KR920018827A - 처리시스템 - Google Patents

처리시스템 Download PDF

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Publication number
KR920018827A
KR920018827A KR1019920003309A KR920003309A KR920018827A KR 920018827 A KR920018827 A KR 920018827A KR 1019920003309 A KR1019920003309 A KR 1019920003309A KR 920003309 A KR920003309 A KR 920003309A KR 920018827 A KR920018827 A KR 920018827A
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load lock
lock chamber
carrying
casing
processing system
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KR1019920003309A
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KR0170411B1 (ko
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데루오 아사카와
데쓰 오사와
노보루 호사카
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이노우에 아키라
도오교오 에레구토론 가부시끼가이샤
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/005—Transport systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
    • H01L21/67213—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one ion or electron beam chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

내용 없음

Description

처리시스템
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명의 처리시스템의 실시예를 나타낸 개략 평면도.
제2도는 제1도의 나타낸 로드로크챔버의 일부의 구성예를 나타낸 측면도.
제3도는 공지의 이온주입장치의 전체 구성을 나타낸 개략도.

Claims (12)

  1. 피처리체가 수납되고, 그 내부에서 이 피처리체가 처리되는 고감압분위기로 조정가능한 공간을 규정하는 제1케이싱과, 상기 제1케이싱과 상기 피처리체의 반송로를 통하여 접속되고, 고감압분위기로 조정가능한 공간을 규정하는 제2케이싱과, 상기 제2케이싱에 형성된 상기 피처리체의 반입구와, 상기 제2케이싱에 형성된 상기 피처리체의 반출구와, 상기 반입구 및 반출구는 서로 따로 형성되어 있는 것과, 상기 반입구에 접속되고, 이것을 개폐하는 게이트(G)를 가지는 제1로드로크챔버(10),(11)와, 상기 반출구에 접속되고, 이것을 개폐하는 게이트를 가지는 제2로드로크챔버(16),(17)와, 상기 제1 및 제2로드로크챔버(10),(11),(16),(17)는 다른 공간을 규정하거나, 서로 독립적으로 내부 분위기를 조정가능하는 것과, 상기 제1로드로크챔버(10),(11)로부터 상기 반입구를 통하여 상기 제2케이싱내로 상기 피처리체를 반입하기 위하여 상기 제2케이싱내에 배열설치된 제1실어서 이송하는 수단(12)과 상기 제2케이싱내로부터 상기 반출구를 통하여 상기 제2로드로크챔버(16),(17)내로 상기 피처리체를 반출하기 위하여 상기 제2케이싱내에 배설된 제2실어서 이송하는 수단(13)과, 상기 제1및 제2실어서 이송하는 수단(12),(13)이 서로 별개체이며, 독립적으로 작동가능한 것과, 상기 제1 및 제2케이싱외의 공간으로 연결되어 통하도록 상기 제1로드로크챔버(10),(11)에 형성된 반입포트와, 상기 반입포트는 게이트(G)에 의하여 개폐되는 것과, 상기 반입포트를 통하여 상기 제2로드로크챔버(16),(17)내로 상기 피처리체를 반입하는 반입수단과, 상기 제1 및 제2케이싱외의 공간으로 연결되어 통하도록 상기 제1로드로크챔버(10),(11)에 형성된 반출포트와, 상기 반출포트는 게이트(G)에 의하여 개폐되는 것과, 상기 반출포트를 통하여 상기 제2로드로크챔버(16),(17)내로 상기 피처리체를 반출하는 반출수단과, 를 구비하는 처리시스템.
  2. 제1항에 있어서, 상기 제1로드로크챔버(10),(11)는, 상기 피처리체의 위치오차를 검출하는 검출수단을 가지하는 처리시스템.
  3. 제1항에 있어서, 상기 반입구 및 반출구, 상기 제1 및 제2로드로크챔버(10),(11),(16),(17)상기 반입포트 및 반출포트, 상기 제1및 제2실어서 이송하는 수단(12),(13), 상기 반입수단 및 반출수단의 각 쌍이 좌우대칭으로 배치되는 처리시스템.
  4. 제1항에 있어서, 상기 반입구 및 반출구, 상기 제1및 제2로드로크챔버(10),(11),(16),(17), 상기 반입포트 및 반출포트가 각각 여러개가 배열설치되는 처리시스템.
  5. 제1항에 있어서, 상기 제1로드로크챔버(10),(11)가 한 개의 피처리체를 수납하는 구조를 이루는 처리시스템.
  6. 제1항에 있어서, 상기 제2로드로크챔버(16),(17)가 여러개의 피처리체를 수납하는 구조를 이루는 처리시스템.
  7. 제1항에 있어서, 상기 제1로드로크챔버(10),(11)가 여러개의 피처리체를 수납하는 구조를 이루는 처리시스템.
  8. 제1항에 있어서, 상기 제2로드로크챔버(16),(17)가 한 개의 피처리체를 수납하는 구조를 이루는 처리시스템.
  9. 제1항에 있어서, 상기 제1 및 제2케이싱내가 공통된 분위기를 가지는 처리시스템.
  10. 제9항에 있어서, 상기 제1케이싱이 이온주입장치가 처리탱크(1)를 구비하고, 상기 처리탱크(1)내에 여러개의 상기 피처리체를 재치하는 재치대가 배열 설치되는 처리시스템.
  11. 제10항에 있어서, 상기 제1실어서 이송하는 수단(12)이 상기 제1로드로크챔버(10), (11)로부터 상기 재치대상에 상기 피처리체를 반송하고, 상기 제2실어서 이송하는 수단(13)이 상기 재치대상으로부터 상기 제2로드로크챔버(16),(17)내에 상기 피처리체를 반송하는 처리시스템.
  12. 제11항에 있어서, 상기 재치대상에 상기 피처리체의 더미로서 재치하는 더미체를 수납하는 수납부가 상기 제2케이싱내에 배열설치되고, 상기 제1실어서 이송하는 수단(12)이 상기 수납부로부터 상기 재치대상에 상기 더미체를 반송하고, 상기 제2실어서 이송하는 수단(13)이 상기 재치대상으로부터 상기 수납부에 상기 더미체를 반송하는 처리시스템.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019920003309A 1991-03-01 1992-02-29 처리시스템 KR0170411B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3062660A JPH05275511A (ja) 1991-03-01 1991-03-01 被処理体の移載システム及び処理装置
JP91-62660 1991-03-01

Publications (2)

Publication Number Publication Date
KR920018827A true KR920018827A (ko) 1992-10-22
KR0170411B1 KR0170411B1 (ko) 1999-03-30

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ID=13206680

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Application Number Title Priority Date Filing Date
KR1019920003309A KR0170411B1 (ko) 1991-03-01 1992-02-29 처리시스템

Country Status (5)

Country Link
US (2) US5248886A (ko)
EP (1) EP0502412B1 (ko)
JP (1) JPH05275511A (ko)
KR (1) KR0170411B1 (ko)
DE (1) DE69210290T2 (ko)

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US5248886A (en) 1993-09-28
EP0502412A1 (en) 1992-09-09
EP0502412B1 (en) 1996-05-01
US5357115A (en) 1994-10-18
DE69210290D1 (de) 1996-06-05
KR0170411B1 (ko) 1999-03-30

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