TWI255835B - Radiation sensitive composition for use as a projection material for vertically aligned color liquid crystal displays panels - Google Patents

Radiation sensitive composition for use as a projection material for vertically aligned color liquid crystal displays panels

Info

Publication number
TWI255835B
TWI255835B TW091114072A TW91114072A TWI255835B TW I255835 B TWI255835 B TW I255835B TW 091114072 A TW091114072 A TW 091114072A TW 91114072 A TW91114072 A TW 91114072A TW I255835 B TWI255835 B TW I255835B
Authority
TW
Taiwan
Prior art keywords
radiation sensitive
sensitive composition
liquid crystal
color liquid
vertically aligned
Prior art date
Application number
TW091114072A
Other languages
Chinese (zh)
Inventor
Shigeru Abe
Original Assignee
Jsr Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corp filed Critical Jsr Corp
Application granted granted Critical
Publication of TWI255835B publication Critical patent/TWI255835B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Liquid Crystal (AREA)

Abstract

The radiation sensitive composition gives a cured body having less than 10<12> Omega.cm electric resistance and preferably contains (A) electrically conductive particles, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photopolymerization initiator. The radiation sensitive composition for a protrusion material of a perpendicular alignment type color liquid crystal display panel has high film hardness and excellent smoothness of the surfaces of protrusions, less liable to produce residue and surface stain on a substrate in an unexposed area and less liable to cause seizing and defective display such as uneven display.
TW091114072A 2001-06-27 2002-06-26 Radiation sensitive composition for use as a projection material for vertically aligned color liquid crystal displays panels TWI255835B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001194864A JP4660985B2 (en) 2001-06-27 2001-06-27 Projection material for vertical alignment color LCD panel

Publications (1)

Publication Number Publication Date
TWI255835B true TWI255835B (en) 2006-06-01

Family

ID=19032925

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091114072A TWI255835B (en) 2001-06-27 2002-06-26 Radiation sensitive composition for use as a projection material for vertically aligned color liquid crystal displays panels

Country Status (4)

Country Link
JP (1) JP4660985B2 (en)
KR (1) KR20030004057A (en)
SG (1) SG94877A1 (en)
TW (1) TWI255835B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4619835B2 (en) * 2005-03-11 2011-01-26 富士フイルム株式会社 Projection for liquid crystal alignment control, manufacturing method thereof, and liquid crystal display device
JP4739048B2 (en) * 2005-03-11 2011-08-03 富士フイルム株式会社 Projection for liquid crystal alignment control and manufacturing method thereof, photosensitive resin composition, resin transfer material, substrate for liquid crystal display device, liquid crystal display element, and liquid crystal display device
JP4739065B2 (en) * 2005-03-29 2011-08-03 富士フイルム株式会社 Projection for liquid crystal alignment control, and composition, resin transfer material, method for manufacturing liquid crystal alignment control projection, substrate for liquid crystal display device, liquid crystal display element, and liquid crystal display device
JP4739066B2 (en) * 2005-03-29 2011-08-03 富士フイルム株式会社 Projection for liquid crystal alignment control, and composition, resin transfer material, method for manufacturing liquid crystal alignment control projection, substrate for liquid crystal display device, liquid crystal display element, and liquid crystal display device
JP4715575B2 (en) * 2006-03-20 2011-07-06 Ｊｓｒ株式会社 Radiation sensitive resin composition for spacer, spacer and liquid crystal display element
JP5235305B2 (en) * 2007-01-09 2013-07-10 早川ゴム株式会社 Protruding conductive fine particles, anisotropic conductive material, and manufacturing method of protruding conductive fine particles
JP5764931B2 (en) * 2010-02-02 2015-08-19 東レ株式会社 Photosensitive paste for forming organic-inorganic composite conductive pattern and method for producing organic-inorganic composite conductive pattern
JP5461372B2 (en) * 2010-11-26 2014-04-02 株式会社ジャパンディスプレイ Alignment film forming solvent, alignment film material using the same, and method for producing liquid crystal display device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3916722B2 (en) * 1997-04-30 2007-05-23 シャープ株式会社 Liquid crystal display
TWI269250B (en) * 1997-06-12 2006-12-21 Sharp Kk Liquid crystal display device
JPH11249299A (en) * 1998-02-27 1999-09-17 Fuji Photo Film Co Ltd Photosensitive dispersed matter, photosensitive sheet and manufacture of conductive pattern
JP3422938B2 (en) * 1998-08-05 2003-07-07 松下電器産業株式会社 Liquid crystal display device and manufacturing method thereof
JP3940535B2 (en) * 1998-11-30 2007-07-04 Ｊｓｒ株式会社 Radiation sensitive composition for black resist
JP2003055583A (en) * 1998-12-08 2003-02-26 Taiyo Ink Mfg Ltd Photocurable anisotropic electroconductive composition and anisotropic electroconductive pattern formed by using the same

Also Published As

Publication number Publication date
JP4660985B2 (en) 2011-03-30
SG94877A1 (en) 2003-03-18
JP2003015276A (en) 2003-01-15
KR20030004057A (en) 2003-01-14

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees