TWI266146B - Resist composition for column spacer of liquid crystal display element - Google Patents

Resist composition for column spacer of liquid crystal display element

Info

Publication number
TWI266146B
TWI266146B TW91106401A TW91106401A TWI266146B TW I266146 B TWI266146 B TW I266146B TW 91106401 A TW91106401 A TW 91106401A TW 91106401 A TW91106401 A TW 91106401A TW I266146 B TWI266146 B TW I266146B
Authority
TW
Taiwan
Prior art keywords
resist composition
liquid crystal
crystal display
display element
pts
Prior art date
Application number
TW91106401A
Other languages
Chinese (zh)
Inventor
You-Lee Pae
Hyuk-Jin Cha
Jae-Hwan Lee
Seong-Jae Hong
Keun-Joo Lee
Original Assignee
Samyang Ems Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR10-2001-0017151A external-priority patent/KR100463309B1/en
Priority claimed from KR1020020011196A external-priority patent/KR100592418B1/en
Application filed by Samyang Ems Co Ltd filed Critical Samyang Ems Co Ltd
Application granted granted Critical
Publication of TWI266146B publication Critical patent/TWI266146B/en

Links

Landscapes

  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)

Abstract

To provide a resist composition for the column spacers of a liquid crystal display element. The resist composition contains 10-40 pts.wt. Binder resin selected from the group comprising a binder resin of formula (1), a binder resin of formula (2) and a mixture of these, 1-20 pts.wt. Polyfunctional monomer having an ethylenically unsaturated bond, 0.8-10 pts.wt. Photoinitiator and 0.001-1.2 pt.wt. Epoxy-containing silicon compound. The resist composition is excellent in heat resistance, can form a pattern in an appropriate thickness when the column spacers of a liquid crystal display element are formed and has good flatness and resolution, a good residual film rate and good pattern stability.
TW91106401A 2001-03-31 2002-03-29 Resist composition for column spacer of liquid crystal display element TWI266146B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2001-0017151A KR100463309B1 (en) 2001-03-31 2001-03-31 Resist Composition For Column Spacer of LCD
KR1020020011196A KR100592418B1 (en) 2002-03-02 2002-03-02 Resist composition for liquid crystal display device column spacer

Publications (1)

Publication Number Publication Date
TWI266146B true TWI266146B (en) 2006-11-11

Family

ID=36754165

Family Applications (1)

Application Number Title Priority Date Filing Date
TW91106401A TWI266146B (en) 2001-03-31 2002-03-29 Resist composition for column spacer of liquid crystal display element

Country Status (3)

Country Link
JP (1) JP3467488B2 (en)
CN (1) CN1255467C (en)
TW (1) TWI266146B (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7537810B2 (en) 2003-03-24 2009-05-26 Dai Nippon Printing Co., Ltd. Curable resin composition, photosensitive pattern-forming curable resin composition, color filter, substrate for liquid crystalline panel, and liquid crystalline panel
JP4539066B2 (en) * 2003-09-30 2010-09-08 日立化成工業株式会社 Photosensitive resin composition for liquid crystal spacer and photosensitive element
JP4555940B2 (en) * 2003-09-30 2010-10-06 日立化成工業株式会社 Photosensitive resin composition for liquid crystal spacer and photosensitive element
JP5778985B2 (en) * 2004-02-20 2015-09-16 東京応化工業株式会社 POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING THE POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN
KR100935569B1 (en) 2004-02-20 2010-01-07 도오꾜오까고오교 가부시끼가이샤 A compound containing an acid dissociable, dissolution inhibiting group containing a cycloaliphatic group
JP2006096965A (en) 2004-02-20 2006-04-13 Tokyo Ohka Kogyo Co Ltd Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern
CN1898605B (en) * 2004-04-08 2010-08-18 Jsr株式会社 Radiation-sensitive resin composition, interlayer insulation film, microlens and process for producing them
TWI386714B (en) * 2004-05-06 2013-02-21 Dongjin Semichem Co Ltd An interlayer organic insulating film for tft-lcd, acrylic copolymer resin used for an interlayer organic insulating film for tft-lcd and the preparation method thereof
JP4599484B2 (en) * 2004-05-31 2010-12-15 凸版印刷株式会社 Curable resin composition and color filter having photospacer formed using the same
JP4864375B2 (en) * 2004-08-09 2012-02-01 ドンジン セミケム カンパニー リミテッド Photosensitive resin composition for spacer, spacer and liquid crystal display element
CN1757670B (en) * 2004-10-07 2011-07-06 Jsr株式会社 Radial sensitive resin composite, microlens and manufacturing method therof and liquid crystal display element
JP4702594B2 (en) * 2004-12-21 2011-06-15 Ｄｉｃ株式会社 Photocurable composition for liquid crystal panel seal and liquid crystal panel
CN1976961B (en) * 2005-01-25 2010-05-19 Lg化学株式会社 Thermally curable resin composition with extended storage stability and good adhesive property
JP4934353B2 (en) * 2005-06-10 2012-05-16 ドンジン セミケム カンパニー リミテッド Negative photosensitive resin composition
ATE538145T1 (en) * 2005-09-26 2012-01-15 Dejima Tech Bv UV-CROSS-LINKABLE URETHANE (METH)ACRYLATE POLYMERS
CN1945822B (en) 2005-10-07 2012-05-23 日立麦克赛尔株式会社 Semiconductor device, semiconductor module and semiconductor module producing method
JP4313840B2 (en) * 2007-05-11 2009-08-12 積水化学工業株式会社 Curable resin composition for column spacer, column spacer, and liquid crystal display element
KR102060012B1 (en) 2013-02-15 2019-12-30 삼성디스플레이 주식회사 Photosensitive resin composition and method of forming pattern using the same
CN105392770A (en) * 2013-06-21 2016-03-09 株式会社大赛璐 Polyfunctional (meth)acrylate, and method for producing same
CN104793405B (en) * 2015-04-28 2018-06-19 深圳市华星光电技术有限公司 Liquid crystal display and liquid crystal display panel
US10747046B2 (en) 2015-07-01 2020-08-18 Boe Technology Group Co., Ltd. Display substrate, display panel and display apparatus having the same, and fabricating method thereof
CN104950527A (en) 2015-07-01 2015-09-30 合肥鑫晟光电科技有限公司 Display substrate, manufacturing method thereof, display panel and display device

Also Published As

Publication number Publication date
JP3467488B2 (en) 2003-11-17
JP2003021839A (en) 2003-01-24
CN1379060A (en) 2002-11-13
CN1255467C (en) 2006-05-10

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