DE69210290D1 - Behandlungsvorrichtung - Google Patents
BehandlungsvorrichtungInfo
- Publication number
- DE69210290D1 DE69210290D1 DE69210290T DE69210290T DE69210290D1 DE 69210290 D1 DE69210290 D1 DE 69210290D1 DE 69210290 T DE69210290 T DE 69210290T DE 69210290 T DE69210290 T DE 69210290T DE 69210290 D1 DE69210290 D1 DE 69210290D1
- Authority
- DE
- Germany
- Prior art keywords
- treatment device
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/005—Transport systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
- H01L21/67213—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process comprising at least one ion or electron beam chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3062660A JPH05275511A (ja) | 1991-03-01 | 1991-03-01 | 被処理体の移載システム及び処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69210290D1 true DE69210290D1 (de) | 1996-06-05 |
DE69210290T2 DE69210290T2 (de) | 1996-10-02 |
Family
ID=13206680
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69210290T Expired - Fee Related DE69210290T2 (de) | 1991-03-01 | 1992-02-26 | Behandlungsvorrichtung |
Country Status (5)
Country | Link |
---|---|
US (2) | US5248886A (de) |
EP (1) | EP0502412B1 (de) |
JP (1) | JPH05275511A (de) |
KR (1) | KR0170411B1 (de) |
DE (1) | DE69210290T2 (de) |
Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2644912B2 (ja) * | 1990-08-29 | 1997-08-25 | 株式会社日立製作所 | 真空処理装置及びその運転方法 |
US7089680B1 (en) * | 1990-08-29 | 2006-08-15 | Hitachi, Ltd. | Vacuum processing apparatus and operating method therefor |
US5516732A (en) * | 1992-12-04 | 1996-05-14 | Sony Corporation | Wafer processing machine vacuum front end method and apparatus |
JP3654597B2 (ja) | 1993-07-15 | 2005-06-02 | 株式会社ルネサステクノロジ | 製造システムおよび製造方法 |
DE4340522A1 (de) * | 1993-11-29 | 1995-06-01 | Leybold Ag | Vorrichtung und Verfahren zum schrittweisen und automatischen Be- und Entladen einer Beschichtungsanlage |
JP3288554B2 (ja) * | 1995-05-29 | 2002-06-04 | 株式会社日立製作所 | イオン注入装置及びイオン注入方法 |
JPH09102530A (ja) * | 1995-06-07 | 1997-04-15 | Varian Assoc Inc | ウェーハの向き検査システム |
JPH0936198A (ja) | 1995-07-19 | 1997-02-07 | Hitachi Ltd | 真空処理装置およびそれを用いた半導体製造ライン |
US6672819B1 (en) | 1995-07-19 | 2004-01-06 | Hitachi, Ltd. | Vacuum processing apparatus and semiconductor manufacturing line using the same |
TW371796B (en) * | 1995-09-08 | 1999-10-11 | Semiconductor Energy Lab Co Ltd | Method and apparatus for manufacturing a semiconductor device |
US5746565A (en) * | 1996-01-22 | 1998-05-05 | Integrated Solutions, Inc. | Robotic wafer handler |
KR100213439B1 (ko) * | 1996-10-24 | 1999-08-02 | 윤종용 | 더미 웨이퍼를 사용하지 않는 웨이퍼상에 막형성 방법 |
US5943230A (en) * | 1996-12-19 | 1999-08-24 | Applied Materials, Inc. | Computer-implemented inter-chamber synchronization in a multiple chamber substrate processing system |
KR100246860B1 (ko) * | 1997-01-14 | 2000-03-15 | 윤종용 | 스퍼터링장치의 웨이퍼 이송장치 |
US6239441B1 (en) | 1997-01-20 | 2001-05-29 | Kabushiki Kaisha Toshiba | Apparatus for manufacturing a semiconductor device and a method for manufacturing a semiconductor device |
KR100251274B1 (ko) * | 1997-02-14 | 2000-04-15 | 윤종용 | 매엽식반도체시스템의시퀀스처리방법 |
JP3737604B2 (ja) * | 1997-06-03 | 2006-01-18 | 大日本スクリーン製造株式会社 | 基板処理装置 |
CH692741A5 (de) * | 1997-07-08 | 2002-10-15 | Unaxis Trading Ltd C O Balzers | Verfahren zur Herstellung in Vakuum oberflächenbehandelter Werkstücke und Vakuumbehandlungsanlage zu dessen Durchführung |
US5882413A (en) * | 1997-07-11 | 1999-03-16 | Brooks Automation, Inc. | Substrate processing apparatus having a substrate transport with a front end extension and an internal substrate buffer |
US6313469B1 (en) * | 1998-03-13 | 2001-11-06 | Ebara Corporation | Substrate handling apparatus and ion implantation apparatus |
US6672358B2 (en) * | 1998-11-06 | 2004-01-06 | Canon Kabushiki Kaisha | Sample processing system |
JP2000150836A (ja) * | 1998-11-06 | 2000-05-30 | Canon Inc | 試料の処理システム |
TW484184B (en) * | 1998-11-06 | 2002-04-21 | Canon Kk | Sample separating apparatus and method, and substrate manufacturing method |
TW442891B (en) * | 1998-11-17 | 2001-06-23 | Tokyo Electron Ltd | Vacuum processing system |
US20020157691A1 (en) * | 2000-03-29 | 2002-10-31 | Sadayuki Wada | Substrate transfer device |
JP2002043229A (ja) * | 2000-07-25 | 2002-02-08 | Hitachi Kokusai Electric Inc | 半導体製造装置 |
US6516244B1 (en) * | 2000-08-25 | 2003-02-04 | Wafermasters, Inc. | Wafer alignment system and method |
US6609877B1 (en) * | 2000-10-04 | 2003-08-26 | The Boc Group, Inc. | Vacuum chamber load lock structure and article transport mechanism |
US6591161B2 (en) | 2001-01-31 | 2003-07-08 | Wafermasters, Inc. | Method for determining robot alignment |
KR100781351B1 (ko) * | 2001-04-02 | 2007-11-30 | 엘지.필립스 엘시디 주식회사 | 패턴 검사장치 |
JP4937459B2 (ja) * | 2001-04-06 | 2012-05-23 | 東京エレクトロン株式会社 | クラスタツールおよび搬送制御方法 |
JP2002353081A (ja) | 2001-05-25 | 2002-12-06 | Canon Inc | 板部材の分離装置及び分離方法 |
JP2002353423A (ja) * | 2001-05-25 | 2002-12-06 | Canon Inc | 板部材の分離装置及び処理方法 |
JP4327599B2 (ja) * | 2001-11-29 | 2009-09-09 | ダイアモンド セミコンダクタ グループ エルエルシー | ウエーハ取り扱い装置及び方法 |
US6729824B2 (en) * | 2001-12-14 | 2004-05-04 | Applied Materials, Inc. | Dual robot processing system |
JP4070994B2 (ja) * | 2001-12-20 | 2008-04-02 | 株式会社ダイヘン | ワーク搬送用ロボット及びこのロボットを備えたワーク加工装置 |
JP2003264214A (ja) | 2002-03-07 | 2003-09-19 | Hitachi High-Technologies Corp | 真空処理装置及び真空処理方法 |
JP4040499B2 (ja) * | 2003-03-06 | 2008-01-30 | キヤノン株式会社 | ロードロック室、処理システム及び処理方法 |
US6748293B1 (en) * | 2003-03-24 | 2004-06-08 | Varian Semiconductor Equipment Associates, Inc. | Methods and apparatus for high speed object handling |
US7010388B2 (en) * | 2003-05-22 | 2006-03-07 | Axcelis Technologies, Inc. | Work-piece treatment system having load lock and buffer |
TWI290901B (en) * | 2003-06-23 | 2007-12-11 | Au Optronics Corp | Warehousing conveyor system |
TW200532043A (en) | 2004-02-10 | 2005-10-01 | Ulvac Inc | Thin film forming apparatus |
JP4281065B2 (ja) * | 2004-10-18 | 2009-06-17 | 村田機械株式会社 | 搬送車システム |
JP4855398B2 (ja) * | 2005-06-15 | 2012-01-18 | 株式会社アルバック | 成膜装置、薄膜の製造装置、及び成膜方法 |
KR100673006B1 (ko) * | 2005-07-15 | 2007-01-24 | 삼성전자주식회사 | 이온 주입 장치 |
US20080138178A1 (en) * | 2006-12-06 | 2008-06-12 | Axcelis Technologies,Inc. | High throughput serial wafer handling end station |
US7949425B2 (en) * | 2006-12-06 | 2011-05-24 | Axcelis Technologies, Inc. | High throughput wafer notch aligner |
JP4546556B2 (ja) * | 2008-04-18 | 2010-09-15 | 株式会社日立ハイテクノロジーズ | 真空処理装置及び真空処理方法 |
JP5336885B2 (ja) * | 2009-03-03 | 2013-11-06 | 東京エレクトロン株式会社 | 基板搬送装置及び基板搬送方法 |
JP5249098B2 (ja) * | 2009-03-17 | 2013-07-31 | 東京エレクトロン株式会社 | 基板処理システム及び基板処理方法 |
JP5433290B2 (ja) * | 2009-04-20 | 2014-03-05 | 東京エレクトロン株式会社 | 基板収納方法及び制御装置 |
JP5187274B2 (ja) | 2009-05-28 | 2013-04-24 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
JP5223778B2 (ja) * | 2009-05-28 | 2013-06-26 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
JP5101567B2 (ja) * | 2009-06-23 | 2012-12-19 | シャープ株式会社 | 搬送装置および搬送方法 |
JP5394969B2 (ja) * | 2010-03-30 | 2014-01-22 | 大日本スクリーン製造株式会社 | 基板処理装置、基板処理システム、および基板処理方法 |
US9004788B2 (en) | 2010-06-08 | 2015-04-14 | Tokyo Electron Limited | Substrate processing apparatus, substrate processing method, and storage medium |
JP5348290B2 (ja) * | 2012-07-17 | 2013-11-20 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法及び記憶媒体 |
WO2014157358A1 (ja) * | 2013-03-28 | 2014-10-02 | 株式会社日立国際電気 | 基板処理装置、半導体装置の製造方法及び記録媒体 |
JP6271322B2 (ja) * | 2014-03-31 | 2018-01-31 | 東京エレクトロン株式会社 | 基板処理システム |
US9378992B2 (en) | 2014-06-27 | 2016-06-28 | Axcelis Technologies, Inc. | High throughput heated ion implantation system and method |
US9607803B2 (en) | 2015-08-04 | 2017-03-28 | Axcelis Technologies, Inc. | High throughput cooled ion implantation system and method |
JP6598242B2 (ja) * | 2015-08-19 | 2019-10-30 | 芝浦メカトロニクス株式会社 | 基板処理装置、および基板処理方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4433951A (en) * | 1981-02-13 | 1984-02-28 | Lam Research Corporation | Modular loadlock |
US4553069A (en) * | 1984-01-05 | 1985-11-12 | General Ionex Corporation | Wafer holding apparatus for ion implantation |
US5004924A (en) * | 1985-01-28 | 1991-04-02 | Tokyo Electron Limited | Wafer transport apparatus for ion implantation apparatus |
JPS6235513A (ja) * | 1985-08-09 | 1987-02-16 | Hitachi Ltd | 分子線エピタキシ装置 |
US4700077A (en) * | 1986-03-05 | 1987-10-13 | Eaton Corporation | Ion beam implanter control system |
US4705951A (en) * | 1986-04-17 | 1987-11-10 | Varian Associates, Inc. | Wafer processing system |
US4745287A (en) * | 1986-10-23 | 1988-05-17 | Ionex/Hei | Ion implantation with variable implant angle |
US4831270A (en) * | 1987-05-21 | 1989-05-16 | Ion Implant Services | Ion implantation apparatus |
US4986715A (en) * | 1988-07-13 | 1991-01-22 | Tokyo Electron Limited | Stock unit for storing carriers |
US5064337A (en) * | 1988-07-19 | 1991-11-12 | Tokyo Electron Limited | Handling apparatus for transferring carriers and a method of transferring carriers |
-
1991
- 1991-03-01 JP JP3062660A patent/JPH05275511A/ja active Pending
-
1992
- 1992-02-26 EP EP92103255A patent/EP0502412B1/de not_active Expired - Lifetime
- 1992-02-26 DE DE69210290T patent/DE69210290T2/de not_active Expired - Fee Related
- 1992-02-27 US US07/842,421 patent/US5248886A/en not_active Expired - Lifetime
- 1992-02-29 KR KR1019920003309A patent/KR0170411B1/ko not_active IP Right Cessation
-
1993
- 1993-08-20 US US08/109,733 patent/US5357115A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR920018827A (ko) | 1992-10-22 |
KR0170411B1 (ko) | 1999-03-30 |
JPH05275511A (ja) | 1993-10-22 |
EP0502412B1 (de) | 1996-05-01 |
US5357115A (en) | 1994-10-18 |
DE69210290T2 (de) | 1996-10-02 |
US5248886A (en) | 1993-09-28 |
EP0502412A1 (de) | 1992-09-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |