KR102193400B1 - 에너지선 경화형 수지 조성물 및 그 경화물 - Google Patents

에너지선 경화형 수지 조성물 및 그 경화물 Download PDF

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KR102193400B1
KR102193400B1 KR1020157022269A KR20157022269A KR102193400B1 KR 102193400 B1 KR102193400 B1 KR 102193400B1 KR 1020157022269 A KR1020157022269 A KR 1020157022269A KR 20157022269 A KR20157022269 A KR 20157022269A KR 102193400 B1 KR102193400 B1 KR 102193400B1
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meth
acrylate
compound
resin composition
poly
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KR1020157022269A
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Korean (ko)
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KR20150137049A (ko
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준 키도바
유이치로 마츠오
노부히코 나이토
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닛뽄 가야쿠 가부시키가이샤
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/14Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur, or oxygen atoms in addition to the carboxy oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1811C10or C11-(Meth)acrylate, e.g. isodecyl (meth)acrylate, isobornyl (meth)acrylate or 2-naphthyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/12Esters of monohydric alcohols or phenols
    • C08F220/16Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
    • C08F220/18Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
    • C08F220/1818C13or longer chain (meth)acrylate, e.g. stearyl (meth)acrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/26Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/301Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10Esters
    • C08F222/1006Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Materials Engineering (AREA)
KR1020157022269A 2013-03-29 2014-03-28 에너지선 경화형 수지 조성물 및 그 경화물 KR102193400B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013071027A JP6099198B2 (ja) 2013-03-29 2013-03-29 エネルギー線硬化型樹脂組成物及びその硬化物
JPJP-P-2013-071027 2013-03-29
PCT/JP2014/059201 WO2014157642A1 (ja) 2013-03-29 2014-03-28 エネルギー線硬化型樹脂組成物及びその硬化物

Publications (2)

Publication Number Publication Date
KR20150137049A KR20150137049A (ko) 2015-12-08
KR102193400B1 true KR102193400B1 (ko) 2020-12-21

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KR1020157022269A KR102193400B1 (ko) 2013-03-29 2014-03-28 에너지선 경화형 수지 조성물 및 그 경화물

Country Status (5)

Country Link
JP (1) JP6099198B2 (zh)
KR (1) KR102193400B1 (zh)
CN (1) CN105073800B (zh)
TW (1) TWI654212B (zh)
WO (1) WO2014157642A1 (zh)

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WO2016068415A1 (ko) * 2014-10-28 2016-05-06 삼성에스디아이 주식회사 광경화 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 장치
WO2016068414A1 (ko) * 2014-10-29 2016-05-06 삼성에스디아이 주식회사 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치
WO2016068416A1 (ko) * 2014-10-29 2016-05-06 삼성에스디아이 주식회사 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치
KR101871549B1 (ko) * 2014-10-29 2018-07-03 삼성에스디아이 주식회사 디스플레이 밀봉재용 조성물, 이를 포함하는 유기보호층, 및 이를 포함하는 디스플레이 장치
CN107683637A (zh) * 2015-06-15 2018-02-09 日希机电株式会社 机器的散热方法
KR101943689B1 (ko) 2015-06-19 2019-01-30 삼성에스디아이 주식회사 유기발광표시장치
KR101943687B1 (ko) * 2015-06-19 2019-01-30 삼성에스디아이 주식회사 유기발광표시장치
KR101943688B1 (ko) * 2015-06-19 2019-01-30 삼성에스디아이 주식회사 유기발광표시장치
CN109416509B (zh) * 2016-07-06 2022-07-29 富士胶片株式会社 感光性组合物、转印膜、固化膜、以及触摸面板及其制造方法
KR101928803B1 (ko) 2016-08-03 2018-12-17 미쯔비시 가스 케미칼 컴파니, 인코포레이티드 (메트)아크릴계 조성물, 이를 포함하는 도료 및 경화체
WO2018070488A1 (ja) 2016-10-14 2018-04-19 デンカ株式会社 組成物
JP6936330B2 (ja) 2017-10-26 2021-09-15 デンカ株式会社 有機エレクトロルミネッセンス表示素子用封止剤
KR20200143442A (ko) 2018-04-16 2020-12-23 덴카 주식회사 유기 일렉트로루미네센스 표시 소자용 봉지제
KR102323778B1 (ko) * 2019-12-04 2021-11-11 주식회사 트리엘 아다만틸 아크릴계 모노머를 포함하는 저유전 코팅액 조성물
KR20210082015A (ko) * 2019-12-24 2021-07-02 솔루스첨단소재 주식회사 봉지용 조성물, 이를 포함하는 봉지층 및 이를 포함하는 봉지화된 장치
CN113248653B (zh) * 2020-02-13 2023-05-19 三星Sdi株式会社 封装有机发光装置的组合物以及有机发光装置显示设备
JPWO2021200668A1 (zh) 2020-03-31 2021-10-07
JPWO2021241437A1 (zh) 2020-05-29 2021-12-02
WO2022039019A1 (ja) * 2020-08-19 2022-02-24 コニカミノルタ株式会社 電子デバイス封止用組成物、電子デバイス封止膜形成方法及び電子デバイス封止膜
CN117296450A (zh) 2021-04-30 2023-12-26 柯尼卡美能达株式会社 电子器件密封用组合物、电子器件密封膜形成方法以及电子器件密封膜
WO2023032372A1 (ja) 2021-08-30 2023-03-09 コニカミノルタ株式会社 電子デバイス封止用組成物、電子デバイス封止膜形成方法及び電子デバイス封止膜
WO2023153385A1 (ja) * 2022-02-08 2023-08-17 三井化学株式会社 紫外線硬化性樹脂組成物及び表示装置

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JP2012111931A (ja) * 2010-11-01 2012-06-14 Osaka Gas Chem Kk ハードコート性樹脂組成物及びその硬化物
JP2012186356A (ja) * 2011-03-07 2012-09-27 Fujifilm Corp インプリント用硬化性組成物、パターン形成方法およびパターン

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JP2012111931A (ja) * 2010-11-01 2012-06-14 Osaka Gas Chem Kk ハードコート性樹脂組成物及びその硬化物
JP2011090775A (ja) * 2010-12-08 2011-05-06 Toshiba Corp 半導体装置の製造方法
JP2012186356A (ja) * 2011-03-07 2012-09-27 Fujifilm Corp インプリント用硬化性組成物、パターン形成方法およびパターン

Also Published As

Publication number Publication date
WO2014157642A1 (ja) 2014-10-02
TW201504265A (zh) 2015-02-01
CN105073800B (zh) 2018-05-04
CN105073800A (zh) 2015-11-18
JP2014193970A (ja) 2014-10-09
KR20150137049A (ko) 2015-12-08
JP6099198B2 (ja) 2017-03-22
TWI654212B (zh) 2019-03-21

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