CN100334506C - 利用感光性树脂的感光性树脂组合物 - Google Patents

利用感光性树脂的感光性树脂组合物 Download PDF

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Publication number
CN100334506C
CN100334506C CNB031602959A CN03160295A CN100334506C CN 100334506 C CN100334506 C CN 100334506C CN B031602959 A CNB031602959 A CN B031602959A CN 03160295 A CN03160295 A CN 03160295A CN 100334506 C CN100334506 C CN 100334506C
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CN
China
Prior art keywords
weight
pigment
diacrylate
chemical formula
color filter
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Expired - Fee Related
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CNB031602959A
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English (en)
Chinese (zh)
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CN1497343A (zh
Inventor
朴赞硕
金吉来
金奉玘
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Dongjin Semichem Co Ltd
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Dongjin Semichem Co Ltd
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Publication of CN1497343A publication Critical patent/CN1497343A/zh
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F214/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/04—Acids; Metal salts or ammonium salts thereof
    • C08F220/06—Acrylic acid; Methacrylic acid; Metal salts or ammonium salts thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/282—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing two or more oxygen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/30—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety
    • C08F220/301—Esters containing oxygen in addition to the carboxy oxygen containing aromatic rings in the alcohol moiety and one oxygen in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F228/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
CNB031602959A 2002-10-04 2003-09-30 利用感光性树脂的感光性树脂组合物 Expired - Fee Related CN100334506C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR20020060604 2002-10-04
KR10-2002-0060604A KR100481014B1 (ko) 2002-10-04 2002-10-04 포토폴리머를 이용한 감광성 수지 조성물

Publications (2)

Publication Number Publication Date
CN1497343A CN1497343A (zh) 2004-05-19
CN100334506C true CN100334506C (zh) 2007-08-29

Family

ID=32291692

Family Applications (1)

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CNB031602959A Expired - Fee Related CN100334506C (zh) 2002-10-04 2003-09-30 利用感光性树脂的感光性树脂组合物

Country Status (4)

Country Link
JP (1) JP2004124096A (ko)
KR (1) KR100481014B1 (ko)
CN (1) CN100334506C (ko)
TW (1) TWI305780B (ko)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100468398B1 (ko) * 2002-10-22 2005-01-27 엘지전선 주식회사 공중합에 의한 폴리아크릴계 감광성 고분자 액정 배향제조성물, 이를 이용한 감광성 고분자 액정 배향막의제조방법 및 상기 액정 배향막을 이용하는 액정 소자
JP4601267B2 (ja) * 2003-06-20 2010-12-22 東洋インキ製造株式会社 感光性黒色組成物、それを用いたブラックマトリックス基板およびカラーフィルタ
JP4864375B2 (ja) * 2004-08-09 2012-02-01 ドンジン セミケム カンパニー リミテッド スペーサ用感光性樹脂組成物、スペーサ及び液晶表示素子
JP4677262B2 (ja) * 2005-03-24 2011-04-27 東洋インキ製造株式会社 光硬化性着色組成物およびそれを用いて形成されるカラーフィルタ
JP4887486B2 (ja) * 2005-11-08 2012-02-29 国立大学法人東京工業大学 カルコン類縁体
KR101306153B1 (ko) * 2006-08-25 2013-09-10 주식회사 동진쎄미켐 감광성 수지 조성물
JP5487368B2 (ja) * 2008-11-17 2014-05-07 地方独立行政法人大阪府立産業技術総合研究所 フォトレジスト組成物
JP2010271729A (ja) * 2010-07-05 2010-12-02 Toyo Ink Mfg Co Ltd 光硬化性着色組成物およびそれを用いて形成されるカラーフィルタ
KR101443757B1 (ko) 2010-11-08 2014-09-25 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
JP5994782B2 (ja) * 2011-08-30 2016-09-21 旭硝子株式会社 ネガ型感光性樹脂組成物、隔壁、ブラックマトリックスおよび光学素子
KR101674990B1 (ko) 2012-12-07 2016-11-10 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR20150029921A (ko) * 2013-09-11 2015-03-19 동우 화인켐 주식회사 디스플레이 장치의 전면 차광층 형성용 착색 감광성 수지 조성물
KR20200092131A (ko) 2019-01-24 2020-08-03 전백원 프라이팬 손잡이 자동 조립장치
CN112920295B (zh) * 2019-12-05 2024-05-03 固安鼎材科技有限公司 一种大分子光引发剂及其应用
CN114516962B (zh) * 2020-11-19 2024-04-26 北京鼎材科技有限公司 一种高透光敏树脂及使用其的彩色光敏树脂组合物
CN112812347B (zh) * 2021-02-23 2022-08-30 新纶新材料股份有限公司 一种光学薄膜材料及其制备方法、偏光片

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06194515A (ja) * 1992-12-25 1994-07-15 Hitachi Ltd カラ−フィルタ形成用感光性樹脂
JPH08278630A (ja) * 1995-04-07 1996-10-22 Nippon Steel Chem Co Ltd 保存安定性に優れたカラーフィルター用インク及びこれを用いて形成したカラーフィルター
JPH1010315A (ja) * 1996-06-27 1998-01-16 Hitachi Chem Co Ltd カラーフィルタ用感光性フィルム及びこれを用いたカラーフィルタの製造法
US6433118B1 (en) * 1998-10-15 2002-08-13 Mitsui Chemicals, Inc. Copolymer, a manufacturing process therefor and a solution containing thereof
CN1094604C (zh) * 1993-12-27 2002-11-20 克拉瑞特金融(Bvi)有限公司 着色感光性树脂组合物

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JPS55118911A (en) * 1979-03-06 1980-09-12 Agency Of Ind Science & Technol Photosensitive resin composition
JPS6036503A (ja) * 1983-08-10 1985-02-25 Agency Of Ind Science & Technol 感光性樹脂
JPH0745533B2 (ja) * 1986-02-19 1995-05-17 新技術事業団 感光性樹脂とその製造方法
JPS63254443A (ja) * 1987-04-13 1988-10-21 Fuji Photo Film Co Ltd 感光性組成物
JP3730318B2 (ja) * 1996-05-31 2006-01-05 日本合成化学工業株式会社 感光性樹脂組成物及びこれを用いた積層体
US6410206B1 (en) * 1999-02-25 2002-06-25 Dai Nippon Printing Co., Ltd. Photosensitive resin composition, color filter, and copolymer resin useful for them

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06194515A (ja) * 1992-12-25 1994-07-15 Hitachi Ltd カラ−フィルタ形成用感光性樹脂
CN1094604C (zh) * 1993-12-27 2002-11-20 克拉瑞特金融(Bvi)有限公司 着色感光性树脂组合物
JPH08278630A (ja) * 1995-04-07 1996-10-22 Nippon Steel Chem Co Ltd 保存安定性に優れたカラーフィルター用インク及びこれを用いて形成したカラーフィルター
JPH1010315A (ja) * 1996-06-27 1998-01-16 Hitachi Chem Co Ltd カラーフィルタ用感光性フィルム及びこれを用いたカラーフィルタの製造法
US6433118B1 (en) * 1998-10-15 2002-08-13 Mitsui Chemicals, Inc. Copolymer, a manufacturing process therefor and a solution containing thereof

Also Published As

Publication number Publication date
JP2004124096A (ja) 2004-04-22
TW200424219A (en) 2004-11-16
TWI305780B (en) 2009-02-01
CN1497343A (zh) 2004-05-19
KR20040031227A (ko) 2004-04-13
KR100481014B1 (ko) 2005-04-07

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