TW200612196A - Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element - Google Patents

Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element

Info

Publication number
TW200612196A
TW200612196A TW094124367A TW94124367A TW200612196A TW 200612196 A TW200612196 A TW 200612196A TW 094124367 A TW094124367 A TW 094124367A TW 94124367 A TW94124367 A TW 94124367A TW 200612196 A TW200612196 A TW 200612196A
Authority
TW
Taiwan
Prior art keywords
radiation sensitive
resin composition
sensitive resin
spacer
liquid crystal
Prior art date
Application number
TW094124367A
Other languages
Chinese (zh)
Other versions
TWI442174B (en
Inventor
Daigo Ichinohe
Isamu Yonekura
Toshihiro Nishio
Toru Kajita
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200612196A publication Critical patent/TW200612196A/en
Application granted granted Critical
Publication of TWI442174B publication Critical patent/TWI442174B/en

Links

Abstract

To obtain a radiation sensitive resin composition which can acquire a sufficient spacer configuration even in the exposure of not more than 1,200 J/m2 with high sensitivity and high resolution and also can form a spacer for a liquid crystal display element excellent in elastic recovery, rubbing resistance, adhesiveness with a transparent substrate, heat resistance, or the like. The radiation sensitive resin composition comprises: a polymer which is obtained by reacting an isocyanate compound expressed by formula (1) (in formula (1), R1 represents hydrogen atom or methyl group and R2 represents an alkylene group) with a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) an epoxy group-containing unsaturated compound, (a3) a hydroxyl group-containing unsaturated compound, and (a4) another unsaturated compound; a polymerizable unsaturated compound; and a radiation sensitive polymerization initiator.
TW094124367A 2004-08-12 2005-07-19 A branched unsaturated polymer, a radiation-sensitive resin composition, and a spacer for a liquid crystal display element TWI442174B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004235066 2004-08-12
JP2005168015A JP4766235B2 (en) 2004-08-12 2005-06-08 Radiation sensitive resin composition and spacer for liquid crystal display element

Publications (2)

Publication Number Publication Date
TW200612196A true TW200612196A (en) 2006-04-16
TWI442174B TWI442174B (en) 2014-06-21

Family

ID=36156944

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094124367A TWI442174B (en) 2004-08-12 2005-07-19 A branched unsaturated polymer, a radiation-sensitive resin composition, and a spacer for a liquid crystal display element

Country Status (3)

Country Link
JP (1) JP4766235B2 (en)
KR (1) KR20060050406A (en)
TW (1) TWI442174B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI388581B (en) * 2005-08-25 2013-03-11 Jsr Corp Side-chain unsaturated polymers, radiation-sensitive resin compositions, and spacers for liquid crystal display elements
JP4815952B2 (en) 2005-08-26 2011-11-16 Jsr株式会社 Polymer, radiation sensitive composition for color filter, color filter and color liquid crystal display panel
JP4835835B2 (en) * 2006-03-13 2011-12-14 Jsr株式会社 Side chain unsaturated polymer, radiation sensitive resin composition, and spacer for liquid crystal display device
JP4888640B2 (en) * 2006-03-14 2012-02-29 Jsr株式会社 Radiation sensitive resin composition and spacer for liquid crystal display element
JP5181491B2 (en) * 2007-02-20 2013-04-10 Jsr株式会社 Side chain unsaturated polymer, radiation sensitive resin composition, and spacer for liquid crystal display device
JP5279703B2 (en) * 2007-05-11 2013-09-04 株式会社ダイセル Light and / or thermosetting copolymer, curable resin composition, and cured product
JP4985140B2 (en) * 2007-06-21 2012-07-25 Jsr株式会社 Side chain unsaturated polymer, radiation sensitive resin composition, and spacer for liquid crystal display device
JP5152868B2 (en) * 2009-06-11 2013-02-27 日本化薬株式会社 Visible light curable liquid crystal sealant and liquid crystal display cell using the same
JP5829932B2 (en) * 2012-01-31 2015-12-09 大阪有機化学工業株式会社 Hard coat film and resin composition used for production thereof
CN105273157B (en) * 2015-10-22 2017-12-26 广东工业大学 A kind of hypoxemia inhibition nano hybridization filler of uV curable and preparation method thereof
CN106349459A (en) * 2016-08-24 2017-01-25 深圳市谛源光科有限公司 Modified preparation method of high-adhesion UV (Ultraviolet) resin for surface of electronic glass

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4257758B2 (en) * 1999-02-25 2009-04-22 大日本印刷株式会社 Photosensitive resin composition and color filter
JP4218851B2 (en) * 1999-02-25 2009-02-04 大日本印刷株式会社 Photosensitive resin composition for forming color filter protective film
JP2002356602A (en) * 2000-07-28 2002-12-13 Sekisui Chem Co Ltd Colored resin emulsion, ink for ink-jet printing, electrodeposition liquid and color filter
JP2002293837A (en) * 2001-03-30 2002-10-09 Dainippon Printing Co Ltd Hardenable resin and its production method
JP2002296775A (en) * 2001-03-30 2002-10-09 Dainippon Printing Co Ltd Photosensitive resin composition, color filter and liquid crystal panel
DE60234095D1 (en) * 2001-06-11 2009-12-03 Basf Se OXIM ESTER PHOTOINITIATORS WITH COMBINED STRUCTURE
JP2003066604A (en) * 2001-08-28 2003-03-05 Jsr Corp Radiation sensitive resin composition for spacer, spacer and liquid crystal display element

Also Published As

Publication number Publication date
JP2006077231A (en) 2006-03-23
JP4766235B2 (en) 2011-09-07
TWI442174B (en) 2014-06-21
KR20060050406A (en) 2006-05-19

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Legal Events

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MM4A Annulment or lapse of patent due to non-payment of fees