Active
- 2015-12-16 EP EP15816138.0A patent/EP3234696B1/de active Active
Also Published As
Publication number | Publication date |
---|---|
WO2016096945A1 (de) | 2016-06-23 |
US20180004093A1 (en) | 2018-01-04 |
BR112017012559A2 (pt) | 2018-01-02 |
CN107278278A (zh) | 2017-10-20 |
EP3035123A1 (de) | 2016-06-22 |
JP6726190B2 (ja) | 2020-07-22 |
ES2786320T3 (es) | 2020-10-09 |
EP3234696B1 (de) | 2020-02-05 |
US10175580B2 (en) | 2019-01-08 |
EP3234696A1 (de) | 2017-10-25 |
BR112017012559B1 (pt) | 2022-06-07 |
PL3234696T3 (pl) | 2020-09-07 |
CN107278278B (zh) | 2020-09-11 |
JP2018503120A (ja) | 2018-02-01 |
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