SG10202009397WA - Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device - Google Patents
Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceInfo
- Publication number
- SG10202009397WA SG10202009397WA SG10202009397WA SG10202009397WA SG10202009397WA SG 10202009397W A SG10202009397W A SG 10202009397WA SG 10202009397W A SG10202009397W A SG 10202009397WA SG 10202009397W A SG10202009397W A SG 10202009397WA SG 10202009397W A SG10202009397W A SG 10202009397WA
- Authority
- SG
- Singapore
- Prior art keywords
- reflective mask
- reflective
- manufacturing
- multilayered
- film
- Prior art date
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019180328 | 2019-09-30 | ||
| JP2020155903A JP2021056502A (en) | 2019-09-30 | 2020-09-16 | Substrate with multi-layered reflecting film, reflective mask blank, reflective mask and method for manufacturing the same, and method for manufacturing semiconductor device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG10202009397WA true SG10202009397WA (en) | 2021-04-29 |
Family
ID=75270989
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG10202009397WA SG10202009397WA (en) | 2019-09-30 | 2020-09-24 | Multilayered-reflective-film-provided substrate, reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP2021056502A (en) |
| KR (1) | KR20210038360A (en) |
| CN (1) | CN112666788A (en) |
| SG (1) | SG10202009397WA (en) |
| TW (1) | TW202127136A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113376893A (en) * | 2021-05-12 | 2021-09-10 | 宜昌南玻显示器件有限公司 | Semi-reflecting and semi-transmitting structure with hidden display effect and preparation and application thereof |
| KR20240029758A (en) * | 2021-07-12 | 2024-03-06 | 에이지씨 가부시키가이샤 | Reflective mask blank and method of manufacturing the same |
| US20230069583A1 (en) * | 2021-08-27 | 2023-03-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle for an euv lithography mask and a method of manufacturing thereof |
| KR102649175B1 (en) * | 2021-08-27 | 2024-03-20 | 에이지씨 가부시키가이샤 | Reflective mask blank, reflective mask, manufacturing method of reflective mask blank, and manufacturing method of reflective mask |
| WO2023127799A1 (en) * | 2021-12-28 | 2023-07-06 | Ａｇｃ株式会社 | Reflective mask blank, reflective mask, reflective mask blank manufacturing method, and reflective mask manufacturing method |
| JP7367902B1 (en) | 2022-04-01 | 2023-10-24 | Ａｇｃ株式会社 | Reflective mask blank, reflective mask, reflective mask blank manufacturing method, and reflective mask manufacturing method |
| WO2024034439A1 (en) * | 2022-08-09 | 2024-02-15 | Ａｇｃ株式会社 | Reflective mask blank for euv lithography, method for manufacturing same, reflective mask for euv lithography, and method for manufacturing same |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5371162B2 (en) | 2000-10-13 | 2013-12-18 | 三星電子株式会社 | Reflective photomask |
| JP6377361B2 (en) | 2013-02-11 | 2018-08-22 | Hoya株式会社 | SUBSTRATE WITH MULTILAYER REFLECTIVE FILM AND METHOD FOR MANUFACTURING THE SAME, METHOD FOR PRODUCING REFLECTIVE MASK BLANK, METHOD FOR PRODUCING REFLECTIVE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
| KR102305361B1 (en) | 2013-07-22 | 2021-09-24 | 호야 가부시키가이샤 | Substrate with multilayered reflective film, reflective mask blank for euv lithography, reflective mask for euv lithography, process for producing same, and process for producing semiconductor device |
| KR102239726B1 (en) | 2013-09-11 | 2021-04-12 | 호야 가부시키가이샤 | Substrate with multilayer reflective film, reflective mask blank for euv lithography, reflective mask for euv lithography, method for producing reflective mask for euv lithography, and method for manufacturing semiconductor device |
-
2020
- 2020-09-16 JP JP2020155903A patent/JP2021056502A/en active Pending
- 2020-09-24 SG SG10202009397WA patent/SG10202009397WA/en unknown
- 2020-09-28 KR KR1020200125586A patent/KR20210038360A/en active Search and Examination
- 2020-09-29 TW TW109133780A patent/TW202127136A/en unknown
- 2020-09-30 CN CN202011059191.0A patent/CN112666788A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JP2021056502A (en) | 2021-04-08 |
| KR20210038360A (en) | 2021-04-07 |
| TW202127136A (en) | 2021-07-16 |
| CN112666788A (en) | 2021-04-16 |
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