SG145772A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG145772A1
SG145772A1 SG200806312-5A SG2008063125A SG145772A1 SG 145772 A1 SG145772 A1 SG 145772A1 SG 2008063125 A SG2008063125 A SG 2008063125A SG 145772 A1 SG145772 A1 SG 145772A1
Authority
SG
Singapore
Prior art keywords
lithographic apparatus
device manufacturing
different parts
forces
seal
Prior art date
Application number
SG200806312-5A
Other languages
English (en)
Inventor
Pieter Renaat Maria Hennus
Jeroen Johannes Sophia Mertens
Patrick Johannes Cornelus Hendrik Smulders
Peter Smits
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG145772A1 publication Critical patent/SG145772A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
SG200806312-5A 2004-12-08 2005-12-05 Lithographic apparatus and device manufacturing method SG145772A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/006,550 US7365827B2 (en) 2004-12-08 2004-12-08 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG145772A1 true SG145772A1 (en) 2008-09-29

Family

ID=36084289

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200507806A SG123683A1 (en) 2004-12-08 2005-12-05 Lithographic apparatus and device manufacturing method
SG200806312-5A SG145772A1 (en) 2004-12-08 2005-12-05 Lithographic apparatus and device manufacturing method

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG200507806A SG123683A1 (en) 2004-12-08 2005-12-05 Lithographic apparatus and device manufacturing method

Country Status (8)

Country Link
US (3) US7365827B2 (de)
EP (3) EP1970763A3 (de)
JP (4) JP4322865B2 (de)
KR (1) KR100760316B1 (de)
CN (3) CN101900951B (de)
DE (2) DE602005009246D1 (de)
SG (2) SG123683A1 (de)
TW (1) TWI320876B (de)

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US7684010B2 (en) * 2005-03-09 2010-03-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US7633073B2 (en) * 2005-11-23 2009-12-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7830498B2 (en) * 2006-10-10 2010-11-09 Hewlett-Packard Development Company, L.P. Hydraulic-facilitated contact lithography apparatus, system and method
US20080137055A1 (en) * 2006-12-08 2008-06-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7791709B2 (en) 2006-12-08 2010-09-07 Asml Netherlands B.V. Substrate support and lithographic process
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NL2005120A (en) * 2009-09-21 2011-03-22 Asml Netherlands Bv Lithographic apparatus, coverplate and device manufacturing method.
NL2005126A (en) * 2009-09-21 2011-03-22 Asml Netherlands Bv Lithographic apparatus, coverplate and device manufacturing method.
NL2005479A (en) * 2009-11-17 2011-05-18 Asml Netherlands Bv Lithographic apparatus, removable member and device manufacturing method.
NL2005478A (en) * 2009-11-17 2011-05-18 Asml Netherlands Bv Lithographic apparatus, removable member and device manufacturing method.
NL2006244A (en) 2010-03-16 2011-09-19 Asml Netherlands Bv Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus.
NL2006203A (en) * 2010-03-16 2011-09-19 Asml Netherlands Bv Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method.
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JP5313293B2 (ja) 2010-05-19 2013-10-09 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、リソグラフィ装置で使用する流体ハンドリング構造およびデバイス製造方法
JP5973064B2 (ja) 2012-05-29 2016-08-23 エーエスエムエル ネザーランズ ビー．ブイ． 支持装置、リソグラフィ装置及びデバイス製造方法

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EP1821150A1 (de) 2007-08-22
TW200625021A (en) 2006-07-16
KR20060064539A (ko) 2006-06-13
CN1786832A (zh) 2006-06-14
TWI320876B (en) 2010-02-21
JP2006165572A (ja) 2006-06-22
US8860926B2 (en) 2014-10-14
DE602005009246D1 (de) 2008-10-02
JP2010103549A (ja) 2010-05-06
KR100760316B1 (ko) 2007-09-20
JP2009152625A (ja) 2009-07-09
EP1669807B1 (de) 2007-08-01
JP2010212711A (ja) 2010-09-24
CN101900951B (zh) 2013-07-10
CN101900951A (zh) 2010-12-01
DE602005001835D1 (de) 2007-09-13
JP4322865B2 (ja) 2009-09-02
JP4598133B2 (ja) 2010-12-15
JP4790076B2 (ja) 2011-10-12
EP1970763A2 (de) 2008-09-17
CN1786832B (zh) 2010-08-11
EP1669807A1 (de) 2006-06-14
JP4505042B2 (ja) 2010-07-14
US8115905B2 (en) 2012-02-14
EP1821150B1 (de) 2008-08-20
DE602005001835T2 (de) 2008-04-17
CN101916041A (zh) 2010-12-15
US20120008114A1 (en) 2012-01-12
EP1970763A3 (de) 2013-10-09
US20060119817A1 (en) 2006-06-08
US7365827B2 (en) 2008-04-29
US20080174752A1 (en) 2008-07-24
SG123683A1 (en) 2006-07-26

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