HK1174397A1 - Dust-prevention film, the manufacturing method thereof and the dust- prevention component with the film attached - Google Patents

Dust-prevention film, the manufacturing method thereof and the dust- prevention component with the film attached

Info

Publication number
HK1174397A1
HK1174397A1 HK13101203.6A HK13101203A HK1174397A1 HK 1174397 A1 HK1174397 A1 HK 1174397A1 HK 13101203 A HK13101203 A HK 13101203A HK 1174397 A1 HK1174397 A1 HK 1174397A1
Authority
HK
Hong Kong
Prior art keywords
dust
prevention
film
manufacturing
component
Prior art date
Application number
HK13101203.6A
Other languages
English (en)
Inventor
Kazutoshi Sekihara
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of HK1174397A1 publication Critical patent/HK1174397A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
HK13101203.6A 2011-03-31 2013-01-28 Dust-prevention film, the manufacturing method thereof and the dust- prevention component with the film attached HK1174397A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011077976A JP5279862B2 (ja) 2011-03-31 2011-03-31 ペリクル膜、その製造方法及び該膜を張ったペリクル

Publications (1)

Publication Number Publication Date
HK1174397A1 true HK1174397A1 (en) 2013-06-07

Family

ID=46992129

Family Applications (1)

Application Number Title Priority Date Filing Date
HK13101203.6A HK1174397A1 (en) 2011-03-31 2013-01-28 Dust-prevention film, the manufacturing method thereof and the dust- prevention component with the film attached

Country Status (5)

Country Link
JP (1) JP5279862B2 (xx)
KR (1) KR20120111997A (xx)
CN (1) CN102736400B (xx)
HK (1) HK1174397A1 (xx)
TW (1) TWI446104B (xx)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4463473B2 (ja) 2000-12-15 2010-05-19 ジ・アリゾナ・ボード・オブ・リージェンツ 前駆体を含有するナノ粒子を用いた金属のパターニング方法
TWI578096B (zh) * 2013-03-22 2017-04-11 V科技股份有限公司 校正用光罩及校正方法
EP3196699A4 (en) 2014-09-19 2018-05-16 Mitsui Chemicals, Inc. Pellicle, production method thereof, exposure method
CN106796391B (zh) 2014-09-19 2020-02-11 三井化学株式会社 防护膜组件、防护膜组件的制造方法及使用了防护膜组件的曝光方法
US10031411B2 (en) 2014-11-26 2018-07-24 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle for EUV mask and fabrication thereof
JP2018049256A (ja) 2016-04-05 2018-03-29 旭化成株式会社 ペリクル
TWI641783B (zh) 2016-09-02 2018-11-21 蔡惟名 Gas burner and its safety switch
KR20190038369A (ko) 2017-09-29 2019-04-08 아사히 가세이 가부시키가이샤 펠리클

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2938636B2 (ja) * 1991-09-26 1999-08-23 信越化学工業株式会社 リソグラフィ−用ペリクル
JPH0594006A (ja) * 1991-10-01 1993-04-16 Asahi Chem Ind Co Ltd 耐光性ペリクル
JPH10139932A (ja) * 1996-11-05 1998-05-26 Asahi Chem Ind Co Ltd ペリクルの製造方法及びそれにより得られたペリクル
JP2005070120A (ja) * 2003-08-27 2005-03-17 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル
KR101338037B1 (ko) * 2008-11-21 2014-01-28 호야 가부시키가이샤 펠리클막, ｔｆｔ 액정 패널 제조용 마스크와 함께 이용하는 펠리클, 및 상기 펠리클을 포함하는 포토마스크

Also Published As

Publication number Publication date
TWI446104B (zh) 2014-07-21
JP5279862B2 (ja) 2013-09-04
JP2012212043A (ja) 2012-11-01
CN102736400A (zh) 2012-10-17
KR20120111997A (ko) 2012-10-11
CN102736400B (zh) 2014-02-05
TW201305721A (zh) 2013-02-01

Similar Documents

Publication Publication Date Title
TWI562424B (en) Light-emitting panel, light-emitting device, and method for manufacturing the light-emitting panel
GB2497478B (en) Substrate with built-in component, and method the same
GB201215798D0 (en) Pallet and method for manufacturing the same
HK1156116A1 (zh) 光學元件及其製造方法
EP2736425A4 (en) INTRAVASCULAR THROMBLEBLEKTOMY DEVICE AND METHOD THEREFOR
EP2680754A4 (en) DEVICES, SYSTEMS, AND METHODS ASSOCIATED WITH ANALYTE MONITORING DEVICES, AND DEVICES COMPRISING SAID ANALYTE MONITORING DEVICES
TWI563539B (en) Composite substrate, manufacturing method thereof and light emitting device having the same
EP2862213A4 (en) LAYER STRUCTURE FOR OLED DEVICE, ITS MANUFACTURING METHOD, AND OLED DEVICE HAVING THE SAME
EP2740547A4 (en) METHOD OF MANUFACTURING A FUNCTIONAL FILM AND FUNCTIONAL FILM
SG11201504015SA (en) Composite substrate manufacturing method, and composite substrate
IL238832A0 (en) A method for creating a formal film and a formal film created from it
EP2699959A4 (en) OPTICAL ELEMENT, DISPLAY DEVICE THEREFOR AND METHOD OF MANUFACTURING THEREOF
EP2672273A4 (en) INSPECTION SCHIP AND INSPECTION SCHIPE EQUIPPED WITH THE INSPECTION SCHIP
TWI563337B (en) Reflection type mask and method for manufacturing the same
HK1174397A1 (en) Dust-prevention film, the manufacturing method thereof and the dust- prevention component with the film attached
EP2769839A4 (en) MULTILAYER FILM AND METHOD OF MANUFACTURING THE SAME
TWI560400B (en) Laminate film and method for manufacturing the same, and laminate structure
GB201222500D0 (en) Display device and method for manufacturing the same
IL229262A0 (en) Superstructure and methods for its production
EP2624672A4 (en) METHOD FOR PRODUCING A SUBSTRATE WITH INTEGRATED COMPONENT AND SUBSTRATE PRODUCED BY THIS PROCESS WITH INTEGRATED COMPONENT
HK1174400A1 (en) Frame for dust-prevention film component, the manufacturing method thereof, and dust-prevention film component
SG11201500017YA (en) Microchip and method for producing manufacturing the same
EP2678378A4 (en) FLUOROPOLYMER FILMS AND MANUFACTURING METHOD THEREFOR
EP2676800A4 (en) ELEMENT WITH A CONCAVE PART AND MANUFACTURING METHOD THEREFOR
EP2525423A4 (en) METHOD FOR MANUFACTURING PIEZOELECTRIC ELEMENT, AND PIEZOELECTRIC ELEMENT MANUFACTURED USING THE METHOD

Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20220403