TW200728911A - Photosensitive resin composition, spacer for display panel and display panel - Google Patents

Photosensitive resin composition, spacer for display panel and display panel

Info

Publication number
TW200728911A
TW200728911A TW095129926A TW95129926A TW200728911A TW 200728911 A TW200728911 A TW 200728911A TW 095129926 A TW095129926 A TW 095129926A TW 95129926 A TW95129926 A TW 95129926A TW 200728911 A TW200728911 A TW 200728911A
Authority
TW
Taiwan
Prior art keywords
display panel
resin composition
photosensitive resin
spacer
carboxylic acid
Prior art date
Application number
TW095129926A
Other languages
Chinese (zh)
Other versions
TWI372944B (en
Inventor
Daigo Ichinohe
Hiroshi Shiho
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200728911A publication Critical patent/TW200728911A/en
Application granted granted Critical
Publication of TWI372944B publication Critical patent/TWI372944B/zh

Links

Landscapes

  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

Disclosed is a photosensitive resin composition, whose characteristic is in containing an oxetane copolymer with carboxylic acid or carboxylic acid anhydride, an ethylenically unsaturated compound and a photopolymerization initiator containing a specific o-acyloxime type carbazole compound. The satisfactory process margin provided by the composition is used along with the exposure less than 1,500 J/m2 to obtain a satisfactory spacer shape and thickness and to form spacers for a display panel excellent in adhesion, rubbing resistance and heat resistance and also excellent in spacer shape and long-term stability.
TW095129926A 2005-08-16 2006-08-15 Photosensitive resin composition, spacer for display panel and display panel TW200728911A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005236173A JP4631594B2 (en) 2005-08-16 2005-08-16 Photosensitive resin composition, display panel spacer and display panel

Publications (2)

Publication Number Publication Date
TW200728911A true TW200728911A (en) 2007-08-01
TWI372944B TWI372944B (en) 2012-09-21

Family

ID=37737778

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095129926A TW200728911A (en) 2005-08-16 2006-08-15 Photosensitive resin composition, spacer for display panel and display panel

Country Status (3)

Country Link
JP (1) JP4631594B2 (en)
CN (1) CN1916761A (en)
TW (1) TW200728911A (en)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5298653B2 (en) * 2007-07-06 2013-09-25 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP5054456B2 (en) * 2007-07-26 2012-10-24 株式会社Ａｄｅｋａ Polymerizable composition containing polymerizable liquid crystal compound and radical photopolymerization initiator
KR101482552B1 (en) * 2008-04-30 2015-01-21 주식회사 동진쎄미켐 Negative photosensitive resin composition
KR101121038B1 (en) * 2008-07-01 2012-03-15 주식회사 엘지화학 Photoresist resin composition containing a number of photo-initiators, transparent thin film layer and liquid crystal display using the same
JP5317809B2 (en) * 2009-04-20 2013-10-16 富士フイルム株式会社 Colored curable composition, colored pattern forming method, color filter, and liquid crystal display device
WO2010146883A1 (en) * 2009-06-17 2010-12-23 東洋インキ製造株式会社 Oxime ester compound, radical polymerization initiator, polymerizable composition, negative resist and image pattern
TWI438570B (en) 2010-03-11 2014-05-21 Toyo Ink Mfg Co Photosensitive coloring composition and color filter
JP5724681B2 (en) * 2010-08-10 2015-05-27 Jsr株式会社 Radiation sensitive resin composition, cured film, method for forming cured film, color filter, and method for forming color filter
CN102375340A (en) * 2010-08-10 2012-03-14 Jsr株式会社 Radioactive Ray Sensitive Resin Composite, Solidification Film, Preparing Method Of Solidification Film, Color Filter And Preparing Method Of Color Filter
JP6135063B2 (en) * 2011-08-30 2017-05-31 住友化学株式会社 Curable resin composition
TWI544281B (en) * 2014-11-25 2016-08-01 奇美實業股份有限公司 Photosensitive resin composition for black matrix and application thereof
TWI557505B (en) * 2014-12-19 2016-11-11 奇美實業股份有限公司 Photosensitive resin composition and uses thereof
TWI557510B (en) * 2014-12-19 2016-11-11 奇美實業股份有限公司 Photosensitive resin composition and uses thereof
TWI557504B (en) * 2014-12-19 2016-11-11 奇美實業股份有限公司 Photosensitive resin composition and uses thereof
KR101552199B1 (en) 2015-06-11 2015-09-10 주식회사 티에스알 Center bearing for propeller shaft
KR102228630B1 (en) * 2018-12-28 2021-03-16 주식회사 삼양사 Carbazole multi β-oxime ester derivative compounds and, photopolymerization initiator and photoresist composition containing the same
CN114509914A (en) * 2020-11-16 2022-05-17 常州强力先端电子材料有限公司 Photo-curing composition, optical film, preparation method of optical film and optical product
CN115820267B (en) * 2023-02-23 2023-06-20 北京灵犀微光科技有限公司 Holographic polymer dispersed liquid crystal material and application thereof

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001261761A (en) * 2000-03-22 2001-09-26 Jsr Corp Radiation-sensitive resin composition and spacer for display panel
JP4269480B2 (en) * 2000-04-19 2009-05-27 Ｊｓｒ株式会社 Radiation sensitive resin composition
WO2002100903A1 (en) * 2001-06-11 2002-12-19 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators having a combined structure

Also Published As

Publication number Publication date
JP2007052140A (en) 2007-03-01
CN1916761A (en) 2007-02-21
TWI372944B (en) 2012-09-21
JP4631594B2 (en) 2011-02-16

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Legal Events

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