JP6726190B2 - Uv−ledでの多重露光によってフレキソ印刷版を製造する方法 - Google Patents
Uv−ledでの多重露光によってフレキソ印刷版を製造する方法 Download PDFInfo
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- JP6726190B2 JP6726190B2 JP2017533031A JP2017533031A JP6726190B2 JP 6726190 B2 JP6726190 B2 JP 6726190B2 JP 2017533031 A JP2017533031 A JP 2017533031A JP 2017533031 A JP2017533031 A JP 2017533031A JP 6726190 B2 JP6726190 B2 JP 6726190B2
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Electromagnetism (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Printing Plates And Materials Therefor (AREA)
Description
フレキソ印刷版を製造する方法であって、出発材料として光重合可能なフレキソ印刷要素を用い、該フレキソ印刷要素が、積み重ねて配置されて、
・ 寸法安定性の支持体と、
・ エラストマーバインダー、エチレン性不飽和化合物および光開始剤を少なくとも含む、光重合可能な少なくとも1つのレリーフ形成層と、
・ デジタル描画可能な層と
を少なくとも含み、
かつ該方法が、少なくとも以下の工程:
(a)デジタル描画可能な層の描画によってマスクを生成する工程、
(b)マスクを通して光重合可能なレリーフ形成層を化学線で露光し、かつ層の画像領域の光重合を行う工程、および
(c)レリーフ形成層の光重合されていない領域を有機溶剤で洗浄することによってか、または熱現像によって、光重合された層を現像する工程を含む該方法において、
工程(b)が、複数のUV−LEDからの100〜10000mW/cm2の強度を有する化学線での2回以上の露光サイクル(b−1)〜(b−n)を含み、ここで、1回の露光サイクルにつき光重合可能なレリーフ形成層に入力されるエネルギーが、0.1〜5J/cm2であることを特徴とする方法によって解決される。
・ 寸法安定性の支持体と、
・ エラストマーバインダー、エチレン性不飽和化合物および光開始剤を少なくとも含む、光重合可能な少なくとも1つのレリーフ形成層と、
・ レーザーアブレーションによってデジタル描画可能な層と
を少なくとも含む。
フレキソ印刷凸版、特に個々の網点の画像要素の隆起エッジの定量的な検出は、些細な問題ではない。エッジは、ほんの数μmの高さであり、かつ光学的な方法で調べることは困難である。
データポイントを記録する。
Perthometer−結果を、電子顕微鏡写真により調べた。図3は、シングルパスでUV−LED露光された凸版の電子顕微鏡写真を示す。図4は、60回のクイックパスでUV−LED露光された凸版の相応する写真を示す。電子顕微鏡写真から、Perthometer測定の結果が一義的に確認される。
印刷版に入力される1回の部分露光(露光サイクル)当たりのエネルギーは、0.1〜5J/cm2の範囲で変化する。相応する走行速度は、50mm/分から5000mm/分までの範囲で変化する。市販の大型サイズ(1320mm×2032mm)のUV−LED装置(Flint Group社のnyloflex NExT FV露光装置)を使用した場合、記載した走行速度でのサイクル時間は数秒から数分までである。
− カバーフィルムの剥離
− IRレーザーによる描画(Esko Graphics社のCDI Spark 4835、高解像度光学系Pixel+、マスク解像度4000dpi)
− nyloflex FIII管状露光装置での裏面露光(16秒)
− 表1に記載のUV−LED露光
− nyloflex FIIIウォッシャー中でのnylosolv Aにおけるウォッシュアウト(255mm/分)
− 乾燥(60℃で2時間)
− 光による後処理(UVA光で10分間、UVC光で1分間)。
製造した凸版を総合的に評価した。
引き続き、凸版を、同一条件下にてフレキソ印刷機で印刷し、かつ得られた印刷物を評価した。
印刷機:W&H単胴機
印刷インキ:アルコール性のフレキソ印刷インキFlexistar Cyan
接着テープ:Lohmann 5.3
印刷速度:100m/分
印刷設定:最適(キスプリント設定により+70μm;キスプリントは、全画像要素のおよそ半分が印刷される設定をいう。この場合、印刷シリンダーは、実質的な圧力が印加されることなく、基材とちょうど凸版面とを接触させる)
Claims (11)
- フレキソ印刷版を製造する方法であって、出発材料として光重合可能なフレキソ印刷要素を用い、該フレキソ印刷要素が、積み重ねて配置されて、
・ 寸法安定性の支持体と、
・ エラストマーバインダー、エチレン性不飽和化合物および光開始剤を少なくとも含む、光重合可能な少なくとも1つのレリーフ形成層と、
・ デジタル描画可能な層と
を少なくとも含み、
かつ前記方法は、少なくとも以下の工程:
(a)前記デジタル描画可能な層の描画によってマスクを生成する工程、
(b)該マスクを通して前記光重合可能なレリーフ形成層を化学線で露光し、かつ前記層の画像領域の光重合を行う工程、および
(c)前記レリーフ形成層の光重合されていない領域を有機溶剤で洗浄することによってか、または熱現像によって、前記光重合された層を現像する工程
を含む前記方法において、
前記工程(b)が、複数のUV−LEDからの100〜5000mW/cm2の強度を有する化学線での2回以上の露光サイクル(b−1)〜(b−n)を含み、ここで、1回の露光サイクルにつき光重合可能なレリーフ形成層に入力されるエネルギーが、0.1〜5J/cm2であることを特徴とする、前記方法。 - 工程(b)で前記光重合可能なレリーフ形成層に入力されるエネルギーが全体で、5〜25J/cm2であることを特徴とする、請求項1記載の方法。
- 1回の露光サイクルにつき入力されるエネルギーが、露光工程(b)にわたって増大することを特徴とする、請求項1項記載の方法。
- 前記露光工程(b)を、前記フレキソ印刷要素の表面と平行な複数のUV−LEDの相対運動によって実施することを特徴とする、請求項1から3までのいずれか1項記載の方法。
- 前記複数のUV−LEDが、少なくとも1つのUV−LEDストリップ上に並べて配置されており、該UV−LEDストリップを前記フレキソ印刷要素の表面に沿って移動させることを特徴とする、請求項4記載の方法。
- 前記複数のUV−LEDが、少なくとも2つのUV−LEDストリップ上に並べて配置されており、該UV−LEDストリップの少なくとも1つは移動可能であり、かつ少なくとも1つは固定されていることを特徴とする、請求項4または5記載の方法。
- 前記1つのLEDストリップまたは前記複数のLEDストリップを、前記フレキソ印刷要素の表面に対して50〜5000mm/分の速度で移動させることを特徴とする、請求項4から6までのいずれか1項記載の方法。
- 工程(b)で用いられるUV−LEDが、350〜405nmの波長範囲に発光極大を有することを特徴とする、請求項1から7までのいずれか1項記載の方法。
- 工程(b)で用いられるUV−LEDが、350nm、365nm、375nm、385nm、395nmまたは405nmで発光極大を有することを特徴とする、請求項8記載の方法。
- 前記デジタル描画可能な層がレーザーアブレーション可能な層であることを特徴とする、請求項1から9までのいずれか1項記載の方法。
- 前記UV−LEDと前記フレキソ印刷要素の表面との間隔が5〜30mmであることを特徴とする、請求項1から10までのいずれか1項記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP14198604.2A EP3035123A1 (de) | 2014-12-17 | 2014-12-17 | Verfahren zur Herstellung von Flexodruckformen durch mehrfache Belichtung mit UV-LEDs |
EP14198604.2 | 2014-12-17 | ||
PCT/EP2015/079930 WO2016096945A1 (de) | 2014-12-17 | 2015-12-16 | Verfahren zur herstellung von flexodruckformen durch mehrfache belichtung mit uv-leds |
Publications (2)
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JP2018503120A JP2018503120A (ja) | 2018-02-01 |
JP6726190B2 true JP6726190B2 (ja) | 2020-07-22 |
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Country Status (9)
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US (1) | US10175580B2 (ja) |
EP (2) | EP3035123A1 (ja) |
JP (1) | JP6726190B2 (ja) |
CN (1) | CN107278278B (ja) |
BR (1) | BR112017012559B1 (ja) |
ES (1) | ES2786320T3 (ja) |
MX (1) | MX2017007720A (ja) |
PL (1) | PL3234696T3 (ja) |
WO (1) | WO2016096945A1 (ja) |
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US11007767B2 (en) | 2016-11-28 | 2021-05-18 | Flint Group Germany Gmbh | Light exposure device and method for exposing plate-shaped materials to light |
WO2018172374A1 (en) * | 2017-03-20 | 2018-09-27 | Esko-Graphics Imaging Gmbh | Process and apparatus for adjusting the floor of a flexographic printing plate in a controlled exposure system or process |
CN111512231B (zh) | 2017-10-10 | 2024-03-15 | 恩熙思德国有限公司 | 具有低程度的杯形挤压和槽纹的凸纹前体 |
US11724533B2 (en) | 2018-04-06 | 2023-08-15 | Esko-Graphics Imaging Gmbh | System and process for persistent marking of flexo plates and plates marked therewith |
CN112204463B (zh) | 2018-04-06 | 2024-04-30 | 埃斯科绘图成像有限责任公司 | 用于利用工作流程信息持久标记柔性印刷板的方法和利用其标记的板 |
US11867711B2 (en) | 2019-05-30 | 2024-01-09 | Esko-Graphics Imaging Gmbh | Process and apparatus for automatic measurement of density of photopolymer printing plates |
US20220305769A1 (en) | 2019-08-29 | 2022-09-29 | Esko-Graphics Imaging Gmbh | Uv led radiation sources for use in photopolymer exposure |
CN114730141B (zh) * | 2019-10-07 | 2023-09-15 | 埃斯科绘图成像有限责任公司 | 用于柔印版的持久标记的系统和方法以及利用其标记的版 |
US20210318620A1 (en) | 2020-04-10 | 2021-10-14 | Esko-Graphics Imaging Gmbh | Systems and methods for optimization of parameters for exposing flexographic photopolymer plates |
NL2027142B1 (en) | 2020-12-17 | 2022-07-11 | Flint Group Germany Gmbh | Method for exposure of relief precursors with multiple profiles |
CN113635657B (zh) * | 2021-08-19 | 2022-11-04 | 上海出版印刷高等专科学校 | 一种采用led光源的柔性版制版组合曝光方法 |
WO2023089374A2 (en) * | 2021-11-22 | 2023-05-25 | Esko-Graphics Imaging Gmbh | Uvc led light finisher for detacking flexographic printing plates |
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2014
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2015
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- 2015-12-16 WO PCT/EP2015/079930 patent/WO2016096945A1/de active Application Filing
- 2015-12-16 PL PL15816138T patent/PL3234696T3/pl unknown
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- 2015-12-16 CN CN201580076229.6A patent/CN107278278B/zh active Active
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CN107278278B (zh) | 2020-09-11 |
ES2786320T3 (es) | 2020-10-09 |
WO2016096945A1 (de) | 2016-06-23 |
EP3035123A1 (de) | 2016-06-22 |
BR112017012559A2 (pt) | 2018-01-02 |
PL3234696T3 (pl) | 2020-09-07 |
EP3234696B1 (de) | 2020-02-05 |
CN107278278A (zh) | 2017-10-20 |
EP3234696A1 (de) | 2017-10-25 |
BR112017012559B1 (pt) | 2022-06-07 |
US20180004093A1 (en) | 2018-01-04 |
JP2018503120A (ja) | 2018-02-01 |
MX2017007720A (es) | 2017-09-05 |
US10175580B2 (en) | 2019-01-08 |
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