KR101586506B1 - 충전제 재료를 포함하는 투명한 전도성 코팅 - Google Patents

충전제 재료를 포함하는 투명한 전도성 코팅 Download PDF

Info

Publication number
KR101586506B1
KR101586506B1 KR1020107016188A KR20107016188A KR101586506B1 KR 101586506 B1 KR101586506 B1 KR 101586506B1 KR 1020107016188 A KR1020107016188 A KR 1020107016188A KR 20107016188 A KR20107016188 A KR 20107016188A KR 101586506 B1 KR101586506 B1 KR 101586506B1
Authority
KR
South Korea
Prior art keywords
substrate
delete delete
coating
filler material
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020107016188A
Other languages
English (en)
Korean (ko)
Other versions
KR20100114040A (ko
Inventor
아케이디 가바
라 베가 페르난도 데
에릭 엘 그랜스트롬
로렌조 망골리니
Original Assignee
시마 나노 테크 이스라엘 리미티드
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 시마 나노 테크 이스라엘 리미티드 filed Critical 시마 나노 테크 이스라엘 리미티드
Publication of KR20100114040A publication Critical patent/KR20100114040A/ko
Application granted granted Critical
Publication of KR101586506B1 publication Critical patent/KR101586506B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/83—Electrodes
    • H10H20/832—Electrodes characterised by their material
    • H10H20/833—Transparent materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/24—Electrically-conducting paints
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/02—Layer formed of wires, e.g. mesh
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
    • H05B33/26—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80—Constructional details
    • H10H20/83—Electrodes
    • H10H20/831—Electrodes characterised by their shape
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
    • H10K30/80—Constructional details
    • H10K30/81—Electrodes
    • H10K30/82—Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
    • H10K30/83—Transparent electrodes, e.g. indium tin oxide [ITO] electrodes comprising arrangements for extracting the current from the cell, e.g. metal finger grid systems to reduce the serial resistance of transparent electrodes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24851—Intermediate layer is discontinuous or differential
    • Y10T428/24868—Translucent outer layer
    • Y10T428/24876—Intermediate layer contains particulate material [e.g., pigment, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24893—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including particulate material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Electroluminescent Light Sources (AREA)
  • Photovoltaic Devices (AREA)
  • Non-Insulated Conductors (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Paints Or Removers (AREA)
  • Conductive Materials (AREA)
  • Manufacturing Of Electric Cables (AREA)
KR1020107016188A 2007-12-20 2008-12-19 충전제 재료를 포함하는 투명한 전도성 코팅 Expired - Fee Related KR101586506B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US1548307P 2007-12-20 2007-12-20
US61/015,483 2007-12-20

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020157022520A Division KR101586619B1 (ko) 2007-12-20 2008-12-19 충전제 재료를 포함하는 투명한 전도성 코팅

Publications (2)

Publication Number Publication Date
KR20100114040A KR20100114040A (ko) 2010-10-22
KR101586506B1 true KR101586506B1 (ko) 2016-01-18

Family

ID=40792719

Family Applications (4)

Application Number Title Priority Date Filing Date
KR1020107016188A Expired - Fee Related KR101586506B1 (ko) 2007-12-20 2008-12-19 충전제 재료를 포함하는 투명한 전도성 코팅
KR1020167000471A Abandoned KR20160010646A (ko) 2007-12-20 2008-12-19 충전제 재료를 포함하는 투명한 전도성 코팅
KR1020157022520A Expired - Fee Related KR101586619B1 (ko) 2007-12-20 2008-12-19 충전제 재료를 포함하는 투명한 전도성 코팅
KR1020107016046A Expired - Fee Related KR101234881B1 (ko) 2007-12-20 2008-12-19 나노입자로 형성된 투명한 전극을 갖는 광전지 소자

Family Applications After (3)

Application Number Title Priority Date Filing Date
KR1020167000471A Abandoned KR20160010646A (ko) 2007-12-20 2008-12-19 충전제 재료를 포함하는 투명한 전도성 코팅
KR1020157022520A Expired - Fee Related KR101586619B1 (ko) 2007-12-20 2008-12-19 충전제 재료를 포함하는 투명한 전도성 코팅
KR1020107016046A Expired - Fee Related KR101234881B1 (ko) 2007-12-20 2008-12-19 나노입자로 형성된 투명한 전극을 갖는 광전지 소자

Country Status (7)

Country Link
US (3) US8795462B2 (https=)
EP (2) EP2232571A2 (https=)
JP (3) JP5937300B2 (https=)
KR (4) KR101586506B1 (https=)
CN (2) CN101945710B (https=)
TW (2) TWI462119B (https=)
WO (2) WO2009086161A1 (https=)

Families Citing this family (157)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2924274B1 (fr) * 2007-11-22 2012-11-30 Saint Gobain Substrat porteur d'une electrode, dispositif electroluminescent organique l'incorporant, et sa fabrication
WO2009082705A1 (en) * 2007-12-20 2009-07-02 Cima Nanotech Israel Ltd. Microstructured material and process for its manufacture
US8506849B2 (en) * 2008-03-05 2013-08-13 Applied Nanotech Holdings, Inc. Additives and modifiers for solvent- and water-based metallic conductive inks
US20100028684A1 (en) * 2008-07-31 2010-02-04 Jose Mariscal Conductive multilayer stack
US8053867B2 (en) 2008-08-20 2011-11-08 Honeywell International Inc. Phosphorous-comprising dopants and methods for forming phosphorous-doped regions in semiconductor substrates using phosphorous-comprising dopants
US7951696B2 (en) 2008-09-30 2011-05-31 Honeywell International Inc. Methods for simultaneously forming N-type and P-type doped regions using non-contact printing processes
US8518170B2 (en) 2008-12-29 2013-08-27 Honeywell International Inc. Boron-comprising inks for forming boron-doped regions in semiconductor substrates using non-contact printing processes and methods for fabricating such boron-comprising inks
JP5155231B2 (ja) * 2009-03-30 2013-03-06 富士フイルム株式会社 Ｅｌ素子、導電膜形成用感光材料および導電膜
DE102009026148A1 (de) 2009-07-10 2011-01-13 Saint-Gobain Sekurit Deutschland Gmbh & Co. Kg Elektrochrome Schichtstruktur und Verfahren zu dessen Herstellung
US8324089B2 (en) 2009-07-23 2012-12-04 Honeywell International Inc. Compositions for forming doped regions in semiconductor substrates, methods for fabricating such compositions, and methods for forming doped regions using such compositions
US10164135B2 (en) 2009-08-07 2018-12-25 Guardian Glass, LLC Electronic device including graphene-based layer(s), and/or method or making the same
US10167572B2 (en) 2009-08-07 2019-01-01 Guardian Glass, LLC Large area deposition of graphene via hetero-epitaxial growth, and products including the same
US8507797B2 (en) 2009-08-07 2013-08-13 Guardian Industries Corp. Large area deposition and doping of graphene, and products including the same
JP5554529B2 (ja) * 2009-08-31 2014-07-23 キヤノン電子株式会社 光電変換デバイス及び太陽電池
KR101601272B1 (ko) * 2009-09-03 2016-03-08 엘지이노텍 주식회사 낮은 휨 특성을 나타내는 태양전지 후면전극 형성용 조성물
TWI416545B (zh) * 2009-09-25 2013-11-21 Innolux Corp 導電板的製作方法及其製備系統
JP5727766B2 (ja) * 2009-12-10 2015-06-03 理想科学工業株式会社 導電性エマルジョンインク及びそれを用いた導電性薄膜の形成方法
TWI573846B (zh) * 2010-03-09 2017-03-11 西瑪奈米技術以色列有限公司 形成具有燒結添加物之透明導電塗層的方法
KR101487342B1 (ko) * 2010-07-30 2015-01-30 주식회사 잉크테크 투명 도전막의 제조방법 및 이에 의해 제조된 투명 도전막
KR101489161B1 (ko) * 2010-07-30 2015-02-06 주식회사 잉크테크 투명 도전막의 제조방법 및 이에 의해 제조된 투명 도전막
KR101154577B1 (ko) * 2010-07-30 2012-06-08 엘지이노텍 주식회사 태양전지 및 이의 제조방법
JP5918236B2 (ja) 2010-08-20 2016-05-18 ロディア オペレーションズＲｈｏｄｉａ Ｏｐｅｒａｔｉｏｎｓ ポリマー組成物、ポリマーフィルム、ポリマーゲル、ポリマーフォーム、並びに当該フィルム、ゲル及びフォームを含有する電子デバイス
CN101944437B (zh) * 2010-08-31 2012-12-12 中国乐凯胶片集团公司 一种用于柔性染料敏化太阳能电池的柔性光阳极及其制备方法
US20120103660A1 (en) * 2010-11-02 2012-05-03 Cambrios Technologies Corporation Grid and nanostructure transparent conductor for low sheet resistance applications
CN102074590B (zh) * 2010-11-11 2016-04-13 中国科学院上海硅酸盐研究所 碲化镉薄膜太阳能电池结构中的背接触电极及制备方法
TWI471072B (zh) * 2010-12-30 2015-01-21 Ind Tech Res Inst 具有導電膜層的基板組合及其製造方法
GB2487579B (en) * 2011-01-28 2015-07-22 Novalia Ltd Printed article with at least one capacitive touch switch
US20120196053A1 (en) * 2011-01-28 2012-08-02 Coull Richard Methods for creating an electrically conductive transparent structure
WO2012103285A2 (en) * 2011-01-29 2012-08-02 Pchem Associates, Inc. Methods and systems for generating a substantially transparent and conductive substrate
US8771381B2 (en) 2011-02-15 2014-07-08 Kemet Electronics Corporation Process for producing electrolytic capacitors and capacitors made thereby
CN102173133A (zh) * 2011-02-28 2011-09-07 福耀玻璃工业集团股份有限公司 一种包含金属纳米结构导电层的复合功能夹层玻璃
GB201105025D0 (en) * 2011-03-25 2011-05-11 Peratech Ltd Electrically responsive composite material
CN102270749A (zh) * 2011-04-18 2011-12-07 电子科技大学 一种柔性发光器件用基板及其制备方法
KR20140035942A (ko) * 2011-06-10 2014-03-24 시마 나노 테크 이스라엘 리미티드 패턴화된 코팅의 제조 방법
US20120319157A1 (en) * 2011-06-14 2012-12-20 Semiconductor Energy Laboratory Co., Ltd. Photoelectric conversion device
US9309589B2 (en) 2011-06-21 2016-04-12 Ppg Industries Ohio, Inc. Outboard durable transparent conductive coating on aircraft canopy
US8629294B2 (en) 2011-08-25 2014-01-14 Honeywell International Inc. Borate esters, boron-comprising dopants, and methods of fabricating boron-comprising dopants
US9484123B2 (en) 2011-09-16 2016-11-01 Prc-Desoto International, Inc. Conductive sealant compositions
JP2014532115A (ja) 2011-09-19 2014-12-04 シーマ ナノテック イスラエル リミテッド 透明導電性コーティングを調製するための方法
JP5713856B2 (ja) * 2011-09-26 2015-05-07 株式会社東芝 光透過型金属電極、電子装置及び光学素子
CN102442788B (zh) * 2011-10-18 2014-03-12 江苏铁锚玻璃股份有限公司 一种玻璃导电加热膜及其制备方法
US8975170B2 (en) 2011-10-24 2015-03-10 Honeywell International Inc. Dopant ink compositions for forming doped regions in semiconductor substrates, and methods for fabricating dopant ink compositions
TW201325335A (zh) * 2011-10-29 2013-06-16 西瑪奈米技術以色列有限公司 經圖案化基材上之導電網路
TWI584485B (zh) * 2011-10-29 2017-05-21 西瑪奈米技術以色列有限公司 於基材上對齊的網路
CN102368539A (zh) * 2011-10-30 2012-03-07 中国乐凯胶片集团公司 一种用于柔性有机太阳能电池的柔性阳极及其制备方法
US20130115720A1 (en) * 2011-11-07 2013-05-09 Arnold Allenic Surface measurement
WO2013074710A1 (en) * 2011-11-14 2013-05-23 Vorbeck Materials Graphene compositions
CN102420261A (zh) * 2011-11-30 2012-04-18 南京华伯仪器科技有限公司 太阳能电池片
US20130155001A1 (en) * 2011-12-19 2013-06-20 Esat Yilmaz Low-Resistance Electrodes
WO2013096356A1 (en) * 2011-12-20 2013-06-27 University Of Connecticut High resolution patterning on conductive fabric by inkjet printing and its application for real wearable displays
US20130157407A1 (en) * 2011-12-20 2013-06-20 Intermolecular, Inc. APPARATUS FOR INLINE PROCESSING OF Cu(In,Ga)(Se,S)2 EMPLOYING A CHALCOGEN SOLUTION COATING MECHANISM
JP6212050B2 (ja) * 2011-12-22 2017-10-11 スリーエム イノベイティブ プロパティズ カンパニー 高い光透過を備えた導電性物品
JP2015507560A (ja) 2011-12-22 2015-03-12 スリーエム イノベイティブ プロパティズ カンパニー 炭素コーティングされた物品及びその製造方法
DE102012002193B4 (de) * 2012-02-07 2021-07-29 Polyic Gmbh & Co. Kg Kapazitives Sensorelement
TWI648751B (zh) * 2012-02-28 2019-01-21 以色列商客利福薄膜技術有限公司 在彈性基材上之透明導電塗層
TWI559331B (zh) * 2012-05-04 2016-11-21 宇亮光電股份有限公司 一種用於形成可撓式透明導電膜之導電材料
CN102722279A (zh) * 2012-05-09 2012-10-10 崔铮 金属网格导电层及其具备该导电层的触摸面板
CN102723126B (zh) * 2012-05-09 2015-10-21 南昌欧菲光科技有限公司 一种基于随机网格的图形化透明导电薄膜
TWM439816U (en) * 2012-05-17 2012-10-21 Star Reach Corp Display module
US9919959B2 (en) 2012-05-31 2018-03-20 Guardian Glass, LLC Window with UV-treated low-E coating and method of making same
US9920207B2 (en) 2012-06-22 2018-03-20 C3Nano Inc. Metal nanostructured networks and transparent conductive material
US10029916B2 (en) 2012-06-22 2018-07-24 C3Nano Inc. Metal nanowire networks and transparent conductive material
US20140022623A1 (en) * 2012-07-17 2014-01-23 Chih-Chien YEN Water proof display device consisting of epd and led matrix
TWI623597B (zh) * 2012-08-16 2018-05-11 西瑪奈米技術以色列有限公司 用於製造透明導電塗層之乳液
US20140083508A1 (en) * 2012-09-25 2014-03-27 Research Foundation Of The City University Of New York Method for forming an aluminum organic photovoltaic cell electrode and electrically conducting product thereof
JP6147860B2 (ja) 2012-09-27 2017-06-14 ロディア オペレーションズＲｈｏｄｉａ Ｏｐｅｒａｔｉｏｎｓ 銀ナノ構造を作製するための方法及び同方法に有用なコポリマー
US9252304B2 (en) * 2012-10-04 2016-02-02 International Business Machines Corporation Solution processing of kesterite semiconductors
US8941128B2 (en) * 2012-11-21 2015-01-27 Intel Corporation Passivation layer for flexible display
WO2014128696A1 (en) * 2013-02-20 2014-08-28 Camtek Ltd. Coat-protecting defects in a wafer piece
KR102153428B1 (ko) * 2013-02-20 2020-09-08 도오쿄 인스티튜드 오브 테크놀로지 도전성 나노와이어 네트워크 및 이것을 이용한 도전성 기판 및 투명전극, 그리고 그들의 제조 방법
CN103117311B (zh) * 2013-02-25 2016-04-06 中国东方电气集团有限公司 一种具有透明电极的晶硅太阳能电池
US10020807B2 (en) 2013-02-26 2018-07-10 C3Nano Inc. Fused metal nanostructured networks, fusing solutions with reducing agents and methods for forming metal networks
US20140256068A1 (en) * 2013-03-08 2014-09-11 Jeffrey L. Franklin Adjustable laser patterning process to form through-holes in a passivation layer for solar cell fabrication
US20150129024A1 (en) * 2013-11-13 2015-05-14 Gtat Corporation Free-Standing Metallic Article With Expansion Segment
US8916038B2 (en) 2013-03-13 2014-12-23 Gtat Corporation Free-standing metallic article for semiconductors
US8936709B2 (en) * 2013-03-13 2015-01-20 Gtat Corporation Adaptable free-standing metallic article for semiconductors
US9640698B2 (en) * 2013-03-15 2017-05-02 Banpil Photonics, Inc. Energy harvesting devices and method of fabrication thereof
US10431354B2 (en) 2013-03-15 2019-10-01 Guardian Glass, LLC Methods for direct production of graphene on dielectric substrates, and associated articles/devices
US9593019B2 (en) 2013-03-15 2017-03-14 Guardian Industries Corp. Methods for low-temperature graphene precipitation onto glass, and associated articles/devices
TW201505199A (zh) * 2013-05-08 2015-02-01 Cima Nanotech Israel Ltd 製造具有背側鈍化層之光伏打電池的方法
US20150047693A1 (en) * 2013-06-28 2015-02-19 New Energy Technologies, Inc. Coatings for aircraft window surfaces to produce electricity for mission-critical systems and maintenance load on commercial aircraft
EA201600246A1 (ru) * 2013-09-09 2016-07-29 Общество С Ограниченной Ответственностью "Функциональные Наносистемы" Сетчатая микро- и наноструктура и способ её получения
TW201515738A (zh) * 2013-09-12 2015-05-01 西瑪奈米技術以色列有限公司 於製造金屬奈米粒子組合物之方法
CN103489504B (zh) * 2013-09-27 2016-08-31 汕头超声显示器（二厂）有限公司 一种低反射的导电层及其制作方法
KR101815277B1 (ko) * 2013-11-15 2018-01-05 나노코 테크놀로지스 리미티드 구리가 풍부한 구리 인듐 (갈륨) 디셀레나이드/디설파이드 나노 입자의 제조
US11274223B2 (en) 2013-11-22 2022-03-15 C3 Nano, Inc. Transparent conductive coatings based on metal nanowires and polymer binders, solution processing thereof, and patterning approaches
DE102013114572A1 (de) * 2013-12-19 2015-06-25 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Verfahren zur Herstellung strukturierter metallischer Beschichtungen
CN103730523B (zh) * 2014-01-06 2016-05-11 山东师范大学 一种石墨烯基碲镉汞复合薄膜材料及其制备方法
CN109491173B (zh) * 2014-01-17 2022-07-12 伊英克公司 具有双相电极层的电光显示器
US20160326664A1 (en) * 2014-01-30 2016-11-10 Hewlett-Packard Development Company, L.P. Treating a Substrate
KR101441607B1 (ko) * 2014-02-13 2014-09-24 인천대학교 산학협력단 고효율 광전소자 및 그 제조방법
WO2015136449A1 (en) * 2014-03-13 2015-09-17 Cima Nanotech Israel Ltd. Process for preparing conductive coatings using metal nanoparticles
KR101541517B1 (ko) * 2014-03-26 2015-08-03 부산대학교 산학협력단 단결정 구리를 이용한 나노 망사 다층 구조의 투명전극 및 그 제조방법
US11343911B1 (en) 2014-04-11 2022-05-24 C3 Nano, Inc. Formable transparent conductive films with metal nanowires
CN106462026B (zh) * 2014-04-25 2019-09-13 惠普发展公司，有限责任合伙企业 经对准的粒子涂敷
ES2851673T3 (es) 2014-05-30 2021-09-08 Univ Connecticut Proceso para preparar espuma de material compuesto de polímero de grafeno/grafito derivada de emulsiones estabilizadas mediante el atrapamiento cinético de grafeno/grafito
CN104020886B (zh) * 2014-05-30 2017-09-29 南昌欧菲光科技有限公司 触摸屏
KR101508144B1 (ko) * 2014-06-17 2015-04-08 전자부품연구원 기능화된 그래핀 기반 발열기판
DE102014213978A1 (de) * 2014-07-17 2016-01-21 Belectric Opv Gmbh Verfahren zur Herstellung eines organischen Halbleiterbauteils und organisches Halbleiterbauteil
GB2528476A (en) * 2014-07-23 2016-01-27 Eight19 Ltd Roll-to-roll processing of a coated web
US9183968B1 (en) 2014-07-31 2015-11-10 C3Nano Inc. Metal nanowire inks for the formation of transparent conductive films with fused networks
CN106661255A (zh) 2014-08-07 2017-05-10 沙特基础工业全球技术有限公司 用于热成型应用的导电多层片材
TWI531079B (zh) * 2014-08-12 2016-04-21 友達光電股份有限公司 太陽能電池及其製作方法
DE102014112430A1 (de) * 2014-08-29 2016-03-03 Ev Group E. Thallner Gmbh Verfahren zur Herstellung eines leitenden Mehrfachsubstratstapels
CN104465993A (zh) * 2014-10-28 2015-03-25 南昌大学 一种碳基复合透明电极及制备方法
KR101687992B1 (ko) * 2014-11-18 2016-12-20 인트리 주식회사 나노섬유 패턴을 구비한 광투과성 도전체를 제조하기 위한 포토마스크 및 그 제조방법
KR101632614B1 (ko) * 2014-12-24 2016-06-22 코닝정밀소재 주식회사 유기발광소자용 광추출 기판 제조방법, 유기발광소자용 광추출 기판 및 이를 포함하는 유기발광소자
KR102360936B1 (ko) * 2015-05-08 2022-02-10 고려대학교 산학협력단 광 구조물의 제조 방법
CN104851523B (zh) * 2015-05-21 2017-01-25 苏州大学 一种柔性透明导电膜制作方法及柔性透明导电膜
US10701801B2 (en) * 2015-06-09 2020-06-30 Continental—Industria Textil Do Ave, S.A Multifunctional textile sensor
JP2018526528A (ja) * 2015-07-16 2018-09-13 ダウ グローバル テクノロジーズ エルエルシー ナノ導電性粒子堆積層の光焼結及び化学焼結の組み合わせ
WO2017015561A1 (en) * 2015-07-23 2017-01-26 E Ink Corporation Polymer formulations for use with electro-optic media
US10145005B2 (en) 2015-08-19 2018-12-04 Guardian Glass, LLC Techniques for low temperature direct graphene growth on glass
EP3340315B1 (en) * 2015-08-21 2021-10-27 Sharp Kabushiki Kaisha Photoelectric conversion element
CN208488734U (zh) 2015-08-21 2019-02-12 3M创新有限公司 包括金属迹线的透明导体
CN105185432B (zh) * 2015-10-09 2017-10-27 重庆文理学院 一种多重保护的银纳米线透明导电薄膜
WO2017077933A1 (ja) * 2015-11-06 2017-05-11 リンテック株式会社 透明導電層積層用フィルム、その製造方法、及び透明導電性フィルム
KR101813161B1 (ko) * 2016-03-11 2017-12-28 한국과학기술연구원 투광성 전자파 차폐 및 흡수 필름
TWI612477B (zh) * 2016-08-31 2018-01-21 聯相光電股份有限公司 光能電子顯示裝置
US10228495B2 (en) * 2016-09-08 2019-03-12 Goodrich Corporation Apparatus and methods of electrically conductive optical semiconductor coating
US10126656B2 (en) 2016-09-08 2018-11-13 Goodrich Corporation Apparatus and methods of electrically conductive optical semiconductor coating
KR20180032734A (ko) 2016-09-22 2018-04-02 삼성디스플레이 주식회사 커브드 액정 표시 장치의 제조 방법 및 그 제조 방법에 의하여 제조된 커브드 액정 표시 장치
KR102664438B1 (ko) 2016-09-23 2024-05-14 삼성디스플레이 주식회사 표시 장치
WO2018077725A1 (en) 2016-10-24 2018-05-03 Luxembourg Institute Of Science And Technology (List) Method for forming an electrically conductive multilayer coating with anti-corrosion properties onto a metallic substrate
JPWO2018101438A1 (ja) * 2016-11-30 2019-11-07 株式会社カネカ 電極構造体、生体信号計測装置、粘着剤形成用組成物
CN106671438B (zh) * 2016-12-06 2018-12-07 北京大学 一种层层组装三维功能复合材料及其制备方法
JP6993784B2 (ja) * 2017-03-17 2022-01-14 株式会社東芝 太陽電池、多接合型太陽電池、太陽電池モジュール及び太陽光発電システム
CN107393979B (zh) * 2017-06-09 2019-07-16 中国科学院宁波材料技术与工程研究所 一种基于超薄金属膜的透明电极及其制备方法和应用
CN107910097B (zh) * 2017-10-18 2019-09-10 苏州城邦达益材料科技有限公司 一种具有凹陷结构的透明导电电极及其制备方法
LU100768B1 (en) 2018-04-18 2019-10-22 Luxembourg Inst Science & Tech List Method for forming an electrically conductive multilayer coating with anti-corrosion properties onto a metallic substrate
WO2019209968A1 (en) 2018-04-24 2019-10-31 University Of Connecticut Flexible fabric antenna system comprising conductive polymers and method of making same
JP7143019B2 (ja) * 2018-06-06 2022-09-28 株式会社ディスコ ウェーハの加工方法
US10822270B2 (en) 2018-08-01 2020-11-03 Guardian Glass, LLC Coated article including ultra-fast laser treated silver-inclusive layer in low-emissivity thin film coating, and/or method of making the same
AU2019316496A1 (en) * 2018-08-02 2021-02-18 Axis Innovation Pty Ltd Heat generating compositions
CN109656099B (zh) * 2018-11-07 2020-07-10 深圳市华星光电半导体显示技术有限公司 减反阵列基板的制备方法及其制备的减反阵列基板
CN111200110A (zh) 2018-11-16 2020-05-26 宁德时代新能源科技股份有限公司 一种正极极片及电化学装置
JP7120890B2 (ja) * 2018-11-16 2022-08-17 田中貴金属工業株式会社 金属配線を備える導電基板及び該導電基板の製造方法、並びに金属配線形成用の金属インク
CN111200131A (zh) * 2018-11-16 2020-05-26 宁德时代新能源科技股份有限公司 一种正极极片及电化学装置
CN113260740B (zh) * 2019-01-10 2024-12-17 松下知识产权经营株式会社 镀敷用图案版以及布线基板的制造方法
WO2020170115A1 (en) * 2019-02-21 2020-08-27 3M Innovative Properties Company Nettings
KR102240669B1 (ko) * 2019-05-08 2021-04-16 (주)플렉솔루션 유기 전기화학 트랜지스터 소자 및 그 제조방법
CN120358826A (zh) * 2019-06-03 2025-07-22 蒂梅尔罗德科技有限责任公司 高效率石墨烯/宽带隙半导体异质结太阳能电池
KR102198877B1 (ko) * 2019-07-16 2021-01-05 정소영 블루 라이트 차단 필터
US11133438B2 (en) 2019-11-20 2021-09-28 Sharp Kabushiki Kaisha Light-emitting device with transparent nanoparticle electrode
KR102250850B1 (ko) * 2019-12-06 2021-05-11 주식회사 엘엠에스 필름, 전도성 필름 및 이의 용도
TWI724752B (zh) * 2020-01-16 2021-04-11 曾程予 應用具延展性的電致發光薄膜結構而製成的產品
KR102503909B1 (ko) * 2020-02-03 2023-02-24 닛토덴코 가부시키가이샤 투명 도전층, 투명 도전성 시트, 터치 센서, 조광 소자, 광전 변환 소자, 열선 제어 부재, 안테나, 전자파 실드 부재 및 화상 표시 장치
CN111211180B (zh) * 2020-03-13 2026-01-09 通威太阳能（合肥）有限公司 用于光电元件的复合电极、串联光电元件和光电模块
US11905591B2 (en) * 2020-03-16 2024-02-20 Xtpl S.A. Method of decreasing a sheet resistance of a transparent conductor and a method of forming a multilayer transparent conductor
US12339714B2 (en) 2020-07-27 2025-06-24 Hewlett-Packard Development Company, L.P. Housings for electronic devices
US11294513B1 (en) * 2020-11-20 2022-04-05 Cambrios Film Solutions Corporation Transparent conductive film, manufacturing method of a transparent conductive film and touch panel
CN114050759A (zh) * 2021-10-20 2022-02-15 福建农林大学 一种光伏和水伏耦合型的全天候发电装置及其制备方法
CN114121346A (zh) * 2021-11-26 2022-03-01 中南大学 一种耐腐蚀的银纳米线复合透明电极及其制备方法
WO2023122668A1 (en) 2021-12-22 2023-06-29 Nabors Energy Transition Solutions Llc Sulfur doped carbon-based nanomaterial and methods of forming the same
WO2023168219A1 (en) 2022-03-04 2023-09-07 Nabors Energy Transition Solutions Llc Boron doped carbon-based nanomaterial and methods of forming the same
KR102491964B1 (ko) * 2022-06-20 2023-01-26 주식회사 도프 전도성 금속입자 에멀젼 액적의 커피링 현상을 이용하여 제조된 전도성 필름
JP7595709B1 (ja) 2023-06-23 2024-12-06 信越ポリマー株式会社 センサシートおよびその製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050215689A1 (en) 2002-06-13 2005-09-29 Arkady Garbar Nano-powder-based coating and ink compositions
JP2005530005A (ja) * 2002-06-13 2005-10-06 ナノパウダーズ インダストリーズ リミテッド 導電性及び透明性を有するナノ被覆物及びナノインクの製造方法、並びにこの製造方法により製造されるナノ粉末被覆物及びインク
WO2007043569A1 (ja) * 2005-10-14 2007-04-19 Kyoto University 透明導電性膜およびその製造方法
US20070153362A1 (en) 2004-12-27 2007-07-05 Regents Of The University Of California Fabric having nanostructured thin-film networks

Family Cites Families (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL106958A (en) 1993-09-09 1996-06-18 Ultrafine Techn Ltd Method of producing high-purity ultra-fine metal powder
JP3563236B2 (ja) * 1996-09-26 2004-09-08 触媒化成工業株式会社 透明導電性被膜形成用塗布液、透明導電性被膜付基材およびその製造方法、表示装置
WO1998054767A1 (de) * 1997-05-31 1998-12-03 Robert Bosch Gmbh Leitfähiges schichtsystem und dessen verwendung in elektrolumineszierenden anordnungen
KR100472496B1 (ko) 1997-07-23 2005-05-16 삼성에스디아이 주식회사 투명도전성조성물,이로부터형성된투명도전막및그제조방법
TW505685B (en) * 1997-09-05 2002-10-11 Mitsubishi Materials Corp Transparent conductive film and composition for forming same
JP3824289B2 (ja) * 1998-09-11 2006-09-20 Ｈｏｙａ株式会社 透明導電性薄膜
JP4397451B2 (ja) 1999-03-30 2010-01-13 Ｈｏｙａ株式会社 透明導電性薄膜及びその製造方法
KR100798234B1 (ko) 2000-04-06 2008-01-24 아크조 노벨 엔.브이. 광기전성박의 제조 방법
US7022910B2 (en) 2002-03-29 2006-04-04 Konarka Technologies, Inc. Photovoltaic cells utilizing mesh electrodes
AT411306B (de) 2000-04-27 2003-11-25 Qsel Quantum Solar Energy Linz Photovoltaische zelle mit einer photoaktiven schicht aus zwei molekularen organischen komponenten
AT410729B (de) 2000-04-27 2003-07-25 Qsel Quantum Solar Energy Linz Photovoltaische zelle mit einer photoaktiven schicht aus zwei molekularen organischen komponenten
JP2002131531A (ja) * 2000-10-25 2002-05-09 Sumitomo Metal Mining Co Ltd 熱線反射性透明基材とその製造方法および熱線反射性透明基材が適用された表示装置
NZ513637A (en) * 2001-08-20 2004-02-27 Canterprise Ltd Nanoscale electronic devices & fabrication methods
US7777303B2 (en) 2002-03-19 2010-08-17 The Regents Of The University Of California Semiconductor-nanocrystal/conjugated polymer thin films
EP1470563A2 (en) * 2002-01-25 2004-10-27 Konarka Technologies, Inc. Photovoltaic cell components and materials
US7601406B2 (en) 2002-06-13 2009-10-13 Cima Nanotech Israel Ltd. Nano-powder-based coating and ink compositions
IL150325A (en) 2002-06-19 2010-12-30 Cima Nanotech Israel Ltd Method for the production of highly pure metallic nano-powders and nano-powders produced thereby
US7361413B2 (en) 2002-07-29 2008-04-22 Lumimove, Inc. Electroluminescent device and methods for its production and use
US7118836B2 (en) * 2002-08-22 2006-10-10 Agfa Gevaert Process for preparing a substantially transparent conductive layer configuration
JP3988935B2 (ja) 2002-11-25 2007-10-10 富士フイルム株式会社 網目状導電体及びその製造方法並びに用途
US20040265550A1 (en) 2002-12-06 2004-12-30 Glatkowski Paul J. Optically transparent nanostructured electrical conductors
US7001669B2 (en) 2002-12-23 2006-02-21 The Administration Of The Tulane Educational Fund Process for the preparation of metal-containing nanostructured films
CN100587857C (zh) * 2003-09-08 2010-02-03 住友金属矿山株式会社 透明导电层叠体与采用了该层叠体的有机el元件及它们的制造方法
JP4344589B2 (ja) * 2003-11-11 2009-10-14 富士通株式会社 導電性樹脂組成物、導電性樹脂膜、電子装置の製造方法
US7351607B2 (en) 2003-12-11 2008-04-01 Georgia Tech Research Corporation Large scale patterned growth of aligned one-dimensional nanostructures
US20060062983A1 (en) * 2004-09-17 2006-03-23 Irvin Glen C Jr Coatable conductive polyethylenedioxythiophene with carbon nanotubes
JP4380487B2 (ja) 2004-09-28 2009-12-09 住友金属工業株式会社 マルテンサイト系ステンレス鋼管の製造方法
JP2006127929A (ja) * 2004-10-29 2006-05-18 Mitsubishi Chemicals Corp 透明導電膜付き基板、塗布液及びその製造方法
US20070186971A1 (en) * 2005-01-20 2007-08-16 Nanosolar, Inc. High-efficiency solar cell with insulated vias
US8711063B2 (en) 2005-03-11 2014-04-29 The Invention Science Fund I, Llc Self assembly of elements for displays
JP5009907B2 (ja) 2005-06-10 2012-08-29 シーマ ナノ テック イスラエル リミティド 向上透明導電性被膜及びそれらを作製する方法
KR101223718B1 (ko) 2005-06-18 2013-01-18 삼성디스플레이 주식회사 나노 도전성 막의 패터닝 방법
JP2007019069A (ja) 2005-07-05 2007-01-25 Toyo Aluminium Kk ペースト組成物およびそれを用いた太陽電池素子
TWI322919B (en) 2005-07-22 2010-04-01 Ind Tech Res Inst Transparent conductive film and fabrication method thereof
JP2007048564A (ja) * 2005-08-09 2007-02-22 Fujikura Ltd 透明導電膜付き基材の製造方法
ATE532217T1 (de) 2005-08-12 2011-11-15 Cambrios Technologies Corp Verfahren zur herstellung von transparente leiter auf nanodrahtbasis
US7791700B2 (en) 2005-09-16 2010-09-07 Kent Displays Incorporated Liquid crystal display on a printed circuit board
US7800117B2 (en) * 2005-12-28 2010-09-21 Group Iv Semiconductor, Inc. Pixel structure for a solid state light emitting device
TWI426531B (zh) 2006-10-12 2014-02-11 坎畢歐科技公司 以奈米線為主之透明導體及其應用
CN101755493A (zh) 2007-07-19 2010-06-23 拜尔材料科学股份公司 在表面上制备精细导电结构的方法
WO2009082705A1 (en) 2007-12-20 2009-07-02 Cima Nanotech Israel Ltd. Microstructured material and process for its manufacture

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050215689A1 (en) 2002-06-13 2005-09-29 Arkady Garbar Nano-powder-based coating and ink compositions
JP2005530005A (ja) * 2002-06-13 2005-10-06 ナノパウダーズ インダストリーズ リミテッド 導電性及び透明性を有するナノ被覆物及びナノインクの製造方法、並びにこの製造方法により製造されるナノ粉末被覆物及びインク
US20070153362A1 (en) 2004-12-27 2007-07-05 Regents Of The University Of California Fabric having nanostructured thin-film networks
WO2007043569A1 (ja) * 2005-10-14 2007-04-19 Kyoto University 透明導電性膜およびその製造方法

Also Published As

Publication number Publication date
KR20160010646A (ko) 2016-01-27
TWI438906B (zh) 2014-05-21
KR101586619B1 (ko) 2016-01-21
TW200939494A (en) 2009-09-16
JP2011508424A (ja) 2011-03-10
KR20100098448A (ko) 2010-09-06
WO2009085224A3 (en) 2009-09-17
CN101945710A (zh) 2011-01-12
KR101234881B1 (ko) 2013-02-20
US8795462B2 (en) 2014-08-05
US8633474B2 (en) 2014-01-21
TW200935452A (en) 2009-08-16
JP5937300B2 (ja) 2016-06-22
EP2240286A1 (en) 2010-10-20
EP2232571A2 (en) 2010-09-29
WO2009085224A2 (en) 2009-07-09
TWI462119B (zh) 2014-11-21
JP2014225459A (ja) 2014-12-04
US20110273085A1 (en) 2011-11-10
KR20100114040A (ko) 2010-10-22
JP2011515003A (ja) 2011-05-12
KR20150103309A (ko) 2015-09-09
CN101952973B (zh) 2012-09-26
JP5302332B2 (ja) 2013-10-02
CN101952973A (zh) 2011-01-19
WO2009086161A1 (en) 2009-07-09
CN101945710B (zh) 2014-03-12
US20110175065A1 (en) 2011-07-21
EP2240286A4 (en) 2014-05-21
US20140306263A1 (en) 2014-10-16

Similar Documents

Publication Publication Date Title
KR101586506B1 (ko) 충전제 재료를 포함하는 투명한 전도성 코팅
JP6924789B2 (ja) パターン化された透明導電体の製造方法
JP6130882B2 (ja) 導電層をパターン化するための方法
CN107075280B (zh) 使用纳米级着色剂控制光色调的透明膜
JP5397376B2 (ja) 透明電極、有機エレクトロルミネッセンス素子及び透明電極の製造方法
US20180277787A1 (en) Thermally stable silver nanowire transparent electrode
EP2521138A1 (en) Conductive laminated body and touch panel using the same
WO2011106730A2 (en) Structures with surface-embedded additives and related manufacturing methods
JP2011124536A (ja) 電磁波シールド材、及びその製造方法
JP2013531861A (ja) 光電子および電子装置のための透明な導電性皮膜
WO2012168941A1 (en) Flexible transparent conductive coatings by direct room temperature evaporative lithography
JP2010263067A (ja) パターン電極の製造方法及びパターン電極
JP7172712B2 (ja) 導電体及び導電体の製造方法
HK1242722A1 (en) Transparent films with control of light hue using nanoscale colorants

Legal Events

Date Code Title Description
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E601 Decision to refuse application
PE0601 Decision on rejection of patent

St.27 status event code: N-2-6-B10-B15-exm-PE0601

A107 Divisional application of patent
AMND Amendment
E13-X000 Pre-grant limitation requested

St.27 status event code: A-2-3-E10-E13-lim-X000

J201 Request for trial against refusal decision
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A18-div-PA0104

St.27 status event code: A-0-1-A10-A16-div-PA0104

PJ0201 Trial against decision of rejection

St.27 status event code: A-3-3-V10-V11-apl-PJ0201

PB0901 Examination by re-examination before a trial

St.27 status event code: A-6-3-E10-E12-rex-PB0901

B701 Decision to grant
PB0701 Decision of registration after re-examination before a trial

St.27 status event code: A-3-4-F10-F13-rex-PB0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

P22-X000 Classification modified

St.27 status event code: A-4-4-P10-P22-nap-X000

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20190113

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20190113