TW200641528A - Radiation sensitive resin composition and spacer for liquid crystal display element - Google Patents

Radiation sensitive resin composition and spacer for liquid crystal display element

Info

Publication number
TW200641528A
TW200641528A TW095107070A TW95107070A TW200641528A TW 200641528 A TW200641528 A TW 200641528A TW 095107070 A TW095107070 A TW 095107070A TW 95107070 A TW95107070 A TW 95107070A TW 200641528 A TW200641528 A TW 200641528A
Authority
TW
Taiwan
Prior art keywords
resin composition
sensitive resin
radiation sensitive
unsaturated compound
liquid crystal
Prior art date
Application number
TW095107070A
Other languages
Chinese (zh)
Other versions
TWI383253B (en
Inventor
Daigo Ichinohe
Toru Kajita
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200641528A publication Critical patent/TW200641528A/en
Application granted granted Critical
Publication of TWI383253B publication Critical patent/TWI383253B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

To provide a radiation sensitive resin composition having high sensitivity and high resolution, giving a satisfactory spacer shape even under exposure energy of about ≤ 1,200 J/m2, and capable of forming spacers for a liquid crystal display element excellent in elastic recovery, rubbing resistance, adhesion to a substrate, heat resistance, etc. The radiation sensitive resin composition contains (A) a polymer obtained by reacting a copolymer α of an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, a hydroxyl group-containing unsaturated compound and another unsaturated compound with a free isocyanato group-containing unsaturated compound β obtained by reacting a diisocyanate compound represented by the formula (1): OCN-W-NCO with a hydroxyl group-containing polymerizable unsaturated compound. In the formula (1), W denotes a divalent group represented by one of formulae (I)-(ix) (where n is an integer of 1-12).
TW095107070A 2005-03-02 2006-03-02 Sensitive linear resin composition and spacers for liquid crystal display elements TWI383253B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005057836 2005-03-02

Publications (2)

Publication Number Publication Date
TW200641528A true TW200641528A (en) 2006-12-01
TWI383253B TWI383253B (en) 2013-01-21

Family

ID=37623987

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095107070A TWI383253B (en) 2005-03-02 2006-03-02 Sensitive linear resin composition and spacers for liquid crystal display elements

Country Status (3)

Country Link
KR (1) KR101299380B1 (en)
CN (1) CN101030036A (en)
TW (1) TWI383253B (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4994136B2 (en) * 2006-07-26 2012-08-08 富士フイルム株式会社 Photosensitive composition, photosensitive resin transfer film, photospacer production method, liquid crystal display substrate, and liquid crystal display device
CN101855597B (en) * 2007-11-16 2012-12-12 富士胶片株式会社 Radiation-sensitive resin composition for forming spacer, spacer, method for forming spacer, and liquid crystal display device
JP5333734B2 (en) * 2008-02-28 2013-11-06 Ｊｓｒ株式会社 Radiation sensitive resin composition and spacer for liquid crystal display element
CN103688221B (en) * 2011-07-29 2016-08-17 三洋化成工业株式会社 Photosensitive polymer combination, solidfied material and sept
CN110187568A (en) * 2019-05-28 2019-08-30 上海天马微电子有限公司 A kind of liquid crystal display panel and preparation method thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0695369A (en) * 1991-10-14 1994-04-08 Sannopuko Kk Photosensitive resin composition
JP4306060B2 (en) 1999-12-09 2009-07-29 Ｊｓｒ株式会社 Radiation-sensitive resin composition for spacer and spacer
JP2003066604A (en) 2001-08-28 2003-03-05 Jsr Corp Radiation sensitive resin composition for spacer, spacer and liquid crystal display element
JP4014946B2 (en) * 2001-09-28 2007-11-28 東亞合成株式会社 Photosensitive pattern-forming curable resin, method for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel

Also Published As

Publication number Publication date
CN101030036A (en) 2007-09-05
KR101299380B1 (en) 2013-08-22
KR20060096330A (en) 2006-09-11
TWI383253B (en) 2013-01-21

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