CO2018004325A2 - Sistema y método para exposición controlada de placas de impresión flexográfica - Google Patents

Sistema y método para exposición controlada de placas de impresión flexográfica

Info

Publication number
CO2018004325A2
CO2018004325A2 CONC2018/0004325A CO2018004325A CO2018004325A2 CO 2018004325 A2 CO2018004325 A2 CO 2018004325A2 CO 2018004325 A CO2018004325 A CO 2018004325A CO 2018004325 A2 CO2018004325 A2 CO 2018004325A2
Authority
CO
Colombia
Prior art keywords
printing plates
exposure
flexographic printing
main
controlled exposure
Prior art date
Application number
CONC2018/0004325A
Other languages
English (en)
Inventor
Jorg Wolterink
Thomas Hansel
Wolfgang Sievers
Original Assignee
Esko Graphics Imaging Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=57590729&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CO2018004325(A2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Esko Graphics Imaging Gmbh filed Critical Esko Graphics Imaging Gmbh
Publication of CO2018004325A2 publication Critical patent/CO2018004325A2/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2032—Simultaneous exposure of the front side and the backside
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)

Abstract

Un método y aparato para exponer placas de impresión fotosensibles con una densidad de radiación predeterminada desde el lado principal (superior) y una densidad de radiación predeterminada desde el lado posterior (inferior). El método comprende ejecutar la exposición principal con un retardo de tiempo después de la exposición posterior. El retardo de tiempo entre la exposición posterior y la exposición principal se optimiza para crear elementos de puntos únicos estables y más pequeños en la placa de impresión fotosensible después del procesamiento y tamaños de puntos de elementos únicos más pequeños impresos en el sustrato de impresión.
CONC2018/0004325A 2015-10-26 2016-10-26 Sistema y método para exposición controlada de placas de impresión flexográfica CO2018004325A2 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201562246276P 2015-10-26 2015-10-26
PCT/IB2016/001660 WO2017072588A2 (en) 2015-10-26 2016-10-26 System and method for controlled exposure of flexographic printing plates

Publications (1)

Publication Number Publication Date
CO2018004325A2 true CO2018004325A2 (es) 2018-09-20

Family

ID=57590729

Family Applications (1)

Application Number Title Priority Date Filing Date
CONC2018/0004325A CO2018004325A2 (es) 2015-10-26 2016-10-26 Sistema y método para exposición controlada de placas de impresión flexográfica

Country Status (11)

Country Link
US (1) US20220269178A1 (es)
EP (3) EP3879344A1 (es)
JP (1) JP6602984B2 (es)
CN (2) CN113934116A (es)
BR (1) BR112018008024A2 (es)
CA (1) CA3001473C (es)
CO (1) CO2018004325A2 (es)
DE (3) DE20209977T1 (es)
DK (2) DK3800508T3 (es)
MX (1) MX2018005006A (es)
WO (1) WO2017072588A2 (es)

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FR3085304B1 (fr) 2018-08-31 2021-01-08 D Uniflexo Forme imprimante photosensible pour un procede d’impression flexographique comprenant des informations visibles et non imprimables, procede de preparation d’une telle forme imprimante
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Also Published As

Publication number Publication date
BR112018008024A2 (pt) 2018-10-23
EP3800508B1 (en) 2022-05-04
WO2017072588A2 (en) 2017-05-04
DK3800508T3 (da) 2022-05-23
DE202016008962U1 (de) 2021-02-16
JP6602984B2 (ja) 2019-11-06
CA3001473A1 (en) 2017-05-04
DE202016008961U1 (de) 2021-02-08
WO2017072588A3 (en) 2017-06-08
EP3368949A2 (en) 2018-09-05
CN113934116A (zh) 2022-01-14
CA3001473C (en) 2020-07-21
EP3800508A1 (en) 2021-04-07
JP2018533081A (ja) 2018-11-08
CN107430346A (zh) 2017-12-01
EP3368949B1 (en) 2022-02-16
MX2018005006A (es) 2019-01-31
DK3368949T3 (da) 2022-04-11
EP3879344A1 (en) 2021-09-15
CN107430346B (zh) 2021-11-09
US20220269178A1 (en) 2022-08-25
DE20209977T1 (de) 2021-10-07

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