SG80064A1 - Method for production of soi substrate by pasting and soi substrate - Google Patents

Method for production of soi substrate by pasting and soi substrate

Info

Publication number
SG80064A1
SG80064A1 SG9904180A SG1999004180A SG80064A1 SG 80064 A1 SG80064 A1 SG 80064A1 SG 9904180 A SG9904180 A SG 9904180A SG 1999004180 A SG1999004180 A SG 1999004180A SG 80064 A1 SG80064 A1 SG 80064A1
Authority
SG
Singapore
Prior art keywords
soi substrate
pasting
production
soi
substrate
Prior art date
Application number
SG9904180A
Other languages
English (en)
Inventor
Yamagata Kenji
Yonehara Takao
Atoji Tadashi
Sakaguchi Kiyofumi
Original Assignee
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kk filed Critical Canon Kk
Publication of SG80064A1 publication Critical patent/SG80064A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
    • H01L21/2003—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy characterised by the substrate
    • H01L21/2007—Bonding of semiconductor wafers to insulating substrates or to semiconducting substrates using an intermediate insulating layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76—Making of isolation regions between components
    • H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/7624—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology
    • H01L21/76251—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers using semiconductor on insulator [SOI] technology using bonding techniques
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/977—Thinning or removal of substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Recrystallisation Techniques (AREA)
  • Thin Film Transistor (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Element Separation (AREA)
SG9904180A 1996-04-08 1997-04-07 Method for production of soi substrate by pasting and soi substrate SG80064A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8518796 1996-04-08
JP9079783A JPH09331049A (ja) 1996-04-08 1997-03-31 貼り合わせｓｏｉ基板の作製方法及びｓｏｉ基板

Publications (1)

Publication Number Publication Date
SG80064A1 true SG80064A1 (en) 2001-04-17

Family

ID=26420778

Family Applications (2)

Application Number Title Priority Date Filing Date
SG9904180A SG80064A1 (en) 1996-04-08 1997-04-07 Method for production of soi substrate by pasting and soi substrate
SG1997001065A SG54491A1 (en) 1996-04-08 1997-04-07 Method for production of soi substrate by pasting ans soi substrate

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG1997001065A SG54491A1 (en) 1996-04-08 1997-04-07 Method for production of soi substrate by pasting ans soi substrate

Country Status (8)

Country Link
US (1) US6156624A (de)
EP (1) EP0801420A3 (de)
JP (1) JPH09331049A (de)
KR (1) KR100235398B1 (de)
CN (1) CN1099699C (de)
CA (1) CA2202003C (de)
SG (2) SG80064A1 (de)
TW (1) TW337042B (de)

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JP2000315635A (ja) * 1999-04-30 2000-11-14 Mitsubishi Materials Silicon Corp 張り合わせ用シリコンウェーハおよびこれを用いた張り合わせ基板の製造方法
JP2001007362A (ja) * 1999-06-17 2001-01-12 Canon Inc 半導体基材および太陽電池の製造方法
US6984571B1 (en) 1999-10-01 2006-01-10 Ziptronix, Inc. Three dimensional device integration method and integrated device
US6902987B1 (en) 2000-02-16 2005-06-07 Ziptronix, Inc. Method for low temperature bonding and bonded structure
US20050226993A1 (en) * 2000-10-03 2005-10-13 Nawrocki Jesse G Medical devices having durable and lubricious polymeric coating
KR100418241B1 (ko) * 2001-03-23 2004-02-11 주영창 멤즈소자의 가역적 밀봉 패키지 방법
JP4628580B2 (ja) * 2001-04-18 2011-02-09 信越半導体株式会社 貼り合せ基板の製造方法
US7176528B2 (en) * 2003-02-18 2007-02-13 Corning Incorporated Glass-based SOI structures
FR2851846A1 (fr) * 2003-02-28 2004-09-03 Canon Kk Systeme de liaison et procede de fabrication d'un substrat semi-conducteur
JP2004335642A (ja) * 2003-05-06 2004-11-25 Canon Inc 基板およびその製造方法
WO2004099473A1 (en) * 2003-05-06 2004-11-18 Canon Kabushiki Kaisha Semiconductor substrate, semiconductor device, light emitting diode and producing method therefor
US20050124137A1 (en) * 2003-05-07 2005-06-09 Canon Kabushiki Kaisha Semiconductor substrate and manufacturing method therefor
US7109092B2 (en) 2003-05-19 2006-09-19 Ziptronix, Inc. Method of room temperature covalent bonding
TWI242232B (en) * 2003-06-09 2005-10-21 Canon Kk Semiconductor substrate, semiconductor device, and method of manufacturing the same
JP2005005509A (ja) * 2003-06-12 2005-01-06 Canon Inc 薄膜トランジスタ及びその製造方法
US20050132332A1 (en) * 2003-12-12 2005-06-16 Abhay Sathe Multi-location coordinated test apparatus
US6992025B2 (en) * 2004-01-12 2006-01-31 Sharp Laboratories Of America, Inc. Strained silicon on insulator from film transfer and relaxation by hydrogen implantation
JP2005347302A (ja) 2004-05-31 2005-12-15 Canon Inc 基板の製造方法
JP4771510B2 (ja) * 2004-06-23 2011-09-14 キヤノン株式会社 半導体層の製造方法及び基板の製造方法
US7495313B2 (en) * 2004-07-22 2009-02-24 Board Of Trustees Of The Leland Stanford Junior University Germanium substrate-type materials and approach therefor
US7422447B2 (en) * 2004-08-19 2008-09-09 Fci Americas Technology, Inc. Electrical connector with stepped housing
JP2006080314A (ja) 2004-09-09 2006-03-23 Canon Inc 結合基板の製造方法
US7371662B2 (en) * 2006-03-21 2008-05-13 Taiwan Semiconductor Manufacturing Company, Ltd. Method for forming a 3D interconnect and resulting structures
US7790565B2 (en) * 2006-04-21 2010-09-07 Corning Incorporated Semiconductor on glass insulator made using improved thinning process
JP5171016B2 (ja) * 2006-10-27 2013-03-27 キヤノン株式会社 半導体部材、半導体物品の製造方法、その製造方法を用いたｌｅｄアレイ
JP2009094144A (ja) * 2007-10-04 2009-04-30 Canon Inc 発光素子の製造方法
WO2009142929A1 (en) * 2008-05-23 2009-11-26 Fujifilm Corporation Method and apparatus for substrate bonding
JP5796936B2 (ja) * 2010-06-01 2015-10-21 キヤノン株式会社 多孔質ガラスの製造方法
CN103400890A (zh) * 2013-07-08 2013-11-20 浙江晶科能源有限公司 一种晶硅太阳电池pecvd色差片去膜重镀的返工工艺
JP6447439B2 (ja) * 2015-09-28 2019-01-09 信越半導体株式会社 貼り合わせｓｏｉウェーハの製造方法
US10707302B2 (en) * 2016-11-25 2020-07-07 Shindengen Electric Manufacturing Co., Ltd. Semiconductor device manufacturing method and semiconductor device
JP6558355B2 (ja) * 2016-12-19 2019-08-14 信越半導体株式会社 Ｓｏｉウェーハの製造方法

Citations (2)

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Publication number Priority date Publication date Assignee Title
EP0603849A2 (de) * 1992-12-25 1994-06-29 Canon Kabushiki Kaisha Verfahren zur Herstellung eines Halbleitersubstrates mittels eines Verbundverfahrens
EP0676796A2 (de) * 1994-04-08 1995-10-11 Canon Kabushiki Kaisha Halbleitersubstrat und Verfahren zur Herstellung

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JPS5987481A (ja) * 1982-11-11 1984-05-21 Konishiroku Photo Ind Co Ltd 中間転写体のクリ−ニング装置
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JP2988551B2 (ja) * 1992-01-14 1999-12-13 キヤノン株式会社 画像形成装置
JP3416163B2 (ja) * 1992-01-31 2003-06-16 キヤノン株式会社 半導体基板及びその作製方法
JP3237888B2 (ja) * 1992-01-31 2001-12-10 キヤノン株式会社 半導体基体及びその作製方法
JPH05217822A (ja) * 1992-02-07 1993-08-27 Fujitsu Ltd シリコンオンインシュレータ基板の製造方法
US5441899A (en) * 1992-02-18 1995-08-15 Mitsubishi Denki Kabushiki Kaisha Method of manufacturing substrate having semiconductor on insulator
KR100292330B1 (ko) * 1992-05-01 2001-09-17 이데이 노부유끼 반도체장치와그제조방법및실리콘절연기판의제조방법
KR100289348B1 (ko) * 1992-05-25 2001-12-28 이데이 노부유끼 절연기판실리콘반도체장치와그제조방법
EP0588280B1 (de) * 1992-09-14 1998-01-14 Canon Kabushiki Kaisha Reinigungseinrichtung für ein elektrophotografisches Gerät und ein diese Reinigungseinrichtung verwendendes elektrophotografisches Gerät
JP3644980B2 (ja) * 1993-09-06 2005-05-11 株式会社ルネサステクノロジ 半導体装置の製造方法
TW330313B (en) * 1993-12-28 1998-04-21 Canon Kk A semiconductor substrate and process for producing same
US6004406A (en) * 1994-06-16 1999-12-21 Nec Corporation Silicon on insulating substrate
JP3265493B2 (ja) * 1994-11-24 2002-03-11 ソニー株式会社 Ｓｏｉ基板の製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0603849A2 (de) * 1992-12-25 1994-06-29 Canon Kabushiki Kaisha Verfahren zur Herstellung eines Halbleitersubstrates mittels eines Verbundverfahrens
EP0676796A2 (de) * 1994-04-08 1995-10-11 Canon Kabushiki Kaisha Halbleitersubstrat und Verfahren zur Herstellung

Also Published As

Publication number Publication date
KR100235398B1 (ko) 1999-12-15
TW337042B (en) 1998-07-21
CN1099699C (zh) 2003-01-22
JPH09331049A (ja) 1997-12-22
EP0801420A2 (de) 1997-10-15
CA2202003A1 (en) 1997-10-08
EP0801420A3 (de) 1998-05-20
SG54491A1 (en) 1998-11-16
US6156624A (en) 2000-12-05
CA2202003C (en) 2001-02-20
CN1166049A (zh) 1997-11-26

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