TW200613864A - Photosensitive resin composition for spacer - Google Patents

Photosensitive resin composition for spacer

Info

Publication number
TW200613864A
TW200613864A TW094126722A TW94126722A TW200613864A TW 200613864 A TW200613864 A TW 200613864A TW 094126722 A TW094126722 A TW 094126722A TW 94126722 A TW94126722 A TW 94126722A TW 200613864 A TW200613864 A TW 200613864A
Authority
TW
Taiwan
Prior art keywords
spacer
resin composition
photosensitive resin
liquid crystal
voltage holding
Prior art date
Application number
TW094126722A
Other languages
Chinese (zh)
Other versions
TWI407216B (en
Inventor
Taeg-Sung Jung
Hyun-Il Cho
In-Chul Lee
Kyung-Ha Park
Sung-Yong Baik
Chan-Seok Park
Original Assignee
Dongjin Semichem Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dongjin Semichem Co Ltd filed Critical Dongjin Semichem Co Ltd
Publication of TW200613864A publication Critical patent/TW200613864A/en
Application granted granted Critical
Publication of TWI407216B publication Critical patent/TWI407216B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)

Abstract

The object of this invention is to provide a photosensitive resin composition for spacer that can reduce the defect of unfilled area due to the liquid crystal drop amount and prevent the color filter from being damaged by the pressure. The photosensitive resin composition for spacer can not only eliminate the thickness deviation produced in the process, but also prevent decreasing the voltage holding ratio without eluting ions, impurities into the liquid crystal. Also, the photosensitive resin composition for spacer will not affect the alignment of the liquid crystal and has excellent rubbing resistance, sufficient voltage holding ratio and liquid crystal alignment property, as well as good developing property, thermal stability, size stability and compression strength. The photosensitive resin composition for spacer of this invention comprises (a) a resin selected from the group consisting of (i) alkali solvable acrylic resin, (ii) photopolymer resin, and (iii)the mixture thereof; (b) urethane resin; (c) at least two crosslinkable ethylenically unsaturated monomers; (d) a photo-polymerization initiator; and (e) a solvent.
TW094126722A 2004-08-09 2005-08-08 Photosensitive resin composition for spacer TWI407216B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR20040062502 2004-08-09

Publications (2)

Publication Number Publication Date
TW200613864A true TW200613864A (en) 2006-05-01
TWI407216B TWI407216B (en) 2013-09-01

Family

ID=36076832

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094126722A TWI407216B (en) 2004-08-09 2005-08-08 Photosensitive resin composition for spacer

Country Status (4)

Country Link
JP (1) JP4864375B2 (en)
KR (1) KR101247243B1 (en)
CN (1) CN1734351B (en)
TW (1) TWI407216B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI693470B (en) * 2015-06-30 2020-05-11 日商富士軟片股份有限公司 Photosensitive resin composition, method for producing cured film, cured film, and liquid crystal display device

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006257220A (en) * 2005-03-16 2006-09-28 Jsr Corp Copolymer, radiation-sensitive resin composition using this, spacer for liquid crystal display element, and liquid crystal display element
JP4816917B2 (en) * 2006-03-17 2011-11-16 Ｊｓｒ株式会社 Radiation-sensitive resin composition, spacer for liquid crystal display panel, method for forming spacer for liquid crystal display panel, and liquid crystal display panel
WO2008002660A2 (en) 2006-06-28 2008-01-03 Northwestern University Crosslinked polymeric dielectric materials and methods of manufacturing and use thereof
EP2089442B1 (en) * 2006-11-28 2014-10-01 Polyera Corporation Photopolymer-based dielectric materials and methods of preparation and use thereof
KR100839046B1 (en) * 2006-12-14 2008-06-19 제일모직주식회사 Photosensitive resin composition for liquid crystal device, column spacer using the composition, and display device using the column spacer
KR101404459B1 (en) * 2007-04-06 2014-06-09 주식회사 동진쎄미켐 Photosensitive paste composition for plasma display panel barrier rib and method for forming plasma display panel barrier rib
KR100835605B1 (en) * 2007-06-19 2008-06-09 제일모직주식회사 Thermosetting resin composition for color filter of cmos image sensor and color filter using the composition, and cmos image sensor using the color filter
CN101910928B (en) * 2007-12-26 2013-08-07 Jsr株式会社 Liquid crystal aligning agent and method for forming liquid crystal alignment film
JP5328175B2 (en) * 2008-02-25 2013-10-30 富士フイルム株式会社 Photosensitive resin composition, photospacer and method for producing the same, display device substrate and display device
KR20090108781A (en) * 2008-04-14 2009-10-19 주식회사 동진쎄미켐 Black paste composition having conductivity property, filter for shielding electromagnetic interference and display device comprising the same
TWI647532B (en) * 2014-07-01 2019-01-11 南韓商東友精細化工有限公司 Photosensitive resin composition
CN104730863B (en) * 2014-11-03 2018-08-14 杭州福斯特应用材料股份有限公司 A kind of dry film photoresist

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2933145B2 (en) * 1991-05-23 1999-08-09 日本化薬株式会社 UV curable resin composition for color filter protective film and cured product thereof
JP3638660B2 (en) * 1995-05-01 2005-04-13 松下電器産業株式会社 Photosensitive resin composition, photosensitive dry film for sandblasting using the same, and etching method using the same
JP3366859B2 (en) * 1998-03-05 2003-01-14 日立化成デュポンマイクロシステムズ株式会社 Developer for photosensitive polyimide precursor and pattern manufacturing method using the same
JP3940535B2 (en) * 1998-11-30 2007-07-04 Ｊｓｒ株式会社 Radiation sensitive composition for black resist
JP2001117225A (en) * 1999-10-14 2001-04-27 Asahi Kasei Corp Photosensitive resin composition
JP2001154206A (en) * 1999-11-25 2001-06-08 Jsr Corp Radiation sensitive resin composition for spacer, spacer and liquid crystal display element
JP2002040225A (en) * 2000-07-27 2002-02-06 Jsr Corp Radiation sensitive composition for color liquid crystal display device and color liquid crystal display device
CN1462284A (en) * 2000-08-16 2003-12-17 部鲁尔科学公司 Photosensitive resin compositions for color filter applications
JP3467488B2 (en) * 2001-03-31 2003-11-17 アダムス テクノロジー カンパニー リミテッド Resist composition for column spacer of liquid crystal display device
JP2002365795A (en) * 2001-06-06 2002-12-18 Jsr Corp Radiation sensitive composition for color liquid crystal display
JP2004151691A (en) * 2002-09-30 2004-05-27 Rohm & Haas Electronic Materials Llc Improved photoresist
KR100481014B1 (en) * 2002-10-04 2005-04-07 주식회사 동진쎄미켐 Photosensitive resin composition using photopolymer
JP4082186B2 (en) * 2002-11-19 2008-04-30 三菱化学株式会社 Blue-violet laser photosensitive composition, and image forming material, image forming material, and image forming method using the same
EP1567518B1 (en) * 2002-12-03 2009-01-14 Ciba Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
JP2004184871A (en) * 2002-12-05 2004-07-02 Mitsubishi Chemicals Corp Blue-violet laser photosensitive composition and image forming material, imaging material and image forming method using the same
JP2004318047A (en) * 2003-03-31 2004-11-11 Sumitomo Bakelite Co Ltd Photosensitive resin composition, laminate, wiring board, and flexible wiring board
JP2005092198A (en) * 2003-08-12 2005-04-07 Showa Denko Kk Photosensitive resin composition
JP4830310B2 (en) * 2004-02-23 2011-12-07 三菱化学株式会社 Oxime ester-based compound, photopolymerizable composition, and color filter using the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI693470B (en) * 2015-06-30 2020-05-11 日商富士軟片股份有限公司 Photosensitive resin composition, method for producing cured film, cured film, and liquid crystal display device

Also Published As

Publication number Publication date
TWI407216B (en) 2013-09-01
JP2006053557A (en) 2006-02-23
KR20060050296A (en) 2006-05-19
CN1734351A (en) 2006-02-15
KR101247243B1 (en) 2013-03-25
CN1734351B (en) 2010-04-21
JP4864375B2 (en) 2012-02-01

Similar Documents

Publication Publication Date Title
TW200613864A (en) Photosensitive resin composition for spacer
CN101108968B (en) Liquid crystal mixture used for polymerization alignment manufacture process and method for manufacturing liquid crystal display board
WO2008120596A1 (en) Cellulose ester optical film, polarizing plate and liquid crystal display using the cellulose ester optical film, method for producing cellulose ester optical film, and copolymer
WO2009041512A1 (en) Liquid crystal composition and its use
SG152152A1 (en) Radiation-sensitive composition for forming colored layer, color filter and liquid crystal display device
TW200715054A (en) Transfer meterial, process for producing a color filter using the same, a color filter and liquid crystal display device
WO2008126700A1 (en) Optical film, polarizing plate, liquid crystal display and ultraviolet absorbing polymer
WO2007146785A3 (en) Touch screen liquid crystal display
WO2009022644A1 (en) Negative photosensitive resin composition, spacer and liquid crystal display
SG152182A1 (en) Radiation-sensitive composition for blue color filter, color filter and liquid crystal display device
CN103911078B (en) The ultraviolet solidified adhesive of contact panel laminating high transmission rate
WO2009011366A1 (en) Image display device and method for manufacturing the same
TW200639454A (en) Polarizer protection film, polarizing plate, and image display unit
EP2065361A3 (en) Polymerisable compounds
TW200706570A (en) Optical compensation film, method for producing optical compensation film, polarization plate and liquid crystal display
TW200725002A (en) Liquid crystal panel and liquid crystal display
WO2009011228A1 (en) Cellulose ester film, method for producing cellulose ester film, polarizing plate using the same, and liquid crystal display
KR20120104207A (en) Liquid crystal composition that contains polymerizable compound, and liquid crystal display element using same
CN105985750A (en) UV-moisture dual-curing liquid optical cement and preparation method and application thereof
TW200734718A (en) Method for forming pixel isolation wall for color filter, substrate having pixel isolation wall for color filter, color filter for display device, and display device
TW200739259A (en) Radiation-sensitive resin composition, spacer for liquid crystal display panel, method for forming spacer for liquid crystal display panel, and liquid crystal display panel
WO2008126699A1 (en) Ultraviolet absorbing polymer, cellulose ester optical film, method for producing cellulose ester optical film, polarizing plate and liquid crystal display
WO2009131393A3 (en) Adhesive composition, and polarizing plates and lcds utilizing the adhesive composition
TW200801735A (en) Composition for forming liquid crystal orientation film, apparatus for forming liquid orientation film, and liquid crystal display
KR20160003063A (en) Polymerizable mixture and liquid crystal composition thereof