TW200714622A - The side-chain unsaturated polymers, the radiation sensitive resin and the spacers used in LCD elements - Google Patents

The side-chain unsaturated polymers, the radiation sensitive resin and the spacers used in LCD elements

Info

Publication number
TW200714622A
TW200714622A TW095131002A TW95131002A TW200714622A TW 200714622 A TW200714622 A TW 200714622A TW 095131002 A TW095131002 A TW 095131002A TW 95131002 A TW95131002 A TW 95131002A TW 200714622 A TW200714622 A TW 200714622A
Authority
TW
Taiwan
Prior art keywords
sensitive resin
radiation sensitive
spacer
chain unsaturated
unsaturated polymers
Prior art date
Application number
TW095131002A
Other languages
Chinese (zh)
Other versions
TWI388581B (en
Inventor
Daigo Ichinohe
Isamu Yonekura
Toshihiro Nishio
Hiroshi Shiho
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Publication of TW200714622A publication Critical patent/TW200714622A/en
Application granted granted Critical
Publication of TWI388581B publication Critical patent/TWI388581B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/035—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyurethanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

The radiation sensitive resin composition of this invention comprises the following ingreadents: (a1) the unsaturated carboxylic acid and / or the unsaturated carboxylic acid anhydride (a2) the unsaturated compound having a hydroxyl group in molecular structure (a3) the polymer produced by reacting the isocyanate with copolymer of any other unsaturated compound except (a1) and (a2). The present invention provides the radiation sensitive resin which has high radiation sensitivity to obtain sufficient image of spacer even under the exposure of less than 1200 J/M2. This invention also provides the spacer used as the spacer of LCD element and produced by such composition, which has high flexibility, high recovery, abrasion resistance, excellent adhesive to transparent substrate and excellent thermal resistance.
TW095131002A 2005-08-25 2006-08-23 Side-chain unsaturated polymers, radiation-sensitive resin compositions, and spacers for liquid crystal display elements TWI388581B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005244153 2005-08-25

Publications (2)

Publication Number Publication Date
TW200714622A true TW200714622A (en) 2007-04-16
TWI388581B TWI388581B (en) 2013-03-11

Family

ID=38099054

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095131002A TWI388581B (en) 2005-08-25 2006-08-23 Side-chain unsaturated polymers, radiation-sensitive resin compositions, and spacers for liquid crystal display elements

Country Status (3)

Country Link
KR (1) KR100899080B1 (en)
CN (1) CN101131511B (en)
TW (1) TWI388581B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4826803B2 (en) * 2007-03-20 2011-11-30 Ｊｓｒ株式会社 Radiation-sensitive resin composition, spacer for liquid crystal display element and production method thereof
KR101321417B1 (en) 2009-12-28 2013-10-30 제일모직주식회사 Resin composition for protection layer of color filter, protection layer of color filter using same and image sensor including same
TW201702737A (en) * 2015-07-09 2017-01-16 奇美實業股份有限公司 Photosensitive resin composition, protective film, and device
CN109062006A (en) * 2018-08-31 2018-12-21 饶圣红 Photosensitive alkali-soluble resin, preparation method thereof and negative resist composition

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4218851B2 (en) * 1999-02-25 2009-02-04 大日本印刷株式会社 Photosensitive resin composition for forming color filter protective film
JP4385432B2 (en) 1999-04-09 2009-12-16 Ｊｓｒ株式会社 Radiation sensitive composition for color filter and color filter using the same
JP4014946B2 (en) 2001-09-28 2007-11-28 東亞合成株式会社 Photosensitive pattern-forming curable resin, method for producing the same, curable resin composition, color filter, liquid crystal panel substrate, and liquid crystal panel
US6844029B2 (en) * 2001-10-26 2005-01-18 Kansai Paint Co., Ltd. Photocurable primer composition and coating method by use of the same
JP4351519B2 (en) * 2003-11-26 2009-10-28 東洋インキ製造株式会社 Photosensitive composition and color filter
JP4766235B2 (en) * 2004-08-12 2011-09-07 Ｊｓｒ株式会社 Radiation sensitive resin composition and spacer for liquid crystal display element

Also Published As

Publication number Publication date
KR100899080B1 (en) 2009-05-25
CN101131511A (en) 2008-02-27
CN101131511B (en) 2012-05-30
KR20070024399A (en) 2007-03-02
TWI388581B (en) 2013-03-11

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