TW200627067A - Pattern-forming material, pattern-forming device, and pattern-forming method - Google Patents
Pattern-forming material, pattern-forming device, and pattern-forming methodInfo
- Publication number
- TW200627067A TW200627067A TW094141826A TW94141826A TW200627067A TW 200627067 A TW200627067 A TW 200627067A TW 094141826 A TW094141826 A TW 094141826A TW 94141826 A TW94141826 A TW 94141826A TW 200627067 A TW200627067 A TW 200627067A
- Authority
- TW
- Taiwan
- Prior art keywords
- pattern
- forming
- forming material
- binder
- value
- Prior art date
Links
- 239000000463 material Substances 0.000 title abstract 7
- 239000011230 binding agent Substances 0.000 abstract 4
- 239000002253 acid Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 230000009477 glass transition Effects 0.000 abstract 1
- 229920001519 homopolymer Polymers 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polymerisation Methods In General (AREA)
Abstract
The purpose of the present invention is to provide a pattern-forming material which is excellent in resolution, tenting property, developing property and resist-stripping property by prescribing both the I/O value of the binder contained in the photosensitive layer and the glass transition temperature within a certain numeral range, a pattern-forming device having said pattern-forming material, and a pattern-forming method using the above pattern-forming material. Therefore, provided is a pattern-forming material characterized in that it has at least one photosensitive layer on a support, and said photosensitive layer comprises a binder, a polymerizable compound and a photopolymerization initiator, wherein said binder has an I/O value in the range of 0.300 to 0.650 and an acid value in the range of 130 to 250 (mgKOH/g). The binder contains a copolymer which preferably includes 30% by mass or more of a monomer which constitutes a homopolymer having a I/O value of 0.35 or less. Moreover, provided are a pattern-forming device having the above pattern-forming material and a pattern-forming method using the above pattern-forming material.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004347638A JP4500657B2 (en) | 2004-11-30 | 2004-11-30 | Pattern forming material, pattern forming apparatus and pattern forming method |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200627067A true TW200627067A (en) | 2006-08-01 |
TWI460541B TWI460541B (en) | 2014-11-11 |
Family
ID=36564966
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094141826A TWI460541B (en) | 2004-11-30 | 2005-11-29 | Pattern-forming material, pattern-forming device, and pattern-forming method |
TW102140681A TWI514076B (en) | 2004-11-30 | 2005-11-29 | Pattern-forming material, pattern-forming device, and pattern-forming method |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102140681A TWI514076B (en) | 2004-11-30 | 2005-11-29 | Pattern-forming material, pattern-forming device, and pattern-forming method |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP4500657B2 (en) |
KR (3) | KR101516613B1 (en) |
CN (1) | CN101103310B (en) |
TW (2) | TWI460541B (en) |
WO (1) | WO2006059532A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI805865B (en) * | 2019-03-22 | 2023-06-21 | 南韓商Lg化學股份有限公司 | Stripper composition for removing photoresists and method for stripping photoresists using the same |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006208730A (en) * | 2005-01-27 | 2006-08-10 | Fuji Photo Film Co Ltd | Pattern forming material, apparatus, and method |
JP4942969B2 (en) * | 2005-09-16 | 2012-05-30 | 富士フイルム株式会社 | Pattern forming material and pattern forming method |
TWI546574B (en) * | 2011-06-01 | 2016-08-21 | Jsr股份有限公司 | Coloring composition, color filter and display element |
CN103918021B (en) * | 2012-09-18 | 2016-05-25 | 深圳市柔宇科技有限公司 | Large scale display screen and manufacture method thereof |
JP7308014B2 (en) * | 2017-02-23 | 2023-07-13 | 旭化成株式会社 | Photosensitive resin composition and photosensitive resin laminate |
JP6968633B2 (en) * | 2017-09-07 | 2021-11-17 | 東京応化工業株式会社 | Photosensitive composition and photopolymerization initiator used therein |
JP7327485B2 (en) * | 2019-08-14 | 2023-08-16 | 株式会社レゾナック | Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board |
JP7437212B2 (en) * | 2020-03-26 | 2024-02-22 | 株式会社オーク製作所 | Exposure equipment and exposure method |
KR102325273B1 (en) * | 2021-05-07 | 2021-11-10 | 황록연 | Method for manufacturing spacer in lens for camera and spacer manufacturing therefrom |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3931467A1 (en) * | 1989-09-21 | 1991-04-04 | Hoechst Ag | POLYMERIZABLE MIXTURE BY RADIATION AND METHOD FOR PRODUCING A SOLDER STOP MASK |
JPH04240854A (en) * | 1991-01-25 | 1992-08-28 | Hitachi Chem Co Ltd | Photosensitive resin composition and photosensitive element using same |
JPH07199458A (en) * | 1993-07-22 | 1995-08-04 | E I Du Pont De Nemours & Co | Multilayer, optical-image-forming and aqueously processable element for printed circuit |
JP3239881B2 (en) * | 1998-11-16 | 2001-12-17 | キヤノン株式会社 | Optical system and projection device using the same |
JP2001159817A (en) * | 1999-12-03 | 2001-06-12 | Hitachi Chem Co Ltd | Photosensitive resin composition, photosensitive element using same, method for producing resist pattern and method for producing printed wiring board |
JP2001318461A (en) * | 2000-05-11 | 2001-11-16 | Nichigo Morton Co Ltd | Photosensitive resin composition and photosensitive film using the same |
JP4096682B2 (en) * | 2002-10-04 | 2008-06-04 | 三菱化学株式会社 | Blue-violet laser photosensitive composition, and image forming material, image forming material, and image forming method using the same |
JP4448707B2 (en) * | 2003-02-06 | 2010-04-14 | 富士フイルム株式会社 | Photosensitive planographic printing plate |
JP4305732B2 (en) * | 2003-04-17 | 2009-07-29 | 日立化成工業株式会社 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, and method for producing printed wiring board |
JP2004335639A (en) * | 2003-05-06 | 2004-11-25 | Fuji Photo Film Co Ltd | Projection aligner |
JP4244156B2 (en) * | 2003-05-07 | 2009-03-25 | 富士フイルム株式会社 | Projection exposure equipment |
JP4450689B2 (en) * | 2003-07-31 | 2010-04-14 | 富士フイルム株式会社 | Exposure head |
JP4708785B2 (en) * | 2003-12-26 | 2011-06-22 | 富士フイルム株式会社 | Image exposure method and apparatus |
-
2004
- 2004-11-30 JP JP2004347638A patent/JP4500657B2/en active Active
-
2005
- 2005-11-24 CN CN2005800470449A patent/CN101103310B/en active Active
- 2005-11-24 WO PCT/JP2005/021589 patent/WO2006059532A1/en active Application Filing
- 2005-11-24 KR KR1020137022216A patent/KR101516613B1/en active IP Right Grant
- 2005-11-24 KR KR1020077011922A patent/KR101338091B1/en active IP Right Grant
- 2005-11-24 KR KR1020147036965A patent/KR101528784B1/en active IP Right Grant
- 2005-11-29 TW TW094141826A patent/TWI460541B/en active
- 2005-11-29 TW TW102140681A patent/TWI514076B/en active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI805865B (en) * | 2019-03-22 | 2023-06-21 | 南韓商Lg化學股份有限公司 | Stripper composition for removing photoresists and method for stripping photoresists using the same |
Also Published As
Publication number | Publication date |
---|---|
KR20130101590A (en) | 2013-09-13 |
TWI514076B (en) | 2015-12-21 |
JP2006154556A (en) | 2006-06-15 |
TWI460541B (en) | 2014-11-11 |
KR101516613B1 (en) | 2015-05-04 |
CN101103310B (en) | 2012-03-14 |
WO2006059532A1 (en) | 2006-06-08 |
TW201407283A (en) | 2014-02-16 |
KR20150009609A (en) | 2015-01-26 |
CN101103310A (en) | 2008-01-09 |
KR101528784B1 (en) | 2015-06-15 |
KR20070084581A (en) | 2007-08-24 |
KR101338091B1 (en) | 2013-12-06 |
JP4500657B2 (en) | 2010-07-14 |
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