LV11116B - Removal of surface contaminants by irradiation from high-energy source - Google Patents
Removal of surface contaminants by irradiation from high-energy source Download PDFInfo
- Publication number
- LV11116B LV11116B LVP-94-95A LV940095A LV11116B LV 11116 B LV11116 B LV 11116B LV 940095 A LV940095 A LV 940095A LV 11116 B LV11116 B LV 11116B
- Authority
- LV
- Latvia
- Prior art keywords
- substrate
- gas
- laser
- contaminants
- cleaned
- Prior art date
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Claims (20)
- LV 11116 IZGUDROJUMA FORMULA 1. Virsmas piesārņojumu atdalīšanas paņēmiens no substrāta virsmas,saglabājot attīrāmās virsmas molekulāro struktūru/ kas atšķiras ar to, ka tas ietver sekojošās operācijas: nepārtrauktu gāzes padevi pār substrāta attīrāmo virsmu, turklāt šī gāze ir inerta attiecībā pret substrāta attīrāmo virsmu; un minētā substrāta apstarošanu ar lielas enerģijas starojumu, kura blīvums un ilgums atrodas robežās starp lielumu, kas nepieciešams, lai piesārņojumus atdalītu no substrāta attīrāmās virsmas, un lielumu, pie kura mainās substrāta attīrāmās virsmas molekulārā struktūra.
- 2. Paņēmiens saskaņā ar 1.punktu, kas atšķiras ar to, ka substrāta apstarošana ar lielas enerģijas starojumu ietver substrāta apstarošanu ar lāzera stariem.
- 3. Paņēmiens saskaņā ar 1.punktu, kas atšķiras ar to, ka minētās apstarošanas avots ir lāzera stari.
- 4. Paņēmiens saskaņā ar 3.punktu, kas atšķiras ar to, ka tas ietver arī sekojošās operācijas: pār substrāta attīrāmo virsmu plūstošās gāzes analīzi, virsmu vienlaicīgi apstarojot ar lāzera stariem, lai noteiktu atdalīto piesārņojumu sastāvu; un 2 lāzera staru impulsu enerģijas blīvuma un ilguma regulēšanu, nodrošinot tādu virsmas attīrīšanas enerģijas līmeni,kāds ir nepieciešams, lai pārrautu saites starp analizētajiem virsmas piesārņotājiem un apstrādājamo virsmu.
- 5. Paņēmiens saskaņā ar 4.punktu, kas atšķiras ar to, ka lāzera staru impulsu enerģijas blīvuma un ilguma regulēšanas operācija ietver tādu lāzera staru impulsu enerģijas blīvuma regulēšanu, kas nodrošina virsmas attīrīšanas enerģijas līmeņa paaugstināšanu no divām līdz piecām reizēm, kas ir nepieciešams, lai pārrautu saites starp analizētajiem virsmas piesārņotājiem un attīrāmo virsmu.
- 6. Paņēmiens hemosorbēto molekulāro piesārņojumu atdalīšanai no pusvadītāja substrāta virsmas,vienlaicīgi saglabājot substrāta attīrāmo virsmu, kas atšķiras ar to, ka tas ietver šādas operācijas: nepārtrauktu gāzes padevi pār substrāta attīrāmo virsmu,turklāt šī gāze ir inerta attiecībā pret substrāta attīrāmo virsmu; un minētā substrāta apstarošanu ar lāzera impulsu sēriju, turklāt šīs lāzera impulsu sērijas ilgums ir visma2 6000 impulsu, bet katra impulsa enerģijas blīvums svārstās robežās no 35 līdz 75 mJ/cm2.
- 7. Paņēmiens saskaņā ar 6.punktu, kas atšķiras ar to, ka minētā pusvadītāja substrāta attīrāmā virsma sastāv, galvenokārt, no silīcija. 3 LV 11116
- 8. Paņēmiens saskaņā ar 6.punktu, kas atšķiras ar to, ka minētā pusvadītāja substrāta attīrāmā virsma sastāv, galvenokārt, no silīcija, un uz tās ir uzklāta pusvadītāja elektroniskā shēma.
- 9. Paņēmiens saskaņā ar 8.punktu, kas atšķiras ar to, ka lāzera starojums turpinās apmēram līdz 6000 impulsiem, bet to enerģijas blīvums ir ap 35 mJ/cm2.
- 10. Paņēmiens saskaņā ar 1.punktu molekulāru piesārņojumu atdalīšanai no pusvadītāja substrāta virsmas pusvadītāja izgatavošanas laikā, vienlaicīgi saglabājot substrāta attīrāmo virsmu, kas atšķiras ar to, ka tas ietver šādas operācijas: gāzes padevi pār pusvadītāja substrāta attīrāmo virsmu, turklāt šī gāze ir inerta attiecībā pret substrāta attīrāmo virsmu; inertās gāzes plūsmas laikā pār substrāta attīrāmo virsmu pirms elektroniskās shēmas uzklāšanas uz pusvadītāja substrāta virsmas substrātu apstaro ar lāzera starojumu, kura enerģijas blīvums un ilgums atrodas robežās starp lielumu, kas nepieciešams, lai virsmas piesārņojumus atdalītu no substrāta attīrāmās virsmas un lielumu, pie kura mainās substrāta attīrāmās virsmas molekulārā struktūra; elektroniskās shēmas uzklāšanu uz pusvadītāja substrāta attīrītās virsmas; gāzes padevi pār uzklāto kārtu,turklāt šī gāze ir inerta attiecībā pret substrāta attīrīto virsmu un uzklāto kārtu; inertās gāzes plūsmas laikā pār substrāta attīrāmo virsmu un uzklāto kārtu pēc elektroniskās shēmas uzklāšanas uz substrāta 4 virsmas substrāta attīrīto virsmu apstaro ar lāzera starojumu, kura enerģijas blīvums un ilgums atrodas robežās starp lielumu, kas nepieciešams, lai virsmas piesārņojumus atdalītu no substrāta attīrāmās virsmas un lielumu, pie kura mainās substrāta attīrāmās virsmas molekulārā struktūra.
- 11. Paņēmiens saskaņā ar 10.punktu, kas atšķiras ar to, ka substrāta attīrāmā virsma sastāv, galvenokārt,no silīcija.
- 12. Paņēmiens saskaņā ar 12.punktu, k as atšķiras ar to, ka lāzera starojums turpinās apmēram līdz 6000 impulsiem, bet to enerģijas blīvums ir ap 35 mJ/cm2.
- 13. Ierīce adsorbēto virsmas piesārņojumu atdalīšanai no substrāta (12) virsmas, vienlaicīgi saglabājot substrāta attīrāmo virsmu, kas atšķiras ar to, ka tā satur: gāzi (18), kas ir inerta pret substrāta attīrāmo virsmu; gāzes plūsmas nodrošināšanas līdzekli, kas nepārtraukti šo gāzi pievada substrāta attīrāmai virsmai; lāzera impulsu ģenerēšanas līdzekli (14), kas ģenerē lāzera impulsus (11),kuri vērsti virzienā uz substrāta attīrāmo virsmu, pār kuru plūst gāze (18), un kuru enerģijas blīvums svārstās robežās no lieluma, kas nepieciešams, lai sarautu saites starp ad-sorbētajiem virsmas piesārņotājiem un attīrāmo virsmu, līdz lielumam, pie kura mainās substrāta apstrādājamās virsmas molekulārā struktūra. 5 LV 11116
- 14. Ierīce saskaņā ar 13.punktu, kas atšķiras ar to, ka par lāzera impulsu ģenerēšanas līdzekli (14) kalpo ultravioletās enerģijas avots.
- 15. Ierīce saskaņā ar 13.punktu, kas atšķiras ar to, ka tajā lāzera impulsu ģenerēšanas līdzeklis (14) ir KrF ek-simēra lāzers.
- 16. Ierīce saskaņā ar 13.punktu, kas atšķiras ar to, ka gāzes plūsmas nodrošināšanas līdzekļi satur: ierobežotu telpu (15), kurā var ievietot attīrāmo substrātu (12), turklāt šai telpai ir ieejas atvere (23) un izejas atvere (25), un ierīci gāzes ievadīšanai ierobežotajā telpā pa ieejas atveri (23).
- 17. Ierīce saskaņā ar 13.punktu, kas atšķiras ar to,ka gāze ir ķīmiski inerta attiecībā pret minētā substrāta (12) virsmu.
- 18. Ierīce saskaņā ar 17.punktu, kas atšķiras ar to, ka ķīmiski inertā gāze ir argons.
- 19. Ierīce saskaņā ar 13.punktu, kas atšķiras ar to, ka tā satur arī gāzes analizatoru (27) pār substrāta apstrādājamo virsmu plūstošās gāzes analīzei pret šo virsmu virzītās lāzera enerģijas ģenerēšanas laikā,turklāt šis gāzes analizators (27) kalpo, lai noteiktu no minētās virsmas atdalīto piesārņojumu sastāvu. 6
- 20. Ierīce saskaņā ar 16.punktu, kas atšķiras ar to, ka tā bez tam satur arī gāzes analizatoru (27) pār substrāta apstrādājamo virsmu plūstošās gāzes analīzei pret šo virsmu virzītās lāzera enerģijas ģenerēšanas laikā, turklāt šis gāzes analizators (27) kalpo, lai noteiktu no minētās virsmas atdalīto piesārņojumu sastāvu,un ir savienots ar minētās ierobežotās telpas izejas atveri.
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US07/216,903 US5024968A (en) | 1988-07-08 | 1988-07-08 | Removal of surface contaminants by irradiation from a high-energy source |
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LV (1) | LV11116B (lv) |
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- 1988-07-08 US US07/216,903 patent/US5024968A/en not_active Expired - Lifetime
-
1989
- 1989-07-06 AT AT89112319T patent/ATE88923T1/de not_active IP Right Cessation
- 1989-07-06 ES ES198989112319T patent/ES2041374T3/es not_active Expired - Lifetime
- 1989-07-06 DE DE89112319T patent/DE68906318T2/de not_active Expired - Fee Related
- 1989-07-06 EP EP89112319A patent/EP0350021B1/en not_active Expired - Lifetime
- 1989-07-07 KR KR1019890009662A patent/KR0157608B1/ko not_active IP Right Cessation
- 1989-07-07 WO PCT/US1989/002952 patent/WO1990000812A1/en active Application Filing
- 1989-07-07 BR BR898907529A patent/BR8907529A/pt not_active Application Discontinuation
- 1989-07-07 AU AU38676/89A patent/AU620766B2/en not_active Ceased
- 1989-07-07 CA CA000605060A patent/CA1328908C/en not_active Expired - Fee Related
- 1989-07-10 JP JP1177848A patent/JP2634245B2/ja not_active Expired - Fee Related
-
1990
- 1990-12-21 DK DK303490A patent/DK303490A/da not_active Application Discontinuation
-
1991
- 1991-01-07 FI FI910075A patent/FI910075A0/fi unknown
- 1991-01-07 NO NO910067A patent/NO180739C/no not_active IP Right Cessation
-
1994
- 1994-05-04 LV LVP-94-95A patent/LV11116B/en unknown
-
1995
- 1995-01-12 HK HK5195A patent/HK5195A/xx not_active IP Right Cessation
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LV11116A (lv) | 1996-04-20 |
JPH0286128A (ja) | 1990-03-27 |
EP0350021A2 (en) | 1990-01-10 |
US5024968A (en) | 1991-06-18 |
EP0350021B1 (en) | 1993-05-05 |
ES2041374T3 (es) | 1993-11-16 |
AU620766B2 (en) | 1992-02-20 |
FI910075A0 (fi) | 1991-01-07 |
NO180739C (no) | 1997-06-04 |
DK303490D0 (da) | 1990-12-21 |
KR900002414A (ko) | 1990-02-28 |
NO910067L (no) | 1991-01-07 |
EP0350021A3 (en) | 1990-05-23 |
NO910067D0 (no) | 1991-01-07 |
JP2634245B2 (ja) | 1997-07-23 |
CA1328908C (en) | 1994-04-26 |
NO180739B (no) | 1997-02-24 |
KR0157608B1 (ko) | 1998-12-01 |
BR8907529A (pt) | 1991-06-11 |
DK303490A (da) | 1991-02-25 |
DE68906318D1 (de) | 1993-06-09 |
AU3867689A (en) | 1990-02-05 |
ATE88923T1 (de) | 1993-05-15 |
HK5195A (en) | 1995-01-20 |
WO1990000812A1 (en) | 1990-01-25 |
DE68906318T2 (de) | 1993-10-07 |
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