KR101247243B1 - 스페이서용 감광성 수지 조성물 - Google Patents

스페이서용 감광성 수지 조성물 Download PDF

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Publication number
KR101247243B1
KR101247243B1 KR1020050072120A KR20050072120A KR101247243B1 KR 101247243 B1 KR101247243 B1 KR 101247243B1 KR 1020050072120 A KR1020050072120 A KR 1020050072120A KR 20050072120 A KR20050072120 A KR 20050072120A KR 101247243 B1 KR101247243 B1 KR 101247243B1
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KR
South Korea
Prior art keywords
photosensitive resin
resin composition
acrylate
spacer
weight
Prior art date
Application number
KR1020050072120A
Other languages
English (en)
Korean (ko)
Other versions
KR20060050296A (ko
Inventor
정택성
조현일
이인철
박경하
백성용
박찬석
Original Assignee
주식회사 동진쎄미켐
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Publication of KR20060050296A publication Critical patent/KR20060050296A/ko
Application granted granted Critical
Publication of KR101247243B1 publication Critical patent/KR101247243B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)
KR1020050072120A 2004-08-09 2005-08-08 스페이서용 감광성 수지 조성물 KR101247243B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020040062502 2004-08-09
KR20040062502 2004-08-09

Publications (2)

Publication Number Publication Date
KR20060050296A KR20060050296A (ko) 2006-05-19
KR101247243B1 true KR101247243B1 (ko) 2013-03-25

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020050072120A KR101247243B1 (ko) 2004-08-09 2005-08-08 스페이서용 감광성 수지 조성물

Country Status (4)

Country Link
JP (1) JP4864375B2 (zh)
KR (1) KR101247243B1 (zh)
CN (1) CN1734351B (zh)
TW (1) TWI407216B (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006257220A (ja) * 2005-03-16 2006-09-28 Jsr Corp 共重合体、これを用いた感放射線性樹脂組成物、液晶表示素子用スペーサー、および液晶表示素子
JP4816917B2 (ja) * 2006-03-17 2011-11-16 Ｊｓｒ株式会社 感放射線性樹脂組成物、液晶表示パネル用スペーサー、液晶表示パネル用スペーサーの形成方法、および液晶表示パネル
US20080161464A1 (en) 2006-06-28 2008-07-03 Marks Tobin J Crosslinked polymeric dielectric materials and methods of manufacturing and use thereof
EP2089442B1 (en) * 2006-11-28 2014-10-01 Polyera Corporation Photopolymer-based dielectric materials and methods of preparation and use thereof
KR100839046B1 (ko) * 2006-12-14 2008-06-19 제일모직주식회사 액정표시소자용 감광성 수지 조성물, 이를　이용하여제조된 칼럼 스페이서 및 그 칼럼 스페이서를 포함하는디스플레이 장치
KR101404459B1 (ko) * 2007-04-06 2014-06-09 주식회사 동진쎄미켐 플라즈마 디스플레이 패널 격벽 형성용 감광성 페이스트조성물 및 플라즈마 디스플레이 패널 격벽 형성방법
KR100835605B1 (ko) * 2007-06-19 2008-06-09 제일모직주식회사 Ｃｍｏｓ 이미지센서 컬러필터용 열경화성 수지 조성물,이를 이용하여 제조된 투명막을 포함하는 컬러필터, 및 그컬러필터를 사용하여 제조된 이미지센서
JP4544439B2 (ja) * 2007-12-26 2010-09-15 Ｊｓｒ株式会社 液晶配向剤および液晶配向膜の形成方法
JP5328175B2 (ja) * 2008-02-25 2013-10-30 富士フイルム株式会社 感光性樹脂組成物、フォトスペーサ及びその製造方法、表示装置用基板並びに表示装置
KR20090108781A (ko) * 2008-04-14 2009-10-19 주식회사 동진쎄미켐 흑색 도전성 페이스트 조성물, 이를 포함하는 전자파차폐용 필터 및 표시 장치
TWI647532B (zh) * 2014-07-01 2019-01-11 南韓商東友精細化工有限公司 光敏樹脂組成物
CN104730863B (zh) * 2014-11-03 2018-08-14 杭州福斯特应用材料股份有限公司 一种干膜抗蚀剂
TWI693470B (zh) * 2015-06-30 2020-05-11 日商富士軟片股份有限公司 感光性樹脂組成物、硬化膜的製造方法、硬化膜及液晶顯示裝置

Citations (2)

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JP2000227654A (ja) * 1998-11-30 2000-08-15 Jsr Corp ブラックレジスト用感放射線性組成物
JP2001117225A (ja) 1999-10-14 2001-04-27 Asahi Kasei Corp 感光性樹脂組成物

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JP2933145B2 (ja) * 1991-05-23 1999-08-09 日本化薬株式会社 カラ−フイルタ−保護膜用紫外線硬化性樹脂組成物及びその硬化物
JP3638660B2 (ja) * 1995-05-01 2005-04-13 松下電器産業株式会社 感光性樹脂組成物、それを用いたサンドブラスト用感光性ドライフィルム及びそれを用いた食刻方法
JP3366859B2 (ja) * 1998-03-05 2003-01-14 日立化成デュポンマイクロシステムズ株式会社 感光性ポリイミド前駆体用現像液及びこれを用いたパターン製造法
JP2001154206A (ja) * 1999-11-25 2001-06-08 Jsr Corp スペーサー用感放射線性樹脂組成物、スペーサーおよび液晶表示素子
JP2002040225A (ja) * 2000-07-27 2002-02-06 Jsr Corp カラー液晶表示装置用感放射線性組成物およびカラー液晶表示装置
WO2002014382A1 (en) * 2000-08-16 2002-02-21 Brewer Science, Inc. Photosensitive resin compositions for color filter applications
TWI266146B (en) * 2001-03-31 2006-11-11 Samyang Ems Co Ltd Resist composition for column spacer of liquid crystal display element
JP2002365795A (ja) * 2001-06-06 2002-12-18 Jsr Corp カラー液晶表示装置用感放射線性組成物
JP2004151691A (ja) * 2002-09-30 2004-05-27 Rohm & Haas Electronic Materials Llc 改良フォトレジスト
KR100481014B1 (ko) * 2002-10-04 2005-04-07 주식회사 동진쎄미켐 포토폴리머를 이용한 감광성 수지 조성물
JP4082186B2 (ja) * 2002-11-19 2008-04-30 三菱化学株式会社 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
AU2003294034A1 (en) * 2002-12-03 2004-06-23 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
JP2004184871A (ja) * 2002-12-05 2004-07-02 Mitsubishi Chemicals Corp 青紫色レーザー感光性組成物、並びにそれを用いた画像形成材料、画像形成材、及び画像形成方法
JP2004318047A (ja) * 2003-03-31 2004-11-11 Sumitomo Bakelite Co Ltd 感光性樹脂組成物、積層体、配線板およびフレキシブル配線板
JP2005092198A (ja) * 2003-08-12 2005-04-07 Showa Denko Kk 感光性樹脂組成物
JP4830310B2 (ja) * 2004-02-23 2011-12-07 三菱化学株式会社 オキシムエステル系化合物、光重合性組成物及びこれを用いたカラーフィルター

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000227654A (ja) * 1998-11-30 2000-08-15 Jsr Corp ブラックレジスト用感放射線性組成物
JP2001117225A (ja) 1999-10-14 2001-04-27 Asahi Kasei Corp 感光性樹脂組成物

Also Published As

Publication number Publication date
JP2006053557A (ja) 2006-02-23
CN1734351A (zh) 2006-02-15
JP4864375B2 (ja) 2012-02-01
TWI407216B (zh) 2013-09-01
TW200613864A (en) 2006-05-01
KR20060050296A (ko) 2006-05-19
CN1734351B (zh) 2010-04-21

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