TW200300282A - Semiconductor package and method of production thereof - Google Patents

Semiconductor package and method of production thereof Download PDF

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Publication number
TW200300282A
TW200300282A TW091132188A TW91132188A TW200300282A TW 200300282 A TW200300282 A TW 200300282A TW 091132188 A TW091132188 A TW 091132188A TW 91132188 A TW91132188 A TW 91132188A TW 200300282 A TW200300282 A TW 200300282A
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Taiwan
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capacitor
dielectric constant
mounting hole
conductor
board
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TW091132188A
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Takahiro Iijima
Akio Rokugawa
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Shinko Electric Ind Co
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0216Reduction of cross-talk, noise or electromagnetic interference
    • H05K1/0218Reduction of cross-talk, noise or electromagnetic interference by printed shielding conductors, ground planes or power plane
    • H05K1/0219Printed shielding conductors for shielding around or between signal conductors, e.g. coplanar or coaxial printed shielding conductors
    • H05K1/0222Printed shielding conductors for shielding around or between signal conductors, e.g. coplanar or coaxial printed shielding conductors for shielding around a single via or around a group of vias, e.g. coaxial vias or vias surrounded by a grounded via fence
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49827Via connections through the substrates, e.g. pins going through the substrate, coaxial cables
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/642Capacitive arrangements
    • HELECTRICITY
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    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/66High-frequency adaptations
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/11Printed elements for providing electric connections to or between printed circuits
    • H05K1/115Via connections; Lands around holes or via connections
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/16Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
    • H05K1/162Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed capacitors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6605High-frequency electrical connections
    • H01L2223/6616Vertical connections, e.g. vias
    • H01L2223/6622Coaxial feed-throughs in active or passive substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/16235Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a via metallisation of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01078Platinum [Pt]
    • HELECTRICITY
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15172Fan-out arrangement of the internal vias
    • H01L2924/15174Fan-out arrangement of the internal vias in different layers of the multilayer substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/301Electrical effects
    • H01L2924/3011Impedance
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09Shape and layout
    • H05K2201/09209Shape and layout details of conductors
    • H05K2201/09654Shape and layout details of conductors covering at least two types of conductors provided for in H05K2201/09218 - H05K2201/095
    • H05K2201/09809Coaxial layout
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4038Through-connections; Vertical interconnect access [VIA] connections
    • H05K3/4046Through-connections; Vertical interconnect access [VIA] connections using auxiliary conductive elements, e.g. metallic spheres, eyelets, pieces of wire

Description

200300282 坎、發明說明 (發明說明應敘明 發明所屬之技術領域 先前技術、内容、實施方式及圖式簡單說明) 【發明所屬^技術領域】 發明領域 本發明係有關半導體封裝體及其製造方法,尤係關於 5 一種高頻率特性優異的半導體封裝體及其製造方法。 L 前 發明背景 在處理U處理器等之高頻率信號的半導體封裝體中, 其信號傳輸路徑的頻率特性會是一個問題。因此,於實務 上曰見藉匹配特性阻抗或盡可能地縮短信號線,而來在輪 入及輸出端子處防止信號的反射者。例如,有關匹配特性 阻抗的方法,曾有將信號傳輸路徑製成共平面狀而實際形 成一共軸線的方法;或在電路板中形成一凹槽,並將—共 軸鏡線插設於該凹槽内來製成一共轴結構(曰本未審查專 15利公告(k〇kai)“_167258號)等之方法。而,有關縮短該信 號線的方法,實務上曾見將一晶片電容器及其它的電路構 件設成盡可能地靠近該半導體晶片之連接端子的作法。 概觀本發明所要解決的問題係,若該半導體封裝體所 處理的信號頻率變成1GHz高,則電源供應的波動將會對 頻率特性有所影響,故實務上曾將—大尺寸的電容器連接 於該電源供應線,而來在傳輪信號時抑止其電源供應電壓 的任何減降。假使該相關技術之半導體元件係由一設在電 路板上的半導體晶片所構成,則—電容器會被設在該電路 上,其乃將-晶片電容器設在該電路板之相反於設有該半 200300282 玖、發明說明 導體晶片的表面上,或將一晶片電容器設在該半導體晶片 的附近。此係為能將該晶片電容器設成盡可能地靠近該半 導體晶片的連接端子,而來儘量減少其傳輸路徑的電感。 但是,半導體元件的操作頻率逐漸變高。若其需要在 5操作時滿足將該電感值減至不大於數PH的條件,則將會發 生問題,即使以上述之方法將該晶片電容器設在安裝該半 導體晶片的相反表面上盡可能靠近該半導體晶片之處,但 在與電極連接部份處的電感最後亦會高到超過該所需值; 此乃視該板的厚度,或該晶片電容器的尺寸而定,故該半 10導體元件將不能獲得所需的性能。 C 明内】 發明概要 15 本發明之一目的係為提供一種高頻率特性優異的半導 體封裝體’其能容易安褒—大尺寸的電容器,而可抑止電 源供應電壓的起伏波動’並能減少連接該電容器與連接: 子之線路部份的電容者;以及該半導體封裝體的製造方法。而 為達到上述目的’依據本發明之第一態樣,乃在提供 -種半導體元件其裝有一電容器可抑止電源供應電壓的波 動升降,而該電容器係由以下結構所形成··在—沿厚度方 向來貫穿-板的裝設孔中,有一在末端會連接於 晶片之連接端子的導線,及-以預定厚度來包覆該導線之 高介電常數材料’和—設在該高介電常數材料的外緣盘号 裝設孔内壁之間的導體層等,將會以該導線作為中心來形 成一共轴結構。 20 200300282 ίο 15 20 玖、發明說明 較好是’至少有-設在該板上的信號線係由以下結構 所形成:在一沿厚度方向來貫穿該板的裝設孔中,一在蕊 心的信號線’-低介電常數材料,及_導體層等,將會形 成匹配其阻抗的共軸纜線部。 依據本發明的第二態樣,乃在提供一種設有一電容器 而可抑止電源供應電壓波動之半導體封敦體的方法,乃包 含下列步驟:形成-裳設孔沿厚度方向來貫穿一板,及將 一電容器纜線壓裝於該裝設孔内,該電容㈣線包含一導 線位於蕊心,一高介電常數材料會以預定厚度同軸地包覆 。亥導線& |體勒套包覆在該高介電常數材料的外周緣 上,而將該電容器裝設於該板中。 依據本發明的第三態樣,係在提供一種設有一電容器 而可抑止電源供應電壓波動之半導體封装體的製造方法, 乃包含:形成一裝設孔沿厚度方向來貫穿一板,在該裝設 孔的内壁製成-導體層,並在該設有導電層的裝設孔内麼 裝-電容器i線’其具有一導線位於蕊心,及一高介電常 數材料以-預定厚度同軸地包覆該導線,而將該電容器裝 設於該板中。 圖式簡單說明 本毛明之足些及其它的目的和特徵,將可由以下較佳 實施例的說明並參照所附圖式而得更清楚暸解;其中: 第1圖為本發明之一半導體封裝體裝設一半導體晶片 的狀態之截面圖; 弟2A至2DU為本發明之—半導體封裝體的製程步驟
8 玖、發明說明 之截面圖;及 第3A與3B圖為用來製造半導體封裝 的立體圖。 〜為#見線 C實施方式】 較佳實施例之詳細說明 本發明的較佳實施騎參照所_式_細說明 第1圖為本發明一每 只苑例之半導體封裝體的構造截面 圖。該圖中係示屮—生诣_ ^ ^ +冷肢封裝體20上裝有一半導俨曰 1 〇的狀態。本實施例之半導 、曰曰 10 <牛¥ to封裝體的特徵係,_ 半導體封裝體2 0之板2 2的帝、 勺兒谷态3 0,將會與該半導體晶 1〇之連接端子咖的列設位置吻合地來裝設。 a曰曰 15 該電容器30係包含一導線32, 一高介電常數材祕 以預定厚度來包覆該導線32,及一導體勒套36形成—導二 層來包覆該高介電常數材料34的外周緣。該導線32與該導 體勒’套36係同心地列設。該電容器30即由該導線32,高介 電常數材料34’及該導體鞘套36等所形成,而具有—丘軸 結構。該高介電常數材料34係能供在該導線32和導體勒套 36之間來獲得—所需的靜電電容。該導線32及導體勒套36 即形如該電容器30的電極。於高介電常數材料Μ係由鈦化 鏍、鈦化鋇’或其它的高介電常數材料所製成,或由一種 其中混有-高介電常數材料來作為填充料的有機材料所製 成’俾可獲得所需的靜電電容。 在本實施例的半導體封裝體中,該電容器3 〇係用來抑 制電源供應電壓的起伏波動’因此該導㈣會連接於電源 20 200300282 玫、發明說明 10 15 20 供應線’而該包覆著高介電常數材料34外周面的導體勒套 36會連接於-接地線來形成接地電位。故而,該電容器% 會被设在該電路的電源供應線與接地線之間。 如第1圖所示,該電容器30係套裝於一沿厚度方向貫 穿該板22的裝設孔中來形成一共輛結構。該導線32會直接 連接於半導體晶的連接料⑽。料線被設成 垂直地穿過該電容器30。其係同時為該電容器%之一構件 及供連接料接端子1Ga和電源供應的線路。因此,該連 接端子H)a與該電容器會被以最短的距離來連接,而沒有 任何線路的迁迴。連接該電容器3〇和連接端子心的線路 長度會變成最短,且線路部份的電感會變成最小。故,當 其在處理數GHz的高頻率信號時,將能有效地抑止特性的 另化。在一晋通半導體封裝體的結構中,電感會有200至 3〇〇 pH,但依據該結構,乃可將電感減少到⑺至咒 於第1圖中,標號40係為一可供阻抗匹配的共軸纜線 部,而被設在一信號線的連接部處。標號41為一作為該信 號 '、泉的.線,42為一低介電常數材料,而43為一導體鞘套 其冒包覆该低介電常數材料42的外周面。該導體鞘套43 係連接於-接地線,而會成為接地電位。該共軸欖部部糾 的4寸被係纟製成一共轴結構,而可在形成該信號線之特性 阻抗的。亥$線41之輸入/輸出端子處來匹配阻抗。該低介 電常數材料42係為一可供匹配50〇之特性阻抗的介電材料 。製成該電容器30的介電材料具有3〇至4〇的單位介電常數 ,而该低介電常數材料42係為一種約為3之低單位介電常
10 200300282 玖、發明說明 數的材料。 t圖例的半導體封裝體中,標號45係為—類似於導線 41紅唬線,但其並未形成一共軸結構,因該信號線45在 本實施例的半導體封裝體中係僅供—低頻信號的輪人/輸出。 該接地線46係經由一設在該板22 標號46為一接地線 别述導體勒套3 6和4 3,以使 。標號50係設在該板22底面 内層之互接圖案47來電連接於 該一鞘套36和43形成接地電位 的外。P連接ife子。㈣外部連制子㈣將焊球連結於設 在5亥板22表面上的平墊52而來製成者。 10 第2A至2DD乃示出上述半導體封裝體之各製程步驟。 第2A圖不出一板22設有形成信號線45和接地線衫的導 體線路,以及一互接圖案47。 該板22可被製成一多層板 而包含-由樹脂製成的核心板,其兩面會透過絕緣層來疊 設各互接層等。 15 第⑶圖乃示出裝設孔⑼與62沿著厚度方向貫穿該板22 來被形成的狀態。該等裝設孔6〇,62係在用來製成上述電 容器30和高頻信號使用的共軸纜線部4〇之位置處鑽孔而被 形成。該等裝設孔60與62係被製成使其内徑尺寸匹配於所 要I a又在该板22中之該電容器3〇和共軸纜線部4〇的外徑尺 20 寸。 第2C圖乃示出该電容器3〇和共軸纜線部4〇被裝設於該 板22之孔60與62中的狀態。為將該電容器3〇安裝於該裝設 孔60中,一事先製成圓筒狀的電容器纜線會被插入該裝設 孔60内。 200300282 玖、發明說明 第3A圖為一電容器纜線30a的立體圖。該電容器纜線 30a係由一前述之導線32,一高介電常數材料34,及一形 成長共軸纜線形狀的導體鞘套36等所組成。該電容器30可 藉將該電容器纜線30a切成預定長度,而壓裝於該板22的 5 裝設孔60中來被固設。
藉將該電容器30插入於該裝設孔60中,該導體鞘套36 將會觸接曝現於該裝設孔60内周壁上的互接圖案47,因此 該互接圖案47與導體鞘套36即會電連接。 請暸解將該電容器30裝入裝設孔60内的方法,除了使 10 用第3 A圖所示的電容器纜線30a的方法之外,使用第3B圖 所示之電容器纜線30b的方法亦為可行。在第3B圖中所示 的電容器纜線30b並沒有第30A圖中所示之電容器纜線30a 的導體鞘套36。
當使用第3B圖所示之電容器纜線30b來將該電容器30 15 裝設於該板22中時,首先一裝設孔60會被設於該板22中, 嗣該孔60的内壁會被電鍍而來形成一導體層,然後第3B圖 所示的電容器纜線30b會被壓裝於該裝設孔60内。在此情 況下,該導體層會變成接地電位,且設在該孔60内壁上的 導體層會具有如第3A圖所示之電容器纜線30a之導體鞘套 20 36的功能,而可供形成該電容器30。 該供作為板22之信號線的共軸纜線部40之安裝方法, 係類似於將該電容器30裝設於該板22中的方法。即,可將 第2C圖所示之共軸纜線部40,藉將一如第3A或3B圖所示 之電容器纜線30a或30b的相同方式所製成之一共軸纜線壓 12 ^00300282 ίο 15 20 玖、發明說明 裝於被^在板22中的裝設孔62内而來完成。該共軸繞線係 可在該低介電常數材料42的外表面上設有—導體勒套,或 亦可不設具該導體鞍套。當在該低介電常數材料42的外表 面上未設有該導體勒套時,其亦得以如同前述方式藉電鑛 该裝設孔62的内壁而來製成一導體層。 第2D圖係示出當將該電容器%及共歸線㈣設於該 板22中之後’在該板22的表面上形成—互接圖案的狀態。 該互接圖案係可藉以電鑛等之方法,在該㈣的頂面和底 面上形成一導體層,然後姓刻該導體層來形成一預定圖宰 而被製成。標號52係可供與外部連接端子連結的平塾’而 標號54為用來連結該半導體晶片1G之爆點的接墊。 以此方式,將可製成—半導體封裝體’其呈有一電容 ㈣係沿厚度方向貫穿該板22而來裝設。該實施例之半導 體封裝體’如上所述’乃具有形成電源供應線的導線32來 作為該電容㈣的-部份,並具有該導線以接連結於該 連接端子⑽,故可形成最短的電源供應線長度,而能抑 止其電源供應電壓的波動,並減少其電感,來形成一且有 絕佳高頻特性的封裝體。且,對傳輸該頻信號的信號線而 ::亦能藉匹配其特性阻抗而來改善該高頻特性。故將可 獲得一高頻特性優異的半導體封裝體。 综結本發明之功效,依據本發明的半導體封裝體及其 製造方法’乃可容易地將—電容器裝設於—板中,而來抑 止該電源供應電壓的波動’並能將連接該電路板與連接端 子的線路長度減至最小,而來降低電感。因此,其將能形
13 200300282 玖、發明說明 成一種具有絕佳高頻特性的半導體封裝體。 雖本發明已參照選供說明的特定實施例來詳加描述, 惟專業人士應可暸解各種修正仍可被製成,而不超出本發 明的基本概念和範圍。 5 【圖式簡單說明】 第1圖為本發明之一半導體封裝體裝設一半導體晶片 的狀態之截面圖;
第2A至2D圖為本發明之一半導體封裝體的製造步驟 之截面圖;及 10 第3A與3B圖為用來製造半導體封裝體之電容器纜線 的立體圖。 【圖式之主要元件代表符號表】 10…半導體晶片 10a···連接端子 20···半導體封裝體 22…板 30···電容器 30a,3b···電容器纜線 3 2…導線 34···高介電常數材料 3 6…導體鞘套 40···共軸纜線部 41…導線 42…低介電常數材料 43…導體鞘套 4 5…信號線 4 6…接地線 47…互接圖案 50···外部連接端子 52…平墊 54···接墊 60,62…裝設孔
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Claims (1)

  1. 200300282 10 15 20 拾、申請專利範圍 1. -種半導體元件,裝有一電容器可抑止電源供應電麈 的波動,其中該電容器係如下來構成:在一沿厚度方 向貫穿一板的裝設孔中,有一導線可在一端連接於一 半導體晶片的連接端子,一高介電常數材料會以一預 定厚度來包覆該導線,及一導體層被設於該高介電常 數材料的外周緣與該裝設孔的内壁之間,而以該導線 為其中心來形成一共軸結構。 2·如申請專利範圍第w之半導體元件,其中至少有—設 在該板中的信號線係如下來構成:在-沿厚度方向貫 穿該板的裝設孔中,有一在蕊心的信號線,一低介電 I數材料’及—導體層等會形成—匹配阻抗的共軸^ 3 ’種叙有一電容器可抑止電源供應電壓波動之半導叫 封裝體的製造方法,包含: h 沿厚度方向貫穿一板來形成一裝設孔;及 將一電容器纜線壓裝於該裝設孔内,而該電容哭 i線含有-在蕊心的導線,—高介電常數#㈣二 預定厚度共軸地包覆該導線,及一導體鞠套會包覆, 兩介電常數材料的外周表" 中。 而將4电谷裔固裝於該奴 種裝有一電容器可抑止 電源供應電壓波動之半導 封裝體的製造方法,包含: 沿厚度方向貫穿一板來形成一褒設孔; 在該裝設孔的内壁製成—導體層;及 趲 15 4. 200300282 拾、申請專利範圍 將一電容器纜線壓裝於該設有導體層的裝設孔内 ,而該電容器纟覽線包含一在蕊心的導線,及一高介電 常數材料會以預定厚度共軸地包覆該導線,而將該電 容器固設於該板中。 16
TW091132188A 2001-11-07 2002-10-30 Semiconductor package and method of production thereof TW200300282A (en)

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Families Citing this family (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4005451B2 (ja) * 2002-08-29 2007-11-07 富士通株式会社 多層基板及び半導体装置
US7767876B2 (en) * 2003-10-30 2010-08-03 The Procter & Gamble Company Disposable absorbent article having a visibly highlighted wetness sensation member
JP2006019455A (ja) * 2004-06-30 2006-01-19 Nec Electronics Corp 半導体装置およびその製造方法
KR100858075B1 (ko) * 2004-07-06 2008-09-11 도쿄엘렉트론가부시키가이샤 인터포저
KR100856450B1 (ko) * 2004-07-06 2008-09-04 도쿄엘렉트론가부시키가이샤 관통 기판의 제조 방법
JP4445351B2 (ja) * 2004-08-31 2010-04-07 株式会社東芝 半導体モジュール
SG135065A1 (en) * 2006-02-20 2007-09-28 Micron Technology Inc Conductive vias having two or more elements for providing communication between traces in different substrate planes, semiconductor device assemblies including such vias, and accompanying methods
JP4185499B2 (ja) * 2005-02-18 2008-11-26 富士通マイクロエレクトロニクス株式会社 半導体装置
US7521806B2 (en) * 2005-06-14 2009-04-21 John Trezza Chip spanning connection
US8456015B2 (en) 2005-06-14 2013-06-04 Cufer Asset Ltd. L.L.C. Triaxial through-chip connection
US7851348B2 (en) * 2005-06-14 2010-12-14 Abhay Misra Routingless chip architecture
US7560813B2 (en) 2005-06-14 2009-07-14 John Trezza Chip-based thermo-stack
US7781886B2 (en) 2005-06-14 2010-08-24 John Trezza Electronic chip contact structure
US7687400B2 (en) * 2005-06-14 2010-03-30 John Trezza Side stacking apparatus and method
US7989958B2 (en) * 2005-06-14 2011-08-02 Cufer Assett Ltd. L.L.C. Patterned contact
US7534722B2 (en) * 2005-06-14 2009-05-19 John Trezza Back-to-front via process
US7838997B2 (en) * 2005-06-14 2010-11-23 John Trezza Remote chip attachment
US20060281303A1 (en) * 2005-06-14 2006-12-14 John Trezza Tack & fuse chip bonding
US7767493B2 (en) * 2005-06-14 2010-08-03 John Trezza Post & penetration interconnection
US7786592B2 (en) * 2005-06-14 2010-08-31 John Trezza Chip capacitive coupling
US7701052B2 (en) * 2005-10-21 2010-04-20 E. I. Du Pont De Nemours And Company Power core devices
US7404250B2 (en) * 2005-12-02 2008-07-29 Cisco Technology, Inc. Method for fabricating a printed circuit board having a coaxial via
US20070281460A1 (en) * 2006-06-06 2007-12-06 Cubic Wafer, Inc. Front-end processed wafer having through-chip connections
US7687397B2 (en) 2006-06-06 2010-03-30 John Trezza Front-end processed wafer having through-chip connections
JP2008028188A (ja) * 2006-07-21 2008-02-07 Sharp Corp プリント配線板、プリント配線板の製造方法、及び電子機器
US7473577B2 (en) * 2006-08-11 2009-01-06 International Business Machines Corporation Integrated chip carrier with compliant interconnect
EP2074647B1 (en) * 2006-10-17 2012-10-10 Cufer Asset Ltd. L.L.C. Wafer via formation
US7570493B2 (en) * 2006-11-16 2009-08-04 Sony Ericsson Mobile Communications Printed circuit board with embedded circuit component
US7670874B2 (en) 2007-02-16 2010-03-02 John Trezza Plated pillar package formation
US7850060B2 (en) * 2007-04-05 2010-12-14 John Trezza Heat cycle-able connection
US7748116B2 (en) * 2007-04-05 2010-07-06 John Trezza Mobile binding in an electronic connection
US7960210B2 (en) 2007-04-23 2011-06-14 Cufer Asset Ltd. L.L.C. Ultra-thin chip packaging
US20080261392A1 (en) * 2007-04-23 2008-10-23 John Trezza Conductive via formation
KR20090096174A (ko) * 2008-03-07 2009-09-10 주식회사 하이닉스반도체 회로 기판 및 이를 이용한 반도체 패키지
CN101661920B (zh) * 2008-08-26 2011-06-29 欣兴电子股份有限公司 芯片封装载板及其制造方法
US20100073894A1 (en) * 2008-09-22 2010-03-25 Russell Mortensen Coreless substrate, method of manufacturing same, and package for microelectronic device incorporating same
US8227706B2 (en) * 2008-12-31 2012-07-24 Intel Corporation Coaxial plated through holes (PTH) for robust electrical performance
US20100327433A1 (en) * 2009-06-25 2010-12-30 Qualcomm Incorporated High Density MIM Capacitor Embedded in a Substrate
US8558345B2 (en) * 2009-11-09 2013-10-15 International Business Machines Corporation Integrated decoupling capacitor employing conductive through-substrate vias
TWI370532B (en) * 2009-11-12 2012-08-11 Ind Tech Res Inst Chip package structure and method for fabricating the same
FR2953069B1 (fr) * 2009-11-24 2012-03-09 Eads Europ Aeronautic Defence Dispositif de protection contre la foudre d'un recepteur d'antenne et avion le comportant
US8519515B2 (en) * 2011-04-13 2013-08-27 United Microlectronics Corp. TSV structure and method for forming the same
JP5687336B2 (ja) * 2011-05-24 2015-03-18 三菱電機株式会社 高周波パッケージ
US20130048344A1 (en) * 2011-08-30 2013-02-28 Star Technologies Inc. High frequency circuit board
JP5938918B2 (ja) * 2012-01-24 2016-06-22 株式会社デンソー 配線基板を有する半導体装置
KR102134933B1 (ko) * 2012-08-31 2020-07-16 소니 주식회사 배선 기판 및 배선 기판의 제조 방법
US9368440B1 (en) * 2013-07-31 2016-06-14 Altera Corporation Embedded coaxial wire and method of manufacture
KR102230011B1 (ko) * 2013-12-23 2021-03-19 인텔 코포레이션 쓰루 바디 비아 격리된 동축 커패시터 및 그 형성 기술
JP6147417B2 (ja) * 2014-03-18 2017-06-14 株式会社日本マイクロニクス 電池
US9275975B2 (en) 2014-03-28 2016-03-01 Intel Corporation Electronic package and method of connecting a first die to a second die to form an electronic package
US10119993B2 (en) * 2014-10-30 2018-11-06 Tongfu Microelectronics Co., Ltd. Testing probe and semiconductor testing fixture, and fabrication methods thereof
US9378778B1 (en) * 2015-06-14 2016-06-28 Darryl G. Walker Package including a plurality of stacked semiconductor devices including a capacitance enhanced through via and method of manufacture
US9807867B2 (en) 2016-02-04 2017-10-31 Taiwan Semiconductor Manufacturing Co., Ltd. Interconnect structure and method of manufacturing the same
JP2017204511A (ja) * 2016-05-10 2017-11-16 ソニー株式会社 半導体装置、半導体装置の製造方法、及び、電子機器
CN106912160A (zh) * 2017-03-14 2017-06-30 上海摩软通讯技术有限公司 一种pcb板及其制作方法
EP3755126A4 (en) * 2018-03-15 2021-03-03 Huawei Technologies Co., Ltd. CONNECTING BOARD, PCB ASSEMBLY AND ELECTRONIC DEVICE
KR102509050B1 (ko) * 2018-06-26 2023-03-13 에스케이하이닉스 주식회사 전자기 밴드갭 구조를 갖는 패키지 기판 및 이를 이용한 반도체 패키지
KR102611780B1 (ko) 2018-10-26 2023-12-11 삼성전자 주식회사 관통 배선이 형성된 영역을 둘러싸는 개구부 및 개구부의 측면에 도전성 부재가 형성된 기판을 포함하는 기판 연결 부재 및 이를 포함하는 전자 장치
CN109841430B (zh) * 2019-03-22 2020-12-01 杭州灵通电子有限公司 一种用于大尺寸多层瓷介电容器的封端装置及封端工艺
KR20220146907A (ko) 2021-04-26 2022-11-02 삼성전기주식회사 인쇄회로기판

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2891375B2 (ja) * 1990-02-27 1999-05-17 新光電気工業株式会社 高速電子部品用セラミック基板とその製造方法
JPH05167258A (ja) * 1991-12-12 1993-07-02 Nec Corp 多層配線基板
JPH10163A (ja) 1996-06-15 1998-01-06 Chubu Corp:Kk 焼き肉ロースタの使用方法
US6072690A (en) * 1998-01-15 2000-06-06 International Business Machines Corporation High k dielectric capacitor with low k sheathed signal vias
US6122187A (en) * 1998-11-23 2000-09-19 Micron Technology, Inc. Stacked integrated circuits
JP4390368B2 (ja) 2000-06-08 2009-12-24 新光電気工業株式会社 配線基板の製造方法
TW525417B (en) * 2000-08-11 2003-03-21 Ind Tech Res Inst Composite through hole structure
US6605551B2 (en) * 2000-12-08 2003-08-12 Intel Corporation Electrocoating process to form a dielectric layer in an organic substrate to reduce loop inductance

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