PL2881498T3 - Sposób hodowli kryształu węgliku krzemu - Google Patents
Sposób hodowli kryształu węgliku krzemuInfo
- Publication number
- PL2881498T3 PL2881498T3 PL14195245T PL14195245T PL2881498T3 PL 2881498 T3 PL2881498 T3 PL 2881498T3 PL 14195245 T PL14195245 T PL 14195245T PL 14195245 T PL14195245 T PL 14195245T PL 2881498 T3 PL2881498 T3 PL 2881498T3
- Authority
- PL
- Poland
- Prior art keywords
- silicon carbide
- carbide crystal
- growing silicon
- growing
- crystal
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/02—Zone-melting with a solvent, e.g. travelling solvent process
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B17/00—Single-crystal growth onto a seed which remains in the melt during growth, e.g. Nacken-Kyropoulos method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
- C30B11/08—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/14—Crucibles or vessels
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/206—Controlling or regulating the thermal history of growing the ingot
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
- C30B19/02—Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux
- C30B19/04—Liquid-phase epitaxial-layer growth using molten solvents, e.g. flux the solvent being a component of the crystal composition
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B9/00—Single-crystal growth from melt solutions using molten solvents
- C30B9/04—Single-crystal growth from melt solutions using molten solvents by cooling of the solution
- C30B9/08—Single-crystal growth from melt solutions using molten solvents by cooling of the solution using other solvents
- C30B9/10—Metal solvents
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013253541A JP6178227B2 (ja) | 2013-12-06 | 2013-12-06 | 炭化珪素の結晶成長方法 |
JP2013253426A JP6129065B2 (ja) | 2013-12-06 | 2013-12-06 | 炭化珪素の結晶成長方法 |
JP2013253502A JP6180910B2 (ja) | 2013-12-06 | 2013-12-06 | 炭化珪素の結晶成長方法 |
JP2013253540A JP6181534B2 (ja) | 2013-12-06 | 2013-12-06 | 炭化珪素の結晶成長方法 |
JP2013253411A JP6129064B2 (ja) | 2013-12-06 | 2013-12-06 | 炭化珪素の結晶成長方法 |
JP2013253490A JP6177676B2 (ja) | 2013-12-06 | 2013-12-06 | 炭化珪素の結晶成長方法 |
EP14195245.7A EP2881498B1 (en) | 2013-12-06 | 2014-11-27 | Method for growing silicon carbide crystal |
Publications (1)
Publication Number | Publication Date |
---|---|
PL2881498T3 true PL2881498T3 (pl) | 2020-06-15 |
Family
ID=52101015
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL14195245T PL2881498T3 (pl) | 2013-12-06 | 2014-11-27 | Sposób hodowli kryształu węgliku krzemu |
PL14195250T PL2881499T3 (pl) | 2013-12-06 | 2014-11-27 | Sposób hodowli kryształu węgliku krzemu |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PL14195250T PL2881499T3 (pl) | 2013-12-06 | 2014-11-27 | Sposób hodowli kryształu węgliku krzemu |
Country Status (6)
Country | Link |
---|---|
US (2) | US9951439B2 (pl) |
EP (2) | EP2881499B1 (pl) |
KR (2) | KR102302521B1 (pl) |
CN (2) | CN104695007B (pl) |
PL (2) | PL2881498T3 (pl) |
TW (2) | TWI657170B (pl) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
PL2881498T3 (pl) | 2013-12-06 | 2020-06-15 | Shin-Etsu Chemical Co., Ltd. | Sposób hodowli kryształu węgliku krzemu |
KR101983491B1 (ko) * | 2015-03-18 | 2019-05-28 | 도요타지도샤가부시키가이샤 | SiC 단결정의 제조 방법 |
JP6533716B2 (ja) | 2015-08-06 | 2019-06-19 | 信越化学工業株式会社 | SiC単結晶の製造方法 |
JP2017031034A (ja) * | 2015-08-06 | 2017-02-09 | 信越化学工業株式会社 | SiC単結晶の製造方法 |
EP3285280B1 (en) | 2015-10-26 | 2022-10-05 | LG Chem, Ltd. | Silicon-based molten composition and method for manufacturing sic single crystals using same |
US10662547B2 (en) | 2015-10-26 | 2020-05-26 | Lg Chem, Ltd. | Silicon-based molten composition and manufacturing method of SiC single crystal using the same |
CN106119951B (zh) * | 2016-08-23 | 2019-04-12 | 昆明理工大学 | 低温高速生长SiC单晶的助熔剂 |
US11427926B2 (en) | 2016-09-29 | 2022-08-30 | Lg Chem, Ltd. | Silicon-based molten composition and method for manufacturing silicon carbide single crystal using the same |
CN108166058A (zh) * | 2016-12-07 | 2018-06-15 | 上海新昇半导体科技有限公司 | 4H-SiC晶体生长方法 |
CN110462112B (zh) * | 2017-03-28 | 2022-03-22 | 三菱电机株式会社 | 碳化硅基板、碳化硅基板的制造方法及碳化硅半导体装置的制造方法 |
JP6784220B2 (ja) | 2017-04-14 | 2020-11-11 | 信越化学工業株式会社 | SiC単結晶の製造方法 |
WO2019088740A2 (ko) * | 2017-11-03 | 2019-05-09 | 주식회사 엘지화학 | 실리콘계 용융 조성물 및 이를 이용하는 실리콘카바이드 단결정의 제조 방법 |
KR102158624B1 (ko) * | 2017-11-03 | 2020-09-22 | 주식회사 엘지화학 | 실리콘계 용융 조성물 및 이를 이용하는 실리콘카바이드 단결정의 제조 방법 |
KR102302753B1 (ko) | 2018-05-25 | 2021-09-14 | 주식회사 엘지화학 | 실리콘계 용융 조성물 및 이를 이용하는 실리콘카바이드 단결정의 제조 방법 |
JP7024622B2 (ja) * | 2018-06-19 | 2022-02-24 | 株式会社デンソー | 炭化珪素単結晶およびその製造方法 |
CN109097833A (zh) * | 2018-11-12 | 2018-12-28 | 孟静 | 大尺寸碳化硅单晶板的制备装置 |
CN109112615A (zh) * | 2018-11-12 | 2019-01-01 | 孟静 | 大尺寸碳化硅单晶板的制备方法 |
WO2020179796A1 (ja) * | 2019-03-05 | 2020-09-10 | 学校法人関西学院 | SiCエピタキシャル基板の製造方法及びその製造装置 |
EP4018019B1 (de) * | 2020-07-21 | 2022-12-21 | Wacker Chemie AG | Verfahren zur bestimmung von spurenmetallen in silicium |
CN113322510B (zh) * | 2021-05-27 | 2023-05-16 | 天津理工大学 | SiC单晶生长装置及液相外延SiC单晶生长方法 |
EP4130347A1 (en) * | 2021-08-05 | 2023-02-08 | Shin-Etsu Chemical Co., Ltd. | Method for producing sic single crystal |
CN114292129B (zh) * | 2021-12-13 | 2023-03-14 | 天津理工大学 | 利用溶液法在石墨件表面沉积碳化硅涂层的方法 |
CN114481317A (zh) * | 2022-01-27 | 2022-05-13 | 北京青禾晶元半导体科技有限责任公司 | 一种制造碳化硅晶体的装置及制造碳化硅晶体的方法 |
CN114481325A (zh) * | 2022-01-29 | 2022-05-13 | 北京青禾晶元半导体科技有限责任公司 | 一种碳化硅多晶的制造装置及方法 |
CN114318541A (zh) * | 2022-03-07 | 2022-04-12 | 常州臻晶半导体有限公司 | 一种碳化硅晶体生长用输送装置 |
CN114717651B (zh) * | 2022-05-18 | 2023-10-10 | 北京青禾晶元半导体科技有限责任公司 | 一种碳化硅复合基板的制造方法及制造装置 |
CN116516483B (zh) * | 2023-04-28 | 2024-02-27 | 通威微电子有限公司 | 一种液相法生长碳化硅晶体的装置及长晶炉 |
CN116516486B (zh) * | 2023-07-03 | 2023-09-19 | 北京青禾晶元半导体科技有限责任公司 | 一种碳化硅晶体生长中抑制表面台阶粗化的方法 |
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JP5839117B2 (ja) | 2012-04-20 | 2016-01-06 | トヨタ自動車株式会社 | SiC単結晶及びその製造方法 |
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JP6181534B2 (ja) | 2013-12-06 | 2017-08-16 | 信越化学工業株式会社 | 炭化珪素の結晶成長方法 |
PL2881498T3 (pl) | 2013-12-06 | 2020-06-15 | Shin-Etsu Chemical Co., Ltd. | Sposób hodowli kryształu węgliku krzemu |
-
2014
- 2014-11-27 PL PL14195245T patent/PL2881498T3/pl unknown
- 2014-11-27 PL PL14195250T patent/PL2881499T3/pl unknown
- 2014-11-27 EP EP14195250.7A patent/EP2881499B1/en active Active
- 2014-11-27 EP EP14195245.7A patent/EP2881498B1/en active Active
- 2014-12-03 KR KR1020140171881A patent/KR102302521B1/ko active IP Right Grant
- 2014-12-03 US US14/559,362 patent/US9951439B2/en active Active
- 2014-12-03 US US14/559,299 patent/US9945047B2/en active Active
- 2014-12-03 KR KR1020140171882A patent/KR102313257B1/ko active IP Right Grant
- 2014-12-04 TW TW103142174A patent/TWI657170B/zh active
- 2014-12-04 TW TW103142175A patent/TWI654345B/zh active
- 2014-12-05 CN CN201410741299.6A patent/CN104695007B/zh active Active
- 2014-12-05 CN CN201410737734.8A patent/CN104695019B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
EP2881499B1 (en) | 2020-03-11 |
US9945047B2 (en) | 2018-04-17 |
EP2881499A1 (en) | 2015-06-10 |
EP2881498B1 (en) | 2020-03-11 |
KR20150066459A (ko) | 2015-06-16 |
US20150159297A1 (en) | 2015-06-11 |
KR102302521B1 (ko) | 2021-09-14 |
TWI654345B (zh) | 2019-03-21 |
PL2881499T3 (pl) | 2020-06-29 |
CN104695019A (zh) | 2015-06-10 |
TW201529913A (zh) | 2015-08-01 |
TW201527611A (zh) | 2015-07-16 |
EP2881498A1 (en) | 2015-06-10 |
TWI657170B (zh) | 2019-04-21 |
CN104695007B (zh) | 2018-12-21 |
KR102313257B1 (ko) | 2021-10-14 |
US20150159299A1 (en) | 2015-06-11 |
CN104695019B (zh) | 2018-12-21 |
KR20150066458A (ko) | 2015-06-16 |
CN104695007A (zh) | 2015-06-10 |
US9951439B2 (en) | 2018-04-24 |
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