TW200606583A - Photosensitive composition, photosensitive film, and permanent pattern and process for forming the same - Google Patents

Photosensitive composition, photosensitive film, and permanent pattern and process for forming the same

Info

Publication number
TW200606583A
TW200606583A TW094109725A TW94109725A TW200606583A TW 200606583 A TW200606583 A TW 200606583A TW 094109725 A TW094109725 A TW 094109725A TW 94109725 A TW94109725 A TW 94109725A TW 200606583 A TW200606583 A TW 200606583A
Authority
TW
Taiwan
Prior art keywords
photosensitive
copolymer
photosensitive composition
objects
equivalent
Prior art date
Application number
TW094109725A
Other languages
Chinese (zh)
Inventor
Takashi Takayanagi
Yuichi Wakata
Hiromi Ishikawa
Yuji Shimoyama
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of TW200606583A publication Critical patent/TW200606583A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser

Abstract

The objects of the present invention are to provide photosensitive compositions and hotosensitive films that may represent little surface tackiness, proper laminating ability, appropriate handling property, and superior shelf stability, and also may display superior chemical resistance, higher surface hardness, and sufficient thermal resistance after developing; in addition, to provide highly fine and precise permanent patterns such as protective layers, interlayer insulating films, and solder resist patterns and the like. These objects may be attained by the photosensitive composition that comprises (A) a copolymer, (B) a polymerizable compound, and (C) a photopolymerization initiator, wherein the copolymer (A) is synthesized from a precursor copolymer containing at least a monomer unit of maleic anhydride and a primary amine compound, by reacting one equivalent of anhydride group of the precursor copolymer with 0.1 to 1.2 equivalent of the primary amine compound; and the photosensitive film that utilizes the photosensitive composition.
TW094109725A 2004-03-29 2005-03-29 Photosensitive composition, photosensitive film, and permanent pattern and process for forming the same TW200606583A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004095060 2004-03-29
JP2005082426A JP2005316431A (en) 2004-03-29 2005-03-22 Photosensitive composition, photosensitive film, and permanent pattern and process for forming same

Publications (1)

Publication Number Publication Date
TW200606583A true TW200606583A (en) 2006-02-16

Family

ID=35056347

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094109725A TW200606583A (en) 2004-03-29 2005-03-29 Photosensitive composition, photosensitive film, and permanent pattern and process for forming the same

Country Status (3)

Country Link
JP (1) JP2005316431A (en)
TW (1) TW200606583A (en)
WO (1) WO2005093515A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107799407A (en) * 2016-08-29 2018-03-13 中国科学院苏州纳米技术与纳米仿生研究所 The notched gates preparation method and high-power RF device of a kind of transistor

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2562599B1 (en) 2009-01-29 2014-12-10 Digiflex Ltd. Process for producing a photomask on a photopolymeric surface

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2720238B2 (en) * 1992-03-17 1998-03-04 富士写真フイルム株式会社 Photopolymerizable composition, color filter using the same, and method for producing the same
JPH06123967A (en) * 1992-08-26 1994-05-06 Fuji Photo Film Co Ltd Photopolymerizable composition, color filter using the same and its production
JPH07110577A (en) * 1993-08-16 1995-04-25 Fuji Photo Film Co Ltd Photopolymerizable composition, color filter using the composition and its production method
JP3592827B2 (en) * 1996-03-06 2004-11-24 富士写真フイルム株式会社 Method for manufacturing photosensitive element and multilayer wiring board
JPH1184650A (en) * 1997-09-03 1999-03-26 Hitachi Chem Co Ltd Photosensitive resin composition, photosensitive element and production of printed circuit board using that
JP2000003039A (en) * 1998-06-16 2000-01-07 Fuji Photo Film Co Ltd Photosensitive resin composition, photosensitive element, insulating resin material, and production of multilayer interconnection board using the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107799407A (en) * 2016-08-29 2018-03-13 中国科学院苏州纳米技术与纳米仿生研究所 The notched gates preparation method and high-power RF device of a kind of transistor
CN107799407B (en) * 2016-08-29 2020-07-17 中国科学院苏州纳米技术与纳米仿生研究所 Preparation method of groove gate of transistor and high-power radio frequency device

Also Published As

Publication number Publication date
JP2005316431A (en) 2005-11-10
WO2005093515A1 (en) 2005-10-06

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