KR20040030517A - 기판을 균일하게 코팅하는 방법 - Google Patents

기판을 균일하게 코팅하는 방법 Download PDF

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Publication number
KR20040030517A
KR20040030517A KR10-2003-7011353A KR20037011353A KR20040030517A KR 20040030517 A KR20040030517 A KR 20040030517A KR 20037011353 A KR20037011353 A KR 20037011353A KR 20040030517 A KR20040030517 A KR 20040030517A
Authority
KR
South Korea
Prior art keywords
wafer
extrusion
substrate
photoresist
housing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
KR10-2003-7011353A
Other languages
English (en)
Korean (ko)
Inventor
구러에미어
종톰
르웰런존
리에드워드씨
맨달로버트피
그램보제임스씨
베테스테드씨
사우어도날드알
와드에드몬드알
Original Assignee
실리콘 밸리 그룹, 인크.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/795,924 external-priority patent/US6977098B2/en
Application filed by 실리콘 밸리 그룹, 인크. filed Critical 실리콘 밸리 그룹, 인크.
Publication of KR20040030517A publication Critical patent/KR20040030517A/ko
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0208—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to separate articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0254—Coating heads with slot-shaped outlet
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/002—Processes for applying liquids or other fluent materials the substrate being rotated
    • B05D1/005—Spin coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/04—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to gases
    • B05D3/0486—Operating the coating or treatment in a controlled atmosphere
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0245—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work for applying liquid or other fluent material to a moving work of indefinite length, e.g. to a moving web
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • B05D1/265—Extrusion coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR10-2003-7011353A 2001-02-28 2002-02-21 기판을 균일하게 코팅하는 방법 Ceased KR20040030517A (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US09/795,924 2001-02-28
US09/795,924 US6977098B2 (en) 1994-10-27 2001-02-28 Method of uniformly coating a substrate
US09/895,786 2001-06-30
US09/895,786 US7018943B2 (en) 1994-10-27 2001-06-30 Method of uniformly coating a substrate
PCT/US2002/005187 WO2002071154A2 (en) 2001-02-28 2002-02-21 Method of uniformly coating a substrate

Publications (1)

Publication Number Publication Date
KR20040030517A true KR20040030517A (ko) 2004-04-09

Family

ID=27121668

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2003-7011353A Ceased KR20040030517A (ko) 2001-02-28 2002-02-21 기판을 균일하게 코팅하는 방법

Country Status (7)

Country Link
US (1) US7018943B2 (https=)
EP (1) EP1364256A2 (https=)
JP (1) JP2004531879A (https=)
KR (1) KR20040030517A (https=)
CN (1) CN1265245C (https=)
AU (1) AU2002252049A1 (https=)
WO (1) WO2002071154A2 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190060557A (ko) 2017-11-24 2019-06-03 고려대학교 산학협력단 코팅 비드 영역이 개선된 슬롯 코팅 장치

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US7018943B2 (en) 1994-10-27 2006-03-28 Asml Holding N.V. Method of uniformly coating a substrate
US6977098B2 (en) * 1994-10-27 2005-12-20 Asml Holding N.V. Method of uniformly coating a substrate
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CN104810252B (zh) * 2014-01-24 2018-07-06 中芯国际集成电路制造(上海)有限公司 底部抗反射涂层的涂布方法
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US9548199B2 (en) * 2014-09-09 2017-01-17 Texas Instruments Incorporated Method of forming a thin film that eliminates air bubbles
KR102284064B1 (ko) * 2014-09-16 2021-08-02 에이씨엠 리서치 (상하이) 인코포레이티드 자동 클리닝 기능을 갖는 코터 및 코터 자동 클리닝 방법
CN110673444B (zh) * 2019-09-12 2020-06-09 中国科学院上海光学精密机械研究所 超大超重衬底表面光刻胶均匀涂覆的旋涂设备
CN110867529A (zh) * 2019-10-22 2020-03-06 深圳市华星光电半导体显示技术有限公司 真空冷却干燥设备以及显示功能层干燥方法
CN113318941B (zh) * 2020-07-27 2022-10-14 上海先进半导体制造有限公司 在晶圆表面的聚酰亚胺前驱体的旋涂方法和系统
JP7597459B2 (ja) * 2020-09-14 2024-12-10 東京エレクトロン株式会社 原料供給装置及び原料供給方法
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20190060557A (ko) 2017-11-24 2019-06-03 고려대학교 산학협력단 코팅 비드 영역이 개선된 슬롯 코팅 장치

Also Published As

Publication number Publication date
JP2004531879A (ja) 2004-10-14
CN1265245C (zh) 2006-07-19
EP1364256A2 (en) 2003-11-26
US7018943B2 (en) 2006-03-28
WO2002071154A3 (en) 2003-02-20
WO2002071154A2 (en) 2002-09-12
AU2002252049A1 (en) 2002-09-19
US20020127334A1 (en) 2002-09-12
CN1503928A (zh) 2004-06-09

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