SG184735A1 - Cleaning agent for electronic material - Google Patents

Cleaning agent for electronic material Download PDF

Info

Publication number
SG184735A1
SG184735A1 SG2012066916A SG2012066916A SG184735A1 SG 184735 A1 SG184735 A1 SG 184735A1 SG 2012066916 A SG2012066916 A SG 2012066916A SG 2012066916 A SG2012066916 A SG 2012066916A SG 184735 A1 SG184735 A1 SG 184735A1
Authority
SG
Singapore
Prior art keywords
cleaning
electronic material
acid
substrate
salt
Prior art date
Application number
SG2012066916A
Other languages
English (en)
Inventor
Kazumitsu Suzuki
Ayayo Sugiyama
Yoshitaka Katsukawa
Original Assignee
Sanyo Chemical Ind Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Chemical Ind Ltd filed Critical Sanyo Chemical Ind Ltd
Publication of SG184735A1 publication Critical patent/SG184735A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
SG2012066916A 2007-09-14 2008-09-12 Cleaning agent for electronic material SG184735A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007239356 2007-09-14
JP2007239474 2007-09-14

Publications (1)

Publication Number Publication Date
SG184735A1 true SG184735A1 (en) 2012-10-30

Family

ID=40452095

Family Applications (1)

Application Number Title Priority Date Filing Date
SG2012066916A SG184735A1 (en) 2007-09-14 2008-09-12 Cleaning agent for electronic material

Country Status (5)

Country Link
CN (1) CN101848987A (zh)
MY (1) MY156414A (zh)
SG (1) SG184735A1 (zh)
TW (1) TWI398514B (zh)
WO (1) WO2009035089A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11845917B2 (en) 2018-12-21 2023-12-19 Entegris, Inc. Compositions and methods for post-CMP cleaning of cobalt substrates

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5377058B2 (ja) * 2009-04-22 2013-12-25 花王株式会社 ハードディスク用基板用の洗浄剤組成物
KR101673589B1 (ko) * 2009-10-30 2016-11-07 동우 화인켐 주식회사 평판표시장치의 유리기판용 세정제 조성물
JP5401359B2 (ja) * 2010-02-16 2014-01-29 花王株式会社 硬質表面用アルカリ洗浄剤組成物
JP2012017420A (ja) * 2010-07-08 2012-01-26 Neos Co Ltd 水溶性洗浄剤組成物
RU2578718C2 (ru) * 2010-07-19 2016-03-27 Басф Се Водные щелочные очищающие композиции и способы их применения
CN102338994B (zh) * 2010-07-23 2014-12-31 安集微电子（上海）有限公司 一种光刻胶的清洗液
CN102346383B (zh) * 2010-08-06 2016-03-16 安集微电子（上海）有限公司 一种光刻胶的清洗液
JP5774330B2 (ja) * 2011-02-28 2015-09-09 三洋化成工業株式会社 電子材料用洗浄剤
CN102653706A (zh) * 2011-03-03 2012-09-05 宁波市鄞州声光电子有限公司 非金属元件清洁剂
KR20140053003A (ko) * 2011-05-24 2014-05-07 아사히 가라스 가부시키가이샤 세정제 및 유리 기판의 세정 방법
CN102981376A (zh) * 2011-09-05 2013-03-20 安集微电子（上海）有限公司 一种光刻胶清洗液
CN102604751B (zh) * 2012-01-20 2013-06-19 深圳市飞世尔实业有限公司 一种光学玻璃清洗剂
MY181715A (en) * 2012-09-20 2021-01-04 Hoya Corp Method for manufacturing glass substrate for information recording medium
JPWO2014080917A1 (ja) * 2012-11-22 2017-01-05 株式会社パーカーコーポレーション ガラス基板の洗浄方法
CN104673540A (zh) * 2013-11-30 2015-06-03 天津晶美微纳科技有限公司 一种水溶性液晶玻璃基板清洗剂及其制备方法
CN103668144B (zh) * 2013-12-24 2016-01-20 淮南天力生物工程开发有限公司 一种环保型有机金属处理液及其制备方法
CN104710608B (zh) * 2015-02-09 2016-11-23 上海金兆节能科技有限公司 醇醚磷酸酯及其制备方法和用该酯制备环保金属清洗剂
WO2016181751A1 (ja) * 2015-05-13 2016-11-17 バンドー化学株式会社 研磨パッド及び研磨パッドの製造方法
CN104894593A (zh) * 2015-07-02 2015-09-09 傅宇晓 冷轧管材清洗液
CN105838507B (zh) * 2016-05-16 2019-02-01 深圳市路维光电股份有限公司 光罩清洗剂及清洗方法
CN106811347A (zh) * 2016-11-29 2017-06-09 洛阳新巨能高热技术有限公司 一种电子材料清洗剂
JP6495230B2 (ja) * 2016-12-22 2019-04-03 花王株式会社 シリコンウェーハ用リンス剤組成物
CN108499963A (zh) * 2017-05-18 2018-09-07 苏州权素船舶电子有限公司 一种电子材料研磨清洗方法
CN108004049A (zh) * 2017-12-28 2018-05-08 广州云普电子科技有限公司 一种具备防腐防锈功能的电子材料清洗剂

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3751324B2 (ja) * 1993-12-10 2006-03-01 忠弘 大見 基体の表面洗浄方法及び表面洗浄剤
JP2001070898A (ja) * 1999-09-06 2001-03-21 Shin Etsu Chem Co Ltd 精密基板の洗浄液及び洗浄方法
JP2002069495A (ja) * 2000-06-16 2002-03-08 Kao Corp 洗浄剤組成物
JP2003119494A (ja) * 2001-10-05 2003-04-23 Nec Corp 洗浄組成物およびこれを用いた洗浄方法と洗浄装置
JP4107825B2 (ja) * 2001-10-16 2008-06-25 電気化学工業株式会社 スラグ系注入材スラリー
JP3667273B2 (ja) * 2001-11-02 2005-07-06 Ｎｅｃエレクトロニクス株式会社 洗浄方法および洗浄液
JP4232002B2 (ja) * 2003-01-16 2009-03-04 日本電気株式会社 デバイス基板用の洗浄組成物及び該洗浄組成物を用いた洗浄方法並びに洗浄装置
WO2007125634A1 (ja) * 2006-03-31 2007-11-08 Sanyo Chemical Industries, Ltd. 銅配線用洗浄剤

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11845917B2 (en) 2018-12-21 2023-12-19 Entegris, Inc. Compositions and methods for post-CMP cleaning of cobalt substrates

Also Published As

Publication number Publication date
TWI398514B (zh) 2013-06-11
WO2009035089A1 (ja) 2009-03-19
CN101848987A (zh) 2010-09-29
TW200923072A (en) 2009-06-01
MY156414A (en) 2016-02-26

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