KR940006676B1 - 시험회로를 내장한 기억용 반도체 집적회로 - Google Patents
시험회로를 내장한 기억용 반도체 집적회로 Download PDFInfo
- Publication number
- KR940006676B1 KR940006676B1 KR1019910018043A KR910018043A KR940006676B1 KR 940006676 B1 KR940006676 B1 KR 940006676B1 KR 1019910018043 A KR1019910018043 A KR 1019910018043A KR 910018043 A KR910018043 A KR 910018043A KR 940006676 B1 KR940006676 B1 KR 940006676B1
- Authority
- KR
- South Korea
- Prior art keywords
- test
- circuit
- layer
- memory
- channel
- Prior art date
Links
- 238000012360 testing method Methods 0.000 title claims abstract description 120
- 239000004065 semiconductor Substances 0.000 title claims abstract description 19
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims abstract description 27
- 229920005591 polysilicon Polymers 0.000 claims abstract description 23
- 229910021417 amorphous silicon Inorganic materials 0.000 claims abstract description 8
- 230000005669 field effect Effects 0.000 claims description 12
- 238000001514 detection method Methods 0.000 claims description 2
- 230000008054 signal transmission Effects 0.000 claims description 2
- 239000004020 conductor Substances 0.000 claims 1
- 239000010409 thin film Substances 0.000 abstract description 13
- 239000012535 impurity Substances 0.000 abstract description 7
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 230000005540 biological transmission Effects 0.000 abstract 1
- 230000007704 transition Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 53
- 238000000034 method Methods 0.000 description 19
- 239000000758 substrate Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 239000002184 metal Substances 0.000 description 3
- 238000010998 test method Methods 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 2
- 230000000295 complement effect Effects 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000007274 generation of a signal involved in cell-cell signaling Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010187 selection method Methods 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/10—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a repetitive configuration
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/04—Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
- G11C29/08—Functional testing, e.g. testing during refresh, power-on self testing [POST] or distributed testing
- G11C29/12—Built-in arrangements for testing, e.g. built-in self testing [BIST] or interconnection details
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/04—Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/04—Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
- G11C29/08—Functional testing, e.g. testing during refresh, power-on self testing [POST] or distributed testing
- G11C29/12—Built-in arrangements for testing, e.g. built-in self testing [BIST] or interconnection details
- G11C29/38—Response verification devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Power Engineering (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- For Increasing The Reliability Of Semiconductor Memories (AREA)
- Semiconductor Memories (AREA)
- Dram (AREA)
- Tests Of Electronic Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Read Only Memory (AREA)
- Non-Volatile Memory (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019910018043A KR940006676B1 (ko) | 1991-10-14 | 1991-10-14 | 시험회로를 내장한 기억용 반도체 집적회로 |
GB9204291A GB2260618B (en) | 1991-10-14 | 1992-02-28 | An integrated semiconductor memory device with a test circuit |
ITMI920457A IT1254651B (it) | 1991-10-14 | 1992-02-28 | Dispositivo di memoria integrato a semiconduttori utilizzante un circuito di prova |
US07/843,260 US5351213A (en) | 1991-10-14 | 1992-02-28 | Integrated semiconductor memory device utilizing a test circuit |
FR9202391A FR2682521B1 (fr) | 1991-10-14 | 1992-02-28 | Dispositif integre a memoire a semiconducteurs. |
DE4206344A DE4206344C2 (de) | 1991-10-14 | 1992-02-29 | Integrierter Halbleiterspeicherbaustein, der eine Prüfschaltung verwendet |
JP9091292A JP2526344B2 (ja) | 1991-10-14 | 1992-04-10 | 試験回路を内蔵したメモリ―用半導体集積回路 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019910018043A KR940006676B1 (ko) | 1991-10-14 | 1991-10-14 | 시험회로를 내장한 기억용 반도체 집적회로 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR930008868A KR930008868A (ko) | 1993-05-22 |
KR940006676B1 true KR940006676B1 (ko) | 1994-07-25 |
Family
ID=19321217
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019910018043A KR940006676B1 (ko) | 1991-10-14 | 1991-10-14 | 시험회로를 내장한 기억용 반도체 집적회로 |
Country Status (7)
Country | Link |
---|---|
US (1) | US5351213A (it) |
JP (1) | JP2526344B2 (it) |
KR (1) | KR940006676B1 (it) |
DE (1) | DE4206344C2 (it) |
FR (1) | FR2682521B1 (it) |
GB (1) | GB2260618B (it) |
IT (1) | IT1254651B (it) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6208195B1 (en) | 1991-03-18 | 2001-03-27 | Integrated Device Technology, Inc. | Fast transmission gate switch |
WO1992016998A1 (en) | 1991-03-18 | 1992-10-01 | Quality Semiconductor, Inc. | Fast transmission gate switch |
TW260788B (it) * | 1993-09-01 | 1995-10-21 | Philips Electronics Nv | |
DE69406942T2 (de) * | 1993-09-16 | 1998-03-19 | Quality Semiconductor Inc | Abtastprüfungsschaltung mit schnellem übertragungsgateschalter |
US5535164A (en) * | 1995-03-03 | 1996-07-09 | International Business Machines Corporation | BIST tester for multiple memories |
US6388314B1 (en) * | 1995-08-17 | 2002-05-14 | Micron Technology, Inc. | Single deposition layer metal dynamic random access memory |
KR100197554B1 (ko) * | 1995-09-30 | 1999-06-15 | 윤종용 | 반도체 메모리장치의 고속테스트 방법 |
US5925142A (en) * | 1995-10-06 | 1999-07-20 | Micron Technology, Inc. | Self-test RAM using external synchronous clock |
US5721863A (en) * | 1996-01-29 | 1998-02-24 | International Business Machines Corporation | Method and structure for accessing semi-associative cache memory using multiple memories to store different components of the address |
US5703818A (en) * | 1996-08-26 | 1997-12-30 | Mitsubishi Denki Kabushiki Kaisha | Test circuit |
US5740180A (en) * | 1997-02-18 | 1998-04-14 | Motorola, Inc. | Circuit and test method for testing input cells |
DE19711097C2 (de) * | 1997-03-17 | 2000-04-06 | Siemens Ag | Integrierte Schaltung mit einem Speicher und einer Prüfschaltung |
US5903491A (en) | 1997-06-09 | 1999-05-11 | Micron Technology, Inc. | Single deposition layer metal dynamic random access memory |
US5848010A (en) * | 1997-07-14 | 1998-12-08 | Micron Technology, Inc. | Circuit and method for antifuse stress test |
JP3235523B2 (ja) * | 1997-08-06 | 2001-12-04 | 日本電気株式会社 | 半導体集積回路 |
US6154864A (en) * | 1998-05-19 | 2000-11-28 | Micron Technology, Inc. | Read only memory embedded in a dynamic random access memory |
KR100333536B1 (ko) * | 1998-05-29 | 2002-08-27 | 주식회사 하이닉스반도체 | 센스앰프를이용하여테스트를수행하는메모리소자 |
US6603693B2 (en) | 2001-12-12 | 2003-08-05 | Micron Technology, Inc. | DRAM with bias sensing |
US6747889B2 (en) * | 2001-12-12 | 2004-06-08 | Micron Technology, Inc. | Half density ROM embedded DRAM |
US6545899B1 (en) * | 2001-12-12 | 2003-04-08 | Micron Technology, Inc. | ROM embedded DRAM with bias sensing |
US20030115538A1 (en) * | 2001-12-13 | 2003-06-19 | Micron Technology, Inc. | Error correction in ROM embedded DRAM |
JP2003288800A (ja) * | 2002-03-27 | 2003-10-10 | Nec Electronics Corp | 半導体記憶装置のテスト方法、半導体記憶装置及び半導体装置 |
US20030185062A1 (en) * | 2002-03-28 | 2003-10-02 | Micron Technology, Inc. | Proximity lookup for large arrays |
US6785167B2 (en) * | 2002-06-18 | 2004-08-31 | Micron Technology, Inc. | ROM embedded DRAM with programming |
US6781867B2 (en) * | 2002-07-11 | 2004-08-24 | Micron Technology, Inc. | Embedded ROM device using substrate leakage |
US6865100B2 (en) * | 2002-08-12 | 2005-03-08 | Micron Technology, Inc. | 6F2 architecture ROM embedded DRAM |
DE10245712A1 (de) * | 2002-10-01 | 2004-04-22 | Infineon Technologies Ag | Speicherschaltung mit einem Testmodus zum Schreiben von Testdaten |
US7174477B2 (en) * | 2003-02-04 | 2007-02-06 | Micron Technology, Inc. | ROM redundancy in ROM embedded DRAM |
US6836106B1 (en) * | 2003-09-23 | 2004-12-28 | International Business Machines Corporation | Apparatus and method for testing semiconductors |
US7152192B2 (en) * | 2005-01-20 | 2006-12-19 | Hewlett-Packard Development Company, L.P. | System and method of testing a plurality of memory blocks of an integrated circuit in parallel |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2002129B (en) * | 1977-08-03 | 1982-01-20 | Sperry Rand Corp | Apparatus for testing semiconductor memories |
US4196389A (en) * | 1978-07-13 | 1980-04-01 | International Business Machines Corporation | Test site for a charged coupled device (CCD) array |
US4253059A (en) * | 1979-05-14 | 1981-02-24 | Fairchild Camera & Instrument Corp. | EPROM Reliability test circuit |
JPS5736844A (en) * | 1980-08-15 | 1982-02-27 | Hitachi Ltd | Semiconductor device |
JPS5893347A (ja) * | 1981-11-30 | 1983-06-03 | Toshiba Corp | Mos型半導体装置及びその製造方法 |
US4757503A (en) * | 1985-01-18 | 1988-07-12 | The University Of Michigan | Self-testing dynamic ram |
EP0193210A3 (en) * | 1985-02-28 | 1988-12-14 | Nec Corporation | Semiconductor memory device with a built-in test circuit |
JPS61260668A (ja) * | 1985-05-15 | 1986-11-18 | Seiko Epson Corp | 半導体装置 |
JPS62169355A (ja) * | 1986-01-21 | 1987-07-25 | Sharp Corp | 半導体集積回路素子 |
JPH01253266A (ja) * | 1988-03-31 | 1989-10-09 | Sharp Corp | 半導体集積回路 |
GB2222461B (en) * | 1988-08-30 | 1993-05-19 | Mitsubishi Electric Corp | On chip testing of semiconductor memory devices |
GB2256279B (en) * | 1988-08-30 | 1993-05-12 | Mitsubishi Electric Corp | Semiconductor memory device |
JP2901188B2 (ja) * | 1988-12-28 | 1999-06-07 | 株式会社東芝 | 半導体集積回路 |
JP2518401B2 (ja) * | 1989-06-14 | 1996-07-24 | 三菱電機株式会社 | 半導体記憶装置 |
US5265100A (en) * | 1990-07-13 | 1993-11-23 | Sgs-Thomson Microelectronics, Inc. | Semiconductor memory with improved test mode |
JPH0372770A (ja) * | 1990-07-17 | 1991-03-27 | Seiko Epson Corp | 読み取り装置 |
-
1991
- 1991-10-14 KR KR1019910018043A patent/KR940006676B1/ko not_active IP Right Cessation
-
1992
- 1992-02-28 US US07/843,260 patent/US5351213A/en not_active Expired - Lifetime
- 1992-02-28 IT ITMI920457A patent/IT1254651B/it active
- 1992-02-28 FR FR9202391A patent/FR2682521B1/fr not_active Expired - Lifetime
- 1992-02-28 GB GB9204291A patent/GB2260618B/en not_active Expired - Lifetime
- 1992-02-29 DE DE4206344A patent/DE4206344C2/de not_active Expired - Lifetime
- 1992-04-10 JP JP9091292A patent/JP2526344B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH05274899A (ja) | 1993-10-22 |
GB9204291D0 (en) | 1992-04-08 |
DE4206344A1 (de) | 1993-04-15 |
DE4206344C2 (de) | 1994-04-21 |
ITMI920457A1 (it) | 1993-08-28 |
ITMI920457A0 (it) | 1992-02-28 |
KR930008868A (ko) | 1993-05-22 |
FR2682521A1 (fr) | 1993-04-16 |
FR2682521B1 (fr) | 1996-03-15 |
IT1254651B (it) | 1995-09-28 |
JP2526344B2 (ja) | 1996-08-21 |
US5351213A (en) | 1994-09-27 |
GB2260618B (en) | 1996-05-22 |
GB2260618A (en) | 1993-04-21 |
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Legal Events
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G160 | Decision to publish patent application | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20100630 Year of fee payment: 17 |
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LAPS | Lapse due to unpaid annual fee |