KR102208848B1 - 익스팬드 시트 - Google Patents
익스팬드 시트 Download PDFInfo
- Publication number
- KR102208848B1 KR102208848B1 KR1020170059284A KR20170059284A KR102208848B1 KR 102208848 B1 KR102208848 B1 KR 102208848B1 KR 1020170059284 A KR1020170059284 A KR 1020170059284A KR 20170059284 A KR20170059284 A KR 20170059284A KR 102208848 B1 KR102208848 B1 KR 102208848B1
- Authority
- KR
- South Korea
- Prior art keywords
- expand sheet
- glue layer
- holding unit
- sheet
- frame
- Prior art date
Links
Images
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
- B23K26/364—Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/70—Auxiliary operations or equipment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Dicing (AREA)
- Adhesive Tapes (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2016-098227 | 2016-05-16 | ||
JP2016098227A JP6723644B2 (ja) | 2016-05-16 | 2016-05-16 | エキスパンドシート |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20170129059A KR20170129059A (ko) | 2017-11-24 |
KR102208848B1 true KR102208848B1 (ko) | 2021-01-27 |
Family
ID=60415626
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020170059284A KR102208848B1 (ko) | 2016-05-16 | 2017-05-12 | 익스팬드 시트 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6723644B2 (ja) |
KR (1) | KR102208848B1 (ja) |
CN (1) | CN107442943B (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2021022606A (ja) * | 2019-07-25 | 2021-02-18 | 株式会社ディスコ | ウェーハの分割方法及びウェーハの分割に用いるテープ |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100751182B1 (ko) | 2006-07-25 | 2007-08-22 | 제일모직주식회사 | 박막 웨이퍼의 다이싱용 다이 본드 필름의 제조방법 |
JP2009147201A (ja) | 2007-12-17 | 2009-07-02 | Denki Kagaku Kogyo Kk | ダイシングシート、その製造方法、および電子部品の製造方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4664739A (en) * | 1983-12-19 | 1987-05-12 | Stauffer Chemical Company | Removal of semiconductor wafers from dicing film |
JP3408805B2 (ja) | 2000-09-13 | 2003-05-19 | 浜松ホトニクス株式会社 | 切断起点領域形成方法及び加工対象物切断方法 |
EP1635390B1 (en) | 2002-03-12 | 2011-07-27 | Hamamatsu Photonics K. K. | Substrate dividing method |
JP4923398B2 (ja) * | 2004-09-21 | 2012-04-25 | 日立化成工業株式会社 | 接着剤層付き半導体素子の製造方法 |
JP2006229021A (ja) * | 2005-02-18 | 2006-08-31 | Disco Abrasive Syst Ltd | ウエーハの分割方法 |
CN102093828A (zh) * | 2007-09-14 | 2011-06-15 | 古河电气工业株式会社 | 晶片加工用带 |
JP2011077482A (ja) | 2009-10-02 | 2011-04-14 | Disco Abrasive Syst Ltd | テープ拡張装置 |
JP4976531B2 (ja) * | 2010-09-06 | 2012-07-18 | 日東電工株式会社 | 半導体装置用フィルム |
JP2012069586A (ja) * | 2010-09-21 | 2012-04-05 | Nitto Denko Corp | ダイシング・ダイボンドフィルム、ダイシング・ダイボンドフィルムの製造方法、及び、半導体装置の製造方法 |
US9786541B2 (en) * | 2011-09-30 | 2017-10-10 | Lintec Corporation | Dicing sheet with protective film forming layer and chip fabrication method |
JP5980600B2 (ja) | 2012-07-12 | 2016-08-31 | 株式会社ディスコ | テープ拡張装置 |
JP5992277B2 (ja) * | 2012-09-20 | 2016-09-14 | 株式会社ディスコ | 加工方法 |
US10030174B2 (en) * | 2013-03-27 | 2018-07-24 | Lintec Corporation | Composite sheet for forming protective film |
KR102535477B1 (ko) * | 2014-05-23 | 2023-05-23 | 가부시끼가이샤 레조낙 | 다이본드 다이싱 시트 |
-
2016
- 2016-05-16 JP JP2016098227A patent/JP6723644B2/ja active Active
-
2017
- 2017-05-10 CN CN201710327584.7A patent/CN107442943B/zh active Active
- 2017-05-12 KR KR1020170059284A patent/KR102208848B1/ko active IP Right Grant
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100751182B1 (ko) | 2006-07-25 | 2007-08-22 | 제일모직주식회사 | 박막 웨이퍼의 다이싱용 다이 본드 필름의 제조방법 |
JP2009147201A (ja) | 2007-12-17 | 2009-07-02 | Denki Kagaku Kogyo Kk | ダイシングシート、その製造方法、および電子部品の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
CN107442943A (zh) | 2017-12-08 |
CN107442943B (zh) | 2021-01-29 |
JP6723644B2 (ja) | 2020-07-15 |
JP2017208390A (ja) | 2017-11-24 |
KR20170129059A (ko) | 2017-11-24 |
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Legal Events
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A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant |