KR101162135B1 - 회절 소자 및 광학 장치 - Google Patents
회절 소자 및 광학 장치 Download PDFInfo
- Publication number
- KR101162135B1 KR101162135B1 KR1020057014183A KR20057014183A KR101162135B1 KR 101162135 B1 KR101162135 B1 KR 101162135B1 KR 1020057014183 A KR1020057014183 A KR 1020057014183A KR 20057014183 A KR20057014183 A KR 20057014183A KR 101162135 B1 KR101162135 B1 KR 101162135B1
- Authority
- KR
- South Korea
- Prior art keywords
- grating
- diffraction element
- diffraction
- substrate
- convex portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title claims description 32
- 239000000758 substrate Substances 0.000 claims abstract description 93
- 238000000034 method Methods 0.000 claims abstract description 35
- 239000000463 material Substances 0.000 claims description 20
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 13
- 230000005540 biological transmission Effects 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 10
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 8
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 4
- -1 Ta 2 O 5 Inorganic materials 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims description 2
- 229910052710 silicon Inorganic materials 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims 1
- 230000000694 effects Effects 0.000 abstract description 16
- 238000000926 separation method Methods 0.000 abstract description 13
- 230000010287 polarization Effects 0.000 description 24
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 15
- 239000011521 glass Substances 0.000 description 10
- 230000003595 spectral effect Effects 0.000 description 10
- 238000005530 etching Methods 0.000 description 9
- 238000012545 processing Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 238000001312 dry etching Methods 0.000 description 6
- 238000000206 photolithography Methods 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 230000000644 propagated effect Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010668 complexation reaction Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/18—Generating the spectrum; Monochromators using diffraction elements, e.g. grating
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1866—Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
- G02B5/1871—Transmissive phase gratings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Polarising Elements (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2003-00068214 | 2003-03-13 | ||
| JP2003068214 | 2003-03-13 | ||
| JP2003078133 | 2003-03-20 | ||
| JPJP-P-2003-00078133 | 2003-03-20 | ||
| PCT/JP2004/003305 WO2004081620A1 (ja) | 2003-03-13 | 2004-03-12 | 回折素子および光学装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20050109475A KR20050109475A (ko) | 2005-11-21 |
| KR101162135B1 true KR101162135B1 (ko) | 2012-07-03 |
Family
ID=32992966
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020057014183A Expired - Lifetime KR101162135B1 (ko) | 2003-03-13 | 2004-03-12 | 회절 소자 및 광학 장치 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7142363B2 (enExample) |
| EP (1) | EP1602947A4 (enExample) |
| JP (2) | JPWO2004081620A1 (enExample) |
| KR (1) | KR101162135B1 (enExample) |
| WO (1) | WO2004081620A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013024625A (ja) * | 2011-07-19 | 2013-02-04 | Seiko Epson Corp | 分光装置、検出装置及び分光装置の製造方法 |
Families Citing this family (62)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1437608A4 (en) * | 2001-09-13 | 2006-07-26 | Asahi Glass Co Ltd | DIFFRACTION DEVICE |
| US9040090B2 (en) | 2003-12-19 | 2015-05-26 | The University Of North Carolina At Chapel Hill | Isolated and fixed micro and nano structures and methods thereof |
| US7420735B2 (en) * | 2004-07-26 | 2008-09-02 | Nippon Sheet Glass Co., Ltd. | Transmission type diffraction grating |
| JP4826472B2 (ja) * | 2004-07-29 | 2011-11-30 | 旭硝子株式会社 | 偏光性回折型フィルタおよび積層偏光性回折型フィルタ |
| US7961393B2 (en) | 2004-12-06 | 2011-06-14 | Moxtek, Inc. | Selectively absorptive wire-grid polarizer |
| US7570424B2 (en) | 2004-12-06 | 2009-08-04 | Moxtek, Inc. | Multilayer wire-grid polarizer |
| US7630133B2 (en) | 2004-12-06 | 2009-12-08 | Moxtek, Inc. | Inorganic, dielectric, grid polarizer and non-zero order diffraction grating |
| US20080055719A1 (en) * | 2006-08-31 | 2008-03-06 | Perkins Raymond T | Inorganic, Dielectric Grid Polarizer |
| US7800823B2 (en) | 2004-12-06 | 2010-09-21 | Moxtek, Inc. | Polarization device to polarize and further control light |
| JP2006350126A (ja) * | 2005-06-17 | 2006-12-28 | Sharp Corp | 波長選択素子 |
| WO2007057500A1 (en) * | 2005-11-18 | 2007-05-24 | Nanocomp Oy Ltd | Method of producing a diffraction grating element |
| JP2007264013A (ja) * | 2006-03-27 | 2007-10-11 | Konica Minolta Opto Inc | 光学素子及び双方向光通信モジュール |
| US7554734B1 (en) * | 2006-04-28 | 2009-06-30 | Johan Christer Holm | Polarization independent grating |
| US8755113B2 (en) | 2006-08-31 | 2014-06-17 | Moxtek, Inc. | Durable, inorganic, absorptive, ultra-violet, grid polarizer |
| JP5280654B2 (ja) * | 2006-09-21 | 2013-09-04 | 日本板硝子株式会社 | 透過型回折格子、並びに、それを用いた分光素子及び分光器 |
| EP2085968A4 (en) * | 2006-10-10 | 2011-03-30 | Asahi Glass Co Ltd | BENDING ELEMENT AND EQUIPPED OPTICAL HEAD ARRANGEMENT |
| JP5181552B2 (ja) * | 2007-07-04 | 2013-04-10 | 株式会社リコー | 回折光学素子および光ビーム検出手段および光走査装置および画像形成装置 |
| US8040607B2 (en) * | 2008-04-25 | 2011-10-18 | Jds Uniphase Corporation | Surface-relief diffraction grating |
| US7821900B2 (en) * | 2008-05-15 | 2010-10-26 | Northrop Grumman Systems Corporation | Diffractive optical element and method of designing the same |
| US8248696B2 (en) | 2009-06-25 | 2012-08-21 | Moxtek, Inc. | Nano fractal diffuser |
| CN103097925B (zh) * | 2010-08-06 | 2016-04-13 | 旭硝子株式会社 | 衍射光学元件和计测装置 |
| US8611007B2 (en) | 2010-09-21 | 2013-12-17 | Moxtek, Inc. | Fine pitch wire grid polarizer |
| US8913321B2 (en) | 2010-09-21 | 2014-12-16 | Moxtek, Inc. | Fine pitch grid polarizer |
| US8873144B2 (en) | 2011-05-17 | 2014-10-28 | Moxtek, Inc. | Wire grid polarizer with multiple functionality sections |
| US8913320B2 (en) | 2011-05-17 | 2014-12-16 | Moxtek, Inc. | Wire grid polarizer with bordered sections |
| US8922890B2 (en) | 2012-03-21 | 2014-12-30 | Moxtek, Inc. | Polarizer edge rib modification |
| JP2017004004A (ja) * | 2012-03-26 | 2017-01-05 | 旭硝子株式会社 | 透過型回折素子 |
| JP6007830B2 (ja) | 2012-03-26 | 2016-10-12 | 旭硝子株式会社 | 透過型回折素子 |
| WO2014016403A1 (de) * | 2012-07-27 | 2014-01-30 | Seereal Technologies S.A. | Polarisationsgitter für schräge einfallswinkel |
| JP2014092730A (ja) * | 2012-11-06 | 2014-05-19 | Canon Inc | 回折格子、それを用いた光学装置 |
| WO2014118925A1 (ja) | 2013-01-31 | 2014-08-07 | 株式会社島津製作所 | レーザパルス圧縮用回折格子及びレーザ装置 |
| JP2015028528A (ja) * | 2013-07-30 | 2015-02-12 | キヤノン株式会社 | 透過型回折光学素子及び計測装置 |
| JP6356557B2 (ja) * | 2013-09-30 | 2018-07-11 | 株式会社豊田中央研究所 | レンズおよびその製造方法 |
| US9348076B2 (en) | 2013-10-24 | 2016-05-24 | Moxtek, Inc. | Polarizer with variable inter-wire distance |
| US9720147B2 (en) | 2014-03-28 | 2017-08-01 | Lumentum Operations Llc | Reflective diffraction grating and fabrication method |
| JP6510231B2 (ja) * | 2014-08-27 | 2019-05-08 | 京セラ株式会社 | 携帯電子機器 |
| JP2017142465A (ja) * | 2016-02-12 | 2017-08-17 | 古河電気工業株式会社 | 光操作装置および光源装置 |
| CN106094087B (zh) * | 2016-08-02 | 2019-07-23 | 中国科学院微电子研究所 | 一种单级衍射光栅 |
| JP2018061155A (ja) * | 2016-10-06 | 2018-04-12 | レノボ・シンガポール・プライベート・リミテッド | 情報処理装置、情報処理装置の制御方法、及び情報処理装置の制御プログラム |
| JP2017033019A (ja) * | 2016-10-28 | 2017-02-09 | 株式会社島津製作所 | レーザ装置におけるチャープパルス増幅方法 |
| JP7071374B2 (ja) | 2017-01-05 | 2022-05-18 | マジック リープ, インコーポレイテッド | プラズマエッチングによる高屈折率ガラスのパターン化 |
| JP2018146624A (ja) * | 2017-03-01 | 2018-09-20 | Agc株式会社 | 透過型回折素子および反射防止構造 |
| US10712475B2 (en) | 2017-08-16 | 2020-07-14 | Lumentum Operations Llc | Multi-layer thin film stack for diffractive optical elements |
| US10802185B2 (en) * | 2017-08-16 | 2020-10-13 | Lumentum Operations Llc | Multi-level diffractive optical element thin film coating |
| US10914954B2 (en) | 2018-08-03 | 2021-02-09 | Facebook Technologies, Llc | Rainbow reduction for waveguide displays |
| US10761330B2 (en) * | 2018-01-23 | 2020-09-01 | Facebook Technologies, Llc | Rainbow reduction in waveguide displays |
| US10845596B2 (en) | 2018-01-23 | 2020-11-24 | Facebook Technologies, Llc | Slanted surface relief grating for rainbow reduction in waveguide display |
| JP7327907B2 (ja) * | 2018-04-25 | 2023-08-16 | デクセリアルズ株式会社 | 偏光板及び偏光板の製造方法 |
| CN115390173A (zh) * | 2018-06-11 | 2022-11-25 | Agc株式会社 | 衍射光学元件、投影装置及计测装置 |
| EP3588150A1 (en) | 2018-06-29 | 2020-01-01 | Thomson Licensing | An optical device comprising multi-layer waveguides |
| CN109581570B (zh) * | 2018-11-23 | 2021-09-07 | 京东方科技集团股份有限公司 | 金属线栅及其制造方法、显示面板、显示装置 |
| EP3671322A1 (en) | 2018-12-18 | 2020-06-24 | Thomson Licensing | Device for forming an outgoing electromagnetic wave from an incident electromagnetic wave |
| EP3671310A1 (en) | 2018-12-18 | 2020-06-24 | Thomson Licensing | Optical manipulation apparatus for trapping or moving micro or nanoparticles |
| EP3671293A1 (en) | 2018-12-21 | 2020-06-24 | Thomson Licensing | An optical device comprising at least one diffraction grating having a grating pitch above the wavelength |
| US11150394B2 (en) * | 2019-01-31 | 2021-10-19 | Facebook Technologies, Llc | Duty cycle range increase for waveguide combiners |
| US11487053B2 (en) | 2019-02-26 | 2022-11-01 | Ii-Vi Delaware, Inc. | Partially etched phase-transforming optical element |
| CN113646668A (zh) | 2019-04-11 | 2021-11-12 | 应用材料公司 | 用于光学装置的多深度膜 |
| CN112389111A (zh) * | 2019-08-19 | 2021-02-23 | 中钞特种防伪科技有限公司 | 光学防伪元件及光学防伪产品 |
| US12019252B2 (en) | 2019-11-26 | 2024-06-25 | Analog Devices, Inc. | Optical element with diffractive focusing features and diffractive anti-reflection features |
| JP2023059010A (ja) * | 2021-10-14 | 2023-04-26 | 三菱ケミカル株式会社 | 導光板 |
| US20230120539A1 (en) * | 2021-10-15 | 2023-04-20 | Applied Materials, Inc. | Metallized high-index blaze grating incoupler |
| US20230359031A1 (en) * | 2022-05-09 | 2023-11-09 | Visera Technologies Company Limited | Waveguide structure and display device using the same |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010046055A1 (en) * | 1996-12-17 | 2001-11-29 | Peter Speckbacher | Photoelectric position measuring device |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01213599A (ja) * | 1988-02-23 | 1989-08-28 | Nippon Telegr & Teleph Corp <Ntt> | 反射型回折格子 |
| JPH0527108A (ja) * | 1991-07-18 | 1993-02-05 | Ishikawajima Harima Heavy Ind Co Ltd | ラミナーグレーテイングの製造方法 |
| DE19502727A1 (de) * | 1995-01-28 | 1996-08-01 | Heidenhain Gmbh Dr Johannes | Phasengitter |
| JP3407477B2 (ja) * | 1995-06-08 | 2003-05-19 | 松下電器産業株式会社 | 位相格子とその作製方法並びに光学式エンコーダ |
| US5907436A (en) * | 1995-09-29 | 1999-05-25 | The Regents Of The University Of California | Multilayer dielectric diffraction gratings |
| JPH09145922A (ja) * | 1995-11-20 | 1997-06-06 | Sankyo Seiki Mfg Co Ltd | 回折用光学素子およびこれを用いた光ピックアップ装置 |
| BE1010069A6 (nl) * | 1996-03-29 | 1997-12-02 | Imec Inter Uni Micro Electr | Optisch systeem met hoge reflectiviteitsrooster. |
| JPH10148707A (ja) * | 1996-11-18 | 1998-06-02 | Nikon Corp | 回折格子及び分光装置 |
| JPH10177107A (ja) * | 1996-12-17 | 1998-06-30 | Hitachi Koki Co Ltd | 回折格子及び光記録装置 |
| JP3978821B2 (ja) * | 1997-08-20 | 2007-09-19 | 旭硝子株式会社 | 回折素子 |
| JPH11183249A (ja) * | 1997-12-24 | 1999-07-09 | Ando Electric Co Ltd | 分光器 |
| JPH11250483A (ja) * | 1998-03-03 | 1999-09-17 | Sankyo Seiki Mfg Co Ltd | 光ピックアップ装置 |
| JPH11271516A (ja) * | 1998-03-26 | 1999-10-08 | Minolta Co Ltd | 回折型カラーフィルター及びそれを用いた液晶表示装置 |
| JPH11312329A (ja) * | 1998-04-28 | 1999-11-09 | Asahi Glass Co Ltd | 偏光性回折素子および光ヘッド装置 |
| US6426837B1 (en) * | 1999-03-22 | 2002-07-30 | Mems Optical, Inc. | Diffractive selectively polarizing beam splitter and beam routing prisms produced thereby |
| JP4157654B2 (ja) * | 1999-08-23 | 2008-10-01 | 独立行政法人 日本原子力研究開発機構 | 円錐回折斜入射分光器及び該分光器用回折格子 |
| JP2001235710A (ja) * | 2000-02-24 | 2001-08-31 | Japan Science & Technology Corp | 回折光学素子及び撮像光学装置 |
| JP3443656B2 (ja) * | 2000-05-09 | 2003-09-08 | 独立行政法人産業技術総合研究所 | 光触媒発色部材とその製造方法 |
| US8054416B2 (en) * | 2000-08-15 | 2011-11-08 | Reflexite Corporation | Light polarizer |
| JP3996760B2 (ja) * | 2000-11-16 | 2007-10-24 | 松下電器産業株式会社 | 回折格子体、光ピックアップ、半導体レーザ装置、及び光情報装置 |
| US20020097660A1 (en) * | 2000-11-16 | 2002-07-25 | Matsushita Electric Industrial Co., Ltd. | Diffraction grating body, optical pick-up, semiconductor laser apparatus and optical information apparatus |
| JP2002169010A (ja) * | 2000-12-04 | 2002-06-14 | Minolta Co Ltd | 回折光学素子 |
| US6762880B2 (en) | 2001-02-21 | 2004-07-13 | Ibsen Photonics A/S | Grating structures and methods of making the grating structures |
| JP2002357716A (ja) * | 2001-05-31 | 2002-12-13 | Mitsubishi Chemicals Corp | 偏光板及び反射型液晶表示装置 |
| JP2003014914A (ja) | 2001-07-02 | 2003-01-15 | Sharp Corp | 回折素子およびそれを組み込んだ光ピックアップ装置 |
| JP2003255113A (ja) * | 2002-02-28 | 2003-09-10 | Canon Inc | 光分離素子およびそれを用いた光学機器 |
| US20040247010A1 (en) * | 2002-10-07 | 2004-12-09 | Makoto Okada | Antireflection diffraction grating |
| JP4609318B2 (ja) * | 2003-02-18 | 2011-01-12 | 住友電気工業株式会社 | 回折格子素子 |
-
2004
- 2004-03-12 JP JP2005503603A patent/JPWO2004081620A1/ja not_active Withdrawn
- 2004-03-12 EP EP04720263A patent/EP1602947A4/en not_active Withdrawn
- 2004-03-12 KR KR1020057014183A patent/KR101162135B1/ko not_active Expired - Lifetime
- 2004-03-12 WO PCT/JP2004/003305 patent/WO2004081620A1/ja not_active Ceased
-
2005
- 2005-09-13 US US11/223,936 patent/US7142363B2/en not_active Expired - Lifetime
-
2010
- 2010-08-26 JP JP2010189874A patent/JP5077404B2/ja not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20010046055A1 (en) * | 1996-12-17 | 2001-11-29 | Peter Speckbacher | Photoelectric position measuring device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013024625A (ja) * | 2011-07-19 | 2013-02-04 | Seiko Epson Corp | 分光装置、検出装置及び分光装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010262320A (ja) | 2010-11-18 |
| EP1602947A1 (en) | 2005-12-07 |
| JPWO2004081620A1 (ja) | 2006-06-15 |
| JP5077404B2 (ja) | 2012-11-21 |
| US20060001972A1 (en) | 2006-01-05 |
| US7142363B2 (en) | 2006-11-28 |
| WO2004081620A1 (ja) | 2004-09-23 |
| EP1602947A4 (en) | 2007-03-28 |
| KR20050109475A (ko) | 2005-11-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR101162135B1 (ko) | 회절 소자 및 광학 장치 | |
| US8165436B2 (en) | Highly efficient optical gratings with reduced thickness requirements and impedance-matching layers | |
| US6927915B2 (en) | Diffractive optical element, and optical system and optical apparatus provided with the same | |
| US11747529B2 (en) | Wafer level microstructures for an optical lens | |
| CN1881605B (zh) | 固体摄像元件、固体摄像装置及其制造方法 | |
| KR101340900B1 (ko) | 이중층 구조의 와이어 그리드 편광자 및 그 제조 방법 | |
| KR100623026B1 (ko) | 선 격자 편광자 및 그 제조방법 | |
| JP5739224B2 (ja) | 光学部品の製造方法及び光学部品 | |
| CN100386653C (zh) | 衍射元件以及光学装置 | |
| CN114325885B (zh) | 超表面光学器件、光学设备及制作超表面光学器件的方法 | |
| JP2002169022A (ja) | 光学素子およびそれを用いた分光装置および集積光学装置 | |
| JP2009092730A (ja) | 偏光変換素子 | |
| JP3189922B2 (ja) | 回折光学素子 | |
| JPH1020106A (ja) | 回折光学素子、投影光学系、照明光学系、光学機器、露光装置及びデバイスの製造方法 | |
| JP3214964B2 (ja) | 回折光学素子 | |
| JPH1020107A (ja) | 回折光学素子、投影光学系、照明光学系、光学機器、露光装置及びデバイス製造方法 | |
| JP2006072112A (ja) | 光学ローパスフィルタ及び光学機器 | |
| Ferstl et al. | Antireflection-coated arrays of binary lenses for interconnection networks at 1.5 um | |
| JP3314625B2 (ja) | 光量フィルタおよびその製造方法 | |
| WO2006104045A1 (ja) | 波長フィルタ | |
| Marciante et al. | Polarization-insensitive, high-dispersion TIR diffraction gratings |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0105 | International application |
Patent event date: 20050801 Patent event code: PA01051R01D Comment text: International Patent Application |
|
| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20090311 Comment text: Request for Examination of Application |
|
| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20101220 Patent event code: PE09021S01D |
|
| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20120425 |
|
| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20120627 Patent event code: PR07011E01D |
|
| PR1002 | Payment of registration fee |
Payment date: 20120627 End annual number: 3 Start annual number: 1 |
|
| PG1601 | Publication of registration | ||
| FPAY | Annual fee payment |
Payment date: 20150619 Year of fee payment: 4 |
|
| PR1001 | Payment of annual fee |
Payment date: 20150619 Start annual number: 4 End annual number: 4 |
|
| FPAY | Annual fee payment |
Payment date: 20160621 Year of fee payment: 5 |
|
| PR1001 | Payment of annual fee |
Payment date: 20160621 Start annual number: 5 End annual number: 5 |
|
| FPAY | Annual fee payment |
Payment date: 20170616 Year of fee payment: 6 |
|
| PR1001 | Payment of annual fee |
Payment date: 20170616 Start annual number: 6 End annual number: 6 |
|
| FPAY | Annual fee payment |
Payment date: 20180619 Year of fee payment: 7 |
|
| PR1001 | Payment of annual fee |
Payment date: 20180619 Start annual number: 7 End annual number: 7 |
|
| PC1801 | Expiration of term |
Termination date: 20240912 Termination category: Expiration of duration |