SG10202009397WA - Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device - Google Patents

Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device

Info

Publication number
SG10202009397WA
SG10202009397WA SG10202009397WA SG10202009397WA SG10202009397WA SG 10202009397W A SG10202009397W A SG 10202009397WA SG 10202009397W A SG10202009397W A SG 10202009397WA SG 10202009397W A SG10202009397W A SG 10202009397WA SG 10202009397W A SG10202009397W A SG 10202009397WA
Authority
SG
Singapore
Prior art keywords
reflective mask
reflective
manufacturing
multilayered
film
Prior art date
Application number
SG10202009397WA
Other languages
English (en)
Inventor
Suzuki Kota
ONOUE Takahiro
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of SG10202009397WA publication Critical patent/SG10202009397WA/en

Links

SG10202009397WA 2019-09-30 2020-09-24 Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device SG10202009397WA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2019180328 2019-09-30
JP2020155903A JP2021056502A (ja) 2019-09-30 2020-09-16 多層反射膜付き基板、反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法

Publications (1)

Publication Number Publication Date
SG10202009397WA true SG10202009397WA (en) 2021-04-29

Family

ID=75270989

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10202009397WA SG10202009397WA (en) 2019-09-30 2020-09-24 Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device

Country Status (5)

Country Link
JP (1) JP2021056502A (zh)
KR (1) KR20210038360A (zh)
CN (1) CN112666788A (zh)
SG (1) SG10202009397WA (zh)
TW (1) TW202127136A (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113376893A (zh) * 2021-05-12 2021-09-10 宜昌南玻显示器件有限公司 具有隐藏显示器效果的半反半透结构及其制备和应用
JPWO2023286669A1 (zh) * 2021-07-12 2023-01-19
US12066755B2 (en) * 2021-08-27 2024-08-20 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle for an EUV lithography mask and a method of manufacturing thereof
KR102649175B1 (ko) * 2021-08-27 2024-03-20 에이지씨 가부시키가이샤 반사형 마스크 블랭크, 반사형 마스크, 반사형 마스크 블랭크의 제조 방법 및 반사형 마스크의 제조 방법
JP7416343B2 (ja) * 2021-12-28 2024-01-17 Ａｇｃ株式会社 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、及び反射型マスクの製造方法
KR20240115334A (ko) 2022-04-01 2024-07-25 에이지씨 가부시키가이샤 반사형 마스크 블랭크, 반사형 마스크, 반사형 마스크 블랭크의 제조 방법 및 반사형 마스크의 제조 방법
WO2024024513A1 (ja) * 2022-07-25 2024-02-01 Ａｇｃ株式会社 反射型マスクブランク、反射型マスク、反射型マスクブランクの製造方法、および反射型マスクの製造方法
WO2024034439A1 (ja) * 2022-08-09 2024-02-15 Ａｇｃ株式会社 Ｅｕｖリソグラフィ用反射型マスクブランク及びその製造方法、並びに、ｅｕｖリソグラフィ用反射型マスク及びその製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5371162B2 (ja) 2000-10-13 2013-12-18 三星電子株式会社 反射型フォトマスク
JP4910856B2 (ja) * 2006-06-08 2012-04-04 旭硝子株式会社 Ｅｕｖリソグラフィ用反射型マスクブランク、および該マスクブランク用の機能膜付基板
JP5082681B2 (ja) * 2007-08-29 2012-11-28 凸版印刷株式会社 反射型フォトマスクブランク及び反射型フォトマスクの製造方法
JP2009210802A (ja) * 2008-03-04 2009-09-17 Asahi Glass Co Ltd Ｅｕｖリソグラフィ用反射型マスクブランク
KR20130007533A (ko) * 2009-12-09 2013-01-18 아사히 가라스 가부시키가이샤 Ｅｕｖ 리소그래피용 광학 부재
JP2014116498A (ja) * 2012-12-11 2014-06-26 Nikon Corp 光学素子、露光装置、及びデバイスの製造方法
JP6377361B2 (ja) 2013-02-11 2018-08-22 Hoya株式会社 多層反射膜付き基板及びその製造方法、反射型マスクブランクの製造方法、反射型マスクの製造方法、並びに半導体装置の製造方法
JP2014229825A (ja) * 2013-05-24 2014-12-08 旭硝子株式会社 Ｅｕｖリソグラフィ用反射型マスクブランクの製造方法および、該マスクブランク用の反射層付基板の製造方法
JP6470176B2 (ja) 2013-07-22 2019-02-13 Hoya株式会社 多層反射膜付き基板、ｅｕｖリソグラフィー用反射型マスクブランク、ｅｕｖリソグラフィー用反射型マスク及びその製造方法、並びに半導体装置の製造方法
WO2015037564A1 (ja) 2013-09-11 2015-03-19 Hoya株式会社 多層反射膜付き基板、ｅｕｖリソグラフィー用反射型マスクブランク、ｅｕｖリソグラフィー用反射型マスク及びその製造方法、並びに半導体装置の製造方法
JP6845122B2 (ja) * 2017-11-27 2021-03-17 Hoya株式会社 反射型マスクブランク、反射型マスク及びその製造方法、並びに半導体装置の製造方法

Also Published As

Publication number Publication date
TW202127136A (zh) 2021-07-16
KR20210038360A (ko) 2021-04-07
CN112666788A (zh) 2021-04-16
JP2021056502A (ja) 2021-04-08

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