TW200612196A - Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element - Google Patents
Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display elementInfo
- Publication number
- TW200612196A TW200612196A TW094124367A TW94124367A TW200612196A TW 200612196 A TW200612196 A TW 200612196A TW 094124367 A TW094124367 A TW 094124367A TW 94124367 A TW94124367 A TW 94124367A TW 200612196 A TW200612196 A TW 200612196A
- Authority
- TW
- Taiwan
- Prior art keywords
- radiation sensitive
- resin composition
- sensitive resin
- spacer
- liquid crystal
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title abstract 4
- 239000011342 resin composition Substances 0.000 title abstract 3
- 125000006850 spacer group Chemical group 0.000 title abstract 3
- 239000004973 liquid crystal related substance Substances 0.000 title abstract 2
- 229920000642 polymer Polymers 0.000 title abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 4
- 125000002947 alkylene group Chemical group 0.000 abstract 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 abstract 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 125000003700 epoxy group Chemical group 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 abstract 1
- 239000012948 isocyanate Substances 0.000 abstract 1
- -1 isocyanate compound Chemical class 0.000 abstract 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 abstract 1
- 239000003505 polymerization initiator Substances 0.000 abstract 1
- 238000011084 recovery Methods 0.000 abstract 1
- 230000035945 sensitivity Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Abstract
To obtain a radiation sensitive resin composition which can acquire a sufficient spacer configuration even in the exposure of not more than 1,200 J/m2 with high sensitivity and high resolution and also can form a spacer for a liquid crystal display element excellent in elastic recovery, rubbing resistance, adhesiveness with a transparent substrate, heat resistance, or the like. The radiation sensitive resin composition comprises: a polymer which is obtained by reacting an isocyanate compound expressed by formula (1) (in formula (1), R1 represents hydrogen atom or methyl group and R2 represents an alkylene group) with a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) an epoxy group-containing unsaturated compound, (a3) a hydroxyl group-containing unsaturated compound, and (a4) another unsaturated compound; a polymerizable unsaturated compound; and a radiation sensitive polymerization initiator.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004235066 | 2004-08-12 | ||
JP2005168015A JP4766235B2 (en) | 2004-08-12 | 2005-06-08 | Radiation sensitive resin composition and spacer for liquid crystal display element |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200612196A true TW200612196A (en) | 2006-04-16 |
TWI442174B TWI442174B (en) | 2014-06-21 |
Family
ID=36156944
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094124367A TWI442174B (en) | 2004-08-12 | 2005-07-19 | A branched unsaturated polymer, a radiation-sensitive resin composition, and a spacer for a liquid crystal display element |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4766235B2 (en) |
KR (1) | KR20060050406A (en) |
TW (1) | TWI442174B (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI388581B (en) * | 2005-08-25 | 2013-03-11 | Jsr Corp | Side-chain unsaturated polymers, radiation-sensitive resin compositions, and spacers for liquid crystal display elements |
JP4815952B2 (en) | 2005-08-26 | 2011-11-16 | Jsr株式会社 | Polymer, radiation sensitive composition for color filter, color filter and color liquid crystal display panel |
JP4835835B2 (en) * | 2006-03-13 | 2011-12-14 | Jsr株式会社 | Side chain unsaturated polymer, radiation sensitive resin composition, and spacer for liquid crystal display device |
JP4888640B2 (en) * | 2006-03-14 | 2012-02-29 | Jsr株式会社 | Radiation sensitive resin composition and spacer for liquid crystal display element |
JP5181491B2 (en) * | 2007-02-20 | 2013-04-10 | Jsr株式会社 | Side chain unsaturated polymer, radiation sensitive resin composition, and spacer for liquid crystal display device |
JP5279703B2 (en) * | 2007-05-11 | 2013-09-04 | 株式会社ダイセル | Light and / or thermosetting copolymer, curable resin composition, and cured product |
JP4985140B2 (en) * | 2007-06-21 | 2012-07-25 | Jsr株式会社 | Side chain unsaturated polymer, radiation sensitive resin composition, and spacer for liquid crystal display device |
JP5152868B2 (en) * | 2009-06-11 | 2013-02-27 | 日本化薬株式会社 | Visible light curable liquid crystal sealant and liquid crystal display cell using the same |
JP5829932B2 (en) * | 2012-01-31 | 2015-12-09 | 大阪有機化学工業株式会社 | Hard coat film and resin composition used for production thereof |
CN105273157B (en) * | 2015-10-22 | 2017-12-26 | 广东工业大学 | A kind of hypoxemia inhibition nano hybridization filler of uV curable and preparation method thereof |
CN106349459A (en) * | 2016-08-24 | 2017-01-25 | 深圳市谛源光科有限公司 | Modified preparation method of high-adhesion UV (Ultraviolet) resin for surface of electronic glass |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4257758B2 (en) * | 1999-02-25 | 2009-04-22 | 大日本印刷株式会社 | Photosensitive resin composition and color filter |
JP4218851B2 (en) * | 1999-02-25 | 2009-02-04 | 大日本印刷株式会社 | Photosensitive resin composition for forming color filter protective film |
JP2002356602A (en) * | 2000-07-28 | 2002-12-13 | Sekisui Chem Co Ltd | Colored resin emulsion, ink for ink-jet printing, electrodeposition liquid and color filter |
JP2002293837A (en) * | 2001-03-30 | 2002-10-09 | Dainippon Printing Co Ltd | Hardenable resin and its production method |
JP2002296775A (en) * | 2001-03-30 | 2002-10-09 | Dainippon Printing Co Ltd | Photosensitive resin composition, color filter and liquid crystal panel |
DE60234095D1 (en) * | 2001-06-11 | 2009-12-03 | Basf Se | OXIM ESTER PHOTOINITIATORS WITH COMBINED STRUCTURE |
JP2003066604A (en) * | 2001-08-28 | 2003-03-05 | Jsr Corp | Radiation sensitive resin composition for spacer, spacer and liquid crystal display element |
-
2005
- 2005-06-08 JP JP2005168015A patent/JP4766235B2/en not_active Expired - Fee Related
- 2005-07-19 TW TW094124367A patent/TWI442174B/en not_active IP Right Cessation
- 2005-08-11 KR KR1020050073783A patent/KR20060050406A/en not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
JP2006077231A (en) | 2006-03-23 |
JP4766235B2 (en) | 2011-09-07 |
TWI442174B (en) | 2014-06-21 |
KR20060050406A (en) | 2006-05-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |