KR20120111997A - 펠리클막, 그 제조 방법 및 그 막을 붙인 펠리클 - Google Patents
펠리클막, 그 제조 방법 및 그 막을 붙인 펠리클 Download PDFInfo
- Publication number
- KR20120111997A KR20120111997A KR1020120017363A KR20120017363A KR20120111997A KR 20120111997 A KR20120111997 A KR 20120111997A KR 1020120017363 A KR1020120017363 A KR 1020120017363A KR 20120017363 A KR20120017363 A KR 20120017363A KR 20120111997 A KR20120111997 A KR 20120111997A
- Authority
- KR
- South Korea
- Prior art keywords
- pellicle
- pellicle film
- layer
- film
- ultraviolet
- Prior art date
Links
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- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 8
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- 239000011737 fluorine Substances 0.000 description 8
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Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011077976A JP5279862B2 (ja) | 2011-03-31 | 2011-03-31 | ペリクル膜、その製造方法及び該膜を張ったペリクル |
| JPJP-P-2011-077976 | 2011-03-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| KR20120111997A true KR20120111997A (ko) | 2012-10-11 |
Family
ID=46992129
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020120017363A KR20120111997A (ko) | 2011-03-31 | 2012-02-21 | 펠리클막, 그 제조 방법 및 그 막을 붙인 펠리클 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP5279862B2 (ja) |
| KR (1) | KR20120111997A (ja) |
| CN (1) | CN102736400B (ja) |
| HK (1) | HK1174397A1 (ja) |
| TW (1) | TWI446104B (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20160063235A (ko) * | 2014-11-26 | 2016-06-03 | 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 | Euv 마스크용 펠리클 및 그 제조 |
| US10488751B2 (en) | 2014-09-19 | 2019-11-26 | Mitsui Chemicals, Inc. | Pellicle, production method thereof, exposure method |
| US10585348B2 (en) | 2014-09-19 | 2020-03-10 | Mitsui Chemicals, Inc. | Pellicle, pellicle production method and exposure method using pellicle |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002048432A2 (en) | 2000-12-15 | 2002-06-20 | The Arizona Board Of Regents | Method for patterning metal using nanoparticle containing precursors |
| TWI578096B (zh) * | 2013-03-22 | 2017-04-11 | V科技股份有限公司 | 校正用光罩及校正方法 |
| JP2018049256A (ja) | 2016-04-05 | 2018-03-29 | 旭化成株式会社 | ペリクル |
| TWI641783B (zh) | 2016-09-02 | 2018-11-21 | 蔡惟名 | Gas burner and its safety switch |
| KR20190038369A (ko) | 2017-09-29 | 2019-04-08 | 아사히 가세이 가부시키가이샤 | 펠리클 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2938636B2 (ja) * | 1991-09-26 | 1999-08-23 | 信越化学工業株式会社 | リソグラフィ−用ペリクル |
| JPH0594006A (ja) * | 1991-10-01 | 1993-04-16 | Asahi Chem Ind Co Ltd | 耐光性ペリクル |
| JPH10139932A (ja) * | 1996-11-05 | 1998-05-26 | Asahi Chem Ind Co Ltd | ペリクルの製造方法及びそれにより得られたペリクル |
| JP2005070120A (ja) * | 2003-08-27 | 2005-03-17 | Shin Etsu Chem Co Ltd | リソグラフィ用ペリクル |
| TWI493278B (zh) * | 2008-11-21 | 2015-07-21 | Asahi Kasei E Materials Corp | A film (PELLICLE) film, a film for manufacturing a mask for manufacturing a TFT liquid crystal panel, and a film containing a film |
-
2011
- 2011-03-31 JP JP2011077976A patent/JP5279862B2/ja not_active Expired - Fee Related
-
2012
- 2012-02-21 KR KR1020120017363A patent/KR20120111997A/ko not_active Application Discontinuation
- 2012-03-30 TW TW101111217A patent/TWI446104B/zh not_active IP Right Cessation
- 2012-03-30 CN CN201210091249.9A patent/CN102736400B/zh not_active Expired - Fee Related
-
2013
- 2013-01-28 HK HK13101203.6A patent/HK1174397A1/xx not_active IP Right Cessation
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10488751B2 (en) | 2014-09-19 | 2019-11-26 | Mitsui Chemicals, Inc. | Pellicle, production method thereof, exposure method |
| US10585348B2 (en) | 2014-09-19 | 2020-03-10 | Mitsui Chemicals, Inc. | Pellicle, pellicle production method and exposure method using pellicle |
| KR20160063235A (ko) * | 2014-11-26 | 2016-06-03 | 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 | Euv 마스크용 펠리클 및 그 제조 |
| US10031411B2 (en) | 2014-11-26 | 2018-07-24 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle for EUV mask and fabrication thereof |
| US10520806B2 (en) | 2014-11-26 | 2019-12-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle for EUV mask and fabrication thereof |
| US10831094B2 (en) | 2014-11-26 | 2020-11-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle for EUV mask and fabrication thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201305721A (zh) | 2013-02-01 |
| TWI446104B (zh) | 2014-07-21 |
| CN102736400B (zh) | 2014-02-05 |
| JP5279862B2 (ja) | 2013-09-04 |
| JP2012212043A (ja) | 2012-11-01 |
| CN102736400A (zh) | 2012-10-17 |
| HK1174397A1 (en) | 2013-06-07 |
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