KR950011376A - 금속 및 세라믹 소결체 및 코팅의 제조방법 - Google Patents
금속 및 세라믹 소결체 및 코팅의 제조방법 Download PDFInfo
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- KR950011376A KR950011376A KR1019940027393A KR19940027393A KR950011376A KR 950011376 A KR950011376 A KR 950011376A KR 1019940027393 A KR1019940027393 A KR 1019940027393A KR 19940027393 A KR19940027393 A KR 19940027393A KR 950011376 A KR950011376 A KR 950011376A
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Abstract
본 발명은 분산 매질인 물 및(또는) 극성 유기 용매 중에 분산 되어 있는 (a) 개별 입자들의 1% 미만인 평균 입도로부터 40% 초과의 편차를 갖고 60% 초과의 편차를 갖는 개별 입자는 본질적으로 존재하지 않는 나노 크기 세라믹 또는 금속 분말 입자 및 (b) 분말 입자의 표면 상에 존재하는 기와 반응 및(또는) 상호 반응할 수 있는 관능기를 1개 이상 갖는 1종 이상의 저 분자량 유기 화합물로 이루어진 금속 및 세라믹 소결체 또는 코팅의 제조 방법으로서, 추가로 분산 매질을 제거하고, 분산 매질 제거 전 또는 후에 표면 개질 세라믹 또는 금속 분말을 압분체 또는 코팅으로 성형시키고, 이 압분체 또는 코팅을 소결시키는 것으로 이루어진 상기 금속 및 세라믹 소결체 또는 코팅의 제조 방법에 관한 것이다.
Description
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Claims (35)
- 분산 매질인 물 및(또는) 극성 유기 용매 중에 분산되어 있는 (a) 개별 입자들의 1% 미만인 평균 입도로부터 40% 초과의 편차를 갖고 60% 초과의 편차를 갖는 개별 입자는 본질적으로 존재하지 않는 나노 크기 세라믹 또는 금속 분말 입자 및 (b) 분말 입자의 표면 상에 존재하는 기와 반응 및(또는) 상호 반응할 수 있는 관능기를 1개 이상 갖는 1종 이상의 저 분자량 유기 화합물로 이루어진 금속 및 세라믹 소결체 또는 코팅의 제조 방법으로서, 추가로 분산 매질을 제거하고, 분산 매질 제거 전 또는 후에 표면 개질 세라믹 또는 금속 분말을 압분체 또는 코팅으로 성형시키고, 이 압분체 또는 코팅을 소결시키는 것으로 이루어진 상기 금속 및 세라믹 소결체 또는 코팅의 제조 방법.
- 제1항에 있어서, 개별 입자의 1% 미만이 평균 입도로부터 20% 초과의 편차를 가지며, 50% 초과의 편차를 갖는 개별 입자는 존재하지 않는 것을 특징으로 하는 방법.
- 제1항 또는 2항에 있어서, 개별 입자의 1% 미만이 평균 입도로부터 10% 초과의 편차를 가지며, 40% 초과의 편차를 갖는 개별 입자는 존재하지 않는 것을 특징으로 하는 방법.
- 제1항 또는 2항에 있어서, 금속 및(또는) 세라믹 분말이, 원소 B, Al, Si, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, La, Y, Fe, Co, Ni의 탄화물, 질화물, 붕소화물, 규화물, 아인산염, 황화물, 산화물 및(또는) 이들의 혼합물 또는 이들의 상호 혼합물 중에서 선택되는 것을 특징으로 하는 방법.
- 제1항 또는 2항에 있어서, 금속 분말로서, 1.0nm에서 100nm미만 사이의 한정된 입도를 갖는, Fe, Co, Ni, W 및 Mo로 이루어진 군으로부터 선택된 금속의 미립자성 분말을 사용하는 것을 특징으로 하는 방법.
- 제1항 또는 2항에 있어서, 금속 분말로서, 1.0nm에서 3㎛ 사이의 한정된 입도를 갖는, B, Al, Ti, Zr, Hf, V, Nb, Ta, 및 Cr로 이루어진 군으로부터 선택된 금속의 미립자성 분말을 사용하는 것을 특징으로 하는 방법.
- 제1항 또는 2항에 있어서, 100nm를 초과하는 Si3N4및 200nm를 초과하는 A1N을 제외한 미립자성 비산화 세라믹 분말 MeX(여기서, Me는 B, Al, Si, Ti, Zr, Hf, V, Ta, Nb, Mo, W, La, Fe, Ni 및 Cr 및 이들의 혼합물로 이루어진 군으로부터 선택되고, X는, C, N, B, Si 및 이들의 혼합물로 이루어진 군으로부터 선택됨)를 세라믹 분말로서 사용하는 것을 특징으로 하는 방법.
- 제5항에 있어서, 세라믹 분말이 5,000ppm 미만의 산소 함량을 갖는 것을 특징으로 하는 방법.
- 제8항에 있어서, 산소 함량이 1,000ppm 미만인 것을 특징으로 하는 방법.
- 제8항에 있어서, 산소 함량이 50ppm 미만인 것을 특징으로 하는 방법.
- 제1항 또는 2항에 있어서, 금속 분말을 사용하고 이들은 5,000ppm 미만의 산소 함량을 갖는 것을 특징으로 하는 방법.
- 제9항에 있어서, 산소 함량이 1,000ppm 미만인 것을 특징으로 하는 방법.
- 제11항에 있어서, 산소 함량이 50ppm 미만인 것을 특징으로 하는 방법.
- 제1항에 있어서, 금속 산화물의 미립자성 산화 세라믹 분말을 사용하고, 여기서 금속은, Al, Si, Zr, Hf, Ta, Nb, Mo, W, La, Y 및 이들의 혼합물로 이루어진 군으로부터 선택되고, Al2O3는-상으로 존재하며 SiO2는 결정 형태로 존재하는 것을 특징으로 하는 방법.
- 제14항에 있어서, 산화성 불순물을 제외하고 세라믹 분말의 총 불순물이 5,000ppm 미만인 것을 특징으로 하는 방법.
- 제15항에 있어서, 산화성 불순물을 제외하고 총 불순물이 1,000ppm 미만인 것을 특징으로 하는 방법.
- 제16항에 있어서, 산화성 불순물을 제외하고 총 불순물이 200ppm 미만인 것을 특징으로 하는 방법.
- 제17항에 있어서, 표면 개질 금속 또는 세라믹 분말을 융점 또는 분해점의 0.4 내지 0.6인 온도에서 소결시키는 것을 특징으로 하는 방법.
- 제1항에 있어서, 저 분자량 유기 화합물이 1,000 이하, 특히 500 이하의 분자량을 갖는 것을 특징으로 하는 방법.
- 제1항 또는 19항에 있어서, 저 분자량 유기 화합물이 지방족 화합물, 포호 또는 불포화 C1-C12모노카르복실산, 폴리카르복실산, 일반식 R3-nNHn(여기서, n=0, 1 또는 2, 잔기 R은 서로 독립적으로 탄소수 1 내지 12의 알킬기를 나타냄)의 아민, 탄소수 4 내지 12의-카르보닐 화합물, 티탄산 에스테르, 알코올레이트 및 오르가노알콕시실란으로 이루어진 군으로부터 선택되는 것을 특징으로 하는 방법.
- 제20항에 있어서, R이 탄소수 1 내지 6의 A1Y1기인 것을 특징으로 하는 방법.
- 제20항에 있어서, 디카르보닐 화합물이 5 내지 8개의 탄소 원자를 갖는 것인 것을 특징으로 하는 방법.
- 제20항에 있어서, 분산 매질이 물과 극성 유기 용매의 혼합물로 이루어진 것을 특징으로 하는 방법.
- 제20항에 있어서, 분산 매질의 총 중량을 기준으로 20 내지 90 중량%의 세라믹 또는 금속 분말 및 저 분자량 유기 화합물을 사용하는 것을 특징으로 하는 방법.
- 제24항에 있어서, 분산 매질의 30 내피 80 중량%를 사용하는 것을 특징으로 하는 방법.
- 제20항에 있어서, 세라믹 또는 금속 분말/저 분자량 유기 화합물의 중량비가 1000 : 1 내지 4 : 1인 것을 특징으로 하는 방법.
- 제26항에 있어서, 분말/유기 화합물의 중량비가 500 : 1 sowl 8 : 1의 범위인 것을 특징으로 하는 방법.
- 제1항에 있어서, 분산이 20℃에서 분산 매질의 비점까지의 온도에서 수행되는 것을 특징으로 하는 방법.
- 제28항에 있어서, 분산 매질을 환류시키는 것을 특징으로 하는 방법.
- 제1항에 있어서, 분산 매질을 동결 건조 또는 동결 분무 건조에 의해 제거시키는 것을 특징으로 하는 방법.
- 제1항에 있어서, 표면 개질 세라믹 또는 금속 분말을 분산 매질의 분리 후 다른 매질에 재분산시키는 것을 특징으로 하는 방법.
- 제1항의 방법에 따라 제조된 금속 또는 세라믹 소결체.
- 제1항의 방법에 따라 제조된 금속 또는 세라믹 코팅.
- 기판과 조합된 제33항 기재의 코팅.
- 나노 크기 평규 입도(100nm) 및 이론치의 95% 초과의 밀도를 갖는 제32항, 33항, 34항 또는 35항 중 어느 한 항 기재의 금속 또는 세라믹 소결체 또는 코팅.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
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DE4336694A DE4336694A1 (de) | 1993-10-27 | 1993-10-27 | Verfahren zur Herstellung von Metall- und Keramiksinterkörpern und -schichten |
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-
1993
- 1993-10-27 DE DE4336694A patent/DE4336694A1/de not_active Withdrawn
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1994
- 1994-10-11 US US08/321,416 patent/US5590387A/en not_active Expired - Lifetime
- 1994-10-14 DE DE59403718T patent/DE59403718D1/de not_active Expired - Fee Related
- 1994-10-14 EP EP94116229A patent/EP0650945B1/de not_active Expired - Lifetime
- 1994-10-24 CA CA002134180A patent/CA2134180A1/en not_active Abandoned
- 1994-10-25 JP JP6283957A patent/JPH07232965A/ja active Pending
- 1994-10-26 KR KR1019940027393A patent/KR100336276B1/ko not_active IP Right Cessation
- 1994-10-26 RU RU94039287A patent/RU2139839C1/ru not_active IP Right Cessation
- 1994-10-27 CN CN94113669A patent/CN1076719C/zh not_active Expired - Fee Related
- 1994-10-27 TW TW083109903A patent/TW406062B/zh not_active IP Right Cessation
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TW406062B (en) | 2000-09-21 |
DE4336694A1 (de) | 1995-05-04 |
CN1076719C (zh) | 2001-12-26 |
EP0650945A3 (de) | 1995-11-02 |
KR100336276B1 (ko) | 2002-09-25 |
EP0650945B1 (de) | 1997-08-13 |
CA2134180A1 (en) | 1995-04-28 |
CN1105918A (zh) | 1995-08-02 |
JPH07232965A (ja) | 1995-09-05 |
EP0650945A2 (de) | 1995-05-03 |
RU94039287A (ru) | 1996-09-10 |
RU2139839C1 (ru) | 1999-10-20 |
DE59403718D1 (de) | 1997-09-18 |
US5590387A (en) | 1996-12-31 |
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