PL3605229T3 - Światłoczuła, fleksograficzna, pierwotna, forma drukowa CTP - Google Patents

Światłoczuła, fleksograficzna, pierwotna, forma drukowa CTP

Info

Publication number
PL3605229T3
PL3605229T3 PL18774184T PL18774184T PL3605229T3 PL 3605229 T3 PL3605229 T3 PL 3605229T3 PL 18774184 T PL18774184 T PL 18774184T PL 18774184 T PL18774184 T PL 18774184T PL 3605229 T3 PL3605229 T3 PL 3605229T3
Authority
PL
Poland
Prior art keywords
flexographic printing
original plate
printing original
ctp flexographic
photosensitive ctp
Prior art date
Application number
PL18774184T
Other languages
English (en)
Inventor
Keisuke Matsuo
Hiromichi YONEKURA
Original Assignee
Toyobo Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co., Ltd. filed Critical Toyobo Co., Ltd.
Publication of PL3605229T3 publication Critical patent/PL3605229T3/pl

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41NPRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00Printing plates or foils; Materials therefor
    • B41N1/12Printing plates or foils; Materials therefor non-metallic other than stone, e.g. printing plates or foils comprising inorganic materials in an organic matrix
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41FPRINTING MACHINES OR PRESSES
    • B41F5/00Rotary letterpress machines
    • B41F5/24Rotary letterpress machines for flexographic printing
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/202Masking pattern being obtained by thermal means, e.g. laser ablation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mechanical Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
PL18774184T 2017-03-31 2018-03-27 Światłoczuła, fleksograficzna, pierwotna, forma drukowa CTP PL3605229T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017070529 2017-03-31
PCT/JP2018/012493 WO2018181354A1 (ja) 2017-03-31 2018-03-27 感光性ctpフレキソ印刷原版
EP18774184.8A EP3605229B1 (en) 2017-03-31 2018-03-27 Photosensitive ctp flexographic printing original plate

Publications (1)

Publication Number Publication Date
PL3605229T3 true PL3605229T3 (pl) 2022-01-31

Family

ID=63675937

Family Applications (1)

Application Number Title Priority Date Filing Date
PL18774184T PL3605229T3 (pl) 2017-03-31 2018-03-27 Światłoczuła, fleksograficzna, pierwotna, forma drukowa CTP

Country Status (7)

Country Link
US (1) US10857826B2 (pl)
EP (1) EP3605229B1 (pl)
JP (1) JP6414375B1 (pl)
CN (1) CN110462519B (pl)
ES (1) ES2894027T3 (pl)
PL (1) PL3605229T3 (pl)
WO (1) WO2018181354A1 (pl)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7267777B2 (ja) 2019-03-01 2023-05-02 旭化成株式会社 フレキソ印刷版用原版
CN114401847B (zh) * 2019-09-20 2024-06-07 东洋纺Mc株式会社 柔性印刷版原版
JP2023064817A (ja) * 2021-10-27 2023-05-12 東レ株式会社 感光性樹脂印刷版原版
JP7753054B2 (ja) * 2021-10-28 2025-10-14 キヤノン株式会社 微細構造体の製造方法、液体吐出ヘッドの製造方法、微細構造体及び液体吐出ヘッド

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS532082B2 (pl) 1973-05-26 1978-01-25
JPS51150416A (en) 1975-06-17 1976-12-24 Touwa Taipuraitaa Kk Japanese typewriter feeding device
JPS52131227A (en) 1976-04-28 1977-11-04 Nippon Furnace Kogyo Kk Combustion device
JPS5579437A (en) 1978-12-11 1980-06-14 Toray Ind Inc Photosensitive polyamide resin composition
JPH04332865A (ja) * 1991-05-08 1992-11-19 Shimadzu Corp 核酸の検出装置
US5262275A (en) 1992-08-07 1993-11-16 E. I. Du Pont De Nemours And Company Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate
US5719009A (en) * 1992-08-07 1998-02-17 E. I. Du Pont De Nemours And Company Laser ablatable photosensitive elements utilized to make flexographic printing plates
CN1103698C (zh) * 1995-02-14 2003-03-26 东丽株式会社 平版印刷版及平板印刷版原版
CN101416110A (zh) * 2006-04-07 2009-04-22 旭化成化学株式会社 柔性印刷用感光性树脂组合物
JP4332865B1 (ja) 2008-05-23 2009-09-16 東洋紡績株式会社 フレキソ印刷原版
JP4200510B1 (ja) 2008-06-11 2008-12-24 東洋紡績株式会社 感光性フレキソ印刷原版
JP4247725B1 (ja) * 2008-07-16 2009-04-02 東洋紡績株式会社 感光性凸版印刷原版
JP5332566B2 (ja) * 2008-12-05 2013-11-06 東洋紡株式会社 水現像性凸版印刷用感光性樹脂組成物及びそれから得られる水現像性凸版印刷用感光性樹脂原版
JP5625911B2 (ja) * 2009-06-25 2014-11-19 東洋紡株式会社 感光性凸版印刷原版
PL2461215T3 (pl) * 2009-07-30 2018-02-28 Toyobo Co., Ltd. Fleksograficzna pierwotna płyta drukowa
JP5691274B2 (ja) 2010-07-16 2015-04-01 東レ株式会社 感光性樹脂印刷版原版
JP6241034B2 (ja) * 2011-10-28 2017-12-06 東洋紡株式会社 凸版印刷版用感光性樹脂積層体
JP6111521B2 (ja) * 2012-02-29 2017-04-12 東洋紡株式会社 感光性凸版用シール印刷原版
JP5981738B2 (ja) * 2012-03-14 2016-08-31 旭化成株式会社 感光性樹脂組成物、及び硬化レリーフパターンの製造方法
WO2013146586A1 (ja) * 2012-03-30 2013-10-03 東洋紡株式会社 Ctpフレキソ印刷原版用感光性樹脂組成物およびそれから得られる印刷原版
JP2015150798A (ja) * 2014-02-17 2015-08-24 東レ株式会社 樹脂積層体および凸版印刷版原版
JP2017032845A (ja) * 2015-08-04 2017-02-09 旭化成株式会社 フレキソ印刷版用感光性樹脂組成物

Also Published As

Publication number Publication date
EP3605229A1 (en) 2020-02-05
JP6414375B1 (ja) 2018-10-31
US20190375227A1 (en) 2019-12-12
WO2018181354A1 (ja) 2018-10-04
ES2894027T3 (es) 2022-02-11
JPWO2018181354A1 (ja) 2019-04-04
CN110462519B (zh) 2023-05-02
EP3605229A4 (en) 2020-12-23
EP3605229B1 (en) 2021-09-15
US10857826B2 (en) 2020-12-08
CN110462519A (zh) 2019-11-15

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