KR100481014B1 - 포토폴리머를 이용한 감광성 수지 조성물 - Google Patents
포토폴리머를 이용한 감광성 수지 조성물 Download PDFInfo
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- KR100481014B1 KR100481014B1 KR10-2002-0060604A KR20020060604A KR100481014B1 KR 100481014 B1 KR100481014 B1 KR 100481014B1 KR 20020060604 A KR20020060604 A KR 20020060604A KR 100481014 B1 KR100481014 B1 KR 100481014B1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/04—Acids; Metal salts or ammonium salts thereof
- C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
- C08F220/282—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing two or more oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
- C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
- C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F228/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Abstract
Description
실시예1 | 실시예2 | 실시예3 | 실시예4 | 비교예1 | 비교예2 | ||
패턴폭(㎛) | 100 | ○ | ○ | ○ | ○ | △ | △ |
50 | ○ | ○ | ○ | ○ | × | × | |
20 | ○ | ○ | ○ | △ | × | × |
실시예1 | 실시예2 | 실시예3 | 실시예4 | ||
패턴폭 | 2일 | ○ | ○ | ○ | ○ |
4일 | ○ | ○ | ○ | ○ | |
6일 | ○ | ○ | ○ | ○ | |
8일 | ○ | ○ | ○ | ○ | |
10일 | ○ | △ | ○ | △ |
Claims (8)
- 하기 화학식 1a 또는 화학식 1b로 표시되는 매크로 폴리머:[화학식 1a][화학식 1b]상기 식에서,R1은 각각 독립적으로 수소, 또는 탄소수 1∼2의 알킬기이고;R2는 히드록시기로 치환되거나 치환되지 않은 탄소수 2∼5의 알킬기이며;a+b+c=1이고, 0.1<a<0.4, 0<b<0.5, 0.1<c<0.5이다.
- 제 1 항에 있어서, 상기 매크로 폴리머는 중량평균분자량이 10,000 내지 40,000인 것을 특징으로 매크로폴리머.
- 컬러필터용 감광성 수지 조성물에 있어서,가) 하기 화학식 1a 또는 화학식 1b로 표시되는 매크로 폴리머 1 내지 30 중량부;나) 적어도 2개 이상의 에틸렌계 이중결합을 갖는 가교성 모노머 5 내지 30 중량부;다) 안료 10 내지 60 중량부;라) 광중합 개시제 0.5 내지 5 중량부; 및마) 용제 20 내지 80 중량부를 포함하는 컬러필터용 감광성 수지 조성물:[화학식 1a][화학식 1b]상기 식에서,R1은 각각 독립적으로 수소, 또는 탄소수 1∼2의 알킬기이고;R2는 히드록시기로 치환되거나 치환되지 않은 탄소수 2∼5의 알킬기이며;a+b+c=1이고, 0.1<a<0.4, 0<b<0.5, 0.1<c<0.5이다.
- 제 3 항에 있어서, 상기 매크로 폴리머는 중량평균분자량이 10,000 내지 40,000인 것을 특징으로 하는 컬러필터용 감광성 수지 조성물.
- 제 3 항에 있어서, 상기 적어도 2개 이상의 에틸렌계 이중결합을 갖는 가교성 모노머가 1,4-부탄디올디아크릴레이트, 1,3-부틸렌글리콜디아크릴레이트, 에틸렌글리콜디아크릴레이트, 펜타에리스리톨테트라아크릴레이트, 트리에틸렌글리콜디아크릴레이트, 폴리에틸렌글리콜디아크릴레이트, 디펜타에리스리톨디아크릴레이트, 솔비톨트리아크릴레이트, 비스페놀 A 디아클릴레이트 유도체, 트리메틸프로판트리아크릴레이트, 디펜타에리스리톨폴리아크릴레이트, 및 이들의 메타크릴레이트류로 이루어진 군으로부터 1 종 이상 선택되는 것을 특징으로 하는 컬러필터용 감광성 수지 조성물.
- 제 3 항에 있어서, 상기 안료가 유기안료 또는 무기안료인 것을 특징으로 하는 컬러필터용 감광성 조성물.
- 제 3 항에 있어서, 상기 용제가 에틸렌글리콜모노메틸에테르아세테이트, 프로필렌글리콜모노메틸에테르, 프로필렌글리콜메틸에테르아세테이트, 프로필렌글리콜모노에틸에테르아세테이트, 디에틸렌글리콜디메틸에테르, 디에틸렌글리콜메틸에틸에테르, 시클로헥사논, 3-메톡시프로피온산에틸, 3-에톡시프로피온산메틸, 및 3-에톡시프로피온산에틸로 이루어진 군으로부터 1 종 이상 선택되는 것을 특징으로 하는 컬러필터용 감광성 조성물.
- 제 3 항에 있어서, 상기 감광성 수지 조성물은 폴리에스테르계 분산제, 폴리우레탄계 분산제, 실리콘계 계면활성제 및 불소계 계면활성제로 이루어진 군으로부터 1 종 이상 선택되는 바) 안료와의 분산성을 향상시키기 위한 분산제 또는 코팅성 향상을 위한 첨가제 0.01 내지 1 중량부를 더욱 포함하는 것을 특징으로 하는 컬러필터용 감광성 조성물.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0060604A KR100481014B1 (ko) | 2002-10-04 | 2002-10-04 | 포토폴리머를 이용한 감광성 수지 조성물 |
CNB031602959A CN100334506C (zh) | 2002-10-04 | 2003-09-30 | 利用感光性树脂的感光性树脂组合物 |
TW092127353A TWI305780B (en) | 2002-10-04 | 2003-10-02 | Photosensitive resin composition using photopolymer |
JP2003345157A JP2004124096A (ja) | 2002-10-04 | 2003-10-03 | マクロポリマー及び感光性樹脂組成物 |
Applications Claiming Priority (1)
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KR10-2002-0060604A KR100481014B1 (ko) | 2002-10-04 | 2002-10-04 | 포토폴리머를 이용한 감광성 수지 조성물 |
Publications (2)
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KR20040031227A KR20040031227A (ko) | 2004-04-13 |
KR100481014B1 true KR100481014B1 (ko) | 2005-04-07 |
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KR10-2002-0060604A KR100481014B1 (ko) | 2002-10-04 | 2002-10-04 | 포토폴리머를 이용한 감광성 수지 조성물 |
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JP (1) | JP2004124096A (ko) |
KR (1) | KR100481014B1 (ko) |
CN (1) | CN100334506C (ko) |
TW (1) | TWI305780B (ko) |
Cited By (1)
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KR20200092131A (ko) | 2019-01-24 | 2020-08-03 | 전백원 | 프라이팬 손잡이 자동 조립장치 |
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KR100468398B1 (ko) * | 2002-10-22 | 2005-01-27 | 엘지전선 주식회사 | 공중합에 의한 폴리아크릴계 감광성 고분자 액정 배향제조성물, 이를 이용한 감광성 고분자 액정 배향막의제조방법 및 상기 액정 배향막을 이용하는 액정 소자 |
JP4601267B2 (ja) * | 2003-06-20 | 2010-12-22 | 東洋インキ製造株式会社 | 感光性黒色組成物、それを用いたブラックマトリックス基板およびカラーフィルタ |
JP4864375B2 (ja) * | 2004-08-09 | 2012-02-01 | ドンジン セミケム カンパニー リミテッド | スペーサ用感光性樹脂組成物、スペーサ及び液晶表示素子 |
JP4677262B2 (ja) * | 2005-03-24 | 2011-04-27 | 東洋インキ製造株式会社 | 光硬化性着色組成物およびそれを用いて形成されるカラーフィルタ |
JP4887486B2 (ja) * | 2005-11-08 | 2012-02-29 | 国立大学法人東京工業大学 | カルコン類縁体 |
KR101306153B1 (ko) * | 2006-08-25 | 2013-09-10 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
JP5487368B2 (ja) * | 2008-11-17 | 2014-05-07 | 地方独立行政法人大阪府立産業技術総合研究所 | フォトレジスト組成物 |
JP2010271729A (ja) * | 2010-07-05 | 2010-12-02 | Toyo Ink Mfg Co Ltd | 光硬化性着色組成物およびそれを用いて形成されるカラーフィルタ |
KR101443757B1 (ko) | 2010-11-08 | 2014-09-25 | 제일모직 주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
JP5994782B2 (ja) * | 2011-08-30 | 2016-09-21 | 旭硝子株式会社 | ネガ型感光性樹脂組成物、隔壁、ブラックマトリックスおよび光学素子 |
KR101674990B1 (ko) | 2012-12-07 | 2016-11-10 | 제일모직 주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
KR20150029921A (ko) * | 2013-09-11 | 2015-03-19 | 동우 화인켐 주식회사 | 디스플레이 장치의 전면 차광층 형성용 착색 감광성 수지 조성물 |
CN112920295B (zh) * | 2019-12-05 | 2024-05-03 | 固安鼎材科技有限公司 | 一种大分子光引发剂及其应用 |
CN114516962B (zh) * | 2020-11-19 | 2024-04-26 | 北京鼎材科技有限公司 | 一种高透光敏树脂及使用其的彩色光敏树脂组合物 |
CN112812347B (zh) * | 2021-02-23 | 2022-08-30 | 新纶新材料股份有限公司 | 一种光学薄膜材料及其制备方法、偏光片 |
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US6433118B1 (en) * | 1998-10-15 | 2002-08-13 | Mitsui Chemicals, Inc. | Copolymer, a manufacturing process therefor and a solution containing thereof |
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2002
- 2002-10-04 KR KR10-2002-0060604A patent/KR100481014B1/ko active IP Right Grant
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2003
- 2003-09-30 CN CNB031602959A patent/CN100334506C/zh not_active Expired - Fee Related
- 2003-10-02 TW TW092127353A patent/TWI305780B/zh not_active IP Right Cessation
- 2003-10-03 JP JP2003345157A patent/JP2004124096A/ja active Pending
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JPS55118911A (en) * | 1979-03-06 | 1980-09-12 | Agency Of Ind Science & Technol | Photosensitive resin composition |
JPS6036503A (ja) * | 1983-08-10 | 1985-02-25 | Agency Of Ind Science & Technol | 感光性樹脂 |
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KR20000058201A (ko) * | 1999-02-25 | 2000-09-25 | 기타지마 요시토시 | 감광성수지 조성물, 칼라필터 및 이들에 유용한 공중합수지 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR20200092131A (ko) | 2019-01-24 | 2020-08-03 | 전백원 | 프라이팬 손잡이 자동 조립장치 |
Also Published As
Publication number | Publication date |
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CN100334506C (zh) | 2007-08-29 |
CN1497343A (zh) | 2004-05-19 |
KR20040031227A (ko) | 2004-04-13 |
TWI305780B (en) | 2009-02-01 |
TW200424219A (en) | 2004-11-16 |
JP2004124096A (ja) | 2004-04-22 |
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