TW200722920A - Polymer, radiation-sensitive resin composition and spacer for liquid crystal display element - Google Patents

Polymer, radiation-sensitive resin composition and spacer for liquid crystal display element

Info

Publication number
TW200722920A
TW200722920A TW095128002A TW95128002A TW200722920A TW 200722920 A TW200722920 A TW 200722920A TW 095128002 A TW095128002 A TW 095128002A TW 95128002 A TW95128002 A TW 95128002A TW 200722920 A TW200722920 A TW 200722920A
Authority
TW
Taiwan
Prior art keywords
radiation
polymer
resin composition
sensitive resin
spacer
Prior art date
Application number
TW095128002A
Other languages
Chinese (zh)
Inventor
Daigo Ichinohe
Isamu Yonekura
Hiroshi Shiho
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200722920A publication Critical patent/TW200722920A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

To provide a radiation-sensitive resin composition providing a sufficient spacer shape even by a little exposure, and enabling the spacer for a liquid crystal display element having excellent elastic recovery, rubbing resistance, adhesion to a transparent substrate, heat resistance or the like, and sufficiently exhibiting resistance to stripping liquid at stripping of an oriented film to be formed. The polymer [A] is obtained by reacting a monoisocyanate compound containing a (meth)acryloyloxy group with a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride, (a2) an unsaturated compound having one or more hydroxy groups in one molecule, and (a3) other unsaturated compounds. The radiation-sensitive resin composition contains the polymer [A], a polymerizable unsaturated compound [B] and a radiation-sensitive polymerization initiator [C].
TW095128002A 2005-08-26 2006-07-31 Polymer, radiation-sensitive resin composition and spacer for liquid crystal display element TW200722920A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005246595A JP2007056221A (en) 2005-08-26 2005-08-26 Polymer, radiation-sensitive resin composition and spacer for liquid crystal display element

Publications (1)

Publication Number Publication Date
TW200722920A true TW200722920A (en) 2007-06-16

Family

ID=37919979

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095128002A TW200722920A (en) 2005-08-26 2006-07-31 Polymer, radiation-sensitive resin composition and spacer for liquid crystal display element

Country Status (4)

Country Link
JP (1) JP2007056221A (en)
KR (1) KR100838001B1 (en)
CN (1) CN101130577B (en)
TW (1) TW200722920A (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4862998B2 (en) * 2005-07-27 2012-01-25 Ｊｓｒ株式会社 Side chain unsaturated polymer, radiation sensitive resin composition, and spacer for liquid crystal display device
JP4888640B2 (en) * 2006-03-14 2012-02-29 Ｊｓｒ株式会社 Radiation sensitive resin composition and spacer for liquid crystal display element
WO2008059670A1 (en) * 2006-11-15 2008-05-22 Taiyo Ink Mfg. Co., Ltd. Photocurable/thermosetting resin composition, cured object, and printed wiring board
JP5132160B2 (en) * 2007-02-02 2013-01-30 富士フイルム株式会社 Curable composition, color filter, method for producing color filter, and graft polymer
KR101420470B1 (en) 2007-05-29 2014-07-16 아사히 가라스 가부시키가이샤 Photosensitive composition, partition wall, and black matrix
JP2008298859A (en) * 2007-05-29 2008-12-11 Asahi Glass Co Ltd Photosensitive composition, partition using the same, method for producing partition, method for producing color filter, method for producing organic el display element and method for producing organic tft array
JP5829932B2 (en) * 2012-01-31 2015-12-09 大阪有機化学工業株式会社 Hard coat film and resin composition used for production thereof
WO2022259893A1 (en) * 2021-06-07 2022-12-15 富士フイルム株式会社 Curable resin composition, hard coat film, and production method for hard coat film

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02182712A (en) * 1989-01-10 1990-07-17 Nok Corp Novel isocyanate group-containing acrylic copolymer and composition of same copolymer
JP3446274B2 (en) * 1993-12-21 2003-09-16 三菱化学株式会社 Manufacturing method of separation agent
DE4447550C2 (en) * 1994-09-22 1997-09-18 Dainippon Ink & Chemicals Aqueous polymer emulsions
SG77689A1 (en) * 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
JP2000105456A (en) * 1998-07-31 2000-04-11 Dainippon Printing Co Ltd Photosensitive resin composition and color filter
KR100481601B1 (en) * 1999-09-21 2005-04-08 주식회사 하이닉스반도체 Photoresist composition containing photo base generator with photo acid generator
JP4524944B2 (en) * 2001-03-28 2010-08-18 Ｊｓｒ株式会社 Radiation sensitive resin composition, its use for forming interlayer insulating film and microlens, and interlayer insulating film and microlens
JP2002296775A (en) * 2001-03-30 2002-10-09 Dainippon Printing Co Ltd Photosensitive resin composition, color filter and liquid crystal panel
KR100592418B1 (en) * 2002-03-02 2006-06-22 주식회사 삼양이엠에스 Resist composition for liquid crystal display device column spacer
JP4244680B2 (en) * 2003-03-31 2009-03-25 日立化成工業株式会社 Photosensitive alkali-soluble composition
JP2005010763A (en) * 2003-05-23 2005-01-13 Sumitomo Chemical Co Ltd Colored photosensitive resin composition
KR100673296B1 (en) * 2003-12-18 2007-01-24 주식회사 코오롱 Photoresist composition for column spacer of liquid crystal display
CN101084186B (en) * 2004-11-04 2011-05-11 昭和电工株式会社 Isocyanate compound and process for producing the same, and reactive monomer, reactive (meth)acrylate polymer and its use
JP4802186B2 (en) * 2005-02-22 2011-10-26 日本化薬株式会社 Retardation film using cellulose derivative
JP2008000029A (en) * 2006-06-20 2008-01-10 Yanmar Co Ltd Combine harvester

Also Published As

Publication number Publication date
JP2007056221A (en) 2007-03-08
KR20070024423A (en) 2007-03-02
KR100838001B1 (en) 2008-06-13
CN101130577B (en) 2010-08-25
CN101130577A (en) 2008-02-27

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