NO20084616L - Fremgangsmate for a rense silikon - Google Patents
Fremgangsmate for a rense silikonInfo
- Publication number
- NO20084616L NO20084616L NO20084616A NO20084616A NO20084616L NO 20084616 L NO20084616 L NO 20084616L NO 20084616 A NO20084616 A NO 20084616A NO 20084616 A NO20084616 A NO 20084616A NO 20084616 L NO20084616 L NO 20084616L
- Authority
- NO
- Norway
- Prior art keywords
- silicon
- procedure
- purified
- cleaning silicone
- processes
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/037—Purification
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B9/00—Single-crystal growth from melt solutions using molten solvents
- C30B9/04—Single-crystal growth from melt solutions using molten solvents by cooling of the solution
- C30B9/08—Single-crystal growth from melt solutions using molten solvents by cooling of the solution using other solvents
- C30B9/10—Metal solvents
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US78870806P | 2006-04-04 | 2006-04-04 | |
PCT/CA2007/000574 WO2007112592A1 (fr) | 2006-04-04 | 2007-04-04 | Procédé de purification de silicium |
Publications (1)
Publication Number | Publication Date |
---|---|
NO20084616L true NO20084616L (no) | 2008-12-22 |
Family
ID=38563061
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NO20084616A NO20084616L (no) | 2006-04-04 | 2008-10-31 | Fremgangsmate for a rense silikon |
Country Status (13)
Country | Link |
---|---|
US (5) | US7727503B2 (fr) |
EP (2) | EP2024285B1 (fr) |
JP (1) | JP5374673B2 (fr) |
KR (1) | KR101061530B1 (fr) |
CN (2) | CN101460399B (fr) |
AU (1) | AU2007234343B2 (fr) |
BR (1) | BRPI0710313A2 (fr) |
CA (1) | CA2648288A1 (fr) |
ES (1) | ES2497990T3 (fr) |
NO (1) | NO20084616L (fr) |
RU (1) | RU2445258C2 (fr) |
TW (1) | TWI429794B (fr) |
WO (1) | WO2007112592A1 (fr) |
Families Citing this family (54)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2648288A1 (fr) | 2006-04-04 | 2007-10-11 | 6N Silicon Inc. | Procede de purification de silicium |
CA2680515A1 (fr) | 2007-03-13 | 2008-09-18 | 6N Silicon Inc. | Procede de purification de silicium |
CA2694806A1 (fr) | 2007-07-23 | 2009-01-29 | 6N Silicon Inc. | Utilisation d'un lavage acide pour fournir des cristaux de silicium purifie |
US7959730B2 (en) * | 2007-10-03 | 2011-06-14 | 6N Silicon Inc. | Method for processing silicon powder to obtain silicon crystals |
JP4788925B2 (ja) * | 2007-11-07 | 2011-10-05 | 信越化学工業株式会社 | 金属珪素の精製方法 |
TW201012978A (en) * | 2008-08-27 | 2010-04-01 | Bp Corp North America Inc | Apparatus and method of use for a casting system with independent melting and solidification |
WO2010080777A1 (fr) * | 2009-01-08 | 2010-07-15 | Bp Corporation North America Inc. | Procédé de réduction des impuretés pour du silicium et pour un matériau à base de silicium purifié |
US8501139B2 (en) | 2009-02-26 | 2013-08-06 | Uri Cohen | Floating Si and/or Ge foils |
US8603242B2 (en) | 2009-02-26 | 2013-12-10 | Uri Cohen | Floating semiconductor foils |
NO329987B1 (no) | 2009-02-26 | 2011-01-31 | Harsharn Tathgar | Halvkontinuerlig fremgangsmate for dannelse, separasjon og smelting av store, rene silisiumkrystaller |
US20100239484A1 (en) * | 2009-03-19 | 2010-09-23 | Jiawei Solar (Wuhan) Co., Ltd. | Method for Refining Solar Grade (SoG) Silicon by Using Physical Metallurgy |
CN101863476B (zh) * | 2009-04-17 | 2012-05-30 | 南安市三晶阳光电力有限公司 | 一种去除硅中硼元素的方法 |
US8562932B2 (en) * | 2009-08-21 | 2013-10-22 | Silicor Materials Inc. | Method of purifying silicon utilizing cascading process |
KR101151272B1 (ko) * | 2009-09-09 | 2012-06-14 | 박현진 | 고순도 다결정 실리콘 제조장치 |
CN101837348B (zh) * | 2010-04-28 | 2013-01-09 | 江西赛维Ldk太阳能多晶硅有限公司 | 一种将硅与杂质进行分离的方法 |
EP2572010A2 (fr) | 2010-05-20 | 2013-03-27 | Dow Corning Corporation | Procédé et système d'obtention d'alliage d'aluminium-silicium |
TWI403461B (zh) * | 2010-07-21 | 2013-08-01 | Masahiro Hoshino | Method and apparatus for improving yield and yield of metallurgical silicon |
LT5856B (lt) * | 2010-10-14 | 2012-08-27 | Uab "Naujausiå² Technologijå² Centras" | Silicio valymo būdas |
CN102001664B (zh) * | 2010-12-24 | 2012-09-05 | 上海普罗新能源有限公司 | 双室双联真空循环脱气炉及太阳能级多晶硅的制备 |
DE102011002598B4 (de) * | 2011-01-12 | 2016-10-06 | Solarworld Innovations Gmbh | Verfahren zur Herstellung eines Silizium-Ingots |
CN102139879B (zh) * | 2011-02-18 | 2012-12-12 | 厦门大学 | 一种利用硅锡合金提纯多晶硅的方法 |
CN102351188B (zh) * | 2011-07-07 | 2012-10-03 | 陈评 | 针状高纯硅聚集体的制备方法及其设备 |
WO2013078220A1 (fr) | 2011-11-22 | 2013-05-30 | Dow Corning Corporation | Procédé de production de silicium pour applications solaires à partir de dioxyde de silicium |
TWI539039B (zh) * | 2012-01-26 | 2016-06-21 | 希利柯爾材料股份有限公司 | 矽的純化方法 |
TWI627131B (zh) | 2012-02-01 | 2018-06-21 | 美商希利柯爾材料股份有限公司 | 矽純化之模具及方法 |
CN102745695A (zh) * | 2012-06-08 | 2012-10-24 | 兰州理工大学 | 用于从高硅铝合金提取硅的装置及其提取方法 |
CN104583123B (zh) * | 2012-06-25 | 2017-07-25 | 希利柯尔材料股份有限公司 | 纯化硅的方法 |
WO2014004463A1 (fr) | 2012-06-25 | 2014-01-03 | Silicor Materials Inc. | Procédé de purification de silicium |
BR112014032599A2 (pt) * | 2012-06-25 | 2017-06-27 | Silicor Mat Inc | método para purificar alumínio e uso de alumínio purificado para purificar silício. |
TWI488818B (zh) * | 2012-06-25 | 2015-06-21 | Silicor Materials Inc | 坩堝及使用其於矽之純化之方法 |
CN104583464A (zh) * | 2012-06-25 | 2015-04-29 | 希利柯尔材料股份有限公司 | 用于纯化硅的耐火坩埚的表面的衬里以及使用该坩埚进行熔化和进一步定向凝固以纯化硅熔融体的方法 |
JP5863977B2 (ja) * | 2012-09-04 | 2016-02-17 | 新日鐵住金株式会社 | SiC単結晶の製造装置及び製造方法 |
US10266951B2 (en) | 2012-11-28 | 2019-04-23 | Trustees Of Boston University | Method and apparatus for producing solar grade silicon using a SOM electrolysis process |
KR101544088B1 (ko) * | 2013-11-12 | 2015-08-12 | 한국기술교육대학교 산학협력단 | 알루미늄-실리콘 합금으로부터 원심분리를 이용하여 고순도 실리콘을 제조하는 방법 및 실리콘 폼 |
CN103833038A (zh) * | 2014-03-08 | 2014-06-04 | 中国科学院等离子体物理研究所 | 一种从硅合金熔体中半连续结晶提纯硅的方法 |
CN104195636A (zh) * | 2014-09-01 | 2014-12-10 | 大连理工大学 | 一种冶金法快速制备硼母合金的方法 |
CN104556044A (zh) * | 2014-12-10 | 2015-04-29 | 中国科学院等离子体物理研究所 | 一种对Al-Si合金通气处理快速去除硅中硼的方法 |
CN104556043A (zh) * | 2014-12-10 | 2015-04-29 | 中国科学院等离子体物理研究所 | 一种对Al-Si合金通气处理快速去除硅中磷的方法 |
CN104556048B (zh) * | 2014-12-25 | 2016-12-07 | 大连理工大学 | 一种在多晶硅定向凝固提纯中分离高金属杂质区的设备及分离方法 |
CN104817089B (zh) * | 2015-04-21 | 2016-10-19 | 辽宁科技学院 | 一种回收单/多晶硅切割废料浆中金属硅与碳化硅的方法 |
US9783426B2 (en) * | 2015-10-09 | 2017-10-10 | Milwaukee Silicon Llc | Purified silicon, devices and systems for producing same |
HUP1500509A1 (hu) * | 2015-10-29 | 2017-05-29 | Bay Zoltan Alkalmazott Kutatasi Koezhasznu Nonprofit Kft Mernoeki Divizio | Eljárás szilícium kristályok dúsítására és elválasztására fémolvadékból szilícium tisztítására |
CN105967188A (zh) * | 2016-04-18 | 2016-09-28 | 杭州诺麦科科技有限公司 | 一种制备纯硅粉的催化剂及纯硅粉的制备工艺 |
TWI619855B (zh) * | 2016-12-21 | 2018-04-01 | Sun Wen Bin | 分凝提純高純矽之方法 |
JP6919633B2 (ja) * | 2018-08-29 | 2021-08-18 | 信越半導体株式会社 | 単結晶育成方法 |
CN109137069A (zh) * | 2018-09-10 | 2019-01-04 | 孟静 | 太阳能电池用大尺寸硅锭的制备装置 |
CN109850904B (zh) * | 2018-12-28 | 2022-05-17 | 宁夏大学 | 利用半固态法提高合金法提纯多晶硅收率的方法 |
CN110965120A (zh) * | 2019-12-17 | 2020-04-07 | 昆明理工大学 | 一种过共晶铝硅合金中初生硅的分离方法 |
CN115397773A (zh) * | 2020-04-02 | 2022-11-25 | 博斯凯矽剂科技株式会社 | 复合材料 |
CN112110450A (zh) * | 2020-09-24 | 2020-12-22 | 重庆大学 | 一种冶金级硅中杂质硼去除的方法 |
CN112624122B (zh) * | 2021-01-12 | 2022-06-14 | 昆明理工大学 | 一种真空微波精炼工业硅制备6n多晶硅的方法及装置 |
CN112853483A (zh) * | 2021-04-21 | 2021-05-28 | 赛维Ldk太阳能高科技(新余)有限公司 | 掺镓晶体硅锅底料的回收方法、掺镓晶体硅 |
KR102483131B1 (ko) * | 2022-06-29 | 2022-12-29 | 권만수 | 실란화합물 처리시스템 및 처리방법 |
CN115432705A (zh) * | 2022-09-15 | 2022-12-06 | 昆明理工大学 | 溶剂添加与定向凝固相结合去除工业硅中杂质p的方法 |
Family Cites Families (94)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL219242A (fr) * | 1956-09-28 | 1900-01-01 | ||
US3086886A (en) * | 1958-06-04 | 1963-04-23 | Schwarzkopf Dev Co | Process of providing oxidizable refractory-metal bodies with a corrosion-resistant surface coating |
US4042293A (en) * | 1975-01-03 | 1977-08-16 | Rca Corporation | Liquid crystal devices having diode characteristics |
JPS5857897B2 (ja) * | 1975-11-08 | 1983-12-22 | 松下電器産業株式会社 | コタイデンカイコンデンサ |
DE2623413C2 (de) * | 1976-05-25 | 1985-01-10 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum Herstellen von für Halbleiterbauelemente verwendbarem Silicium |
US4094731A (en) * | 1976-06-21 | 1978-06-13 | Interlake, Inc. | Method of purifying silicon |
US4195067A (en) * | 1977-11-21 | 1980-03-25 | Union Carbide Corporation | Process for the production of refined metallurgical silicon |
US4193974A (en) * | 1977-11-21 | 1980-03-18 | Union Carbide Corporation | Process for producing refined metallurgical silicon ribbon |
US4193975A (en) * | 1977-11-21 | 1980-03-18 | Union Carbide Corporation | Process for the production of improved refined metallurgical silicon |
US4200621A (en) * | 1978-07-18 | 1980-04-29 | Motorola, Inc. | Sequential purification and crystal growth |
US4256717A (en) * | 1979-05-24 | 1981-03-17 | Aluminum Company Of America | Silicon purification method |
US4312848A (en) * | 1979-05-24 | 1982-01-26 | Aluminum Company Of America | Boron removal in silicon purification |
US4312846A (en) | 1979-05-24 | 1982-01-26 | Aluminum Company Of America | Method of silicon purification |
US4312847A (en) | 1979-05-24 | 1982-01-26 | Aluminum Company Of America | Silicon purification system |
US4223308A (en) * | 1979-07-25 | 1980-09-16 | Northern Telecom Limited | LCDs (Liquid crystal displays) controlled by thin film diode switches |
US4251136A (en) * | 1979-07-25 | 1981-02-17 | Northern Telecom Limited | LCDs (Liquid crystal displays) controlled by thin film diode switches |
DE2945070A1 (de) * | 1979-11-08 | 1981-06-04 | Heliotronic Forschungs- und Entwicklungsgesellschaft für Solarzellen-Grundstoffe mbH, 8263 Burghausen | Semikontinuierliches verfahren zur herstellung von reinem silicium |
US4312849A (en) * | 1980-09-09 | 1982-01-26 | Aluminum Company Of America | Phosphorous removal in silicon purification |
US4354987A (en) * | 1981-03-31 | 1982-10-19 | Union Carbide Corporation | Consolidation of high purity silicon powder |
US4822585A (en) * | 1982-05-05 | 1989-04-18 | Aluminum Company Of America | Silicon purification method using copper or copper-aluminum solvent metal |
DE3317286A1 (de) * | 1983-05-11 | 1984-11-22 | Heliotronic Forschungs- und Entwicklungsgesellschaft für Solarzellen-Grundstoffe mbH, 8263 Burghausen | Verfahren zur reinigung von silicium durch saeureeinwirkung |
JPS60103015A (ja) * | 1983-11-10 | 1985-06-07 | Nippon Steel Corp | 珪素の製造方法 |
NL8500154A (nl) * | 1985-01-22 | 1986-08-18 | Koninkl Philips Electronics Nv | Zelf-oscillerende voedingsschakeling. |
US4612179A (en) * | 1985-03-13 | 1986-09-16 | Sri International | Process for purification of solid silicon |
US4676968A (en) * | 1985-07-24 | 1987-06-30 | Enichem, S.P.A. | Melt consolidation of silicon powder |
US4905321A (en) * | 1986-05-22 | 1990-03-06 | Allen R. Walunga | Combined workout glove and wrist wrap |
JPS63249323A (ja) * | 1987-04-06 | 1988-10-17 | 松下電器産業株式会社 | 固体電解コンデンサ |
DE3727646A1 (de) * | 1987-08-19 | 1989-03-02 | Bayer Ag | Verfahren zur kontinuierlichen raffination von silicium |
NL8702490A (nl) * | 1987-10-19 | 1989-05-16 | Philips Nv | Weergeefinrichting met laterale schottky-dioden. |
JP2605382B2 (ja) * | 1987-12-18 | 1997-04-30 | セイコーエプソン株式会社 | アクティブマトリクス基板の製造方法 |
US5117298A (en) * | 1988-09-20 | 1992-05-26 | Nec Corporation | Active matrix liquid crystal display with reduced flickers |
US5122889A (en) * | 1988-12-22 | 1992-06-16 | Nec Corporation | Active matrix liquid crystal display using mim diodes having symmetrical voltage-current characteristics as switching elements |
EP0418833A3 (en) * | 1989-09-20 | 1993-03-17 | Hitachi, Ltd. | Organic thin film and liquid crystal display devices with the same |
JP3205352B2 (ja) * | 1990-05-30 | 2001-09-04 | 川崎製鉄株式会社 | シリコン精製方法及び装置 |
US5189136A (en) * | 1990-12-12 | 1993-02-23 | The Regents Of The University Of California | Conducting polymer formed of poly(2-methoxy,5-(2'-ethyl-hexyloxy)-p-phenylenevinylene) |
US5431869A (en) * | 1993-01-12 | 1995-07-11 | Council Of Scientific & Industrial Research | Process for the preparation of polycrystalline silicon ingot |
GB9313841D0 (en) * | 1993-07-05 | 1993-08-18 | Philips Electronics Uk Ltd | An electro-optic device |
JP2580980B2 (ja) * | 1993-10-20 | 1997-02-12 | 日本電気株式会社 | タンタル固体電解コンデンサ及びその製造方法 |
JP3493844B2 (ja) * | 1994-11-15 | 2004-02-03 | 住友電気工業株式会社 | 半導体基板材料とその製造方法及び該基板を用いた半導体装置 |
US5678807A (en) * | 1995-06-13 | 1997-10-21 | Cooper; Paul V. | Rotary degasser |
WO1998016466A1 (fr) * | 1996-10-14 | 1998-04-23 | Kawasaki Steel Corporation | Procede et appareil de preparation de silicium polycristallin et procede de preparation d'un substrat en silicium pour cellule solaire |
US6013872A (en) * | 1997-04-25 | 2000-01-11 | Bayer Ag | Directionally solidified, multicrystalline silicon, a process for the production thereof and its use, and solar cells containing this silicon and a process for the production thereof |
US6177921B1 (en) * | 1997-08-28 | 2001-01-23 | E Ink Corporation | Printable electrode structures for displays |
EP0917208A1 (fr) * | 1997-11-11 | 1999-05-19 | Universiteit van Utrecht | Dispositif optoélectronique formé d'un polymère avec des nanocristals et méthode de fabrication |
US6087196A (en) * | 1998-01-30 | 2000-07-11 | The Trustees Of Princeton University | Fabrication of organic semiconductor devices using ink jet printing |
KR20010040487A (ko) * | 1998-02-02 | 2001-05-15 | 유니액스 코포레이션 | X-y 번지지정 가능한 전기 마이크로스위치 어레이 및이를 사용한 센서 매트릭스 |
AU2492399A (en) * | 1998-02-02 | 1999-08-16 | Uniax Corporation | Image sensors made from organic semiconductors |
US6008872A (en) * | 1998-03-13 | 1999-12-28 | Ois Optical Imaging Systems, Inc. | High aperture liquid crystal display including thin film diodes, and method of making same |
CN1237496C (zh) * | 1998-07-24 | 2006-01-18 | 精工爱普生株式会社 | 显示装置 |
RU2146650C1 (ru) * | 1998-09-21 | 2000-03-20 | Еремин Валерий Петрович | Способ рафинирования кремния и его сплавов |
US6506438B2 (en) * | 1998-12-15 | 2003-01-14 | E Ink Corporation | Method for printing of transistor arrays on plastic substrates |
US6380922B1 (en) * | 1999-04-16 | 2002-04-30 | The Gillette Company | Electronic display |
NO314525B1 (no) * | 1999-04-22 | 2003-03-31 | Thin Film Electronics Asa | Fremgangsmåte ved fremstillingen av organiske halvledende innretninger i tynnfilm |
US7030412B1 (en) * | 1999-05-05 | 2006-04-18 | E Ink Corporation | Minimally-patterned semiconductor devices for display applications |
TW556357B (en) * | 1999-06-28 | 2003-10-01 | Semiconductor Energy Lab | Method of manufacturing an electro-optical device |
EP1198852B1 (fr) * | 1999-07-21 | 2009-12-02 | E Ink Corporation | Procedes preferes de production d'elements de circuits electriques utilises pour commander un affichage electronique |
US6582504B1 (en) * | 1999-11-24 | 2003-06-24 | Sharp Kabushiki Kaisha | Coating liquid for forming organic EL element |
US6372154B1 (en) * | 1999-12-30 | 2002-04-16 | Canon Kabushiki Kaisha | Luminescent ink for printing of organic luminescent devices |
US6891237B1 (en) * | 2000-06-27 | 2005-05-10 | Lucent Technologies Inc. | Organic semiconductor device having an active dielectric layer comprising silsesquioxanes |
US6632413B2 (en) * | 2000-08-21 | 2003-10-14 | Astropower, Inc. | Method for purifying silicon |
JP4304852B2 (ja) * | 2000-09-04 | 2009-07-29 | コニカミノルタホールディングス株式会社 | 非平面液晶表示素子及びその製造方法 |
US6491971B2 (en) * | 2000-11-15 | 2002-12-10 | G.T. Equipment Technologies, Inc | Release coating system for crucibles |
KR100388272B1 (ko) * | 2000-12-26 | 2003-06-19 | 삼성에스디아이 주식회사 | 티알에스 소자 |
US20020127821A1 (en) * | 2000-12-28 | 2002-09-12 | Kazuyuki Ohya | Process for the production of thinned wafer |
US6585797B2 (en) * | 2001-01-25 | 2003-07-01 | Alcoa Inc. | Recirculating molten metal supply system and method |
JP2002303879A (ja) * | 2001-04-03 | 2002-10-18 | Nec Corp | アクティブマトリクス基板及びその製造方法 |
US6623903B2 (en) * | 2001-06-22 | 2003-09-23 | Agfa-Gevaert | Material and method for making an electroconductive pattern |
FR2827592B1 (fr) * | 2001-07-23 | 2003-08-22 | Invensil | Silicium metallurgique de haute purete et procede d'elaboration |
WO2003066523A1 (fr) * | 2002-02-04 | 2003-08-14 | Sharp Kabushiki Kaisha | Procede de purification du silicium, scories pour purifier le silicium et silicium purifie |
JP2003238139A (ja) * | 2002-02-20 | 2003-08-27 | Sharp Corp | シリコンの精製方法およびその精製装置 |
WO2004051750A1 (fr) * | 2002-11-29 | 2004-06-17 | Siemens Aktiengesellschaft | Matrice a diodes servant a commander des unites d'affichage et comprenant des diodes organiques, et procede de production correspondant |
EP1584114A1 (fr) * | 2003-01-17 | 2005-10-12 | Diode Solutions, Inc. | Afficheur utilisant une matiere organique |
KR100961960B1 (ko) * | 2003-11-18 | 2010-06-08 | 삼성전자주식회사 | 액정 표시 장치, 박막 다이오드 표시판 및 그 제조 방법 |
NO333319B1 (no) * | 2003-12-29 | 2013-05-06 | Elkem As | Silisiummateriale for fremstilling av solceller |
US7582707B2 (en) * | 2004-01-12 | 2009-09-01 | Air Products And Chemicals, Inc. | Aqueous blends and films comprising a first electrically conducting conjugated polymer and a second electrically conducting conjugated polymer |
US8147962B2 (en) * | 2004-04-13 | 2012-04-03 | E. I. Du Pont De Nemours And Company | Conductive polymer composites |
US7354532B2 (en) * | 2004-04-13 | 2008-04-08 | E.I. Du Pont De Nemours And Company | Compositions of electrically conductive polymers and non-polymeric fluorinated organic acids |
JP4024232B2 (ja) * | 2004-07-13 | 2007-12-19 | シャープ株式会社 | シリコンの精製方法 |
EP1624333B1 (fr) * | 2004-08-03 | 2017-05-03 | Semiconductor Energy Laboratory Co., Ltd. | Dispositif d'affichage, procédé de fabrication de cela et téléviseur |
US20060051670A1 (en) * | 2004-09-03 | 2006-03-09 | Shin-Etsu Chemical Co., Ltd. | Non-aqueous electrolyte secondary cell negative electrode material and metallic silicon power therefor |
JP2006091059A (ja) * | 2004-09-21 | 2006-04-06 | Seiko Epson Corp | 電気光学装置、電気光学装置の製造方法、及び電子機器 |
US7569158B2 (en) * | 2004-10-13 | 2009-08-04 | Air Products And Chemicals, Inc. | Aqueous dispersions of polythienothiophenes with fluorinated ion exchange polymers as dopants |
US20060091397A1 (en) * | 2004-11-04 | 2006-05-04 | Kengo Akimoto | Display device and method for manufacturing the same |
US7161797B2 (en) * | 2005-05-17 | 2007-01-09 | Vishay Sprague, Inc. | Surface mount capacitor and method of making same |
JP4689373B2 (ja) * | 2005-07-04 | 2011-05-25 | シャープ株式会社 | シリコンの再利用方法 |
CA2648288A1 (fr) | 2006-04-04 | 2007-10-11 | 6N Silicon Inc. | Procede de purification de silicium |
CN101460398B (zh) * | 2006-04-13 | 2012-08-29 | 卡伯特公司 | 通过闭合环路方法生产硅 |
US7682585B2 (en) * | 2006-04-25 | 2010-03-23 | The Arizona Board Of Regents On Behalf Of The University Of Arizona | Silicon refining process |
US7491575B2 (en) * | 2006-08-02 | 2009-02-17 | Xerox Corporation | Fabricating zinc oxide semiconductor using hydrolysis |
EP2074060A4 (fr) * | 2006-09-14 | 2015-12-23 | Silicio Ferrosolar S L U | Procédé et dispositif de purification de matériau en silicium de basse qualité |
CN101622712B (zh) * | 2006-11-07 | 2011-06-15 | 希百特股份有限公司 | 双端开关装置及其制造方法 |
US7898042B2 (en) * | 2006-11-07 | 2011-03-01 | Cbrite Inc. | Two-terminal switching devices and their methods of fabrication |
CA2694806A1 (fr) * | 2007-07-23 | 2009-01-29 | 6N Silicon Inc. | Utilisation d'un lavage acide pour fournir des cristaux de silicium purifie |
US7959730B2 (en) * | 2007-10-03 | 2011-06-14 | 6N Silicon Inc. | Method for processing silicon powder to obtain silicon crystals |
-
2007
- 2007-04-04 CA CA002648288A patent/CA2648288A1/fr not_active Abandoned
- 2007-04-04 RU RU2008143439/05A patent/RU2445258C2/ru not_active IP Right Cessation
- 2007-04-04 WO PCT/CA2007/000574 patent/WO2007112592A1/fr active Application Filing
- 2007-04-04 EP EP07719504.8A patent/EP2024285B1/fr not_active Not-in-force
- 2007-04-04 BR BRPI0710313-1A patent/BRPI0710313A2/pt not_active Application Discontinuation
- 2007-04-04 TW TW096112048A patent/TWI429794B/zh active
- 2007-04-04 CN CN2007800195953A patent/CN101460399B/zh active Active
- 2007-04-04 EP EP14161874.4A patent/EP2749533B1/fr not_active Not-in-force
- 2007-04-04 JP JP2009503383A patent/JP5374673B2/ja active Active
- 2007-04-04 KR KR1020087026844A patent/KR101061530B1/ko active IP Right Grant
- 2007-04-04 CN CN201210016732.0A patent/CN103030148B/zh active Active
- 2007-04-04 ES ES07719504.8T patent/ES2497990T3/es active Active
- 2007-04-04 AU AU2007234343A patent/AU2007234343B2/en not_active Ceased
-
2008
- 2008-10-23 US US12/288,857 patent/US7727503B2/en not_active Expired - Fee Related
- 2008-10-31 NO NO20084616A patent/NO20084616L/no not_active Application Discontinuation
-
2010
- 2010-05-21 US US12/784,576 patent/US7883680B2/en not_active Expired - Fee Related
-
2011
- 2011-01-31 US US13/017,786 patent/US20110129405A1/en not_active Abandoned
-
2012
- 2012-06-25 US US13/532,083 patent/US20120255485A1/en not_active Abandoned
-
2014
- 2014-05-22 US US14/285,125 patent/US20140338587A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
AU2007234343A1 (en) | 2007-10-11 |
CN101460399B (zh) | 2012-03-14 |
RU2445258C2 (ru) | 2012-03-20 |
KR20080108151A (ko) | 2008-12-11 |
EP2024285B1 (fr) | 2014-06-11 |
CN103030148A (zh) | 2013-04-10 |
US20140338587A1 (en) | 2014-11-20 |
CN101460399A (zh) | 2009-06-17 |
US20120255485A1 (en) | 2012-10-11 |
RU2008143439A (ru) | 2010-05-10 |
WO2007112592A1 (fr) | 2007-10-11 |
EP2749533A1 (fr) | 2014-07-02 |
US20110129405A1 (en) | 2011-06-02 |
AU2007234343B2 (en) | 2011-10-06 |
TW200801262A (en) | 2008-01-01 |
EP2749533B1 (fr) | 2016-02-24 |
KR101061530B1 (ko) | 2011-09-01 |
JP5374673B2 (ja) | 2013-12-25 |
CN103030148B (zh) | 2015-02-25 |
BRPI0710313A2 (pt) | 2011-08-09 |
EP2024285A4 (fr) | 2012-03-28 |
JP2009532316A (ja) | 2009-09-10 |
TWI429794B (zh) | 2014-03-11 |
ES2497990T3 (es) | 2014-09-23 |
US7727503B2 (en) | 2010-06-01 |
US7883680B2 (en) | 2011-02-08 |
CA2648288A1 (fr) | 2007-10-11 |
US20090274607A1 (en) | 2009-11-05 |
US20100233064A1 (en) | 2010-09-16 |
EP2024285A1 (fr) | 2009-02-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
NO20084616L (no) | Fremgangsmate for a rense silikon | |
WO2007106690A3 (fr) | Analogues de nucléobase dégénérée | |
ITRM20040570A1 (it) | Procedimento e impianto di purificazione di triclorosilano e di tetracloruro di silicio. | |
DK2415864T3 (da) | Oligomerase-2-enzymer (eller beta-xylosidaseenzymer), nucleinsyrer, som koder for dem, og fremgangsmåder til at fremstille og anvende dem | |
EA200701742A1 (ru) | Способы получения сиропа | |
DK3121169T3 (da) | Fremgangsmåder til syntese og/eller oprensning af diaminophenothiaziniumforbindelser | |
NO20092053L (no) | HCV NS3-proteaseinhibitorer | |
DE502005004912D1 (de) | Reinigung von ionischen flüssigkeiten | |
EP1877161A4 (fr) | Capteurs permettant d'eliminer des gaz acides de flux de fluide | |
IN2012DN00338A (fr) | ||
WO2007022459A3 (fr) | Procedes et intermediaires | |
DE602006020327D1 (de) | 2-phenoxy-n-(1,3,4-thiadizol-2-yl)pyridin-3-aminder-hemmer zur behandlung thromboembolischer erkrankungen | |
NO20081086L (no) | Makrosykliske peptider som HCV NS3-proteaseinhibitorer | |
NO20064355L (no) | Nye ketoamider med sykliske P4-er som inhibitorer for NS3-serinprotease fra hepatitt C-virus | |
TW201129659A (en) | Composition and method for polishing bulk silicon | |
DK1850662T3 (da) | Fremgangsmåde til forbedring af nematodetolerant eller- resistent plantevækst | |
DE602005006254D1 (de) | Verfahren zur reinigung eines schmelzflüssigen metalls | |
NO20064034L (no) | Makrolider og fremgangsmater for a fremstille disse | |
WO2006136678A3 (fr) | Utilisation d'une composition organopolysiloxanique vulcanisable des la temperature ambiante pour former un elastomere auto adherent | |
EP1892323A4 (fr) | Procede de croissance de monocristal de silicium, galette de silicium et substrat utilisant une telle galette de silicium | |
WO2009033900A3 (fr) | Procédé de purification de silicium polycristallin | |
NO20074215L (no) | Fremgangsmate for reduksjon og/eller rensing av metallholdig slagg | |
BRPI0622083A2 (pt) | Método e aparelho destinados à fabricação de substratos purificados ou substratos puros que são adicionalmente processados. | |
WO2008021346A3 (fr) | Palipéridone pure et ses procédés d'obtention | |
DE602004014823D1 (de) | Selektive norepinephrin-wiederaufnahmehemmer zur behandlung von hitzewallungen |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
FC2A | Withdrawal, rejection or dismissal of laid open patent application |