KR101248328B1 - 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소 - Google Patents

강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소 Download PDF

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KR101248328B1
KR101248328B1 KR1020117023187A KR20117023187A KR101248328B1 KR 101248328 B1 KR101248328 B1 KR 101248328B1 KR 1020117023187 A KR1020117023187 A KR 1020117023187A KR 20117023187 A KR20117023187 A KR 20117023187A KR 101248328 B1 KR101248328 B1 KR 101248328B1
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South Korea
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layer
layer thickness
projection objective
reflectance
modulation
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Expired - Fee Related
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Korean (ko)
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KR20110123792A (ko
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파트리크 샤이블레
알렉산드라 파찌디스
라이너 가라이스
미카엘 토트쩨크
하이코 펠트만
파울 그로이프너
한스-위르겐 로스탈스키
볼프강 징거
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칼 짜이스 에스엠티 게엠베하
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/02—Telephoto objectives, i.e. systems of the type + - in which the distance from the front vertex to the image plane is less than the equivalent focal length
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020117023187A 2004-06-04 2005-06-03 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소 Expired - Fee Related KR101248328B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US57680804P 2004-06-04 2004-06-04
US60/576,808 2004-06-04
US63325804P 2004-12-03 2004-12-03
US60/633,258 2004-12-03
PCT/EP2005/005979 WO2005119369A1 (en) 2004-06-04 2005-06-03 Projection system with compensation of intensity variatons and compensation element therefor

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020077000237A Division KR101199076B1 (ko) 2004-06-04 2005-06-03 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소

Publications (2)

Publication Number Publication Date
KR20110123792A KR20110123792A (ko) 2011-11-15
KR101248328B1 true KR101248328B1 (ko) 2013-04-01

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KR1020117023187A Expired - Fee Related KR101248328B1 (ko) 2004-06-04 2005-06-03 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소
KR1020077000237A Expired - Fee Related KR101199076B1 (ko) 2004-06-04 2005-06-03 강도 변동이 보상된 투사 시스템 및 이를 위한 보상 요소

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Country Status (5)

Country Link
US (1) US8605257B2 (https=)
EP (1) EP1759248A1 (https=)
JP (2) JP4913041B2 (https=)
KR (2) KR101248328B1 (https=)
WO (1) WO2005119369A1 (https=)

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KR101199076B1 (ko) 2012-11-07
US8605257B2 (en) 2013-12-10
JP2008502127A (ja) 2008-01-24
US20080094599A1 (en) 2008-04-24
JP4913041B2 (ja) 2012-04-11
EP1759248A1 (en) 2007-03-07
WO2005119369A1 (en) 2005-12-15
KR20070041497A (ko) 2007-04-18
JP2012028803A (ja) 2012-02-09
KR20110123792A (ko) 2011-11-15

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