TW200745753A - Negative photosensitive resin composition - Google Patents

Negative photosensitive resin composition

Info

Publication number
TW200745753A
TW200745753A TW096110791A TW96110791A TW200745753A TW 200745753 A TW200745753 A TW 200745753A TW 096110791 A TW096110791 A TW 096110791A TW 96110791 A TW96110791 A TW 96110791A TW 200745753 A TW200745753 A TW 200745753A
Authority
TW
Taiwan
Prior art keywords
resin composition
photosensitive resin
negative photosensitive
carboxylic acid
liquid crystal
Prior art date
Application number
TW096110791A
Other languages
Chinese (zh)
Other versions
TWI422971B (en
Inventor
Hong-Dae Shin
Joo-Pyo Yun
Hyoc-Min Youn
Tae-Hoon Yeo
Ki-Hyuk Koo
Ui-Cheol Jeong
Ho-Jin Lee
Dong-Myung Kim
Sang-Gak Choi
Dong-Hyuk Lee
Byung-Uk Kim
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of TW200745753A publication Critical patent/TW200745753A/en
Application granted granted Critical
Publication of TWI422971B publication Critical patent/TWI422971B/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26B—HAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B3/00—Hand knives with fixed blades
    • B26B3/08—Hand knives with fixed blades specially adapted for cutting cardboard, or wall, floor, or like covering materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B26—HAND CUTTING TOOLS; CUTTING; SEVERING
    • B26B—HAND-HELD CUTTING TOOLS NOT OTHERWISE PROVIDED FOR
    • B26B9/00—Blades for hand knives
    • B26B9/02—Blades for hand knives characterised by the shape of the cutting edge, e.g. wavy

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Forests & Forestry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

To provide a negative photosensitive resin composition which excels in performances such as adhesive force, heat resistance, insulation, flatness, chemical resistance and room-temperature storage stability and is suitable for an image forming material of a liquid crystal display element, which is suitable for use as an interlayer organic insulating film because of excellent sensitivity, film retention and UV transmittance particularly in the formation of an organic insulating film of a liquid crystal display element, and which can improve sensitivity and film retention when used as a resist resin for an overcoat, for a black matrix, for column spacers or for a color filter. The negative photosensitive resin composition comprises (a) an acrylic copolymer obtained by copolymerizing (I) a phenylmaleimide compound, (ii) an allyl acrylic compound and (iii) an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride or a mixture of these, (b) a photoinitiator, (c) a polyfunctional monomer having an ethylenically unsaturated bond, (d) a silicon compound containing an epoxy group or an amine group, and (e) a solvent.
TW096110791A 2006-04-06 2007-03-28 Negative photosensitive resin composition TWI422971B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060031587A KR101313538B1 (en) 2006-04-06 2006-04-06 Negative photosensitive resin composition

Publications (2)

Publication Number Publication Date
TW200745753A true TW200745753A (en) 2007-12-16
TWI422971B TWI422971B (en) 2014-01-11

Family

ID=38681170

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096110791A TWI422971B (en) 2006-04-06 2007-03-28 Negative photosensitive resin composition

Country Status (4)

Country Link
JP (1) JP5194225B2 (en)
KR (1) KR101313538B1 (en)
CN (1) CN101051186B (en)
TW (1) TWI422971B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI452430B (en) * 2008-07-01 2014-09-11 Jsr Corp Negative Sensitive Radiation Linear Resin Composition
TWI480292B (en) * 2010-11-30 2015-04-11 Nissan Chemical Ind Ltd Photosensitive resin composition for microlens

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4752649B2 (en) * 2006-07-12 2011-08-17 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
EP2436056B1 (en) * 2009-05-25 2016-08-03 Basf Se Electronic device comprising organic crosslinkable dielectrics and method of preparation thereof
KR101505716B1 (en) * 2009-07-29 2015-03-24 아사히 가세이 이-매터리얼즈 가부시키가이샤 Photosensitive resin composition, photosensitive resin laminate, and method for forming resist pattern
CN102033427A (en) * 2009-09-30 2011-04-27 富士胶片株式会社 Colored photosensitive resin composition for ultraviolet laser, pattern forming method, color filter, method for manufacturing color filter, and display device
KR101759929B1 (en) * 2009-11-20 2017-07-20 코오롱인더스트리 주식회사 Photosensitive resin composition
KR20120021488A (en) * 2010-08-03 2012-03-09 주식회사 동진쎄미켐 Negative photosensitive resin composition
JP5636839B2 (en) * 2010-09-16 2014-12-10 Jsr株式会社 Radiation-sensitive resin composition, interlayer insulating film, method for forming interlayer insulating film, and display element
US9247041B2 (en) 2011-03-24 2016-01-26 Bilcare Technologies Singapore Pte. Ltd. Inherent disorder reader adapted to be connected to a mobile device
JP5966268B2 (en) * 2011-07-22 2016-08-10 Jsr株式会社 Array substrate, liquid crystal display element, and method of manufacturing array substrate
JP5966328B2 (en) * 2011-11-16 2016-08-10 Jsr株式会社 Array substrate, liquid crystal display element, and method of manufacturing array substrate
KR20150043452A (en) * 2012-10-17 2015-04-22 후지필름 가부시키가이샤 Process for producing permanent film for optical material, cured film produced thereby, and organic el display device and liquid-crystal display device each obtained using said cured film
KR101609706B1 (en) 2014-01-27 2016-04-06 금호석유화학 주식회사 Photosensitive resin composition and method of manufacturing patternized layer by using the same
TWI647532B (en) * 2014-07-01 2019-01-11 南韓商東友精細化工有限公司 Photosensitive resin composition
KR102630945B1 (en) * 2015-11-20 2024-01-30 주식회사 동진쎄미켐 Photosensitive resin composition
CN113448164A (en) * 2020-03-26 2021-09-28 台湾永光化学工业股份有限公司 Negative photosensitive resin composition and use thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08339084A (en) * 1995-06-09 1996-12-24 Nippon Oil & Fats Co Ltd Resin composition curable with active energy beam
JP2002365795A (en) * 2001-06-06 2002-12-18 Jsr Corp Radiation sensitive composition for color liquid crystal display
TW546541B (en) * 2001-06-15 2003-08-11 Jsr Corp Radiation sensitive resin composition, color filter and color liquid crystal display element
WO2004015497A1 (en) * 2002-08-07 2004-02-19 Mitsubishi Chemical Corporation Image forming material having bluish-violet laser-photosensitive resist material layer and resist image forming method therefor
US7648738B2 (en) * 2002-12-03 2010-01-19 Ciba Specialty Chemicals Corporation Oxime ester photoinitiators with heteroaromatic groups
TWI285298B (en) * 2003-01-14 2007-08-11 Sumitomo Chemical Co Photosensitive resin composition
JP4561101B2 (en) * 2003-03-06 2010-10-13 Ｊｓｒ株式会社 Radiation sensitive composition for color filter and color filter
JP2005283914A (en) * 2004-03-29 2005-10-13 Fuji Photo Film Co Ltd Coloring photosensitive resin composition, photomask production material, photomask, and its manufacturing method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI452430B (en) * 2008-07-01 2014-09-11 Jsr Corp Negative Sensitive Radiation Linear Resin Composition
TWI480292B (en) * 2010-11-30 2015-04-11 Nissan Chemical Ind Ltd Photosensitive resin composition for microlens

Also Published As

Publication number Publication date
JP2007279728A (en) 2007-10-25
JP5194225B2 (en) 2013-05-08
CN101051186A (en) 2007-10-10
CN101051186B (en) 2012-06-27
TWI422971B (en) 2014-01-11
KR101313538B1 (en) 2013-10-01
KR20070100042A (en) 2007-10-10

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