TW200923072A - Cleaning agent for electronic material - Google Patents

Abstract

A cleaning agent for electronic materials, such as magneto-optical disk substrate, flat panel display substrate and mask substrate is provided, wherein the cleaning agent provides a suitable etching ability for surfaces of electronic materials such as the above-mented and prevents to damge the surfaces thereof. The dispersity of particles removed from the substrate surface is enhanced by using a surfactant in the cleaning agent so as to achieve an excellent particle removing ability. Therefore, fabricating yield is improved and high cleaning performance is achieved within a short time. The cleaning agent for electronic materials has surfactant (A), and the PH value and the redox potential of the cleaning agent under a circustace of active ingredient concentration and 25 degree satisfy the following formula (1), wherein the formula (1) represents as V ≤ -38.7xpH+550.

Description

BACKGROUND OF THE INVENTION 1. Field of the Invention This invention relates to a cleaning agent for electronic materials. More specifically, the present invention relates to a magneto-optical disk substrate and a flat panel display. A cleaning agent for electronic materials such as a substrate and a reticle (mask) substrate. [Prior Art] In the cleaning technology of electronic materials such as a magneto-optical disk substrate, a flat display substrate, and a photomask substrate, a trace amount of organic matter, glass cullet, and abrasive grain remaining on the substrate in the manufacturing process. Impurities and other factors can have a large impact on the performance or yield of electronic materials, so impurity control becomes extremely important. In particular, since the impurities to be cleaned are more and more particles, which are more likely to adhere to and remain on the interface than before, it is urgent to establish a high-cleaning technique. Therefore, in order to prevent the contamination caused by the particles, for example, in Japanese Laid-Open Patent Publication No. Hei 11-43791, Japanese Patent Laid-Open No. 2001-276759, and Japanese Patent Laid-Open Publication No. Hei No. Hei. A method of using a surfactant to improve particle removability. However, in the manufacturing step of the substrate for a magneto-optical disk, particularly the aluminum substrate, 'contains: a plating layer which is a non-magnetic layer is plated on the surface of the substrate, and then an oxidized alumina slurry and a citric acid gel are used. 〇u〇idal silica) a step of performing a mirror finish and a mirror finish; and then, using a diamond slurry or the like as needed to texturize the surface of the substrate, thereby having the following problems : In this 200923072, some of the abrasives or abrasive chips adhered firmly to the surface of the substrate, and the attached polishing (4) was not sufficiently removed in the > In addition, in the manufacturing step of the glass substrate for a magneto-optical disk, in particular, a step of performing polishing by yttrium oxide and performing mirror polishing, and a step of texturing the surface of the substrate using a diamond paddle or the like as needed, Thus, there is a problem in that the abrasive or the abrasive scrap adheres firmly to the surface of the substrate in these steps, and the attached abrasive or the abrasive is not sufficiently removed in the cleaning step, in addition, on the flat display substrate or the light grass The manufacturing process of the substrate is made in the following section: On the mother glass, it is necessary to cut the glass crumb (used as glass shavings) generated when the size of the substrate is large, and splash in the clean room (cleanr〇〇 The processing oil of m), such as the polishing agent or the polishing agent used in the step of polishing the surface or the end surface of the substrate, adheres strongly to the surface of the substrate and cannot be sufficiently removed in the cleaning step. Two kinds of cattle, represented by abrasives, grinding debris, and organic matter, adhere to the surface of the substrate. Therefore, in order to sufficiently remove these particles, it is necessary to add _ (etehing) to the substrate or the abrasive table to make the particles ^ Into the liquid 'and as far as possible, the particles dispersed in the liquid will not be again = on the surface of the substrate. Among them, in Japanese Patent Laid-Open No. 1M37, the method uses a method in which the amount of adsorption to the abrasive is large = 5 mg/m, and the number average molecular weight is greater than that of the Kehui surfactant, and the surface tension of the 10 vol% aqueous solution is less than A clearing box composition equal to 3G dyne/em to agglomerate and coarsen the abrasive particles, thereby preventing particles 2 = pair = 200923072

The problem that the coarse particles of the field J adhere to the surface of the substrate may cause serious problems. Further, in the Japanese Patent Laid-Open Publication No. Hei 43-791791, the specific component preparation of the above detergent composition is not described. Further, the cleaning agent proposed in Japanese Patent Publication No. 2001-276759 is a cleaning liquid in which argon fluoride and ozone are dissolved, and when the cleaning agent is used, it is expected to be firmly adhered by the side. The effect of particle removal on the surface of the substrate, but there is a problem in that the cleaning liquid contains fluorine ions, which causes a huge cost on the waste water, and, because the etching liquid is too etched, it is cleaned. It will damage the flatness of the substrate. By making the dynamic potential (Han Potential) of the glass substrate and the surface of the abrasive grain a negative value, it is possible to prevent the particles from adhering again, but the prevention effect is insufficient. In addition, in the cleaning agent proposed in Japanese Laid-Open Patent Publication No. 2002-212597, the effect of preventing the particles from reattaching can be improved by using an anionic interface activity. Since it does not have a _ property, the particle removal property is inadequate, and the cleaning property is inadequate. SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide an electron (four) using a magneto-optical disk substrate, a flat display substrate, and a photomask substrate, which can be used for electronic materials such as a magneto-optical disk substrate, a flat display substrate, and a photomask wire. The surface of the substrate imparts light (four) properties without damaging the flat surface of the substrate and the cleaning agent is excellent in the dispersion of the particles from the substrate by using a surfactant. The particle removability, whereby the manufacturing rate can be improved, and the highly efficient high-cleaning which can be cleaned in a short time of 200923072 can be realized. The present inventors conducted intensive research to solve the above problems. The present invention has been achieved in accordance with the difference in the pH of the detergent at the time of use. The present invention is: (First Invention) A cleaning agent for electronic materials, The interface containing the active stabilizer (A)' is characterized by the pH value at the 25 ° C and the redox potential (v) when used as the active component in the presence of impurities. mV, vsSHE] satisfies the following formula (j); VS-38.7χρΗ value + 550 (1) (Second invention) A cleaning liquid for electronic materials, a agent U) 'The cleaning liquid is characterized by an active ingredient concentration For 〇〇 = percentage of )), the ΡΗ value at 25 °c and the oxidation-reduction potential (V) I are mV in the early position, VSSHE] satisfies the following formula (1); · 38.7 χρΗ value + 550 ( 1) ( A third invention relates to a method for cleaning an electronic material, which cleans an electronic material in a cleaning liquid; and, *, a method of manufacturing the electronic dragon of the fourth invention, the cleaning method for cleaning the electronic material The cleaning agent of the present invention has the following advantages: it becomes a step in the manufacturing process (in particular, the second substrate of the Ni_p electric ore), the flat display substrate, and the photomask substrate. The fine particles of the problem are excellent in cleaning, and can be efficiently cleaned in a short time = 200923072 without causing damage to the surface of the electronic material. ° The above and other objects, features and advantages of the present invention are more apparent. Easy to understand 'the following is a preferred embodiment' and The present invention will be described in detail below. [Embodiment] When the electronic material is a glass substrate for a magneto-optical disk, a flat display substrate or a photomask substrate, the cleaning agent of the first invention of the present invention is used as a cleaning liquid. The concentration of the effect component is 25. The ΡΗ value of the underarm is preferably 1 to 13, more preferably 1 to 5 or 8 to 13, particularly preferably 丨 4 or 9 to 13, and the best is When the pH is within this range, the detergent has an appropriate etching property without impairing the flatness of the substrate, and is easy to exhibit an effect of being fine and excellent in particle re-adhesion. Similarly, from the viewpoint of the effect, when the electronic material is a substrate for a magneto-optical disk substrate, the above pH value is preferably 5 to 13', more preferably 6 to 12, particularly preferably 6 5 to 1; 7~1〇. In addition, especially when the object to be cleaned is cerium oxide used in the grinding step of the electronic material described later, the cleaning liquid is preferably acidic, and the cleaning liquid is oxygen raking, lysing lye, cleaning liquid It is better to test. The cleaning agent of the present invention contains the surfactant (A) and is the same as needed (preferably ion-exchanged water or ultrapure water, the following water is also the active ingredient concentration of the cleaning agent of the present invention is usually 1 Wt0/o ～1〇〇200923072=%, preferably 2%~ articles (hereinafter '% unless otherwise specified, % not wt%) 'When the cleaning agent of the present invention is used as a cleaning liquid, it is usually diluted Moreover, the cleaning agent of the present invention is effective as a cleaning liquid. The concentration is preferably _% to 15%, more preferably G 眺 10 10 /〇. In addition, when the concentration of the active ingredient of the cleaning agent is 1 In the case of %~15%, the concentration can be used as a cleaning liquid. In addition, the active ingredient in the present invention is a component other than water. The recording liquid is used to improve the cleanliness of electronic materials. The various values of the ^ and the _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ And the oxidation of the cleaning solution is also equal to the upper limit of 1 (the upper limit of the effect) Tired of various data analysis 'Result Wei, providing a cleaning agent for the domain of the ship: The cleaning effect is significantly improved, that is, the cleaning liquid 2: the oxidation-reduction potential (V) satisfying the following formula (1) [25. (: value below, the unit is mV, vsSHE). -38.7χρΗ value + 550 (ι) For example, when the right positive value is 2, the redox potential (V) is less than or equal to

When the pH value of the pH is 5, (v) is 356 5 mV or less, and when pH is (7), it is 163.0 mV, and when the pH is 13, (V) is 46 fmV', the effect of the present invention can be exhibited. Inclination: The oxidation-reduction potential (25 C )* satisfies the formula (1), which significantly marks the surface of the substrate and impairs the flatness of the surface, and the particle removal property becomes i, which is not preferable. 11 200923072 As far as the 'Electric material' of the electronic material is concerned, the cleaning agent of the present invention and the cleaning property of the particles are particularly good in θ t絜", and it is better to satisfy The formula (2) is clear V < such as the cleaning agent of the formula (3). = 38.7_ value + 45〇% 38.7 willow value + 350 (3) Method Oxidation potential (V) The well-known < Method for measuring oxidation-reduction potential > Oxygen formed by remelting (vaporized silver electrode)

The ancient π \ complex electrode (for example, model: PST_5421C, T0A DKK bit:) 'measures the potential value (V1) of the cleaning liquid of 25 ΐ. The electric potential mV, 2m, and the reference electrode (silver chloride electrode) unipolar potential difference (199 is added ' can be used to determine the redox potential of the n clean solution (mV, ί bit v, for example, when the potential value (V1) is -1〇 〇mM, redox m, vsSHE) is -100+199 = +99 mV. The essential component of the detergent of the present invention, that is, the surfactant (A), may be exemplified by a nonionic surfactant (4)) and an anion. (Heart (10))! Raw surfactant (A-2), cationic (cati〇n) surfactant (A_3), and amphoteric surfactant (A-4). The nonionic surfactant (Ad) used in the detergent of the present invention may be an alkylene oxide addition nonionic surfactant (A-la), and a polyol type nonionic interface. The active agent (A), etc. (A-la) can be exemplified by higher alcohol (carbon number 8 to 18) alkylene oxide • 12· 200923072 (carbon number 2 to 4) (addition of each active hydrogen The number of ears is 1~30), the adduct, the carbon number is (the carbon number is (2) benzoquinone epoxy (10) (addition of each active hydrogen, the molar number is 丨~(10)), the fatty acid (carbon number is 8 to 18) Epoxy B 9 (additional molar number of each active hydrogen is 】 ~ called adduct 'aliphatic amine (carbon number 6 to 24) epoxy burning adduct (each active Hydrogen addition molar number is 1~30), polypropylene glycol (molecular weight 200~4000) ethylene oxide (additional molar number of each active hydrogen is [~5〇) adduct and polyoxygen Acetyl (each activity is added to the molar number of 1~30) ^ base (carbon number is Bu, sorbose riding lauric acid Lai Weiyi (additional molar number is H) adduct, Sorbitol single oil _ epoxy B (Additional molar number is 1~30) Additives and other multi-components (2~8 yuan or more than 2~8 yuan) of alcohol (carbon number is 2~3〇) of fat? Acid (carbon number is 8~24) _ Epoxy Ethylene (the molar amount of each active hydrogen is 1 to 3 〇) and the like.

L (A lb) can be exemplified by glycerol monostearyl glycerin, glyceric acid vinegar, sorbitan monolaurin vinegar, sorbitan monooleic acid vinegar, etc. (2 or more Γ above) alcohol (carbon number is 2~3〇) fatty acids (carbon, 8~24) S-day 'lauric acid monoethylamine, lauric acid second-class fatty acid alkanolamine and the like. In (^-1), from the viewpoint of cleanability, it is preferred that 1 G to W is epoxy-fired (carbon number is 2 to 3). Two-force: t-mole number is 2,) adduct, succession私私衣》ΐ 'Additional molars of tongue chlorine 2 to 20) Additives, and aliphatic amines (carbon number 8~18) of epoxy burned adducts (per active hydrogen per 200923072) The addition of moles is 2 to 20). Examples of the anionic surfactant (A-2) include an ancient surfactant (A_2a) and a low anion (A_2b). Xuan material surface active polymer type anionic interface activity _ (A sentence selected from the group consisting of sulfonic acid (salt) base, sulfuric acid vinegar (salt) base, • vinegar H with phosphine; (salt) base and citrate (salt) base The group d, the soil group, and the heavy, average molecular weight (hereinafter referred to as diligent) are 3 (8) to 800, _ of 3 molecular anionic surfactants. There are at least two "(A-2a-l) a polymeric anionic surfactant having a sulphate (salt) group:

Polystyrene, phenethyl benzoic acid copolymer, poly-(meth)acrylic ketone 2,2_dimethylbi}, 2_(fine arylamino group H Ethylene/phenyl ethane polymer, 2_(methyl)propyl bromoamino-2,2-dimethylglycolic acid/acrylamide copolymer, 2_(methyl)propanylamino-2 , 2-dimethylglycolic acid/(meth)acrylic acid copolymer, 2_(methyl)propyl arylamino-2,2-dimethylanilic acid/(meth)acrylic acid / propylene glycol amine copolymer, 2-(methyl) propylene decylamino 2,2 dimethyl ethane sulfonic acid / styrene / acrylamide copolymer, 2 · (meth) acryl decyl amine Benzene-2,2-dimethylethanesulfonic acid/styrene/(meth)acrylic acid copolymer, naphthalene acid methyl condensate, methylnaphthalene acid formaldehyde condensate, dimethylnaphthalenesulfonic acid Formaldehyde condensate, oxime sulfonic acid formaldehyde condensate • 14· 200923072 compound, melamine acid condensate, etc.; formaldehyde condensate and aniline sulfonic acid·phenol-formaldehyde surfactant: hinder the acid 8 (salt) base Molecular anionic poly {(methyl)propionate ethyl ester / acrylic acid 2-hydroxymei 7 • silk ethyl acetate sulfate}, 2-hydroxyethyl acrylate Propionic '23 vinegar copolymer and methacrylic acid 2 by rotation

Acrylic acid 2_light base (4) ^2: vinegar sulfate vinegar copolymer, poly{(methyl) taken ^t } sulphate, poly {(meth) propylene oxime (methyl (tetra) decyloxy Polyoxyethylene acesulfate acesulfame / propylene == and cellulose, methyl cellulose or ethyl cellulose: (A-2a-3) polymeric anionic surfactant with phosphate (salt) group: poly {(Methyl)acrylic acid 2-hydroxyethyl phosphate}, 2, hydroxyethyl acrylate / 2-hydroxyethyl acrylate phosphate copolymer and dimethyl diethethyl sulfonium methacrylate 2-Diethyl acetoacetate acid-based copolymer, poly((meth)acrylic acid 2·transethyl ester} disc esterate, poly {(methyl) propyl ethoxylated polyoxyethylene phosphate} , (meth) propylene oxiranoxy polyoxyethylene phosphate / acrylic acid copolymer ' and phosphate ester of cellulose, methyl cellulose or ethyl cellulose; etc.; (A-2a-4) has phosphonic acid (salt Base polymer anionic surfactant: poly{phosphonic acid (meth) propylene methoxyethyl ester}, 2-hydroxyethyl acrylate/phosphonic acid propylene ethoxyethyl ester copolymer and methacrylic acid 2 -hydroxyl Ethyl vinegar / Lin 200923072 acid methyl propylene roasting oxyacetate copolymer, naphthylphosphonic acid methyl condensate, methyl naphthalene phosphonium methylate, dimethyl naphthalene phosphonium methylate, phosphinic acid Furfural condensate and strepidophosphonic acid-phenol-formaldehyde condensate; (A-2a-5) polymer type anionic surfactant having a carboxylic acid (salt) group: poly(meth)acrylic acid, (A) Acrylic acid-maleic acid copolymer, (mercapto)acrylic acid-methylene succinic acid copolymer, (mercapto)acrylic acid_fubutene f-acid copolymer, (mercapto)acrylic acid/vinyl acetate Ester copolymer and mercaptopropene 1-acid 2-hydroxyethyl ester/(meth)acrylic acid copolymer, poly{(meth)acrylic acid 2-ethyl ketone acetate carboxymethylate, carboxymethyl cellulose, carboxy Methylmethylcellulose, stearyl ethylcellulose, benzoic acid methyl condensate, benzoic acid _ phenol-furfural condensate, etc. In terms of preventing particle re-adhesion and low foaming, etc., The molecular weight of the molecular anionic surfactant (A-2a) is preferably 1, 〇〇〇 〜 800, 〇〇〇, more preferably 1, 2 〇〇 〜 4 〇〇, 〇〇〇, 1,5〇〇 ~80,000 is not good 'is preferably 2, 〇〇〇~40,000. Mw U of the present invention is the use of gel permeation chromatography (hereinafter abbreviated as GPC (gel-permeation

Chromatography)), measured at 4 ° C using polyethylene oxide as a reference material. Specifically, for example, the apparatus is used to perform measurement, that is, the apparatus body: HLC-8120 (manufactured by Tosoh Co., Ltd.); the column: TSKgel a6000, G3000 PWXL manufactured by Tosoh Corporation; Device: differential refractive index detector built in the device body; dissolving solution: 0.5% sodium acetate. water/sterol (volume ratio 70/30); eluent flow rate: 1.0 ml/min; column temperature: 40 ° C; Sample·· 0.25% dissolving solution 16 · 200923072 Solution, injection amount: 200 to 1; standard material · TSK standard polyethylene oxide (TSK STANDARD POLYETHYLENE OXIDE) manufactured by Tosoh Corporation; data processing software: Gpc_8 〇2〇model Π (made by Tosoh Corporation). Examples of the low molecular type anionic surfactant (A_2b) include a low molecular type sulfonic acid type surfactant (A-2b-1), a low molecular type sulfate type surfactant (A-2b-2), and a low molecular weight. Anionicity of a molecular weight (Mw or a molecular weight calculated based on the structure) such as a fatty acid-based surfactant (A-2b-3) and a low-molecular-weight phosphate g-based surfactant (A_2b_4) of less than 1,000 Surfactant. The sulfonic acid-based surfactant (Ajbd) in the anionic surfactant may, for example, be a sulfosuccinic acid (mono- and di-) ester (salt) having a carbon number of 6 to 24, and have a carbon number of 8 to 24. a sulfonate (salt) of an α-olefin, a benzoic acid (salt) having a carbon number of 8 14 , a petroleum vinegar (salt), a toluenesulfonic acid (salt), a Toluenesulfonic acid (salt) and cumenesulfonic acid (salt) and the like. Specific examples of the sulfonic acid-based surfactant (A-2b-1) in the anionic surfactant include dioctylsulfobutanoic acid (salt), p-toluenesulfonic acid (salt), and o-toluenesulfonate. Acid (salt), m-dimethyl sulfonic acid (salt), and p-xylene sulfonic acid (salt). The low molecular type sulfate ester type surfactant (A_2b_2) may, for example, be a sulfuric acid vinegar (salt) of an aliphatic alcohol having a carbon number of 8 to 18, or an ethylene oxide 1 molar of an aliphatic alcohol having a carbon number of 8 to Μ. Sulfate (salt), sulfated oil (salt), sulfated fatty acid ester (salt), and sulfated olefin (salt) of the oxime additive. Specific examples of the low molecular type sulfate ester surfactant (A_2b_2) can be used. • 17· 200923072 List: 2-ethylhexanol sulfate (salt), octanol sulfate (salt), hydrazine, ; A disulfate (salt) of an ethylene oxide (5 mol) adduct of disulfate (salt) and lauryl alcohol. The low molecular weight fatty acid type surfactant (A-2b-3) may, for example, be a fatty acid (salt) having a carbon number of 8 to 18 and an ether carboxylic acid (salt) having an aliphatic alcohol having a carbon number of 8 to 18. Specific examples of the low molecular weight fatty acid type surfactant (A-2b-3) include n-octanoic acid (salt), 2-ethylhexanoic acid (salt), n-decanoic acid (salt), and isodecanoic acid (salt). , oleic acid (salt) and stearic acid (salt). Examples of the low molecular type phosphate ester surfactant (A-2b-4) include phosphoric acid (mono- and di) esters (salts) of higher alcohols having a carbon number of 8 to 24, and higher alcohols having a carbon number of 8 to 24. Phosphate (mono- and di) esters (salts) of ethylene oxide adducts, and the like. Specific examples of the low molecular type phosphate ester surfactant (A-2b-4) include a monoester of a lauryl alcohol monophosphate (salt) and an ethylene oxide (5 mol) adduct of lauryl alcohol. (salt), and octanol diphosphate (salt) and the like. The ion to be formed when the salt is formed in (A-2) is not particularly limited, and is usually an alkali metal (sodium and potassium) salt, an ammonium salt, or a primary amine (amine amine, ethylamine, and butylamine, etc.) And guanidine (guanidine) and the like, salts, secondary amines (dialkylamines such as dimethylamine, diethylamine and dibutylamine, and diethanolamine, etc.) salts, tertiary amines {tridecylamine, triethylamine, and three Trialkylamine such as butylamine, triethanolamine, N-methyldiethanolamine, and 1,8-diazabicyclo[5.4.0]-7-unde (1,8-diazabicyclo[5,4,0 ]-7_undecene, DBU), 1,5-diazabicyclo[4.3.0]-5-oxime (l,5-diazabicyclo[4.3.0]-5-nonene ' DBN ) or 1,4-diazo Heterobicyclo[2.2.2]octane•18· 200923072 (l,4-diazabicyclo[2,2,2]octane, DABCO), 1H-P m 0 sitting, 2-methyl-1Η-_β sitting, 2- Ethyl-1Η-_β sit, 4,5-dichloromethane, 2-methyl-4,5-dihydro-1Η·imidazole, 1,4,5,6·tetrahydropyrimidine, 16(4)- a salt of dihydropyrimidine or the like and a salt of a quaternary ammonium (tetraalkylammonium or the like). Among these salts, from the viewpoint of metal contamination of the substrate, preferred are ammonium salts, primary amine salts, secondary amine salts, tertiary amine salts, and quaternary ammonium salts, and particularly preferred tertiary amine salts and The fourth-grade salt is the best of DBU, DBN, DABCO, N-methyldiethanolamine, 1H-imidazole, 2-methyl-1H-imidazole and 2-ethyl-azizol. (In view of preventing re-adhesion of particles, a polymer type anionic surfactant (A-2a) and a low molecular type sulfonic acid type surfactant are preferred among the anionic surfactant (A-2). (8-31-丨), low molecular type sulfuric acid _' interface activity (4) KA_2b_2), and low molecular weight fatty acid surfactant (AI3), more preferably (Α_2&), (Α_21>1) and (A- 2b-2) 'Specially good is polyacrylic acid (salt), polystyrenesulfonic acid (salt), salt of naphthalene % acid formalin condensate, acrylamide 2 - methyl propane sulfonic acid / acrylic acid a salt of a copolymer, a salt of a methacrylic ethoxylated polyoxyethylene sulfate/acetic acid acrylate copolymer, octylbenzenesulfonic acid (salt), p-toluenesulfonic acid (salt), m-toluene 26 acid (salt), and 2_ethylhexanol sulfate vinegar (salt). Among them, (A-2) may be used singly or in combination of two or more. From the viewpoint of the dispersibility of the particles, it is more preferable to use two or more of them in combination. The cationic surfactant (A_3) may be exemplified by a quaternary salt type surfactant (A-3a) {for example, a burnt group (the carbon number is a trimethylna, a burnt base (3⁄4 is a ruthenium) Base 鳋, nitrogen-containing ring of 4-19-200923072-grade ammonium salt, quaternary ammonium salt containing poly(additional molar number 2~15) oxygen b~4) chain, alkyl group (carbon | (carbon number) Is a 2-line surfactant (A-3b) {for example, a carbon number of 3 to 9 (^ and an amine of the order, a carbon number of 3 to 90 alicyclic (containing a nitrogen-containing heterocyclic three, a carbon number of 3) ~90 of a tertiary amine containing a miscible group, ', =, acid salt}, etc.

C Ο amphoteric surfactant (Α·4) can be enumerated: beet test amphoteric surfactant (A-4a) {for example, alkyl (carbon number e^ne) type sulfhydryl beet test, burning base (carbon number is wo Amidoxime base 2 ~ 4) dimethyl betaine, alkyl (carbon number 1 ~ 3 〇) dihydroxy is 1 number is 1 ~ 30) beet test, confirmed beet test, etc.; amine surface Active agent (A-4b) {for example, alanine type [alkyl (carbon number-bonded aminopropionic acid type, silk (carbon number is iminodipropyl^)) glycine type (glycine) type [alkyl base ( The carbon number is i~3〇)amino group], and the aminosulfonate type amphoteric surfactant (A_4c) {for example, the number is 1 to 30), such as a taurine type amphoteric surfactant. In the case of the meta-soil (the effect of carbon on the re-adhesion of the particles, the anionic interface is preferably _ (A_2), and the surfactant (4)) and (4)), and more preferably Use (4)) and (A-2). From the viewpoints of cleanability and foaming, the content ratios of (H') and (A-2) in combination are preferably 小于_υ / ((2)] is less than 6, more preferably 01 to 5 Particularly preferred is 〇2 to 〇8. The content of the surfactant (A) in the cleaning agent of the present invention is preferably 1.5% based on the weight of the active ingredient of the cleaning agent of the present invention. 1〇〇〇/0, more preferably 2 to 9G%, and is preferably 3 to 80%. In addition to the surfactant (A), the cleaning agent of the present invention may further contain a chelating agent selected from the following (eheiating) One or more components of the group consisting of (b), a reducing agent (匸), and an alkaline component (D). f When the cleaning agent of the present invention contains a chelating agent (B), the electricity is improved. The viewpoint of the cleanability of the surface of the sub-material and the viewpoint of controlling the etching property are better. Further, the cleaning agent of the present invention can control the etching property to the surface of the electronic material by containing the reducing agent (C), and thus It is preferred to contain a reducing agent (C). The cleaning agent of the present invention can further improve the clearing of the particles by containing an alkaline component (〇). [The chelating agent (B) can be exemplified by an amine polydox (salt) (B-1) {for example, ethylene diamine tetraacetic acid (EDTA), diethylene triamine pentaacetic acid (diethyl triamine pentaacetic acid ' DTPA ), triethylene (j tetraamine hexaacetic add (TTHA), hydroxyethyl ethylene diamine triacetic acid (salt) (hydroxyethyl ethylene diamine triacetic acid (salt) HEDTA), dihydroxy ethyl ethylene diamine tetraacetic acid (DHEDDA), nitrilotriacetic acid (ΝΤΑ), transethylidene diamine diacetic acid (hydroxy) imino diacetic acid (HIDA), /3 - alanine diacetic acid (salt), aspartic acid diacetic acid (salt), thioglycine diacetic acid (salt), iminodibutyl Acid (salt), serine diacetate (salt), -21- 200923072 hydroxyiminodisuccinic acid (salt), dihydroxyethylglycine (salt), aspartic acid (salt), bran Amino acid (salt), etc.; hydroxycarboxylic acid ( (B-2) {for example, glycolic acid (salt), tartaric acid (salt), citric acid (salt), gluconic acid (salt), etc.; cyclic carboxylic acid (salt) (B-3) {for example, homo benzene Tetraformic acid (salt), benzoquinone polycarboxylic acid (salt), cyclopentane tetracarboxylic acid (salt), etc.; ether carboxylic acid (salt) (B-4) (for example, carboxymethyl tartronate) ), succinic acid methoxy methoxy, oxy disuccinate, tartaric acid monosuccinate, tartaric acid disuccinate, etc.; other carboxylic acid (salt) (B_5) {for example, cisidine Oleic acid derivative, oxalic acid (salt), etc.; phosphonic acid (salt) (B-6) {for example, methyl diphosphonic acid (salt), aminotris (methylene phosphonic acid) (salt), 1 -hydroxyethylidene-1,1-diphosphonic acid (salt), ethylenediaminetetrakis (methylenephosphonic acid) (salt), 1,6-hexanediaminetetrakis (methylenephosphonic acid) (salt) , propylenediamine tetrakis(rhodecylphosphonic acid) (salt), diethylenetriamine penta (methylene phosphonic acid) (salt), triethylenetetramine hexa(methylenephosphonic acid) (salt), triamine Triethylamine hexa(methylene phosphonic acid) (salt), trans-1,2-cyclohexanediamine tetra (sub Phosphonic acid) (salt), glycol ether diamine tetrakis (decylene phosphonic acid) (salt), and tetraethylenepentamine hepta-(ylidenephosphonic acid) (salt), etc.; condensed phosphoric acid (salt) B-7) {For example, metaphosphoric acid (salt), tripolyphosphate (salt), hexametaphosphoric acid (salt), etc. Further, examples of the acid salt include the salts exemplified in the above anionic surfactant (A-2). Further, these chelating agents (B) may be used alone or in combination of two or more. -22· f

O 200923072 Performance, in terms of substrate saturation control and cleaning and these salts, it is better (5) WB_6), (B (_7) m) acid salt, particularly good is ethylenediaminetetraacetic acid ^ =, (, )-, di-andylethyl"amine tetraethyl" "; aspartic acid diacetic acid (salt) 'aspartic acid (even ", sexually controlled and cleaned ί: the content is better than less Is equal to 3〇%, better Ϊ 〇.1/〇~2〇%, particularly preferably 3%.3%~2〇%. Good ((10)), aromatic organic agent ()d歹; I lift The aliphatic organic reducing agent (C-lc) can be exemplified by the following reducing agent (.) and other organic agents: Ξ ΐ ίί (C-la) can be exemplified: carbon number is 1 to 12, 1 to 3 〇 of an aliphatic amine, etc. Acid: ί :: 12 organic acids can be mentioned: formic acid, acetic acid, butyric acid = acid, "butyric acid, cis-butanic acid, 2- oxypropionic acid,: - acid gallic acid (_eacid) and salts of these acids. In addition, -23 - 200923072 (B-2) and (B-5) also have an effect as a reducing agent. Aldehydes having a carbon number of 1 to 12 The class can be listed as: formaldehyde, acetaldehyde, propionaldehyde, vinyl aldehyde, etc. The carbon number is 6 The reducing ketone of 9 may, for example, be L-ascorbic acid, isoascorbic acid, L-ascorbyl sulfate, L-ascorbyl phosphate, L-ascorbic acid 2 (L-ascorbic acid 2) -glucoside), L-ascorbyl palmitate, L-ascorbyl tetraisopalmitate, ascorbyl isopalmitate, erythorbic acid, isoascorbate, iso Ascorbyl palmitate, erythorbyltetraisopalmitate, and salts of these acids, etc. Examples of the aliphatic amine having a carbon number of 1 to 30 include an alkylamine having a carbon number of 丨6 and a carbon number of 2~ a hospital alcohol amine, a carbon dioxide having a carbon number of 2 to 5, a cyclic amine having a carbon number of 4 to 10, a ruthenium (aw-) compound having a carbon number of 3 to 15, and a carbon number of 4 to 3 G. More (2 ~ 5) stretched base (carbon more (n = 3 ~ 6) amines, etc. @ neck carbon ΐ Γ 6! burnt amine can be cited: monofilament methylamine, ethylamine, dialkyl fun-methylamine , and pit amines with a carbon number of 2 to 6 {monomethylmethylamine, propylmethylamine, propylethylamine, and diiso) Alkylamine, such as an alkanolamine triethanolamine having a carbon number of 2 to 6, a dimethylamine, a dr-alkanolamine, an ethanolamine, a diethanolamine, a 2-amino group, a mercapto-propene bromide, a 5-ethyl alcohol, and an N-methyl group. - ν, ν-indole 2_aminoethanol and hydrazine _(aminoethyl)ethanolamine, each and 2-(2-aminoethoxy)ethanol. Further, examples of the alkyldiamine having 2 to 5 carbon atoms include ethylenediamine, propylenediamine, I)·propylenediamine, anthracene-butanediamine, and 1,6-hexanediamine. The cyclic amine having a carbon number of 4 to 10 may, for example, be a piperidine, a piperazine or a M-diazabicyclo[2 2 (DABCO). Examples of the ruthenium compound having a carbon number of 3 to 15 include 18-diaza [, deca-(10) U), diazabicyclo[43.〇 = (DSN) and the like. The carbon number is 4 to 30 (n = 2 to 5) alkyl (the carbon number is 2 to 6). The (n = 3 to 6) amines are exemplified by diethylenetriamine, triethylenetetramine, and tetraethylamine. Pentaamine, hexaethyleneheptaamine, iminodipropylamine, bis(hexamethylene)triamine, pentaethylenehexamine, and the like. The aromatic organic reducing agent (C-lb) may, for example, be an aromatic aldehyde having 7 to 12 carbon atoms, an aromatic amine having 6 to 9 carbon atoms, or a desired compound having 6 to 3 carbon atoms. Examples of the aromatic group having a carbon number of 7 to 12 include benzoic acid (benzaldehyde) and cinnamaldehyde. Examples of the aromatic amine having 6 to 9 carbon atoms include p-phenylenediamine and p-aminophenol. Examples of the compound having a gorge of 6 to 30 include monohydric phenol and polyphenol. The unitary age can be exemplified by: 3-hydroxyflavone, and t〇COpher〇l (α _, yS·, γ_, _, 卜 or _tocopherol, etc.). Many examples include: 3,4,5-trihydroxybenzoic acid, catechol (pyr〇catech〇l), resorcinol-25·200923072 (resorcinol), hydroquinone, naphthalene Diphthoresorcinol, pyrogallol, and phloroglucinol, etc. Other organic reducing agents (C-lc) include phosphorus reducing agents (for example, tris-2-hydroxyethyl) Phosphine, etc., or a calcined complex (for example, borax-tert-butylamine complex, shed-rhodium-quinone, hydrazine-diethylaniline complex, and shed-triammine complex, etc.) a thiol-based reducing agent (for example, L-Cysteine and Fee-based ethanethiol), and an amine-based reducing agent (for example, an amine and a diethylhydroxylamine), etc. The saccharides and sugar alcohols exemplified as (F3) and (F4) hereinafter have an effect as an organic reducing agent. Examples of the inorganic reducing agent (C-2) include sulfur oxyacids (for example, sub- Sulfuric acid (salt), monosulfuric acid (salt), disulfite acid (salt), thiosulfuric acid (salt), disulfuronic acid (salt), polysulfuric acid (salt), etc., phosphorus oxyacids { For example, phosphorous acid (salt), hydrogen phosphite (salt), hypophosphorous acid (salt), etc., other inorganic reducing agents (ferrous ferrous sulfate, tin chloride, sodium cyanoborohydride, and sulphate The salt forming the reducing agent (C) may be the same salt as the above-mentioned (A_2). In terms of controlling the etching property of the cleaning agent and preventing the ions in the cleaning agent from causing re-contamination of the substrate, Among these reducing agents, preferred are those having a carbon number of 1 to 12, a reducing quinone having a carbon number of 6 to 9, a hydrazine aliphatic amine having a carbon number of from 〜30, a thiol-based reducing agent, and sulfur. Oxyacids and oxoacids of discs, more preferably furfural, L-ascorbic acid (salt), isoascorbic add (salt), erythrobic acid (eryth〇rbic add) -26- 200923072 (salt), Monoethanolamine, diethanolamine, (tetra)yl-dihexanolamine, l-deaminic acid, aminoethanethiol, sub Acid (salt), Erya. Weixiao 4 / I, ^ \ JBU J - in sulfur acid (salt), thiosulfate (salt) 'sub-acid (salt ^ ^ (f and sub-view (4), especially good It is L-anti-bad blood 壅 (壅), acid (Μ), di-acid (salt), hetero (salt), phosphite (salt) and hypophosphorous acid (salt). The counter ion in the case of (C) forming a salt is not particularly limited to the same counter ion as the example in the above (Α-2). ',

Ti(C) can be used alone or in combination or above. When the cleaning agent of the present invention contains the reducing agent (c), the content of the reducing agent (6) is preferably 60% or less based on the weight of the active ingredient of the cleaning agent: more preferably 1% to 5% by weight, particularly preferably The 2% ~ Pei. The content of this range is preferable in terms of controlling the etching property of the substrate. The test component (9) can be counted as follows: the carbon number of the above-mentioned aliphatic organic reducing agent (c_la), which is represented by the general formula (1), the fourth-grade money salt (]>1), the ammonia (D-2), and the above-mentioned aliphatic organic reducing agent (c_la) Aliphatic amine (D-3), no, and a mixture of 14 ingredients. Further, an aliphatic amine (1>3) having a carbon number of 丨~(7)' has an effect as a reducing agent and an effect as an alkaline component.

Ra I + 1 — N ~ R * · 〇 Η ~

In the formula I R4, R1, R2, R3 and R4 each independently represent a graft having a carbon number of i to 24 or a group represented by -(R5〇)r_H, and R5 represents a carbon number of 2 to 4 -27·200923072 The stretching base 'r represents an integer of 1 to 6. The alkyl group having a carbon number of 1 to 24 may, for example, be a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a decyl group, a decyl group, an undecyl group or a dodecane group. , tridecyl, tetradecyl, pentadecyl, hexadecyl, heptadecyl, octadecyl, nonadecyl, eicosyl, icosyl, twentieth Dialkyl, behenyl, tetracosyl and the like. Examples of the alkylene group having a carbon number of 2 to 4 include an ethyl group, a propyl group and a butyl group. r is preferably 1 to 3. Specific examples of the quaternary ammonium salt (D-1) include tetramethylammonium hydroxide, tridecylethylammonium hydroxide, tetraethylammonium hydroxide, triethylmethylhydroxide, and tetrapropyl. Ammonium hydroxide, tetrabutylammonium hydroxide, tetrapentylammonium hydroxide, tetrahexylammonium arsenide, tridecylethylammonium arsenide, tetraethylammonium hydroxide, hydroxyethyltrimethylammonium hydroxide, Hydroxyethyl triethyl hydride, dihydroxyethyl decyl ammonium hydroxide, trishydroxyethyl methyl ammonium hydroxide, and the like. Examples of the inorganic test (D-4) include a hydroxide chain, sodium hydroxide, and hydrogen. From the viewpoint of cleanability, preferred among the '(D) is a quaternary ammonium salt (D-1) and an aliphatic amine (d-3) having a carbon number of 1 to 30, more preferably tetradecyl hydrogen. Oxidation record, tridecylethylammonium hydroxide, tetraethylammonium hydroxide, triethylmethylammonium hydroxide, monoethanolamine, diethanolamine, triethanolamine, N-methyl-diethanolamine, DBU, DBN and combined use These test ingredients. When the cleaning agent of the present invention contains the alkaline component (D), the weight of the active ingredient of the cleaning agent based on the present invention is preferably less than or equal to the weight of the active ingredient of the cleaning agent of the present invention. Lu is better ^ Especially good is 3〇/. ~25. /. . The ruler is preferably 2% to 30%, and the cleaning agent of the present invention is preferably a good agent (8) and an inspective component (9). The sounding agent (8) is preferably used in combination with (8) disks, one of the groups or - Kind (D). "() or in combination with (B), (C) and when the cleaning agent of the present invention contains the nutrient-mixing agent (8) and the reducing agent (6), the weight of the surfactant (Α), the chelation range is Based on the boundary (〇^ 0,〇/〇.2〇〇/〇, ^ι%-6〇〇/〇, 3na' and the reducing agent (8) is 〇.5%~t art is 1%~~ knee 鸠(8) is a chelating agent (8), in addition to the surfactant (4), water, chelating agent, the range of effects (8), ternary or ternary of the cleaning agent of the present invention is formed by a dispersing agent in a surface containing 1 additive (Η) One or more of the group consisting of f saccharides and their emitters (via benzylethyl cellulose, cationized cellulose, phthalocyanine, hydroxymethylcellulose, hydroxypropylcellulose), cations; , f Gua gum (/, xanthan gum (xanthan gum), alginate: Γ子化赖); polyethylene glycol (―) and • 曰{直酸(phytic aci(i), two (polyoxyethylene) alkyl ether phosphate, three -29 · 200923072 (poly ethoxylate) alkyl ether phosphate, etc. In addition, the sexual surfactant (A_2a) also has = knife in (four) ion ^ ^ eight negative as The effect of the dispersant. h _ cleaning agent containing an active ingredient of the invention, these dispersants) based on the present Temple

The 疋 is less than or equal to 10% ‘Better is less than or equal to 5% or less. Examples of the ternary or trivalent or higher polyhydric alcohol (F) are the following (f ~ (F5), etc. (F1) aliphatic polyhydric alcohol (glycerol, trimethylolethane, trimethylolpropane, (f2) (F1) a dehydrated condensate (diglycerol, triglycerin, tetraglycerol, pentaglycerol, etc.); (F 3) a sugar such as a monosaccharide {pentose (arabinose (Hongbei Huayu se) ), xylose, ribose, xylulose, ribulose, etc., hexose (giucose, mannose, galactose, fructose) (fructose), sorbose, tagatose, etc., heptose (sedoheptulose, etc.), disaccharides (trehalose, saccharose) ), maltose, cellobiose, gentiobiose, lactose (iact〇se), and trisaccharides (raffinose, maltotriose, etc.) (F4) sugar alcohol (arabitol, adonitol, xylitol) , sorbitol, mannitol-30-200923072 imanmtoij, dulcitol, etc.; (F5) trisphenol (trisphenol pA, etc.); and the above (F1) to (F5) rings An oxane (carbon number: 2 to 4) adduct (additional molar number is 1 mol to 7 mol), etc. Further, the ternary or trivalent or higher polyhydric alcohol (F) may be used alone or in combination. In the case of preventing the substrate from being corroded, the ternary trivalent or higher polyol (F) is preferably (f1), (f2), (f3) and F4), more preferably glycerin, sucrose and sorbitol. When the cleaning agent of the present invention contains a ternary or trihydric polyol (F): the ternary or tribasic based on the weight of the active ingredient of the clear paste The content of the polyterpene alcohol (F) or more is preferably 3% or less, more preferably 20% or less, particularly preferably 1% by weight or less. The water-soluble organic solvent (G) is exemplified in The organic solvent in which the solubility in water (%/g of g/l〇〇g) is 3 or more, preferably 1 or more, is exemplified. 〇 碍 ( 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 〇 Base; 飒, etc.}; guanamine {N,N-dimercaptocarboxamide 'N·methylmethionamine, N,N•dimethyl ketone amine, N,N-dimethyl propylamine, etc. }; indoleamine {N-methyl-2-pyrrolid〇ne (N-methyl-2-pyrrolid〇ne), N-ethyl-2-pyrrolidone, N-hydroxymethyl-2, each burning _, etc. : lactone {石_丙内酉的(卜pr〇pi〇iact〇ne), butyrolactone, butyrolactone, τ-valerolactone, valerolactone, etc.; alcohol armor-31 - 200923072 alcohol, Ethanol, isopropanol, etc.; glycol and glycol ether {ethylene glycol, ethylene glycol monomethyl ether, triethylene glycol monoterpene ether, ethylene glycol monoethyl ether, diethylene glycol, diethylene glycol single Ether ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, diethylene glycol monohexyl ether, propylene glycol, propylene glycol monomethyl ether, dipropylene glycol monomethyl ether, 1,3-butylene glycol, diethylene glycol Alcohol dimethyl ether, diethylene glycol diethyl ether, triethylene glycol dimethyl ether, triethylene glycol diethyl ether, etc.; oxazolidinone (N-methyl-2-oxazolidine oxime (N-methyl -2-oxazolidi None), 3,5-dimercapto-2-° oxazepine

Etc.) 'acetonitrile (acetonitrile, propionitrile, butyronitrile, acrylonitrile, methyl, nitrile, benzonitrile, etc.); carbonated vinegar (ethylene carbonate, rhegidide internal diester, etc.) Ketone (acetone, diethyl ketone, acetophenone, methyl ethyl hydrazine, cyclopentanone, diacetone alcohol, etc.); cyclic ether (tetrahydrofuran, tetrahydropyran, etc.) and the like. Further, the above water-soluble organic solvent (G) may be used singly or in combination of two or more kinds. The nature of the surface and the prevention of the components in the detergent remain in the diol of the electronic material; /, etc., in the above water-soluble organic solvent (G), it is preferred that the alcohol is more preferably Bismuth, diethylene glycol monomethyl _, (tetra), diethylene glycol monotop and diethylene glycol monohexyl oxime. In the case of Qingqingjiji solvent (6), the base is better than the fresh special regulator, buffer enumeration, anti-oxidation sword, anti-scaling agent, PH agent defoamer, preservative and solubilizer (hydros -32. 200923072 agent) and so on. Antioxidants include phenolic antioxidants {2,6-di-t-butylphenol, 2-t-butyl-4-methylphenol, 2,4-dimethyl-7-t-butylaniline Antioxidant {monooctyldiphenylamine, monodecyldiphenylamine=monoalkyldiphenylamine; 4,4,-dibutyldiphenylamine, 4,4,-dipentyl Diphenyldiphenylamine such as phenylamine; tetrabutyldiphenylamine, tetrahexyldiphenyl, etc. neoyldiphenylamine; naphthyl group such as α-naphthylamine or phenyl-α-naphthylamine Amine, etc., a sulfur-based compound {phen〇thiazine, pentaerythritol-tetrakis(3-laurylthiopropionate), bis(3,5_t-butyl sulfhydryl), sulfur scales, etc. Scale; antioxidants {bis(2,4_di-t-butylphenyl)pentaerythritol-subscale 11⁄2, phenyl diisoindole phosphite, diphenyl diisooctyl phthalate, phosphorous acid Phenyl ester} and the like. These antioxidants may be used singly or in combination of two or more. Examples of the rust preventive agent include: benzotriazole (b_iazole), toltriazole (tolyltriazole), benzotriazole having a hydrocarbon group of 2 to 1 fluorene, benzimidazole, and having a carbon number of 2 a hydrocarbyl group of -20, a hydrocarbon having a carbon number of 2 to 20, a sulfonium (fine hydrazine, a hydrazine hydrazine, a 3 I organic scale inhibitor; a dodecenyl succinic acid half vinegar, Octadecyl monohydride, dodecenyl succinate, etc., or succinyl sulphate; sorbitan monooleic acid vinegar (secret such as coffee noodle (10)), glycerol monooleate, pentaerythritol single oil Acid §| etc., such as vinegar, etc. These anti-recording agents may be used singly or in combination of two or more. The pH adjusting agent may be listed as a mineral acid (hydrochloric acid, sulfuric acid, nitric acid, amine-acid (s- Acid), scallops, etc., the inorganic test (d_4'), 33, 200923072, etc. exemplified above, these pH adjusters may be used singly or in combination of two or more. The buffer may be used as a buffer. An organic or inorganic acid, and/or a salt of these organic or inorganic acids. The organic acid may be exemplified by the above aliphatic organic reduction The organic acid having a carbon number of 1 to 12 as exemplified in the agent (c_la), and the inorganic acid may, for example, be a diacid or a boric acid. Examples of the acid salt include the above anionic surfactant (A-2). The same salt in the example.

These buffers may be used singly or in combination of two or more. Examples of the antifoaming agent include a silicone defoaming agent {an antifoaming agent such as dimethyl silicone, fluoroketone or polyether fluorenone as a constituent component, and the like}. These antifoaming agents may be used singly or in combination of two or more: two or more. 5 preservatives can be exemplified by triazine derivatives {hexahydrotris(2.hydroxyethyl)-s-triazine, etc., isothiazoline (is〇thiaz〇Une) derivatives {1,2- awkward嗟 嗟 坐 坐 坐 坐 坐 坐 坐 坐 坐 坐 坐 坐 坐 坐 坐 坐 坐 _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ _ Pyridine derivatives such as pyridine, 2-anthracenyl mercaptan-1-oxide (salt), etc., b〇琳(m〇rph〇Une) derivative {4-(2-nitrobutyl)morpholine, 4, 4-(2-ethyl-2-nitrotrimethylene) di?, etc.}, benzoquinone X» sitting derivative (2-(4-<»sedyl)benzoquinone, etc.), Other preservatives {poly[oxyethylene (dimethylimido)-extended ethyl (didecylimido)-extension ethyl] di-vapor, p-chloro-m-xylenol, phenoxyethanol, phenoxy Propyl butylamino group, propyl methoxy dimethyl dioxal hydrazine, isopropyl methyl phenol, tetrachloroisophthalonitrile, dibromo bromide 34 · 200923072 A, 2, ^ ^ Some preservatives may be used alone or in combination with two or solubilizing agents, such as m-benzoic acid and salicylic acid (salt salts) The anionic interfacial activity is exemplified by the same salt. These solubilizers may be used singly or in combination of two or more. In addition, 'as an acid-based surfactant (Α exemplified phthalic acid (salt), two Toluene acid = (salt) also has the effect of acting as a solubilizer. And, the present invention, although the detergent of the present invention contains other additives (8), the content of the agent is based on the weight of the active ingredient of the detergent, anti-oxidation = added _, _, _, preservative and solubilizing agent is preferably less than 10% 'better than 8%, particularly preferably less than or equal to, and, the amount of defoaming agent is preferably less than or equal to 2 %, 03 is less than or equal to 1.5 〇 / 〇 ' particularly good is less than or equal to 1%. In addition, it is at =, the weight of the active ingredient of the elixirs, the ρ Η value adjusting agent is preferably less than ς ς%, better It is 85% or less, particularly preferably less than or equal to the age. = and 'based on the weight of the active ingredient of the detergent, the other two components of the additive (8) are preferably less than or equal to 90%, more preferably less than or equal to 85. /. ' Particularly good is less than or equal to 80%. When the group 3 of the above chelating agent (8) to other additives (8) is repeated, it is not used to exert an effect corresponding to each component, and does not care about the effect of the components as other components, but also requires consideration of the components. The effect of the other components can be obtained at the same time, and the amount of each component is adjusted according to the purpose of use. The active ingredient of the detergent of the present invention (4) from the viewpoint of workability or transportation efficiency at the time of use The degree is as described above, usually ~ just %, 3 is Γ ~ 5G%. Therefore, the content of the cleaned water of the present invention is usually less than 99%, preferably 50% to 98%. In addition to the case where only the surfactant (4) is used, the cleaning agent of the present invention satisfies the above formula by the surfactant (4) and at least one component selected from the group consisting of (4) (8) to Emperor and water. The cleaning agent of (1), preferably hydrazine, is produced by the method described below. (1) Mixing the surfactant (4) or the mixture of _彳(H) and water selected from the group of the chelating agent H 1 m ^ J - as desired in the interface, obliquely Su Shi, Yan. The concentration of the active ingredient when used as a 4 clean solution is determined by the exact pH of phV; the pH value and the redox potential of 5 are determined by the positive edge = value and the redox potential (v) satisfying the formula (1). Chelating (B; when the oxygen potential does not satisfy the formula (1), adding, for example, reducing T and the relay component (4)), etc., so that the oxidation and oxidation are still =:: number = whole) redox potential 'to make the positive value besides In the case of a cleaning liquid having a specific range of pH values, when the pH of the operation command (1) or (2) is adjusted to be lower than the required pH 利用 by using the following method, for example, The component (9), other additives, the pH adjusting agent and/or the surfactant (A_2), etc., which raise the pH value, are adjusted to the desired range. When the pH value in the operation of the above (1) or (2) is higher than the desired value, a pH adjusting agent such as a chelating agent (B), a reducing agent (c), and other additives (H) is added. And/or a component such as a buffer that lowers the pH to adjust the pH to a desired range. The mixing and dissolving device for producing the cleaning agent of the present invention is not particularly limited, and a stirring mixing device equipped with a stirring blade or a screw may be used.

Is a mixing and mixing device for the spiral blade. From the viewpoint of preventing metal contamination, based on the weight of the active ingredient of the detergent, Na, K, Ca, Fe, Cu, A in the detergent of the present invention

The content of each of the Pb, Ni, and Zn atoms is preferably 2 〇 PPm or less, more preferably 1 〇 ppm or less, and particularly preferably 5 ppm or less. The method for measuring the content of these metal atoms can be known. Methods such as atomic absorption method, inductively-coupled plasma spectrometry (ICP spectrometry), and ICP gravimetric analysis. A cleaning liquid for an electronic material according to a second aspect of the present invention is a cleaning liquid which is used for a cleaning step by diluting the above-mentioned cleaning agent with water as needed, and has an active ingredient concentration of 0.01 wt% to 15 wt% and 25°. The pH value under C and the oxidation-reduction potential (V) [unit: mV, vsSHE] satisfy the following formula (1). V$-38.7xpH value + 550 (1) -37- 200923072 The components of the cleaning liquid of the present invention and the method for measuring the oxidation-reduction potential are as described above. The cleaning liquid for electronic materials of the present invention is particularly suitable for use as a cleaning liquid for a magneto-optical disk substrate, a flat display substrate, a photomask substrate, etc., and as described above, the cleaning liquid for electronic materials of the present invention is preferably used for each electronic material. pH range. The surface tension (pit) of the cleaning agent of the present invention is preferably 65 mN/m or less, more preferably less than #5 m mN/m, from the viewpoint of the wettability of the electronic material. The system is less than or equal to 4〇π^Ν/πι. The surface tension of the present invention can be determined in accordance with the method of still 〇362: touch, corresponding to ISO 304. = Prevention of age again: Fine (four) Secrets The conductivity of the liquid (five) (four) is better 〇 · 2 ~ is Qing Jie 5 ~ 5 · 〇, particularly good is L0 ~ 3.5. X (four) 疋 0.5 The third invention of the present invention is a cleaning method for cleaning an electronic material in an electronic material ～ ^ (in particular, a method for cleaning an aluminum-based slab subjected to Ni-P plating, a reticle substrate, etc.) No basis: oil (coolant ((10) lam) = object (stained) can be listed as sebum, etc.), plasticizer (o-phenylene hydride) (human fingerprints (fingerprints, organic matter and inorganic particles [abrasives ( §曰, etc.), organic particles, etc., and diamonds, etc.) and research (4) (Material oxidation, better oxidation, is excellent in the magnetic substrate Hi (four) button, so it is good for the glass substrate for magneto-optical disk, • 38. In the manufacturing steps of 200923072 and an aluminum substrate for magneto-optical disks subjected to Νι-Ρ plating, a flat display substrate, and a photomask substrate, a cleaning step for removing particles such as abrasives, polishing chips, and grinding chips is performed, and more specifically, Preferably, the cleaning method of the present invention is used as a cleaning step after the grinding step, a cleaning step after the grinding step, and/or a cleaning method in the cleaning step after the texturing step. In addition, in order to prevent floating in the air (grain and organic matter, etc.) the burdock is attached to the surface of the substrate, and the substrate can be immersed in the cleaning liquid of the present invention before and after the above cleaning step. When the above grinding step is to use oxidized sulphate, sulphuric acid, When any of cerium oxide or diamond is used as a polishing step of the abrasive, the effect of the cleaning method of the present invention is particularly easily exhibited. The cleaning method of the present invention can be selected from the group consisting of ultra-wide cleaning, Wei cleaning (sh_deaning), Jianqing-rung), brush cleaning (bmshcleaning), immersion diving, Γ _ _ shooting at least a kind of cleaning method in any mode can easily play the effectiveness of the cleaning method of the present invention From the standpoint of cleanliness, it is better to use too H (t) temperature 妓mi 〇c, and particularly good is 2 (rc~6 (rc.) The material that is cleaned by the sub-material cleaning method is 1 ~1S. (Good 疋 is less than or equal to 20., better 疋 &quot; 5, especially good is 2. ~ 1 〇. If the contact angle is in the range = -39. 200923072 is by When a magnetic film or the like is formed by sputtering, a uniform film can be formed, in terms of magnetic properties In addition, the contact angle can be measured using, for example, a fully automatic contact angle meter (manufactured by Kyowa Interface Science Co., Ltd., PD-W). From the viewpoint of surface flatness of the electronic material, the cleaning of the present invention The surface roughness (Ra) of the surface of the electronic material to be cleaned is preferably 0.5 nm or less, more preferably o.ooi nm to 〇3 nm, particularly preferably 0.05 nm to 0.25 nm. The 'other' surface roughness (Ra) can be measured using E-sweep ' manufactured by SII Nano Technology Co., Ltd. under the following conditions. Measurement mode · DFM (intermittent contact mode, tapping mode) Scanning area: 10 #mxl0 /zm Number of scanning lines: 256 (scanning in the Y direction) Correction: Χ, flat correction in the γ direction, the fourth of the present invention The invention relates to a method for producing an electronic material comprising the step of cleaning an electronic material by the above cleaning method, and is particularly suitable for use as a method of manufacturing a magneto-optical disc substrate, a flat display substrate, and a photomask substrate. [Examples] Hereinafter, the present invention will be described in more detail by way of examples, but the invention is not limited thereto. Further, the following parts are not particularly limited as long as they are not particularly limited. The molecular weight of the polymer was measured by GPC under the measurement conditions of the above method. Further, the ultrapure water used in the examples and the comparative examples had a specific resistance value of 18 Μ Ω or more. [Manufacturing Example 1] 200923072 In a stainless steel garment press (autoclave) having a volume of 1 liter in a steel mixing device and a temperature control device, a lauryl alcohol portion (i-mole and tetradecyl hydroxide) (hereinafter, For example, TMAH) 25% water-cooled liquid 10 parts (0 027 moles), dehydrated for 3G minutes under the salt pressure conditions of 〇, less than or equal to * sand a. Then _ while controlling the reaction temperature to C Ethylene oxide (hereinafter, abbreviated as E〇) was wound dropwise (9.8 moles) in 3 hours, and then, it was aged at 1 Torr (3 hours) to obtain a crude product. The crude product was kept at 150 C for 2 hours under the condition of a reduction of 2.6 kPa or less, and the residual TMAH was decomposed and removed to obtain a 9-mole EO adduct of a nonionic surfactant, that is, lauryl alcohol (A-1-1). 630 parts. [Manufacturing example 2] A stainless steel high-pressure dad with a stirring device and a temperature control device with a volume of 3,000 parts (1.0 moles) of laurylamine and 3.6 parts of a 25% aqueous TMAH solution. 〇.〇1 moles), dehydrated for 3 minutes at a pressure of 1 〇〇, less than or equal to 4 kPa. Then one The reaction temperature was adjusted to HKTC, and 264 parts of EO (6.0 moles) was added dropwise over 3 hours, followed by aging for 3 hours under l〇〇t: to obtain a crude product. The crude product was less than or equal to Under the reduced pressure of 2.6 kPa, 15 Torr. (: Hold for 2 hours, decompose and remove the remaining TMAH, and obtain a 6-mole E 〇 adduct of non-ionic surfactant, namely laurylamine (Winter ^) 445 [Manufacturing Example 3] In a stainless steel horse pressure dad with a volume of 1 liter with a mixing device and a temperature control device, 212 parts of cumylphenol (1.0 - 41 200923072 moles), And 25% of TMAH aqueous solution (0.008 mol parts), dehydrated under reduced pressure of 100 ° C '4 kPa or less for 30 minutes. Then, while controlling the reaction temperature to 1001, add 3 parts by weight ( 8.0 moles of E 〇, then, at 1 〇〇. The aging was carried out for 3 hours to obtain a crude product. The crude product was kept at a pressure of less than or equal to 2 6 j^Pa at 150 C. In hours, decompose and remove the remaining TMAH' to obtain a nonionic surfactant, ie, cumylphenol. Moer EO adduct (A-1-3) 560 parts. ^ 1 [Production Example 4] 300 parts of isopropanol and 1 part of ultrapure water were added to a reaction vessel which was temperature-adjustable and stirred. After nitrogen substitution, the temperature was raised to 75. Then, 407 parts of a 75% aqueous solution of acrylic acid and a 15% isopropyl alcohol solution of dimethyl-2,2'-azobisisobutyrate were added with stirring. 3 5 hours were simultaneously added dropwise to the reaction vessel. After the end of the addition, at 75. The mixture was stirred for 5 hours, and then ultrapure water was intermittently added to the system so that the mixture of water and isopropanol was not solidified in the system until no isopropyl alcohol was detected.中 DBU (about 450 parts) is used to neutralize the obtained aqueous solution of polyacrylic acid until the pH becomes 7, and the concentration is adjusted with ultrapure water, thereby obtaining an anionic surfactant, that is, polyacrylic acid DBu salt (a -2- 1) 40% aqueous solution. Further, the Mw of the polyacrylic acid DBU salt (A-2-1) was 10,000. [Production Example 5] 1 part of dichloroethylene was placed in a reaction vessel equipped with a stirring device capable of temperature adjustment and reflux, and nitrogen substitution was carried out under stirring, and then the temperature was raised to 90. (:, refluxing of dichloroethylene. Then, 12 parts of styrene, -42-200923072, and 2,2,·1,1,1,isobutyronitrile, and 7 parts of pre-dissolved in 6埽2G of dichlorochloride. The initiator solution was added dropwise to the reaction vessel at the same time for 6 hours, and the addition was carried out: after the completion of the polymerization, the polymerization was carried out for an hour. After the polymerization, the mixture was cooled to 2 〇C' under a nitrogen atmosphere and then the temperature was controlled to 20. (:, - 105 parts of anhydrous sulfuric acid was added dropwise over 1 hour, and after completion of the dropwise addition, a sulfone reaction was further carried out for 3 hours. After the reaction, the solvent was removed by solidification, and then 345 parts of ultrapure water was added thereto to dissolve. Polystyrene aqueous acid solution. Then neutralize the obtained polystyrene water/liquid mixture with 25% TMAH water/glutle solution (about 400 parts) until the pH becomes 7, and then use Ultrapure water is used to adjust the concentration, thereby obtaining an anionic surfactant, a 4% aqueous solution of polystyrenesulfonic acid TMAH salt (A_2_2). In addition, polystyrene TMAH salt (A-2-2) The Mw was 40, and the oximation ratio was 97 〇/〇. [Production Example 6] Naphthalene sulfonate was added to a reaction vessel equipped with a stirring device. 21 parts and 10 parts of ultrapure water, add 8 parts of 37% formaldehyde at 8 rc for 3 hours. After the end of the addition, heat up to l〇5 °c for 25 hours, then cool to room temperature (about hunger )' Then adjust the pH to 6.5 (using about 15 parts of dbu) while adjusting in a water bath to adjust the pH to 6.5 (using about 15 parts of dbu). Add the ultra-pure water to adjust the solid content to peach, and obtain an anionic surfactant. A 4% by weight aqueous solution of DBU salt (Α-2·3) of a naphthalenesulfonic acid famarin condensate. Further, MwA 5,000 〇 of the DBU salt (α-2-3) of the naphthalenesulfonic acid famarin condensate [Production Example 7] In addition to 436 parts of a 70% aqueous monomer solution formed from 227 parts of acrylamide-mercaptopropanesulfonic acid, glyceryl acid-43-200923072 parts and 131 parts of ultrapure water, instead of acrylic acid 75 In the same manner as in Production Example 4, a mixture of water and isopropyl alcohol was removed in the same manner as in Production Example 4 until isopropyl alcohol was not detected, and acrylamide-2-methylpropanesulfonic acid/acrylic acid copolymer was obtained. Aqueous solution. Then, while the obtained aqueous solution of acrylamide 2 - mercaptopropanesulfonic acid / acrylic acid copolymer was adjusted to 25 ° C, DBU was slowly added. The pH was adjusted to 6.5 (using about 280 parts of DBU) and the concentration was adjusted with ultrapure water, thereby obtaining an anionic surfactant, acrylamide-2-methylpropanesulfonic acid/acrylic acid copolymer DBU. In addition, the Mw of the above-mentioned copolymer DBU salt (A-2-4) was 8,000. [Production Example 8] In addition to the use of mercapto propylene oxypolyoxyethylene sulfate 50% aqueous solution of ester sodium salt [manufactured by Sanyo Chemical Co., Ltd., ELEMINOL RS-30] 320 parts and 465 parts of 65% monomer aqueous solution formed by 145 parts of acrylic acid to replace 407 parts of 75% aqueous solution of acrylic acid, and manufacture In the same manner as in Example 4, a mixture of water and isopropyl alcohol was distilled off after the polymerization until no isopropyl alcohol was detected, and an aqueous solution of methacryloxy oxyoxyethylene sulfate sodium salt/acrylic acid copolymer was obtained. Then, the obtained copolymer aqueous solution was diluted with ultrapure water so that the solid content concentration became 10 〇/〇, and the sodium ion in the solution was removed using a cation exchange resin "Amberlite IR-120B" (manufactured by Organo Co., Ltd.). Until the sodium ion in the solution is less than or equal to 1 ppm. Further, the sodium content was measured using an ICP spectrometer (manufactured by VARIAN Co., Ltd., Varian 730-ES). Then, the obtained methacryloxy ethoxylated polyoxyethylene decanoic acid/propionic acid total 200923072 polymer was adjusted to 25 ° C ' while neutralizing the A with 25% TMAH aqueous solution (about 600 parts). Acrylic oxy-polyoxyethylene sulfate/acrylic acid copolymer until the pH is 7, and then the ultra-pure water is used to adjust the concentration, thereby obtaining an anionic surfactant A 10% aqueous solution of ethylene sulfate/acrylic acid copolymer TMAH salt (A-2-5). Further, the Mw of the above copolymer TMAH salt (A-2-5) was 9,000. [Production Example 9] 136 parts of octylbenzenesulfonic acid and 245 parts of ultrapure water were placed in a 1 L beaker, and octylbenzenesulfonic acid was dissolved until the solution became uniform. Then, DBN (about 65 parts) was used to neutralize the obtained aqueous solution of octylbenzenesulfonic acid until the pH became 7, and the concentration was adjusted with ultrapure water, thereby obtaining an anionic surfactant, namely, octyl group. A 40% aqueous solution of a benzoic acid salt (A-2-6). [Production Example 10] 144 parts of 2-ethylhexanoic acid and 3 parts of ultrapure water were placed in a beaker of 丨L. [2: Ethylhexanoic acid was dissolved until the solution (4) was self-contained. Then, diethanolamine (about 105 parts) is used to neutralize the obtained aqueous solution of 2-ethylhexanoic acid until the pH becomes 7, and then ultra-pure water is used to adjust the degree of Han, thereby obtaining an anionic surfactant. A 40% aqueous solution of 2_ethyl.diethyl__. [Production Example 11] 1 attached, the glass reactor of the stirring device and the temperature control device is 256 parts of hexylhexanol, and is cooled to enthalpy under the scramble, and then the temperature of the system (4) is maintained as a generation. 3 hours of dropwise addition of chlorine • 45 · 200923072 Continued 229 parts of acid to obtain sulfuric acid vinegar. Then, it was neutralized with a 48% aqueous solution of hydrogen hydroxide (about 230 parts) until the pH became 7, and then the concentration was adjusted with ultrapure water, thereby obtaining 2-ethylhexanol sulfate of an anionic surfactant. The 40% aqueous solution of the salt (A-2-8) was removed. [Example 1 to Example 56], [Comparative Example 比较 to Comparative Example 8] In each of 1 L of the beaker, at room temperature (about 2 Torr., the components described in Tables i to 8 are shown in Table 1 to The amount of the preparation described in Table 8 was uniformly stirred and mixed, and the cleaning agents of Example 1 to Example 56 and Comparative Example 1 to Comparative Example 8 were prepared. Examples 1 to 26 and Comparative Examples 1 to 1 were compared. The detergent of 5 was directly evaluated as a cleaning liquid at this concentration (dilution ratio of 1), and the cleaning agents of Examples 27 to 56 and Comparative Examples 6 to 8 were diluted to 10 times with ultrapure water. The cleaning liquid was evaluated according to the following evaluation methods. The results are shown in Tables 1 to 8. In addition, the number of the components other than the ultrapure water described in the table is the value obtained by converting the active ingredient. The amount of the ultrapure water described in the table includes the surfactant obtained in Production Examples 1 to η and the ultrapure water in the hydrazine aqueous solution. Further, the chelating agents (β) in Tables 1 to 8 are reduced. The abbreviations of the agent (c), the alkaline component (D), and the water-soluble organic solvent (G) are as follows. EDTA: B Amine tetraacetic acid HEDP: 1-Phenylethylidene-1,1.bisphosphonate: Sodium hexametaphosphate: Ascorbic acid Cys: L-cysteine-46 - 200923072 Sub-sodium sulphate: Sub-acid Single-salt salt MDeA: N-methyldiethanolamine TMAH: tetradecyl ammonium hydroxide DEA: diethanolamine DBU: 1,8-diazabicyclo[5.4, 〇]_7·undecene DEG-B: diethylene Alcohol monobutyl ether - The pH value of the obtained cleaning liquid at 25 ° C was measured using a pH meter (manufactured by Horiba, Ltd. 'M_l2). The oxidation-reduction potential and surface tension were measured by the above method, and by the following Method to evaluate cleanliness - 1 - cleanliness - 6, surface flatness - 丨 ~ surface flatness" 3. Etchability - 1 ~ etchability - 3, contact angle ~ contact angle ~ 3 and dispersibility. Evaluation~1&gt; Using a commercially available decanoic acid paste (having a particle size of about 3 Å) as a polishing agent and a polishing cloth, a 3.5-inch substrate for magneto-optical disk subjected to Ni_P plating was polished, and then ultrapure. Rinse the surface with water and blow the surface with nitrogen to make a contaminated substrate. The cleaning liquid prepared above 1&gt;(8) parts were placed in a 1 L glass beaker, and then the prepared contaminated substrate was immersed in the cleaning liquid, and cleaned in an ultrasonic cleaner (200 kHz) at 3 CTC for 5 minutes. 'Ultra-pure water was thoroughly rinsed, and then the substrate was blown with nitrogen to dry the substrate. The surface of the substrate was evaluated using a differential interference microscope (manufactured by Nikon Corporation, '0PTIPH0T_2, magnification 400 times) according to the following evaluation criteria. Cleanliness. In addition, in order to prevent air pollution, this evaluation was carried out in a clean room with a US federal standard cleanliness (class) of 〇00 (FED_STD_2()9D, 1988). ◎: It can be almost completely removed. 〇: It can be roughly cleaned. △ a small amount of particles remained X: almost impossible to clean &lt;cleanness evaluation 1&gt; In addition to the use of a commercially available alumina slurry (having a particle size of approximately the same as the polishing agent, it was carried out in the same manner as the cleaning evaluation - 清洁; Evaluation No. 3 "Only using a commercially available cerium oxide slurry (particle size of approximately (8) nm) and a polishing cloth as an abrasive to polish a 25-sided magneto-optical disk surface substrate, followed by ultrapure water The surface was washed and the surface was washed with nitrogen to prepare a contaminated substrate, and the evaluation was performed in the same manner as the cleanliness evaluation. <Cleanability Evaluation No. 4> In addition to using a commercially available rock acid paste ( The particle size was about 3 〇 nm), and the evaluation was performed in the same manner as the cleaning property evaluation 3 except for the polishing agent. <Cleanability Evaluation No. 5> Commercially available glass substrate (manufactured by Coming, glass plate #1737 ' 1 〇cmxi〇cm), spread the slope of the glass plate when the glass plate is cut (broken) 5 mg' at 1〇5. (: hotplate (PMC Industries' 'Digital heating plate series 730') Heat for 1 hour, use the resulting In addition, the substrate was evaluated in the same manner as the cleanliness evaluation - i 48-200923072. <Cleanability Evaluation No. 5> A hot plate at 70 ° C (manufactured by PMC Industries, Inc., digital heating plate series 730) On the other hand, 10 mg of n-tric acid (manufactured by Tokyo Chemical Industry Co., Ltd.), which is a sample pollutant, was melted on a commercially available glass substrate (manufactured by Corning, glass plate #1737, 10 cmx10 cm). This prepared the contaminated substrate. Then 100 g of the cleaning solution was placed in a 200 ml f glass beaker, and the prepared contaminated substrate was immersed in the cleaning solution, and cleaned in an ultrasonic cleaner (200 kHz) at 3 (TC). 5 minutes. After cleaning, the substrate was taken out, thoroughly rinsed with ultrapure water, and then the substrate was blown with nitrogen to dry the substrate, and the differential interference microscope (manufactured by Nikon Corporation, OPTIPHOT-2) was used according to the same evaluation criteria as the above-mentioned cleanliness evaluation-1. 'The magnification is 400 times' to evaluate the cleanliness of the substrate surface. In addition, in order to prevent air pollution, the evaluation is at a cleanliness of 1, 〇〇〇 (FED-STD-209D, US United Standards, 1988) in a clean room real 'Shi () &lt;. Flatness of a surface 1 &gt;

10 ml of each cleaning solution was placed in a 20 ml glass container, and the temperature was adjusted to 30 ° C. Then, the magneto-optical disc plated with Μ-P plating was cut into a size of 2 cm x 2 cm. The obtained substrate was immersed at 30 ° C for 20 minutes to be cleaned. After cleaning, the substrate was taken out using a pincette, and the cleaning liquid was sufficiently washed with ultrapure water, and then the substrate was blown with nitrogen at room temperature (25 ° C) to dry the substrate. Then, using an atomic force microscope (SII • 49·200923072 parts), the surface roughness (Ra) of the surface of the substrate was measured to evaluate the surface flatness. In addition, the surface roughness of the substrate before the test was evaluated. Degree (Ra) is 〇25 nm. &lt;surface flatness-2&gt; m

Take 10 ml of each cleaning solution and place it in 20 ml of broken glass. 6. Adjust the temperature to 3GX:, and then put the magneto-glass=plate into a size of lcmxlcm, at 3 (rc) After the dipping for 2 minutes, clean it. After cleaning, use a small tweezers to remove the substrate, rinse thoroughly with ultrapure water to remove the cleaning solution, and then blow the substrate with nitrogen at room temperature (25 ° C). The substrate is dried. Then use an atomic force microscope (SH

The surface roughness was evaluated by measuring the surface roughness (Ra) of the surface of the dried substrate by the Nano Technology Co., Ltd., e-Sweep. Further, the surface roughness (Ra) of the substrate before the test was 0.20 nm. &lt;Surface flatness-1&gt; 10 ml of each cleaning liquid was placed in a 20 ml glass container, and the temperature was adjusted to 30 ° C, and then placed in a commercially available glass substrate (manufactured by Corning, glass plate) #1737, 10 cmxlO cm) The substrate obtained by cutting into a size of lcmxl cm was immersed at 30 ° C for 20 minutes to clean. After the cleaning, the substrate was taken out using a small tweezers, and the cleaning liquid was sufficiently washed with ultrapure water, and then the substrate was blown with nitrogen at room temperature (25 ° C) to dry the substrate. Then, the surface roughness (Ra) of the surface of the dried substrate was measured using an atomic force microscope (manufactured by SII Nano Technology Co., Ltd., E-Sweep), and the surface flatness was evaluated. Further, the surface roughness (Ra) of the substrate before the test was 〇.50 nm. -50- 200923072 &lt;etching property 1&gt; 100 parts of each cleaning solution was placed in a 1 L polypropylene container, and a 3.5-inch piece of Ni-P plating was placed in the barn. The aluminum substrate for a magneto-optical disk was covered with a polyvinylidene chloride film on the upper portion of the container to seal the container so that the water did not evaporate, and then placed in a room where the temperature was adjusted to 23 t for 12 hours. After standing, each of the cleaning liquids was collected, and the content of Ni in the cleaning liquid was measured by ICP spectroscopic analysis (varian 730-ES, manufactured by VARIAN Co., Ltd.). Further, the contents of each of the cleaning liquids before the test were measured in the same manner in advance, and the difference therebetween was determined to determine the Ni content (ppm) eluted in the test. The more the Ni content of the elution, the more the etching property is. &lt;Name of the first one &gt; 100 parts of each cleaning solution was placed in a 1 L polypropylene container, and a 2.5-inch glass substrate for magneto-optical discs was placed in the container, and the upper part of the container was covered with a mixture. The container was sealed with dichloroethylene to seal the container so that the water did not evaporate, and then allowed to stand in a room where the temperature was adjusted to 23 ° C for 12 hours. After standing, 各 each cleaning liquid was collected, and the Si content in the cleaning liquid was measured using an ICP spectrometer (manufactured by y^RIAN, Varian 730-ES). Further, the Si content of each of the cleaning liquids before the test was measured in the same manner in advance, and the difference therebetween was determined to determine the Si content (ppb) eluted in the test. The more the Si content is eluted, the higher the money is. &lt;Residuality 3 &gt; 10 parts of each cleaning liquid was placed in a 50 ml polypropylene container, and the temperature was adjusted to 50 ° C, and then placed on a commercially available glass substrate (Coming -51- 200923072 a 1 衣玻璃板# 1737, l〇cmxi〇cm) The substrate obtained by cutting into a size of 2 cmx2 cm 'after immersion in rc, standing for 24 hours, collecting/month cleaning solution' using ICP spectroscopy The device (manufactured by VARIAN Co., Ltd., Vanan 730-ES) was used to determine the content of the cleaning liquid. Moreover, the §1 content of the cleaning liquid before the test was measured in the same manner in advance, and the difference was determined. The Si content (ppb) dissolved in the test was obtained. The more the dissolved Si content, the higher the _ property.

&lt;Contact angle measurement - 1 &gt; For the substrate evaluated in the above cleaning test, the substrate was immediately measured using a Wang automatic contact angle meter [manufactured by Kyowa Interface Science Co., Ltd., pD-W] to measure the substrate relative to water. Contact angle (25t, 1 second later). &lt;Contact angle measurement-2&gt; The substrate evaluated in the above-mentioned cleaning test-3 was used immediately, and an automatic contact angle meter [manufactured by Xiehejiesi Co., Ltd., PD-W] was used to measure the substrate relative to water. Contact angle (25t:, after 1 second). &lt;Contact angle measurement 1 &gt; For the wire evaluated in the above-mentioned cleaning test - 5 towels, 2 movements were used immediately, and the angle meter [manufactured by Kyowa Interface Science Co., Ltd., PD - measured the contact angle of the substrate with respect to water] (25 ° C, after 1 second). &lt;Dispersibility evaluation&gt; The 3G parts of the crying liquid were placed in a glass container of 5 G ml, and the commercially available rock acid paste used in the above-mentioned cleaning evaluation-4 was added only to the sister r4". 0.3 parts of 3 〇 nm), using a magnetic stirrer for a minute. After standing for 5 minutes, using a dynamic light scattering type particle size-52-200923072 cloth measuring device [manufactured by Horiba, Ltd., LB - 550V The particle size (median diameter) is measured. The smaller the particle diameter, the more excellent the dispersibility.

L -53- 200923072 [Table 1] Example Nonionic Surfactant (A-1) (A-1-2) (A-1-3) (A-2-1) (A-2-2) (A-2-3) 0.4 0.2 0.2 0.4 0.7 0.5 0.5 0.5 Anionic surfactant (A-2) (A-2-4) (A-2-5) (A-2-6) (A-2 -7) (A-2-8) 0.2% 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2 0.2

EDTA 0.2 0.2 0.2 Chelating Agent ¢)

HEDP 0.2 0.2 0.2 0.2 0.2 0.2 0.05 0.05

Cys formaldehyde 0.05 0.05 0.05 0.05 reducing agent (C) sulfurous acid disulfinous acid hydrogen phosphite hydrogen peroxide one charge 0.05 0.05

MDEA 0.2 0.2 alkaline component (D)

DEA 0.3 0.2

DBU 0.3 Water-soluble organic solvent (G) Water Dilution ratio pH value _ and formula (1) &amp; right 4 oxidation-reduction potential (mV)

DEG-B ultrapure water 98.2 98.1 97.5 98.1 98.5 98.9 98.1 97.9 98.6 6.5 6.5 6.5 6.5 6.5 6.5 6.5 6.5 6.5 6.5 231 116 229 277 125 272 Evaluation results Surface tension (mN/m) Cleanliness 1 Cleanability 1 Surface flat Properties-1 [Surface Thickness Ra(nm)] Etchability-1 [Ni content (ppm)] Contact angle - 1 〇 Dispersibility (nm) 27 ◎ ◎ 0.25 11.3 8.1 46 26 ◎ ◎ 0.25 11.8 7.3 48 25 25 34 30 30 30 32 65 ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ 0.26 0.28 0.25 0.27 0.26 0.26 0.28 0.25 12.0 14.0 12.1 14.5 13.6 13.0 14.2 12.2 6.5 6.8 8.5 9.0 9.1 8.6 9.2 7.5 47 48 46 33 32 34 36 43 -54- 200923072 [Table 2] Example formulation amount (parts) Evaluation result 11 12 13 14 15 16 17 18 19 20 Nonionic surfactant (A-1) (A-1-1) 0.2 0.2 0.2 0.2 - 0.2 0.2 0.2 0.2 0.2 (A-1-2) - - - - 0.2 - - - - - (A-1-3) Anionic surfactant (A-2) (A-2-1 ) 1 - - 1 (A-2-2) - - - - - - Sleep - - - (A-2^3) - 1 - - 1 1 1 - 1 1 (A-2-4) - - 1 ( A-2-5) - - - - - - - - - - (A-2-6) (A-2-7) (A-2-8) Ink - - - - 0.2 - - - - p-Toluenesulfonic acid 0,2 1 0.2 0.2 Chelating agent (B) EDTA - 0.2 - - 0.2 - - - - - HEDP - - - 0.2 - 0.2 0.2 0.2 0.2 0.2 HMP 0.2 - reducing agent (C) AA 0.05 - - - 0.05 - - - - - Cys - 0.05 - 0.05 - - - - 0.05 - Formaldehyde 0.05 Sulfuric acid - Disulfide acid hydrogen phosphite hypophosphorous acid Monosodium - 0.05 - - 0.05 0.05 - - MDEA Alkaline Component (D) TMAH - 0.2 - - 0.6 - - - - - DEA - - 0.01 - 0.25 0.4 0.3 0.4 0.4 DBU 0.08 - - 0.3 - - - 1 - - Water-soluble organic solvent (G) DEG-B water ultrapure water 98.5 98.3 98.7 98.2 98.0 98.1 98.0 97.3 98.0 98.0 Dilution ratio 1 1 1 1 1 1 1 1 1 1 pH 8.5 8.5 8.5 5.0 13.0 6.5 6.5 6.5 6.5 6.5 Number Value of the right part of (1) 221 221 221 357 47 298 298 298 298 298 Oxidation reduction potential (mV) 162 43 213 171 5 280 278 273 128 223 Surface tension (mN/m) 30 30 30 30 34 24 30 31 30 31 Cleanability 1 ◎ ◎ ◎ ◎ 〇 ◎ ◎ ◎ ◎ ◎ Cleanability 2 ◎ ◎ ◎ 〇〇 ◎ ◎ ◎ ◎ ◎ Surface flatness-1 [Surface light core: degree Ra (nm)] 0.25 0.26 0.25 0.32 0.25 0.25 0.25 0.29 0.24 0.25 Last name l [Ni content (ppm)] 11.9 13.8 12.4 15.0 9.8 14.0 14.2 12.8 14.1 14.0 Contact angle -1 (°) 8.7 8.7 8.9 8.5 10.5 8.7 8.6 9.2 6.8 8.0 Dispersibility (nm) 46 48 47 47 46 34 33 55 33 34 -55- 200923072 [Table 3]

Example 21 22 23 24 25 26 Formulation amount of nonionic surfactant (A-1) (AM) 0.2 0.2 0.2 0.2 0.2 0.2 (A-1-2) - - - - - - (A-1-3) - - - - - - Anionic surfactant (A-2) (A-2-1) - - - - - - (A-2-2) - - - - - - (A-2-3) 1 1 1 1 1 1 (A-2-4) - - - - - - (A-2-5) - - - - - (A-2-6) - - - - (A-2-7) - - - - - - (A-2-8) - - - - - - p-toluenesulfonic acid 0.2 0.2 0.2 0.2 0.2 0.2 Chelating agent (B) EDTA - - - - - - HEDP 0.2 0.2 0.2 0.2 0.2 0.2 HMP - - _ - - 0.2 Reducing agent (C) AA - - - - - - Cys - - - - 0.05 0.05 Formaldehyde - - - - - - - Acidic acid 0.05 Noodles - - - - Disulfuric acid - 0.05 - - - Hydrogen phosphite Acid - - 0.05 - - - Monosodium hypophosphite MDEA - - - 0.05 - - Alkaline component (D) TMAH - - - - - DEA 0.45 0.45 0.45 0.45 0.4 0.4 DBU - - - - - Water-soluble organic solvent (G) DEG-B - - - - 0.5 - Water ultrapure water 97.9 97.9 97.9 97.9 97.5 97.8 Dilution ratio 1 1 1 1 1 1 Evaluation result pH 6.5 6.5 6.5 6.5 6.5 6.0 Value of the right part of the formula (1) 298 298 298 298 298 318 Oxidation reduction potential (mV) 2 70 268 278 284 123 134 Surface tension (mN/m) 30 30 30 29 26 32 Cleanability-1 ◎ ◎ ◎ ◎ ◎ ◎ Cleanability 2 ◎ ◎ ◎ ◎ ◎ ◎ Surface flatness-1 [Surface thick chain Ra (nm)] 0.25 0.25 0.25 0.26 0.24 0.25 Last name -1 [Ni content (ppm)] 13.8 13.9 14.0 13.3 13.6 15.6 Contact angle - l〇7.8 7.9 8.4 8.8 6.3 6.1 Dispersibility (nm) 33 33 34 33 30 34 -56- 200923072 [Table 4]

Comparative Example 1 2 3 4 5 Formulation amount § Nonionic surfactant (A-1) (A-1-1) 0.2 - 0.2 0.2 0.2 (A-1-2) - 0.2 - - - (A-1- 3) - - - - Anionic surfactant (A-2) (A-2-1) 1 - 1 - 1 (A-2-2) - - - - - (A-2-3) - 1 - 1 - (A-2-4) - - - - - (A-2-5) - - - - - (A-2-6) - - - - - (A-2-7) - - - - ( A-2-8) - - - - p-toluene acid - - - - - chelating agent (B) EDTA - - 0.2 - - HEDP 0.2 0.2 - - - HMP - - - 0.2 0.2 reducing agent (C) AA - - - - - Cys - - - - Formaldehyde - - - - - Sulfite - - - - - Disulfide acid - - - - - Hydrogen phosphite - - - - - Sub-sodium acid - - - - - - MDEA - - - - - Alkaline Ingredients (D) TMAH 0.2 - 0.2 - - DEA - - - - DBU - 2.0 - - - Water Soluble Organic Solvent (G) DEG-B - - - - - Water Ultrapure Water 98.4 96.6 98.4 98.6 98.6 Dilution ratio 1 1 1 1 1 Evaluation result pH 4.0 13.5 6.5 6.5 8.5 Value of the right part of equation (1) 395 28 298 298 221 Oxidation reduction potential (mV) 441 74 350 344 267 Surface tension (mN/ m) 30 28 30 30 32 Cleanability - 1 Δ △ Δ Δ 〇 Cleanability - 2 X △ XX Δ Surface flatness-1 [Surface roughness Ra (nm)] 0.42 0.26 0.32 0.35 0.31 Etchability - l [Ni content (ppm)] 20.5 9.4 15.5 16.3 15.1 Contact angle - 1 〇 20.1 19.5 20.3 20.5 22.0 Dispersibility (nm) 576 1012 489 815 460 -57- 200923072 [Table 5]

Example 27 28 29 30 31 32 33 34 35 36 Preparation * Nonionic surfactant (A-1) (A-1-1) 0.2 0.1 - • 0.1 0.1 0.01 (Α-1·2) 0.2 - 0.05 • • _ (Α·1·3) • . • 0.5 • • • Anionic interface active thorn (A-2) (Α-2-1) 0.1 - 0.5 • 0.1 _ (Α·2·2) 0.1 (Α· 2·3) • 0.1 0.1 . 0.05 (Α-2-4) - - 0.1 - • 0.1 • (Α-2.5) . 0.1 . • _ (Α-2^6) - - - 0.1 0.1 0.1 • (Α· 2·7) . . 0.1 • (Α·2·8) m-xylene sulfonate chelating agent (B) citric acid 0.1 0.1 • 0,1 _ HEDP - - 0.1 0.1 • • HMP - 0.2 0.2 0.2 0.2 reducing agent (C) AA 0.5 0.5 垂 • 0.5 . 0.5 Cys 0.5 - 0.5 0.5 _ Formaldehyde _ sulfite disulfite _ phosphorous acid _ sub-disc acid · one nano - - - 0.5 - 0.5 0.5 • MDEA alkaline component ( D) DBU Argon Oxide Nano-Water Soluble Organic Solvent (G) DEG-B Other Additives (H) [pH Adjusting Shot] Amine Sulfonic Acid 1.0 - 7.0 3.5 - 0.8 • 0.5 Phosphoric acid - - • 1.5 - 0.4 _ 1.5 Water ultrapure water 98.1 99.1 99.2 922 97.4 95.1 98.7 98.4 97.6 98.7 Dilution ratio 10 10 10 10 10 10 10 10 10 10 Evaluation result pH 2.0 4.5 3.0 1.5 2.0 1.8 2.5 2.2 2.0 2.3 Value of the right part of equation (1) 473 376 434 492 473 480 453 465 473 461 Oxidation reduction potential (mV) 395 214 360 444 323 294 412 388 428 392 Surface tension (mN/m) 40 35 45 52 42 34 38 32 33 60 Cleanliness 3 ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ Cleanliness ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ Surface flatness ~ 2 [surface roughness Ra (mn)] 0.21 0.20 0.20 0.22 0.23 0.21 0.22 0.20 0.21 0.20 Surface flatness - 3 [surface roughness Ra (nm) l 0.79 0.75 0.77 0.76 0.77 0.79 0.82 0.83 0.83 0.86 Etchability_2 [Si content (ppb) l 1400 1050 1100 1600 1350 1550 1150 1200 1400 1200 Etchability-3 [Si content (ppb) l 720 580 600 760 710 730 630 690 720 670 Contact angle - 2 〇 5.1 6.4 6.0 5. 5 4.8 6.2 5.7 5.6 5.5 6.0 Contact angle -3 (.) 8.0 7.8 7.6 8.5 8.0 8.3 7.9 7.7 8.1 7.9 Dispersibility (nm) 46 46 48 47 46 47 48 48 48 51 -58 - 200923072 [Table 6] Example adjustment S amount (parts) Evaluation result 37 38 39 40 41 42 43 44 45 46 Nonionic surfactant (A-1) (A-1-1) - 0.1 0.1 0.1 - - 0.01 0.1 0.1 0.1 (A-1 -2 - - - - - - - - - - . (A small 3) - - - - - - - - . Anionic surfactant (A-2) (A-2-1) - 0.1 0.1 0.1 0.1 0.1 - 0.1 0.1 (A-2-2) - - - - - - - . - • (A-2-3) - - - - - - - • (A-2-4) 0.1 (A-2-5) - (-) - (-) - 0.3 0.3 0.3 - 0.05 m-xylenesulfonic acid - - - - 0.3 0.3 - . 0.3 0.1 Chelating agent (B) Citric acid 0.1 . HEDP - 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 HMP • Reducing agent (C) AA 0.5 • Cys - • 0.5 formaldehyde _ . sulphite - • * - yabine acid monophosphite hypophosphite MDEA - 0.5 0.5 0.5 0.5 0.5 0.5 0.5 0.5 • Alkaline component (D) DBU - - 0.1 0.10 - 0.4 0.10 - - 0.2 Sodium hydroxide - 0.35 - - 0.7 - - 0.35 0.55 . Water-soluble organic solvent (G) DEG-B Other additives (H) [pH value Adjust 剤] Amine sulfonic acid 0.5 phosphoric acid - 0.4 Water ultrapure water 98.8 98.6 98.8 98.8 98.3 98.6 99.2^ 98.9 98.5 98.5 Dilution ratio 10 10 10 10 10 10 10 10 10 10 pH 2.3 12.5 10.0 8.5 12.5 10.0 8.0 12.5 12.5 2.5 Value of the right part of equation (1) 461 66 163 221 66 163 240 66 66 453 Oxidation reduction potential (mV) 390 40 106 161 39 97 158 54 58 270 Surface tension (mN/m) 65 32 33 35 48 49 58 38 35 39 Cleanliness - 3 ◎ 〇〇 ◎ 〇〇 ◎ 〇〇 ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ Cleanliness -6 ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ Surface flatness 1-2 [surface roughness Ra (nm)] 0.21 0.25 0.24 0.22 0.24 0.23 0.22 0.27 0.29 0.20 Surface flatness - 3 [surface roughness Ra(nm)] 0.84 0.64 0.60 0.53 0.61 0.56 0.77 0.67 0.78 0.60 Etchability _2 [Si Quantity (ppb)] 1200 1550 1450 1300 1500 1450 1200 1550 1550 1200 Etchability-3 [Si content (ppb)] 660 800 760 700 780 750 680 680 620 640 Contact angle - 2 〇 6.2 6.1 6.3 6.8 6.1 6.4 7.2 6.9 7.1 4.7 Contact angle - 3 〇 7.7 6.8 7.2 7.8 6.7 7.3 7.8 8.7 8.9 6.5 Dispersibility (nm) 46 34 33 35 34 34 60 55 58 32 -59- 200923072 [Table 7] Formulation amount (parts) /13⁄4 Example evaluation results 47 48 49 50 51 52 53 54 55 56 Nonionic surfactant (A-1) (A-1-1) 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 (A-1-2) - (A-1 -3 - - - - - - - - - . Anionic surfactant (A-2) (A-2-1) 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 (A-2-2) - - - - - - - - - - (A-2-3) - - - - - - - - (A-2-4) (A-2-5) - - - - - - - - - (A-2 -6) - - - - - - - - . (A-2-7) - - - - - - - - - (A-2-8) dimethyl methacrylate 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 Chelating agent (B) Citric acid - • HEDP 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 0.1 HMP 0.1 0.1 Reducing agent (C) AA - • Cys - - - - - 0.5 0.5 0.5 0.5 Formaldehyde 0.5 • Sulfite 0.5 - - Disulfite - 0.5 - - - - - _ . Hydrogen phosphite - - - 0.5 - - - • . Monosodium hypophosphite - - - - 0,5 - • MDEA - - - - - 0.5 - - - - Test composition (D) DBU 0.2 0.7 0.7 0.7 0.7 0.2 0.2 - 0.2 . Hydroxide sodium 0.45 • 0.45 Water-soluble organic solvent (G) DEG-B 0.5 0.5 - - Others Additive (H) [pH adjuster] Amine sulfonic acid • Phosphoric acid 0.4 0.4 0.4 0.4 0.4 0.4 0.4 - 0.4 • Water ultrapure water 98.5 98.0 98.0 98.0 98.0 98.5 98.0 98.2 98.4 98.6 Dilution ratio 10 10 10 10 10 10 10 10 10 10 10 pH 2.5 2.5 2.5 2.5 2.5 2.5 2.5 12.5 2.5 12.0 The value of the right part of equation (1) 453 453 453 453 453 453 453 66 453 86 Oxidation reduction potential (mV) 396 409 410 403 401 427 266 35 274 43 Surface Tension (niN/m) 38 37 38 37 36 38 30 28 36 34 Cleanability - 3 ◎ ◎ ◎ ◎ ◎ ◎ ◎ 〇 〇 〇 Cleanliness _4 ◎ ◎ ◎ ◎ ◎ 〇 ◎ ◎ ◎ ◎ Cleanliness 5 ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ Cleanliness 6 ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ ◎ Surface flatness - 2 [surface roughness Ra (nm)] 0.20 0.21 0.21 0.22 0.22 0.22 0.19 0.20 0.20 0.21 Surface flatness - 3 [surface roughness Bri (Rain) Ra(nm)] 0.64 0.68 0.68 0.67 0:67 0.70 0.55 0.53 0.58 0.55 Etchability-2 [Si content (ppb)] 1250 1250 1250 1250 1250 1100 1200 1500 1500 1650 Etchability 3 [Si content (ppb)] 650 640 640 650 640 640 620 630 680 660 Contact angle 1 〇 5.8 6.4 6.5 6.5 6.6 6.7 4.5 6.8 4.3 6.9 Contact angle 6.8 7.0 6.9 7.0 7.1 7.4 6.0 6.1 6.4 6.2 Dispersibility (mn) 31 32 33 33 32 34 30 30 36 35 -60- 200923072 [Table 8] i (Part) Evaluation result Comparative Example 6 7 8 Nonionic surfactant (A-1) (A-1-1) 0.2 0.2 0.1 (A-1-2) - - (A-1-3) - . Anionic surfactant (A-2) (A-2-1) 0.1 • 0.1 (A-2-2) - . (A-2-3) - 0.1 . (A-2-4) - . (A -2-5) • (A-2-6) - - (A-2-7) - - - (A-2-8) - 03 m-xylenesulfonic acid - • Chelating agent (B) Citric acid 0.1 - HEDP - 0.1 HMP 0.2 • Reducing agent (C) AA - . Cys • - Formaldehyde - - Sulfite - - Sulfite - Hydrogen phosphite - monosodium hypophosphite - . - MDEA cryptic • Basic component (D) DBU - Sodium hydroxide - . 0.45 Water-soluble organic solvent (G) DEG-B - . - Other additives (H) [pH value Conditioner] Amine sulfonic acid - 1.0 • Phosphoric acid ink - Water ultrapure water 99.6 98.5 99.0 Dilution ratio 10 10 10 pH 5.5 2.0 12.3 The value of the right part of the equation (1) 337 473 74 Oxidation reduction potential (mV) 394 565 167 Surface tension (mN/m) 40 40 42 Cleanability - 3 Δ 〇 X Cleanability _4 〇 X 〇 Cleanability - 5 △ X Δ Cleanability _6 XX 〇 Surface flatness - 2 [Surface roughness Ra (mn )] 0.20 0.28 0.34 Surface flatness - 3 [surface roughness Ra (ran)] 1.12 1.34 1.05 Etchability _2 [Si content (ppb)] 500 800 300 Etchability - 3 [Si content (ppb)] 350 650 550 Contact angle ·2〇10.2 8.5 15.6 Contact angle 〇3〇18.6 13.2 9.4 Dispersibility (nm) 422 1007 576 •61- 200923072 Recording the μ~ the results of the long-term recording, the cleaning of this (4) is attached to the surface of various substrates. The repellency of the particles is extremely excellent. μ, from the results of the lateral test, it can be seen that the present invention has a moderate degree of smear, and hardly changes the flatness of the surface of the substrate after cleaning, so that it is not necessary to make the substrate table (4) secret when clearing f Even if it is firmly attached to the substrate table _ particles (4) is effective. Further, it is also known that since the cleaning property of the present invention lowers the contact angle of the water on the pure surface after cleaning, it is also possible to exhibit an effect of achieving an extremely clean substrate surface. Since the cleaning agent of the present invention is excellent in particle cleanability, it can be preferably used as a cleaning agent for electronic materials: a magneto-optical substrate (substrate board, magneto-optical disk, magnetic head, etc.), plane Display substrate (liquid crystal panel substrate, color filter substrate (c〇1〇r filter board), array substrate (aiTay board), plasma display (plasma) substrate, and organic electroluminescence (EL) display Substrate, etc., reticle substrate, silic 〇n wafer, optical lens, printed circuit board, luminaire #cable, light emitting diode -emitting diode, LED), substrate for battery, and crystal oscillator (CIyStai 〇sciuat〇r). While the present invention has been described in its preferred embodiments, the present invention is not intended to limit the invention, and the invention may be modified and modified without departing from the spirit and scope of the invention. The scope of protection is subject to the definition of the scope of the patent application. • 62 - 200923072 [Simple description of the diagram] None [Key component symbol description] None

Claims (1)

200923072 X. Patent Application Scope 1. A cleaning agent for electronic materials, which contains a surfactant (A), which is characterized by an active ingredient concentration at 25 ° C when used as a cleaning liquid. The pH value and the oxidation-reduction potential (V) satisfy the following formula 〇), in which the unit of the oxidation-reduction potential (V) is mv, and vsSHE: VS-38.7 χρΗ value + 550 (1). 2. The cleaning agent for electronic materials according to claim 1, wherein the cleaning agent has a pH of 1 to 13 at a concentration of an active ingredient when used as a cleaning liquid, and the electronic material is A glass substrate for a magneto-optical disk, a flat display substrate, or a photomask substrate. 3. If you apply for a patent scope! The cleaning agent for an electronic material according to the item, wherein the cleaning agent is used as an active ingredient concentration when used as a cleaning liquid, 25. The pH of the underarm is 5 to 13, and the above electronic material is a substrate for magneto-optical discs. 4. If the electronic material described in any of items _ to 3 of the patent application range is used as a clear paste, it is turned into a clear wire _ the active ingredient concentration is 0.01 wt% to 15 wt%. 5. The electronic material cleaning agent according to claim 4, wherein the surfactant (A) is an anionic surfactant (Α·2) or an anionic interface _(Α_2) and a rotor interface A mixture of active Qi (Α-1). 6. The application of the patent _ 2 or the detergent ‘ further contains a species selected from the group consisting of chelating _) and further; component (D). 7. The cleaning agent for electronic materials according to item 6 of the patent application, 200923072 wherein the above chelating agent (B) is selected from the group consisting of ==·6), condensed Wei (two and the salt - or more than one kind of chelating agent.), the cleaning agent for electronic materials, the number of bismuth reduction two: skillfully 1~12 _, carbon, contiguous mu, buccal inverse number of 1 to 30 aliphatic amine The oxyacid of the thiol-based tit dish _^ sub-material (4), which contains a surfactant (A), characterized in that the concentration of the active ingredient is 0.01 wt%~l5 ^1〇) ^ v&lt;r~ , r potential CV) early position is mV, vsSHE: = -38.7χρΗ value + 550 ") liquid, (d) 9 items of the electronic material with the clean glass substrate flat = two said board electronic material is a magneto-optical disc - second: The cleaning liquid for the electronic material, the plate is 5~13' The above-mentioned electronic (4) is a method for the magneto-disc using the Shaoji Di Village, which is cleaned in the cleaning liquid as described in any one of the items. The electronic material is subjected to the cleaning step after the grinding step and the cleaning step after the grinding step in the electronic material J described in claim 12 -65 - 200923072 The cleaning step of the cleaning step after the step of the texturing process is to clean the magneto-optical substrate flat display substrate or the reticle substrate. 14. The electronic material as described in claim 13 The cleaning method, wherein the grinding step is a grinding step and/or a texturing step using an alumina, a phthalic acid gel, a cerium oxide or a diamond as an abrasive. I. As described in claim 12 The cleaning method of the electronic material, wherein the material is subjected to at least one cleaning method of a group consisting of ultrasonic cleaning, spray cleaning, spray cleaning, brush cleaning, immersion cleaning, and dip-cleaning. 16. The cleaning method of the electronic material according to claim 12, wherein the contact angle of the water with respect to the cleaned substrate is less than 20 at 25 ° C. The tooth 17 - manufacture of an electronic material A method comprising the steps of cleaning an electronic material by a cleaning method as described in claim 12. -66 - 200923072 VII. Designation of representative drawings: (1) Designation of the case Table Pictured: None (b) of FIG element symbols representative of this briefly described: No eight, when the case if the formula, please reveal the best features of the invention show a chemical formula: None