KR102193400B1 - 에너지선 경화형 수지 조성물 및 그 경화물 - Google Patents
에너지선 경화형 수지 조성물 및 그 경화물 Download PDFInfo
- Publication number
- KR102193400B1 KR102193400B1 KR1020157022269A KR20157022269A KR102193400B1 KR 102193400 B1 KR102193400 B1 KR 102193400B1 KR 1020157022269 A KR1020157022269 A KR 1020157022269A KR 20157022269 A KR20157022269 A KR 20157022269A KR 102193400 B1 KR102193400 B1 KR 102193400B1
- Authority
- KR
- South Korea
- Prior art keywords
- meth
- acrylate
- compound
- resin composition
- poly
- Prior art date
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1811—C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1818—C13or longer chain (meth)acrylate, e.g. stearyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Materials Engineering (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013071027A JP6099198B2 (ja) | 2013-03-29 | 2013-03-29 | エネルギー線硬化型樹脂組成物及びその硬化物 |
JPJP-P-2013-071027 | 2013-03-29 | ||
PCT/JP2014/059201 WO2014157642A1 (ja) | 2013-03-29 | 2014-03-28 | エネルギー線硬化型樹脂組成物及びその硬化物 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20150137049A KR20150137049A (ko) | 2015-12-08 |
KR102193400B1 true KR102193400B1 (ko) | 2020-12-21 |
Family
ID=51624598
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020157022269A KR102193400B1 (ko) | 2013-03-29 | 2014-03-28 | 에너지선 경화형 수지 조성물 및 그 경화물 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6099198B2 (zh) |
KR (1) | KR102193400B1 (zh) |
CN (1) | CN105073800B (zh) |
TW (1) | TWI654212B (zh) |
WO (1) | WO2014157642A1 (zh) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2016068415A1 (ko) * | 2014-10-28 | 2016-05-06 | 삼성에스디아이 주식회사 | 광경화 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 장치 |
WO2016068414A1 (ko) * | 2014-10-29 | 2016-05-06 | 삼성에스디아이 주식회사 | 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치 |
WO2016068416A1 (ko) * | 2014-10-29 | 2016-05-06 | 삼성에스디아이 주식회사 | 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치 |
KR101871549B1 (ko) * | 2014-10-29 | 2018-07-03 | 삼성에스디아이 주식회사 | 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치 |
CN107683637A (zh) * | 2015-06-15 | 2018-02-09 | 日希机电株式会社 | 机器的散热方法 |
KR101943689B1 (ko) | 2015-06-19 | 2019-01-30 | 삼성에스디아이 주식회사 | 유기발광표시장치 |
KR101943687B1 (ko) * | 2015-06-19 | 2019-01-30 | 삼성에스디아이 주식회사 | 유기발광표시장치 |
KR101943688B1 (ko) * | 2015-06-19 | 2019-01-30 | 삼성에스디아이 주식회사 | 유기발광표시장치 |
CN109416509B (zh) * | 2016-07-06 | 2022-07-29 | 富士胶片株式会社 | 感光性组合物、转印膜、固化膜、以及触摸面板及其制造方法 |
KR101928803B1 (ko) | 2016-08-03 | 2018-12-17 | 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 | (메트)아크릴계 조성물, 이를 포함하는 도료 및 경화체 |
WO2018070488A1 (ja) | 2016-10-14 | 2018-04-19 | デンカ株式会社 | 組成物 |
JP6936330B2 (ja) | 2017-10-26 | 2021-09-15 | デンカ株式会社 | 有機エレクトロルミネッセンス表示素子用封止剤 |
KR20200143442A (ko) | 2018-04-16 | 2020-12-23 | 덴카 주식회사 | 유기 일렉트로루미네센스 표시 소자용 봉지제 |
KR102323778B1 (ko) * | 2019-12-04 | 2021-11-11 | 주식회사 트리엘 | 아다만틸 아크릴계 모노머를 포함하는 저유전 코팅액 조성물 |
KR20210082015A (ko) * | 2019-12-24 | 2021-07-02 | 솔루스첨단소재 주식회사 | 봉지용 조성물, 이를 포함하는 봉지층 및 이를 포함하는 봉지화된 장치 |
CN113248653B (zh) * | 2020-02-13 | 2023-05-19 | 三星Sdi株式会社 | 封装有机发光装置的组合物以及有机发光装置显示设备 |
JPWO2021200668A1 (zh) | 2020-03-31 | 2021-10-07 | ||
JPWO2021241437A1 (zh) | 2020-05-29 | 2021-12-02 | ||
WO2022039019A1 (ja) * | 2020-08-19 | 2022-02-24 | コニカミノルタ株式会社 | 電子デバイス封止用組成物、電子デバイス封止膜形成方法及び電子デバイス封止膜 |
CN117296450A (zh) | 2021-04-30 | 2023-12-26 | 柯尼卡美能达株式会社 | 电子器件密封用组合物、电子器件密封膜形成方法以及电子器件密封膜 |
WO2023032372A1 (ja) | 2021-08-30 | 2023-03-09 | コニカミノルタ株式会社 | 電子デバイス封止用組成物、電子デバイス封止膜形成方法及び電子デバイス封止膜 |
WO2023153385A1 (ja) * | 2022-02-08 | 2023-08-17 | 三井化学株式会社 | 紫外線硬化性樹脂組成物及び表示装置 |
Citations (3)
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JP2011090775A (ja) * | 2010-12-08 | 2011-05-06 | Toshiba Corp | 半導体装置の製造方法 |
JP2012111931A (ja) * | 2010-11-01 | 2012-06-14 | Osaka Gas Chem Kk | ハードコート性樹脂組成物及びその硬化物 |
JP2012186356A (ja) * | 2011-03-07 | 2012-09-27 | Fujifilm Corp | インプリント用硬化性組成物、パターン形成方法およびパターン |
Family Cites Families (15)
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JP2679586B2 (ja) | 1993-08-17 | 1997-11-19 | 東亞合成株式会社 | 活性エネルギー線硬化型組成物 |
JP2000169552A (ja) | 1998-12-08 | 2000-06-20 | Toagosei Co Ltd | カチオン硬化性樹脂組成物 |
JP2001081182A (ja) | 1999-09-09 | 2001-03-27 | Nippon Shokubai Co Ltd | 重合性樹脂および重合性樹脂組成物 |
JP4655172B2 (ja) | 2000-04-27 | 2011-03-23 | 日立化成工業株式会社 | 水酸基含有オキセタン化合物 |
JP3876630B2 (ja) | 2001-03-01 | 2007-02-07 | 東亞合成株式会社 | 硬化性組成物 |
JP4421938B2 (ja) | 2004-05-10 | 2010-02-24 | 日東電工株式会社 | 紫外線硬化型樹脂組成物 |
US8187718B2 (en) * | 2008-04-14 | 2012-05-29 | Fujifilm Corporation | Barrier laminate, barrier film substrate and device |
US8829070B2 (en) * | 2009-08-31 | 2014-09-09 | Kabushiki Kaisha Toshiba | Ultraviolet-curable resin material for pattern transfer and magnetic recording medium manufacturing method using the same |
JP5691314B2 (ja) * | 2010-09-08 | 2015-04-01 | 東レ株式会社 | ポリエステルフィルム、およびそれを用いた太陽電池 |
JP4988032B2 (ja) * | 2010-12-08 | 2012-08-01 | 株式会社東芝 | 磁気記録媒体の製造方法 |
JP2012216682A (ja) * | 2011-03-31 | 2012-11-08 | Jsr Corp | ナノインプリント用感放射線性組成物、及びパターン形成方法 |
WO2012141000A1 (ja) * | 2011-04-11 | 2012-10-18 | 昭和電工株式会社 | 共重合体、その共重合体を含む樹脂組成物及び感光性樹脂組成物、並びにカラーフィルター |
JP2013076015A (ja) * | 2011-09-30 | 2013-04-25 | Nippon Zeon Co Ltd | 重合性組成物、樹脂成形体、および積層体 |
JP5846974B2 (ja) * | 2012-03-13 | 2016-01-20 | 富士フイルム株式会社 | 光インプリント用硬化性組成物、パターン形成方法およびパターン |
JP2013249381A (ja) * | 2012-05-31 | 2013-12-12 | Idemitsu Kosan Co Ltd | 電子素子用絶縁材料形成用組成物及び電子素子 |
-
2013
- 2013-03-29 JP JP2013071027A patent/JP6099198B2/ja not_active Expired - Fee Related
-
2014
- 2014-03-28 WO PCT/JP2014/059201 patent/WO2014157642A1/ja active Application Filing
- 2014-03-28 KR KR1020157022269A patent/KR102193400B1/ko active IP Right Grant
- 2014-03-28 CN CN201480019186.3A patent/CN105073800B/zh not_active Expired - Fee Related
- 2014-03-31 TW TW103111941A patent/TWI654212B/zh not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012111931A (ja) * | 2010-11-01 | 2012-06-14 | Osaka Gas Chem Kk | ハードコート性樹脂組成物及びその硬化物 |
JP2011090775A (ja) * | 2010-12-08 | 2011-05-06 | Toshiba Corp | 半導体装置の製造方法 |
JP2012186356A (ja) * | 2011-03-07 | 2012-09-27 | Fujifilm Corp | インプリント用硬化性組成物、パターン形成方法およびパターン |
Also Published As
Publication number | Publication date |
---|---|
WO2014157642A1 (ja) | 2014-10-02 |
TW201504265A (zh) | 2015-02-01 |
CN105073800B (zh) | 2018-05-04 |
CN105073800A (zh) | 2015-11-18 |
JP2014193970A (ja) | 2014-10-09 |
KR20150137049A (ko) | 2015-12-08 |
JP6099198B2 (ja) | 2017-03-22 |
TWI654212B (zh) | 2019-03-21 |
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