MX2018005006A - Sistema y metodo para exposicion controlada de placas de impresion flexografica. - Google Patents
Sistema y metodo para exposicion controlada de placas de impresion flexografica.Info
- Publication number
- MX2018005006A MX2018005006A MX2018005006A MX2018005006A MX2018005006A MX 2018005006 A MX2018005006 A MX 2018005006A MX 2018005006 A MX2018005006 A MX 2018005006A MX 2018005006 A MX2018005006 A MX 2018005006A MX 2018005006 A MX2018005006 A MX 2018005006A
- Authority
- MX
- Mexico
- Prior art keywords
- exposure
- printing plates
- flexographic printing
- controlled exposure
- main
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/203—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure comprising an imagewise exposure to electromagnetic radiation or corpuscular radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
- G03F7/2032—Simultaneous exposure of the front side and the backside
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Abstract
Un método y aparato para exponer placas de impresión fotosensibles con una densidad de radiación predeterminada desde el lado principal (superior) y una densidad de radiación predeterminada desde el lado posterior (inferior) El método comprende ejecutar la exposición principal con un retardo de tiempo después de la exposición posterior. El retardo de tiempo entre la exposición posterior y la exposición principal se optimiza para crear elementos de puntos únicos estables y más pequeños en la placa de impresión fotosensible después del procesamiento y tamaños de puntos de elementos únicos más pequeños impresos en el sustrato de impresión.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201562246276P | 2015-10-26 | 2015-10-26 | |
PCT/IB2016/001660 WO2017072588A2 (en) | 2015-10-26 | 2016-10-26 | System and method for controlled exposure of flexographic printing plates |
Publications (1)
Publication Number | Publication Date |
---|---|
MX2018005006A true MX2018005006A (es) | 2019-01-31 |
Family
ID=57590729
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2018005006A MX2018005006A (es) | 2015-10-26 | 2016-10-26 | Sistema y metodo para exposicion controlada de placas de impresion flexografica. |
Country Status (10)
Country | Link |
---|---|
EP (3) | EP3800508B1 (es) |
JP (1) | JP6602984B2 (es) |
CN (2) | CN113934116B (es) |
BR (1) | BR112018008024A2 (es) |
CA (1) | CA3001473C (es) |
CO (1) | CO2018004325A2 (es) |
DE (3) | DE202016008961U1 (es) |
DK (2) | DK3368949T3 (es) |
MX (1) | MX2018005006A (es) |
WO (1) | WO2017072588A2 (es) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10732507B2 (en) | 2015-10-26 | 2020-08-04 | Esko-Graphics Imaging Gmbh | Process and apparatus for controlled exposure of flexographic printing plates and adjusting the floor thereof |
DE202018006543U1 (de) * | 2017-03-20 | 2021-02-15 | Esko-Graphics Imaging Gmbh | Einrichtung zum Anpassen des Bodens einer flexografischen Druckplatte in einem gesteuerten bzw. geregelten Belichtungssystem |
CN110892334B (zh) | 2017-07-20 | 2022-12-09 | 埃斯科绘图成像有限责任公司 | 用于光敏聚合物印刷版的直接固化的系统和过程 |
DE212019000246U1 (de) | 2018-04-06 | 2020-11-11 | Esko-Graphics Imaging Gmbh | System zum Herstellen einer Flexoplatte, Flexoplatte computerlesbares Medium, Flexoplatte-Bearbeitungsmaschine und Lesegerät für eine Verwendung in einem Verfahren zur Herstellung einer Flexoplatte |
US11724533B2 (en) | 2018-04-06 | 2023-08-15 | Esko-Graphics Imaging Gmbh | System and process for persistent marking of flexo plates and plates marked therewith |
FR3085304B1 (fr) | 2018-08-31 | 2021-01-08 | D Uniflexo | Forme imprimante photosensible pour un procede d’impression flexographique comprenant des informations visibles et non imprimables, procede de preparation d’une telle forme imprimante |
EP3877810B1 (en) * | 2019-02-01 | 2023-08-16 | Esko-Graphics Imaging GmbH | System and process for persistent marking of flexo plates and plates marked therewith |
US20220050380A1 (en) * | 2019-04-26 | 2022-02-17 | Esko-Graphics Imaging Gmbh | Apparatus and method for exposing printing plates using light emitting diodes |
EP3797004B1 (en) * | 2019-06-05 | 2024-05-08 | Esko-Graphics Imaging GmbH | Systems and methods for combined radiation and functional layer application |
KR102588061B1 (ko) | 2019-08-29 | 2023-10-13 | 에스코-그래픽스 이미징 게엠베하 | 포토폴리머 노출에서의 사용을 위한 uv led 방사선 소스들 |
EP4042245B1 (en) | 2019-10-07 | 2023-09-27 | Esko-Graphics Imaging GmbH | System and process for persistent marking of flexo plates and plates marked therewith |
CN110971892B (zh) * | 2019-11-27 | 2021-05-11 | 深圳市派科斯科技有限公司 | 曝光延时测量方法、装置及存储介质 |
NL2027144B1 (en) * | 2020-12-17 | 2022-07-11 | Flint Group Germany Gmbh | Apparatus and method for improved exposure of relief precursors |
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DE2964409D1 (en) | 1978-07-10 | 1983-02-03 | Akzo Nv | Process and apparatus for the manufacture of a relief printing form |
US5386268A (en) * | 1993-07-26 | 1995-01-31 | E. I. Du Pont De Nemours And Company | Exposure unit and method for exposing photosensitive materials |
JP3562865B2 (ja) | 1995-05-12 | 2004-09-08 | 旭化成ケミカルズ株式会社 | 感光性樹脂版の製造方法 |
CN1203375C (zh) * | 2000-03-24 | 2005-05-25 | 丰和工业株式会社 | 双侧曝光系统 |
DE10024456A1 (de) | 2000-05-18 | 2001-11-29 | Heidelberger Druckmasch Ag | Integrierte Laser- und UV-Belichtung von Druckplatten |
CA2332190A1 (en) | 2001-01-25 | 2002-07-25 | Efos Inc. | Addressable semiconductor array light source for localized radiation delivery |
US20020192569A1 (en) | 2001-05-15 | 2002-12-19 | The Chromaline Corporation | Devices and methods for exposure of photoreactive compositions with light emitting diodes |
JP2003154628A (ja) * | 2001-11-20 | 2003-05-27 | Asahi Kasei Corp | 感光性樹脂生版の印刷用スリーブへの貼付方法及び貼付装置 |
JP4317488B2 (ja) * | 2004-05-28 | 2009-08-19 | 株式会社オーク製作所 | 露光装置、露光方法および露光処理プログラム |
DE202004017044U1 (de) | 2004-11-02 | 2005-01-13 | Technigraf Gmbh | Leuchte zur Belichtung von Siebdruckschablonen, Offsetdruckplatten, Flexodruckplatten, Inkjet-Beschichtungen o.dgl. sowie Vorrichtung zur Belichtung |
GB2448506A (en) | 2007-04-17 | 2008-10-22 | Perpetuum Ltd | Implanted energy harvester with hydraulically driven linear generator for powering a further implanted device |
US8516961B2 (en) | 2007-05-08 | 2013-08-27 | Esko-Graphics Imaging Gmbh | Method and apparatus for loading and unloading flexographic plates for computer-to-plate imaging including separate loading and unloading areas |
US8389203B2 (en) | 2007-05-08 | 2013-03-05 | Esko-Graphics Imaging Gmbh | Exposing printing plates using light emitting diodes |
DK3054349T3 (en) | 2007-05-08 | 2019-01-14 | Esko Graphics Imaging Gmbh | LIGHTING PRESSURE PLATES USING LIGHTING DIODES |
US8578854B2 (en) | 2008-05-23 | 2013-11-12 | Esko-Graphics Imaging Gmbh | Curing of photo-curable printing plates using a light tunnel of mirrored walls and having a polygonal cross-section like a kaleidoscope |
US8227769B2 (en) | 2008-05-27 | 2012-07-24 | Esko-Graphics Imaging Gmbh | Curing of photo-curable printing plates with flat tops or round tops |
US8034540B2 (en) | 2008-07-31 | 2011-10-11 | Eastman Kodak Company | System and method employing secondary back exposure of flexographic plate |
JP5292048B2 (ja) * | 2008-10-09 | 2013-09-18 | 旭化成イーマテリアルズ株式会社 | 感光性樹脂凸版の製造方法及び感光性樹脂凸版の製造装置 |
US20110014573A1 (en) * | 2009-07-14 | 2011-01-20 | Eynat Matzner | System for engraving flexographic plates |
US8820234B2 (en) | 2009-10-30 | 2014-09-02 | Esko-Graphics Imaging Gmbh | Curing of photo-curable printing plates with flat tops or round tops by variable speed exposure |
JP2011154080A (ja) * | 2010-01-26 | 2011-08-11 | Toppan Printing Co Ltd | 透明基材両面へのパターン形成方法 |
DE102010031527A1 (de) | 2010-07-19 | 2012-01-19 | Flint Group Germany Gmbh | Verfahren zur Herstellung von Flexodruckformen umfassend die Bestrahlung mit UV-LEDs |
JP2012145869A (ja) * | 2011-01-14 | 2012-08-02 | Hitachi High-Technologies Corp | 露光方法及びその装置 |
US8772740B2 (en) | 2011-04-08 | 2014-07-08 | Esko-Graphics Imaging Gmbh | UV curing creating flattop and roundtop structures on a single printing plate |
CN102944978B (zh) * | 2011-08-15 | 2014-08-06 | 中山新诺科技股份有限公司 | 曝光系统、校准系统、光学引擎、曝光方法和制造方法 |
US8524442B1 (en) * | 2012-02-13 | 2013-09-03 | David A. Recchia | Integrated membrane lamination and UV exposure system and method of the same |
US20140373742A1 (en) * | 2013-06-24 | 2014-12-25 | Uni-Pixel Displays, Inc. | Method of manufacturing a high-resolution flexographic printing plate |
US9223201B2 (en) * | 2013-06-27 | 2015-12-29 | Uni-Pixel Displays, Inc. | Method of manufacturing a photomask with flexography |
WO2015004437A1 (en) | 2013-07-08 | 2015-01-15 | Spectral Edge Limited | Image processing method and system |
US20150030984A1 (en) | 2013-07-26 | 2015-01-29 | Uni-Pixel Displays, Inc. | Method of manufacturing a flexographic printing plate for high-resolution printing |
US9063426B2 (en) | 2013-09-25 | 2015-06-23 | Uni-Pixel Displays, Inc. | Method of manufacturing a flexographic printing plate with support structures |
JP6526018B2 (ja) * | 2013-09-30 | 2019-06-05 | フリント、グループ、ジャーマニー、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツング | フレキソ印刷版を一列に並んで生産する装置及び方法 |
CN204086810U (zh) * | 2014-08-06 | 2015-01-07 | 叙丰企业股份有限公司 | 曝光机 |
EP3035123A1 (de) | 2014-12-17 | 2016-06-22 | Flint Group Germany GmbH | Verfahren zur Herstellung von Flexodruckformen durch mehrfache Belichtung mit UV-LEDs |
EP3054352B1 (de) | 2015-02-06 | 2017-11-08 | Flint Group Germany GmbH | Automatisierte uv-led belichtung von flexodruckplatten |
US10036956B2 (en) | 2016-05-03 | 2018-07-31 | Macdermid Graphics Solutions, Llc | Method of making relief image printing elements |
DE202018006543U1 (de) | 2017-03-20 | 2021-02-15 | Esko-Graphics Imaging Gmbh | Einrichtung zum Anpassen des Bodens einer flexografischen Druckplatte in einem gesteuerten bzw. geregelten Belichtungssystem |
-
2016
- 2016-10-26 EP EP20209977.6A patent/EP3800508B1/en active Active
- 2016-10-26 CN CN202111270256.0A patent/CN113934116B/zh active Active
- 2016-10-26 CO CONC2018/0004325A patent/CO2018004325A2/es unknown
- 2016-10-26 CA CA3001473A patent/CA3001473C/en active Active
- 2016-10-26 BR BR112018008024A patent/BR112018008024A2/pt not_active Application Discontinuation
- 2016-10-26 DE DE202016008961.8U patent/DE202016008961U1/de active Active
- 2016-10-26 JP JP2018540233A patent/JP6602984B2/ja active Active
- 2016-10-26 MX MX2018005006A patent/MX2018005006A/es unknown
- 2016-10-26 DE DE20209977.6T patent/DE20209977T1/de active Pending
- 2016-10-26 EP EP21165620.2A patent/EP3879344A1/en active Pending
- 2016-10-26 DK DK16816384.8T patent/DK3368949T3/da active
- 2016-10-26 EP EP16816384.8A patent/EP3368949B1/en active Active
- 2016-10-26 DK DK20209977.6T patent/DK3800508T3/da active
- 2016-10-26 DE DE202016008962.6U patent/DE202016008962U1/de active Active
- 2016-10-26 WO PCT/IB2016/001660 patent/WO2017072588A2/en active Application Filing
- 2016-10-26 CN CN201680004544.2A patent/CN107430346B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN107430346A (zh) | 2017-12-01 |
EP3368949B1 (en) | 2022-02-16 |
EP3879344A1 (en) | 2021-09-15 |
DE202016008961U1 (de) | 2021-02-08 |
BR112018008024A2 (pt) | 2018-10-23 |
WO2017072588A2 (en) | 2017-05-04 |
CA3001473A1 (en) | 2017-05-04 |
DE202016008962U1 (de) | 2021-02-16 |
JP2018533081A (ja) | 2018-11-08 |
EP3368949A2 (en) | 2018-09-05 |
CO2018004325A2 (es) | 2018-09-20 |
CA3001473C (en) | 2020-07-21 |
DK3368949T3 (da) | 2022-04-11 |
CN113934116A (zh) | 2022-01-14 |
CN113934116B (zh) | 2024-07-23 |
DE20209977T1 (de) | 2021-10-07 |
EP3800508A1 (en) | 2021-04-07 |
DK3800508T3 (da) | 2022-05-23 |
WO2017072588A3 (en) | 2017-06-08 |
CN107430346B (zh) | 2021-11-09 |
EP3800508B1 (en) | 2022-05-04 |
JP6602984B2 (ja) | 2019-11-06 |
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